Download or read book Pulsed DC Reactive Magnetron Sputtering of Aluminum Nitride Thin Films written by Jung Won Cho and published by . This book was released on 2002 with total page 227 pages. Available in PDF, EPUB and Kindle. Book excerpt: Keywords: plasma diagnostics, thermal conductivity, AlN, pulsed DC sputtering.

Download or read book Pulsed DC Reactive Magnetron Sputtering of Aluminum Nitride Thin Films written by and published by . This book was released on 2003 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Aluminum nitride thin films have been deposited by pulsed DC reactive magnetron sputtering. The pulsed DC power provides arc-free deposition of insulating films. Two types of pulsed DC (unipolar and asymmetric bipolar) were studied with respect to characteristics and properties of resultant films. The unipolar power supply generates a series of 75 kHz DC pulses modulated with 2.5 kHz frequency. The frequency of asymmetric power supply can be varied from 50 kHz to 250 kHz. The duty cycle, which is a ratio of negative pulse time to total time, can be varied from 60% to 98%. Very fast oscillation and overshoot were observed when the polarity of the target voltage was changed. The control of crystal orientation of deposited film is important since the properties of AlN film is related with the orientation. For example, the acoustic velocity is high along the c-axis. The electromechanical coupling coefficient is large in a-axis direction. The crystal orientation and microstructure of the AlN films were strongly affected by the deposition conditions such as sputtering power, growth temperature, sputtering gas pressure and frequency/duty cycle. The crystal orientation of AlN films was closely related with the energy of sputtered atoms and mobility of adatoms on substrate. The c-axis oriented films were obtained when the target power and growth temperature were high. This provided higher energy of sputtered atoms and mobility of adatoms. The deposited AlN films have a columnar structure. The crystal orientation of the AlN films was changed from (101) to (002) by applying an RF bias was applied to the substrate in unipolar pulsed DC sputtering. The columnar structure disappeared when the RF bias was applied to the substrate. Applying bias was thought to increase mobility of adatoms by ion bombardment. MIM (aluminum-AlN-aluminum or molybdenum) structure was fabricated to measure electric properties of AlN films. Dielectric constants of 8.5 to 11.5 were obtained at 100 kHz. Th.

Download or read book Reactive Ion Enhanced Magnetron Sputtering of Nitride Thin Films written by Al-Ahsan Talukder and published by . This book was released on 2022 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Magnetron sputtering is a popular vacuum plasma coating technique used for depositing metals, dielectrics, semiconductors, alloys, and compounds onto a wide range of substrates. In this work, we present two popular types of magnetron sputtering, i.e., pulsed DC and RF magnetron sputtering, for depositing piezoelectric aluminum nitride (AlN) thin films with high Young's modulus. The effects of important process parameters on the plasma I-V characteristics, deposition rate, and the properties of the deposited AlN films, are studied comprehensively. The effects of these process parameters on Young's modulus of the deposited films are also presented. Scanning electron microscope imaging revealed a c-axis oriented columnar growth of AlN. Performance of surface acoustic devices, utilizing the AlN films deposited by magnetron sputtering, are also presented, which confirms the differences in qualities and microstructures of the pulsed DC and RF sputtered films. The RF sputtered AlN films showed a denser microstructure with smaller grains and a smoother surface than the pulsed DC sputtered films. However, the deposition rate of RF sputtering is about half of the pulsed DC sputtering process. We also present a novel ion source enhanced pulsed DC magnetron sputtering for depositing high-quality nitrogen-doped zinc telluride (ZnTe:N) thin films. This ion source enhanced magnetron sputtering provides an increased deposition rate, efficient N-doping, and improved electrical, structural, and optical properties than the traditional magnetron sputtering. Ion source enhanced deposition leads to ZnTe:N films with smaller lattice spacing and wider X-ray diffraction peak, which indicates denser films with smaller crystallites embedded in an amorphous matrix.

Download or read book Diamond Based Composites written by Mark A. Prelas and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 378 pages. Available in PDF, EPUB and Kindle. Book excerpt: Diamond-based composites, with their advantages of hardness, high Young's modulus and the like, have demonstrated new and unusual features, such as stability to high temperatures and pressure shocks and a large internal surface that can be controlled to offer customised electrical, magnetic and optical properties, leading to efficient filters, absorbents, sensors and other tools for environmental control and monitoring. The current book covers the synthesis of materials, their characterization and properties, trends in high pressure and high temperature technologies, low pressure technologies, basic principles of DBC material science, and future developments in electronics, optics, industrial tools and components, biotechnology, and medicine. Wide band-gap materials are considered, ranging from molecular clusters, nanophase materials, growth, processing and synthesis. The processing of composite based materials can be classified into six basic methods: in situ growth, high pressure/high temperature catalytic conversion; mix and sinter (c-BN plus metal-ceramic polymer mix); direct sintering; direct polymorphic conversion; shock detonation; and SHS sintering.

Download or read book Aluminum Nitride Thin Films by Reactive Sputtering written by Alvin G. Randolph and published by . This book was released on 1996 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt: "Aluminum nitride thin films ( -1000 A) have been deposited on silicon substrate by re active sputtering using Al target in 1 : 1 Ar:N2 environment. The atomic force microscopy examination revealed continuous microcrystalline film structure. The Auger electron spectroscopic analysis shows the presence of oxygen in the films. The annealing at 850 C in nitrogen is found to cause recrystallinization and, by FTIR analysis, further oxidation of the films. The films can be characterized as lossy dielectrics with relative permittivity ~ 10, higher than the bulk value of 8.9. Annealing the films is found to reduce anion vacancies and improve the dielectric strength within a range of a few MV/cm in these thin films. Optical constants, n & k, have been obtained from reflectance and transmittance spec tra (190-900 nm) of films on fused silica. The results indicate the presence of a low energy absorption tail, and exponential absorption that is proportional to degree of disorder in the film. The average defect density of the film as deposited was 1.1 x 10^20 cm"3. Annealing the film at 760 C increased the degree of disorder resulting in an average defect density of 3.4 x 10^20 cm^-3. Subsequent annealing at 800 C and 850 C systematically decreased the degree of disorder and the average defect density. The real part of permittivity (e1) of the annealed films over this frequency range varies approximately +-0.5 from the e(infinity) of 4.84"--Abstract.

Download or read book Effect of DC Magnetron Sputtering on Aluminium Nitride AIN Thin Films written by Mohd Adreen Shah Azman Shah and published by . This book was released on 2014 with total page 108 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods Processes Properties and Applications written by Filipe Vaz and published by Bentham Science Publishers. This book was released on 2013-06-21 with total page 363 pages. Available in PDF, EPUB and Kindle. Book excerpt: Oxynitride thin film technology is rapidly impacting a broad spectrum of applications, ranging from decorative functions (through optoelectronics) to corrosion resistance. Developing a better understanding of the relationships between deposition processes, structure and composition of the deposited films is critical to the continued evolution of these applications. This e-book provides valuable information about the process modeling, fabrication and characterization of metallic oxynitride-based thin films produced by reactive sputtering and some related deposition processes. Its contents are spread in twelve main and concise chapters through which the book thoroughly reviews the bases of oxynitride thin film technology and deposition processes, sputtering processes and the resulting behaviors of these oxynitride thin films. More importantly, the solutions for the growth of oxynitride technology are given in detail with an emphasis on some particular compounds. This is a valuable resource for academic learners studying materials science and industrial coaters, who are concerned not only about fundamental aspects of oxynitride synthesis, but also by their innate material characteristics.

Download or read book Enhanced Reactive Magnetron Sputtering of Aluminum Nitride written by Nathaniel Mark Williams and published by . This book was released on 1998 with total page 296 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Fabrication and Characterization of Aluminum Nitride Thin Films Deposited by RF Magnetron Sputtering written by William A. Carrington and published by . This book was released on 1991 with total page 146 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Niobium Nitride Based Thin Films Deposited by DC Reactive Magnetron Sputtering written by Moushab Benkahoul and published by . This book was released on 2005 with total page 82 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Proceedings of the 6th International Conference on Recrystallization and Grain Growth ReX GG 2016 written by Elizabeth Holm and published by Springer. This book was released on 2016-11-22 with total page 315 pages. Available in PDF, EPUB and Kindle. Book excerpt: This collection represents a cross-section of the papers presented at the 6th International Conference on Recrystallization and Grain Growth. The volume is divided into nine sections: • Grain growth theory and simulation • Recrystallization theory and simulation • Low carbon and IF steels • High strength steels • Electrical steels • Stainless steels • Aluminum and magnesium alloys • Nickel and nickel based superalloys • Unconventional and advanced materials

Download or read book Modified Reactive Sputter Deposition of Titanium Nitride Thin Films Via HiPIMS with Kick pulse and Improvement of the Structure zone Model written by Andrew J. Miceli and published by . This book was released on 2023 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Direct current (DC) and radio frequency (RF) sputtering methods have been commonplace in industry for several decades and widely studied in literature. Hard films of nitrides, such as titanium nitride (TiN), have been deposited using reactive DC sputtering onto cutting tools and medical devices extensively as well. For these applications, the films require excellent adhesion, high density, and high hardness. High-Power Impulse Magnetron Sputtering (HIPIMS) has emerged over the last several years as a method to produce films with increased density and mechanical properties. Process-structure-property relationships for reactive HIPIMS are not yet well developed. Additionally, conventional HIPIMS suffers from relatively low deposition rates, which becomes a challenge or barrier of adoption for applied TiN coatings that are typically greater than several microns in thickness. This work aims to look at increasing this deposition rate while maintaining the beneficial effects of HIPIMS by utilizing the short duration "kick-pulse" in the voltage/current cycle, leading to higher instantaneous deposition rates and increased adatom energy level. TiN films are deposited onto silicon (Si) wafers under varied reactive sputtering conditions, including DC, HIPIMS, and HIPIMS with kick-pulse. Structural characterizations are performed using scanning electron microscopy (SEM) and X-ray diffraction (XRD). Optical properties of the resulting films are also characterized using reflection UV-Vis spectroscopy. The deposition rate, morphology, and chemical composition of the films are highly affected by the processing conditions, with the kick-pulse producing significant increase in deposition rate and observed grain size. Further investigation will aim to develop a modified structural zone model to include HIPIMS with and without kick-pulse.

Download or read book Reactive Sputter Deposition written by Diederik Depla and published by Springer Science & Business Media. This book was released on 2008-06-24 with total page 584 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films.

Download or read book Characterization of the Piezoelectric Response of Aluminum Nitride Grown by DC Magnetron Sputtering for Applications in Thin film Resonators written by Rajan Sharad Naik and published by . This book was released on 1998 with total page 14 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book The Deposition of AlN Thin Films Their Characterization and the Fabrication of Surface Acoustic Wave Devices written by Charlee Fansler and published by . This book was released on 2007 with total page 268 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Thin Films written by Dongfang Yang and published by BoD – Books on Demand. This book was released on 2023-03-29 with total page 224 pages. Available in PDF, EPUB and Kindle. Book excerpt: A thin film is a layer of material ranging from fractions of a nanometer to several micrometers in thickness. Thin films have been employed in many applications to provide surfaces that possess specific optical, electronic, chemical, mechanical and thermal properties. Through ten chapters consisting of original research studies and literature reviews written by experts from the international scientific community, this book covers the deposition and application of thin films.

Download or read book Control and Measurement Applications for Smart Grid written by Sathans Suhag and published by Springer Nature. This book was released on 2022-02-01 with total page 484 pages. Available in PDF, EPUB and Kindle. Book excerpt: The book contains select proceedings of the International Conference on Smart Grid Energy Systems and Control (SGESC 2021). The proceedings is divided into 03 volumes, and this volume focuses on adaptive control and intelligent sensors, wide-area measurements, and applications in the smart grid. This book includes papers on topics such as SMART sensors, vision sensors, sensor fusion, wireless sensors, and the internet of things, MEMS, Mechatronics, Remote sensing, telemetry, and its applications in automated vehicle control. This book is a unique collection of chapters from different areas with a common theme and will be immensely useful to academic researchers and practitioners in the industry.