Download or read book Plasma Process induced Charging Damage on Thin Gate Oxides written by Donggun Park and published by . This book was released on 1998 with total page 240 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Plasma Charging Damage written by Kin P. Cheung and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 354 pages. Available in PDF, EPUB and Kindle. Book excerpt: In the 50 years since the invention of transistor, silicon integrated circuit (IC) technology has made astonishing advances. A key factor that makes these advances possible is the ability to have precise control on material properties and physical dimensions. The introduction of plasma processing in pattern transfer and in thin film deposition is a critical enabling advance among other things. In state of the art silicon Ie manufacturing process, plasma is used in more than 20 different critical steps. Plasma is sometimes called the fourth state of matter (other than gas, liquid and solid). It is a mixture of ions (positive and negative), electrons and neutrals in a quasi-neutral gaseous steady state very far from equilibrium, sustained by an energy source that balances the loss of charged particles. It is a very harsh environment for the delicate ICs. Highly energetic particles such as ions, electrons and photons bombard the surface of the wafer continuously. These bombardments can cause all kinds of damage to the silicon devices that make up the integrated circuits.
Download or read book Thin Oxide Damage by Plasma Processing written by Hyungcheol Shin and published by . This book was released on 1993 with total page 292 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Plasma Processing XII written by G. S. Mathad and published by The Electrochemical Society. This book was released on 1998 with total page 308 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Plasma Etching Induced Thin Gate Oxide Damages and Their Effects on MOSFET s 1 f Noise written by and published by . This book was released on 1996 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Investigation of Plasma Implantation and Gate Oxide Charging During Plasma Processing written by Barry Paul Linder and published by . This book was released on 1999 with total page 458 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Plasma parameter Dependence of Thin oxide Charging Damage to Microelectronic Test Structures in an Electron cyclotron resonance Plasma written by James Benedict Friedmann and published by . This book was released on 1995 with total page 692 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book 2002 7th International Symposium on Plasma and Process Induced Damage written by and published by . This book was released on 2002 with total page 194 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Characterization of Plasma Process induced Damage of Gate Oxide Using Hot carrier Stressing Experiments written by Vijay Janapaty and published by . This book was released on 1997 with total page 134 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Thin Oxide Damage from Plasma Induced Wafer Charging written by Sychyi Fang and published by . This book was released on 1993 with total page 278 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Plasma Processing XIV written by G. S. Mathad and published by . This book was released on 2002 with total page 342 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Study of Plasma Induced Charging Damage at CMOS Gate Process written by Daniel Kien Seen Chong and published by . This book was released on 2002 with total page 190 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Proceedings of the Tenth Symposium on Plasma Processing written by Electrochemical Society. Dielectric Science and Technology Division and published by The Electrochemical Society. This book was released on 1994 with total page 622 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Localized Charging Damage in Thin Oxides written by J. Werking and published by . This book was released on 2000 with total page 15 pages. Available in PDF, EPUB and Kindle. Book excerpt: In the proposed model, breaking of the oxide chemical bonds is assumed to result from the combined effect of electric field and electron fluence in the oxide during electrical stress. Collision between the injected electron and oxide atoms may excite the bond to an unstable electronic state that can lead to the formation of a structural defect. Electric field polarizes, and thus weakens the defect bonds causing bond breakdown. The model describes charge-to-breakdown dependence on electric field, temperature and oxide thickness. The difference in positive and negative gate bias charge-to-breakdown data is attributed to the presence of the structural strained layer at the Si/SiO2 interface. This approach is used for analysis of the effects of process induced charging stress on transistor parameters. It is shown that leakage current may increase or decrease with oxide thickness depending on the magnitude of the stress induced charging damage.
Download or read book Oxide Charging Damage in Integrated Circuit Processing Investigated with a Coupled Plasma IC Device Model written by William George En and published by . This book was released on 1996 with total page 374 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Essderc 98 written by and published by Atlantica Séguier Frontières. This book was released on 1998 with total page 680 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Proceedings of the Eleventh International Symposium on Plasma Processing written by Electrochemical Society. Dielectric Science and Technology Division and published by The Electrochemical Society. This book was released on 1996 with total page 740 pages. Available in PDF, EPUB and Kindle. Book excerpt:
