Download or read book Plasma enhanced Chemical Vapor Deposition of Tungsten Silicide written by Andris Edgar Petriceks and published by . This book was released on 1986 with total page 326 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI ULSI Applications written by John E.J. Schmitz and published by William Andrew. This book was released on 1992-12-31 with total page 264 pages. Available in PDF, EPUB and Kindle. Book excerpt: Publisher description.

Download or read book Plasma Enhanced Chemical Vapor Deposition of Tungsten written by Matthew A. Mahowald and published by . This book was released on 1986 with total page 132 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Plasma enhanced Chemical Vapor Deposition of Titanium Silicide written by Edwin Earl Cervantes and published by . This book was released on 1985 with total page 312 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Chemical Vapor Deposition for Microelectronics written by Arthur Sherman and published by William Andrew. This book was released on 1987 with total page 240 pages. Available in PDF, EPUB and Kindle. Book excerpt: Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.

Download or read book Plasma Enhanced Deposition of Tungsten Molybdenum and Tungsten Silicide Films written by C. C. Tang and published by . This book was released on 1982 with total page 5 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Plasma Enhanced Chemical Vapor Deposition of Tungsten Films written by J. K. Chu and published by . This book was released on 1982 with total page 4 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Plasma enhanced Chemical Vapor Deposition and Plasma Etching of Tungsten Films written by Ching Cheong Tang and published by . This book was released on 1983 with total page 310 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Plasma Enhanced Chemical Vapor Deposition of Stress Free Tungsten Films written by David Perese and published by . This book was released on 1996 with total page 158 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Plasma enhanced Chemical Vapor Deposition and Characterization of Tungsten Films written by John Ka-ngai Chu and published by . This book was released on 1982 with total page 270 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Kinetics of Low Pressure Chemical Vapor Deposition of Tungsten Silicide written by Damodaran Srinivas and published by . This book was released on 1989 with total page 166 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Study of Plasma enhanced Chemical Vapor Deposition of Silicon Thin Films written by Guanghui Yao and published by . This book was released on 1997 with total page 148 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Plasma Enhanced Chemical Vapor Deposition of Beta Tungsten a Metastable Phase written by C. C. Tang and published by . This book was released on 1984 with total page 4 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma-enhanced chemical vapor deposition of a metastable phase of tungsten (beta-W) is performed using tungsten hexafluoride and hydrogen as source gases. At 350 C, the as-deposited resistivity of these films is about 50 micron omega cm. After heat treatments between 650 and 750 C in forming gas, the resistivity drops below 11 micron omega cm. Concomitant with this resistivity change is a phase change to alpha-W, the equilibrium, body-centered-cubic form. Additional keywords: reprint; and Army research.

Download or read book Plasma Enhanced Chemical Vapor Deposition of Silicon and Silicon Containing Films written by DW. Hess and published by . This book was released on 1983 with total page 8 pages. Available in PDF, EPUB and Kindle. Book excerpt: The use of a radio frequency (rf) glow discharge or plasma has recently come into favor for the deposition of thin films. In plasma-enhanced chemical vapor deposition (PECVD), chemical reactions can be carried out at low (

Download or read book Plasma enhanced Chemical Vapor Deposition of Silicon Oxynitrides written by Joseph Edward Schoenholtz and published by . This book was released on 1986 with total page 390 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Modeling of Chemical Vapor Deposition of Tungsten Films written by Chris R. Kleijn and published by Birkhäuser. This book was released on 2013-11-11 with total page 138 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity of all the assumptions made in his work. On the other side, Christoph Werner, working in the context of an industrial research lab, was able to closely interact with manufacturing and development engineers in a modern submicron semiconductor processing line. Because of these different approaches, the informal collaboration during the course of the projects proved to be extremely helpful to both sides, even though - or perhaps because - different computer codes, different CVD reactors and also slightly different models were used. In spite of the inconsistencies which might arise from this double approach, we feel that the presentation of both sets of results in one book will be very useful for people working in similar projects.

Download or read book Plasma Enhanced Chemical Vapor Deposition of Silicon Based Thin Film Materials written by Ashfaqul Islam Chowdhury and published by . This book was released on 1999 with total page 374 pages. Available in PDF, EPUB and Kindle. Book excerpt: