Download or read book Polymers in Microlithography written by Elsa Reichmanis and published by . This book was released on 1989 with total page 476 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume examines the role polymeric materials play in the electronics industry, with special emphasis on recent advances in the science and technology of resist materials and processing for microlithography. It provides the reader with an appreciation for the diversity of chemical research efforts that are required for the development of new resist materials and processes. Its 26 chapters are divided into three sections covering chemically applied resist chemistry, multilevel resist chemistry and processing, and novel chemistry and processes for microlithography. Each section contains an introduction written by a recognized expert in the field.

Download or read book Microlithography Molecular Imprinting written by and published by Springer Science & Business Media. This book was released on 2005-02-18 with total page 296 pages. Available in PDF, EPUB and Kindle. Book excerpt: 1. J.D. Marty, M. Mauzac: Molecular Imprinting: State of the Art and Perspectives.- 2. H. Ito: Chemical Amplification Resists for Microlithography

Download or read book Materials for Microlithography written by L. F. Thompson and published by American Society of Civil Engineers. This book was released on 1984 with total page 512 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Conducting Polymers with Micro or Nanometer Structure written by Meixiang Wan and published by Springer Science & Business Media. This book was released on 2009-03-15 with total page 307 pages. Available in PDF, EPUB and Kindle. Book excerpt: Conducting Polymers with Micro or Nanometer Structure describes a topic discovered by three winners of the Nobel Prize in Chemistry in 2000: Alan J. Heeger, University of California at Santa Barbara, Alan G. MacDiarmid at the University of Pennsylvania, and Hideki Shirakawa at the University of Tsukuba. Since then, the unique properties of conducting polymers have led to promising applications in functional materials and technologies. The book first briefly summarizes the main concepts of conducting polymers before introducing micro/nanostructured conducting polymers dealing with their synthesis, structural characterizations, formation mechanisms, physical and chemical properties, and potential applications in nanomaterials and nanotechnology. The book is intended for researchers in the related fields of chemistry, physics, materials, nanomaterials and nanodevices. Meixiang Wan is a professor at the Institute of Chemistry, Chinese Academy of Sciences, Beijing.

Download or read book Materials for Advanced Microlithography written by Hoang Vi Tran and published by . This book was released on 2002 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Microlithography Molecular Imprinting written by and published by Springer. This book was released on 2009-09-02 with total page 276 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Advances in Polymeric Resist Materials for Microlithography written by and published by . This book was released on 1994 with total page 79 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Microlithography Molecular Imprinting written by and published by Springer. This book was released on 2005-02-18 with total page 276 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Polymers and Light written by Wolfram Schnabel and published by John Wiley & Sons. This book was released on 2007-06-27 with total page 396 pages. Available in PDF, EPUB and Kindle. Book excerpt: This first book to focus on the important and topical effect of light on polymeric materials reflects the multidisciplinary nature of the topic, building a bridge between polymer chemistry and physics, photochemistry and photophysics, and materials science. Written by one experienced author, a consistent approach is maintained throughout, covering such applications as nonlinear optical materials, core materials for optical waveguides, photoresists in the production of computer chips, photoswitches and optical memories. Advanced reading for polymer, physical and organic chemists, manufacturers of optoelectronic devices, chemical engineers, and materials scientists.

Download or read book Introduction to Microlithography written by L. F. Thompson and published by Academic. This book was released on 1994 with total page 568 pages. Available in PDF, EPUB and Kindle. Book excerpt: Reviews the theory, materials, and processes used in the lithographic process by which circuit elements are fabricated (it is these elements' decreasing size that has made possible the miniaturization of electronic devices). After a brief historical introduction, four major topics are discussed: the physics of the lithographic process, organic resist materials, resist processing, and plasma etching. The new edition reflects the many changes that have occurred since the 1983 publication of this tutorial/reference. Annotation copyright by Book News, Inc., Portland, OR

Download or read book Polymers and Electromagnetic Radiation written by Wolfram Schnabel and published by John Wiley & Sons. This book was released on 2014-01-10 with total page 361 pages. Available in PDF, EPUB and Kindle. Book excerpt: This first book to cover the interaction of polymers with radiation from the entire electromagnetic spectrum adopts a multidisciplinary approach to bridge polymer chemistry and physics, photochemistry, photophysics and materials science. The text is equally unique in its scope, devoting equal amounts of attention to the three aspects of synthesis, characterization, and applications. The first part deals with the interaction of polymers with non-ionizing radiation in the frequency-range from sub-terahertz via infrared radiation to visible and ultraviolet light, while the second covers interaction with ionizing radiation from the extreme ultraviolet to ?-ray photons. The result is a systematic overview of how both types of radiation can be used for different polymerization approaches, spectroscopy methods and lithography techniques. Authored by a world-renowned researcher and teacher with over 40 years of experience in the field, this is a highly practical and authoritative guide.

Download or read book Polymer Resist Systems for Advanced Microlithography written by and published by . This book was released on 1991 with total page 7 pages. Available in PDF, EPUB and Kindle. Book excerpt: The aim throughout this work has been to produce and characterize resist systems with enhanced sensitivity, resolution, and etch resistance. New polymers and polymer systems were evaluated as e-beam and x-ray resists using gamma radiation, flood exposure to electrons, synchrotron radiation, and e-beam patterning. The systems investigated have included copolymers and blends. In particular, reactive plasticizers were found to impart high sensitivity to negative-working resists with good resolution. Because of the overwhelming importance of the development step in producing high resolution patterns, dissolution rate measurements were refined and applied to a number of problems. As far as resistance to ion-assisted plasma etching is concerned, our studies have established the importance of conditions including flow rates, power density, pressure, etc.

Download or read book Handbook of Polymers in Electronics written by Bansi D. Malhotra and published by iSmithers Rapra Publishing. This book was released on 2001-12-31 with total page 492 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Handbook of Polymers in Electronics has been designed to discuss the novel ways in which polymers can be used in the rapidly growing electronics industry. It provides discussion of the preparation and characterisation of suitable polymeric materials and their current and potential applications coupled with the fundamentals of electrical, optical and photophysical properties. It will thus serve the needs of those already active in the electronics field as well as new entrants to the industry.

Download or read book Polymers for Electronic Photonic Application written by C. P. Wong and published by Elsevier. This book was released on 2013-10-22 with total page 676 pages. Available in PDF, EPUB and Kindle. Book excerpt: The most recent advances in the use of polymeric materials by the electronic industry can be found in Polymers for Electronic and Photonic Applications. This bookprovides in-depth coverage of photoresis for micro-lithography, microelectronic encapsulants and packaging, insulators, dielectrics for multichip packaging,electronic and photonic applications of polymeric materials, among many other topics. Intended for engineers and scientists who design, process, and manufacturemicroelectronic components, this book will also prove useful for hybrid and systems packaging managers who want to be informed of the very latest developments inthis field.* Presents most recent advances in the use of polymeric materials by the electronic industry* Contributions by foremost experts in the field

Download or read book Three Dimensional Microfabrication Using Two Photon Polymerization written by Tommaso Baldacchini and published by William Andrew. This book was released on 2019-10-31 with total page 762 pages. Available in PDF, EPUB and Kindle. Book excerpt: Three-Dimensional Microfabrication Using Two-Photon Polymerization, Second Edition offers a comprehensive guide to TPP microfabrication and a unified description of TPP microfabrication across disciplines. It offers in-depth discussion and analysis of all aspects of TPP, including the necessary background, pros and cons of TPP microfabrication, material selection, equipment, processes and characterization. Current and future applications are covered, along with case studies that illustrate the book's concepts. This new edition includes updated chapters on metrology, synthesis and the characterization of photoinitiators used in TPP, negative- and positive-tone photoresists, and nonlinear optical characterization of polymers. This is an important resource that will be useful for scientists involved in microfabrication, generation of micro- and nano-patterns and micromachining. - Discusses the major types of nanomaterials used in the agriculture and forestry sectors, exploring how their properties make them effective for specific applications - Explores the design, fabrication, characterization and applications of nanomaterials for new Agri-products - Offers an overview of regulatory aspects regarding the use of nanomaterials for agriculture and forestry

Download or read book Handbook of Microlithography Micromachining and Microfabrication Micromachining and microfabrication written by P. Rai-Choudhury and published by SPIE Press. This book was released on 1997 with total page 706 pages. Available in PDF, EPUB and Kindle. Book excerpt: Focusing on the use of microlithography techniques in microelectronics manufacturing, this volume is one of a series addressing a rapidly growing field affecting the integrated circuit industry. New applications in such areas as sensors, actuators and biomedical devices, are described.

Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2020-05-01 with total page 770 pages. Available in PDF, EPUB and Kindle. Book excerpt: The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.