Download or read book Polyatomic ion implantation damage in silicon written by J. A. Davies and published by . This book was released on 1975 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book A Study of Ion Implantation Damage and Annealing of Silicon Utilizing Differential Reflectometry written by Susan Weixi Feng and published by . This book was released on 1991 with total page 424 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Ion Implantation in Semiconductors 1976 written by Fred Chernow and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 733 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Fifth International Conference on Ion Implantation took place in Boulder, Colorado between the 9th and 13th of August 1976. Papers were delivered by scientists and engineers from 15 countries, and the attendees represented 19 countries. As has become the custom at these conferences, the sessions were intense with the coffee breaks and evenings given to informal meetings among the participants. It was a time to renew old friendships, begin new ones, exchange ideas, personally question authors of papers that appeared in the literature since the last conference and find out what was generally happening in Ion Implantation. In recent years it has beome more difficult to get funding to travel to such meetings. To assist the participating authors financial aid was solicited from industry and the Office of Naval Research. We are most grateful for their positive response to our requests. The success of the conference was in part due to their generous contributions. The Program Committee had the unhappy task of the reviewing of more than 170 abstracts. The result of their labors was well worth their effort. Much thanks goes to them for molding the conference into an accurate representation of activities in the field. Behind the scenes in Boulder, local arrangements were handled ably by Graeme Eldridge. The difficulty of this task cannot be overemphasized. Our thanks to him for a job well done.
Download or read book Study of Ion Implantation Damage in Silicon Wafers Using Phonons written by Keith R. Strickland and published by . This book was released on 1992 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book A Study of Ion Implantation Damage and Its Effects in Silicon written by Kwok Wai Chan and published by . This book was released on 1997 with total page 190 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Backscattering Spectrometry written by Wei-Kan Chu and published by Elsevier. This book was released on 2012-12-02 with total page 401 pages. Available in PDF, EPUB and Kindle. Book excerpt: Backscattering Spectrometry reviews developments in backscattering spectrometry and covers topics ranging from instrumentation and experimental techniques to beam parameters and energy loss measurements. Backscattering spectrometry of thin films is also considered, and examples of backscattering analysis are given. This book is comprised of 10 chapters and begins with an introduction to backscattering spectrometry, what it can and what it cannot accomplish, and some ""rules of thumb"" for interpreting or reading spectra. The relative strengths and weaknesses of backscattering spectrometry in the framework of materials analysis are outlined. The following chapters focus on kinematics, scattering cross sections, energy loss, and energy straggling; backscattering analysis of thin films of various degrees of complications; the influence of beam parameters; and mass and depth resolutions and their relationships to the mass and energy of projectiles. Many examples of backscattering analysis are also presented to illustrate the capability and limitation of backscattering. Backscattering applications when combined with channeling effects are considered as well. The final chapter provides a list of references on the applications of backscattering spectrometry. This monograph will be a useful resource for physicists.
Download or read book Device Implications of Ion Implantation Damage in Silicon written by D. Eirug Davies and published by . This book was released on 1973 with total page 7 pages. Available in PDF, EPUB and Kindle. Book excerpt: Thermal stimulated current and diode recovery measurements are presented for ion implanted silicon. The results are used to evaluate device possibilities such as bipolar transistors and hyperabrupt diodes where control of implantation damage is critical. (Author).
Download or read book Examination of Ion Implantation Damage in Single Crystal Silicon with High Resolution Electron Microscopy written by Eden E. Meyer and published by . This book was released on 1992 with total page 116 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Nuclear Science Abstracts written by and published by . This book was released on 1975 with total page 1070 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Experimental Investigation and Modeling of the Effects of High dose Ion Implantation Damage on Boron Diffusion in Silicon written by Robert Y. S. Huang and published by . This book was released on 1994 with total page 264 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Electrical Characteristics of Silicon Damaged by Ion Implantation written by William Stanford Johnson and published by . This book was released on 1969 with total page 155 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Defects in Ion Implanted Silicon Investigated by Transmission Electron Microscopy written by Kevin Scott Jones and published by . This book was released on 1987 with total page 292 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Monte Carlo simulation of ion implantation damage process in silicon written by Shiyang Tian and published by . This book was released on 1997 with total page 362 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Nucleation of Damage Centres During Ion Implantation of Silicon written by Lewis T. Chadderton and published by . This book was released on 1970 with total page 25 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Coupled Diffusion Of Impurity Atoms And Point Defects In Silicon Crystals written by Oleg Velichko and published by World Scientific. This book was released on 2019-11-05 with total page 404 pages. Available in PDF, EPUB and Kindle. Book excerpt: This work presents a comprehensive theory describing atomic diffusion in silicon crystals under strong nonequilibrium conditions caused by ion implantation and interaction with the surface or other interfaces. A set of generalized equations that describe diffusion of impurity atoms and point defects are presented in a form suitable for solving numerically. Based on this theory, partial diffusion models are constructed, and the simulation of many doping processes used in microelectronics is carried out.Coupled Diffusion of Impurity Atoms and Point Defects in Silicon Crystals is a useful text for researchers, engineers, and advanced students in semiconductor physics, microelectronics, and nanoelectronics. It helps readers acquire a deep understanding of the physics of diffusion and demonstrates the practical application of the theoretical ideas formulated to find cheaper solutions in the course of manufacturing semiconductor devices and integrated microcircuits.
Download or read book The Influence of In situ Photo excitation and Electric Field on Ion Implantation Induced Damage Accumulation in Silicon written by Jallepally Ravi and published by . This book was released on 1995 with total page 216 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Damage Formation and Annealing of Ion Implantation in Si written by M. Tamura and published by . This book was released on 1991 with total page 74 pages. Available in PDF, EPUB and Kindle. Book excerpt:
