Download or read book Point Defect dopant Diffusion Considerations Following Preamorphization of Silicon Via Si and Ge Implantation written by A. C. Ajmera and published by . This book was released on 1987 with total page 7 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Extended Defect dopant Diffusion Considerations Following Preamorphization of Silicon for Shallow Junctions written by Atul C. Ajmera and published by . This book was released on 1987 with total page 118 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Dopant dopant and Dopant defect Processes Underlying Activation Kinetics written by Ali Mokhberi and published by . This book was released on 2003 with total page 168 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Intrinsic Point Defects Impurities and Their Diffusion in Silicon written by Peter Pichler and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 576 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book contains the first comprehensive review of intrinsic point defects, impurities and their complexes in silicon. Besides compiling the structures, energetic properties, identified electrical levels and spectroscopic signatures, and the diffusion behaviour from investigations, it gives a comprehensive introduction into the relevant fundamental concepts.

Download or read book Physics Briefs written by and published by . This book was released on 1988 with total page 828 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Electrical Electronics Abstracts written by and published by . This book was released on 1988 with total page 1440 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Referativny zhurnal written by and published by . This book was released on 1990 with total page 600 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Point Defect Mediated Dopant Diffusion in Silicon written by Sung Tae Ahn and published by . This book was released on 1988 with total page 268 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Point Defects and Dopant Diffusion in Silicon written by Paul Martin Fahey and published by . This book was released on 1995 with total page 224 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book IEDM Technical Digest written by and published by . This book was released on 1987 with total page 972 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Digital Microfluidic Biochips written by Krishnendu Chakrabarty and published by CRC Press. This book was released on 2018-10-03 with total page 228 pages. Available in PDF, EPUB and Kindle. Book excerpt: Digital Microfluidic Biochips focuses on the automated design and production of microfluidic-based biochips for large-scale bioassays and safety-critical applications. Bridging areas of electronic design automation with microfluidic biochip research, the authors present a system-level design automation framework that addresses key issues in the design, analysis, and testing of digital microfluidic biochips. The book describes a new generation of microfluidic biochips with more complex designs that offer dynamic reconfigurability, system scalability, system integration, and defect tolerance. Part I describes a unified design methodology that targets design optimization under resource constraints. Part II investigates cost-effective testing techniques for digital microfluidic biochips that include test resource optimization and fault detection while running normal bioassays. Part III focuses on different reconfiguration-based defect tolerance techniques designed to increase the yield and dependability of digital microfluidic biochips. Expanding upon results from ongoing research on CAD for biochips at Duke University, this book presents new design methodologies that address some of the limitations in current full-custom design techniques. Digital Microfluidic Biochips is an essential resource for achieving the integration of microfluidic components in the next generation of system-on-chip and system-in-package designs.

Download or read book ULSI Science and Technology 1987 written by S. Broydo and published by . This book was released on 1987 with total page 874 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Germanium Based Technologies written by Cor Claeys and published by Elsevier. This book was released on 2011-07-28 with total page 476 pages. Available in PDF, EPUB and Kindle. Book excerpt: Germanium is a semiconductor material that formed the basis for the development of transistor technology. Although the breakthrough of planar technology and integrated circuits put silicon in the foreground, in recent years there has been a renewed interest in germanium, which has been triggered by its strong potential for deep submicron (sub 45 nm) technologies. Germanium-Based technologies: From Materials to Devices is the first book to provide a broad, in-depth coverage of the field, including recent advances in Ge-technology and the fundamentals in material science, device physics and semiconductor processing. The contributing authors are international experts with a world-wide recognition and involved in the leading research in the field. The book also covers applications and the use of Ge for optoelectronics, detectors and solar cells. An ideal reference work for students and scientists working in the field of physics of semiconductor devices and materials, as well as for engineers in research centres and industry. Both the newcomer and the expert should benefit from this unique book. - State-of-the-art information available for the first time as an all-in-source - Extensive reference list making it an indispensable reference book - Broad coverage from fundamental aspects up to industrial applications

Download or read book Defects in Semiconductors written by and published by Academic Press. This book was released on 2015-06-08 with total page 458 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume, number 91 in the Semiconductor and Semimetals series, focuses on defects in semiconductors. Defects in semiconductors help to explain several phenomena, from diffusion to getter, and to draw theories on materials' behavior in response to electrical or mechanical fields. The volume includes chapters focusing specifically on electron and proton irradiation of silicon, point defects in zinc oxide and gallium nitride, ion implantation defects and shallow junctions in silicon and germanium, and much more. It will help support students and scientists in their experimental and theoretical paths. - Expert contributors - Reviews of the most important recent literature - Clear illustrations - A broad view, including examination of defects in different semiconductors

Download or read book Metal Impurities in Silicon and Germanium Based Technologies written by Cor Claeys and published by Springer. This book was released on 2018-08-13 with total page 464 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a unique review of various aspects of metallic contamination in Si and Ge-based semiconductors. It discusses all of the important metals including their origin during crystal and/or device manufacturing, their fundamental properties, their characterization techniques and their impact on electrical devices’ performance. Several control and possible gettering approaches are addressed. The book offers a valuable reference guide for all researchers and engineers studying advanced and state-of-the-art micro- and nano-electronic semiconductor devices and circuits. Adopting an interdisciplinary approach, it combines perspectives from e.g. material science, defect engineering, device processing, defect and device characterization, and device physics and engineering.

Download or read book Fabrication Engineering at the Micro and Nanoscale written by Stephen A. Campbell and published by OUP USA. This book was released on 2008-01-10 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Designed for advanced undergraduate or first-year graduate courses in semiconductor or microelectronic fabrication, the third edition of Fabrication Engineering at the Micro and Nanoscale provides a thorough and accessible introduction to all fields of micro and nano fabrication.

Download or read book Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond written by Guilei Wang and published by Springer Nature. This book was released on 2019-09-20 with total page 115 pages. Available in PDF, EPUB and Kindle. Book excerpt: This thesis presents the SiGe source and drain (S/D) technology in the context of advanced CMOS, and addresses both device processing and epitaxy modelling. As the CMOS technology roadmap calls for continuously downscaling traditional transistor structures, controlling the parasitic effects of transistors, e.g. short channel effect, parasitic resistances and capacitances is becoming increasingly difficult. The emergence of these problems sparked a technological revolution, where a transition from planar to three-dimensional (3D) transistor design occurred in the 22nm technology node. The selective epitaxial growth (SEG) method has been used to deposit SiGe as stressor material in S/D regions to induce uniaxial strain in the channel region. The thesis investigates issues of process integration in IC production and concentrates on the key parameters of high-quality SiGe selective epitaxial growth, with a special focus on its pattern dependency behavior and on key integration issues in both 2D and 3D transistor structures, the goal being to improve future applications of SiGe SEG in advanced CMOS.