Download or read book Proceedings of the Workshop on Silicides and Metals for VLSI Applications V written by Workshop on Silicides and Metals for VLSI Applications (5, 1987, San Juan Bautista, Calif.) and published by . This book was released on 1987 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Proceedings of the Workshop on Silicides and Metals for VLSI Applications V 11 14 May 1987 San Juan Bautista California written by Michael D. Strathman and published by . This book was released on 1987 with total page 1759 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Proceedings of the Workshop on Silicides and Metals for VLSI Applications written by Michael D. Strathman and published by . This book was released on 1987 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Proceedings of the Workshop on Silicides and Metals for VLSI Applications V written by Michael D. Strathman and published by . This book was released on 1987 with total page 1759 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Proceedings of the Workshop on Metals Dielectrics and Interfaces for VLSI VI 9 12 May 1988 St Francis Retreat Center San Juan Bautista California written by and published by . This book was released on 1988 with total page 1795 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI ULSI Applications written by John E.J. Schmitz and published by William Andrew. This book was released on 1992-12-31 with total page 264 pages. Available in PDF, EPUB and Kindle. Book excerpt: Publisher description.
Download or read book Proceedings of the Workshop on Metals Dielectrics and Interfaces for VLSI written by Workshop on Metals, Dielectrics, and Interfaces for VLSI. 6, 1988, San Juan Bautista, Calif.. and published by . This book was released on 1988 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Silicides for VLSI Applications written by Shyam P. Murarka and published by Academic Press. This book was released on 2012-12-02 with total page 213 pages. Available in PDF, EPUB and Kindle. Book excerpt: Most of the subject matter of this book has previously been available only in the form of research papers and review articles. I have not attempted to refer to all the published papers. The reader may find it advantageous to refer to the references listed.
Download or read book Proceedings of the Workshop on Refractory Metal Silicides for VLSI II 14 17 May 1984 St Francis Retreat Center San Juan Bautista California written by Michael D. Strathman and published by . This book was released on 1984 with total page 92 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Proceedings of the Workshop on Refractory Metal Silicides for VLSI III 13 16 May 1984 St Francis Retreat Center San Juan Bautista California written by Strathman, Michael D. and published by . This book was released on 1985 with total page 68 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book The Chemistry of Metal CVD written by Toivo T. Kodas and published by John Wiley & Sons. This book was released on 2008-09-26 with total page 562 pages. Available in PDF, EPUB and Kindle. Book excerpt: High purity, thin metal coatings have a variety of important commercial applications, for example, in the microelectronics industry, as catalysts, as protective and decorative coatings as well as in gas-diffusion barriers. This book offers detailed, up- to-date coverage of the chemistry behind the vapor deposition of different metals from organometallic precursors. In nine chapters, the CVD of metals including aluminum, tungsten, gold, silver, platinum, palladium, nickel, as well as copper from copper(I) and copper(II) compounds is covered. The synthesis and properties of the precursors, the growth process, morphology, quality and adhesion of the resulting films as well as laser- assisted, ion- assisted and plasma-assisted methods are discussed. Present applications and prospects for future developments are summarized. With ca. 1000 references and a glossary, this book is a unique source of in-depth information. It is indispensable for chemists, physicists, engineers and materials scientists working with metal- coating processes and technologies. From Reviews: 'I highly recommend this book to anyone interested in learning more about the chemistry of metal CVD.' J. Am Chem. Soc.
Download or read book Modeling of Chemical Vapor Deposition of Tungsten Films written by Chris R. Kleijn and published by Birkhäuser. This book was released on 2013-11-11 with total page 138 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity of all the assumptions made in his work. On the other side, Christoph Werner, working in the context of an industrial research lab, was able to closely interact with manufacturing and development engineers in a modern submicron semiconductor processing line. Because of these different approaches, the informal collaboration during the course of the projects proved to be extremely helpful to both sides, even though - or perhaps because - different computer codes, different CVD reactors and also slightly different models were used. In spite of the inconsistencies which might arise from this double approach, we feel that the presentation of both sets of results in one book will be very useful for people working in similar projects.
Download or read book Directory of Published Proceedings written by and published by . This book was released on 1996 with total page 836 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Fundamental Aspects and Some Applications of Metals and Metal Silicides in VLSI Technology written by Shi-Li Zhang and published by . This book was released on 1990 with total page 190 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Tungsten and Other Refractory Metals for VLSI Applications IV written by Robert S. Blewer and published by . This book was released on 1989 with total page 400 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Proceedings of the Workshop on Metals Dielectrics and Interfaces for VLSI written by Michael D. Strathman and published by . This book was released on with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Tungsten and Other Refractory Metals for VLSI Applications written by and published by . This book was released on 1984 with total page 600 pages. Available in PDF, EPUB and Kindle. Book excerpt:
