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Book Plasma Polymer Films

Download or read book Plasma Polymer Films written by Hynek Biederman and published by World Scientific. This book was released on 2004 with total page 391 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma Polymer Films examines the current status of the deposition and characterization of fluorocarbon-, hydrocarbon- and silicon-containing plasma polymer films and nanocomposites, with plasma polymer matrix. It introduces plasma polymerization process diagnostics such as optical emission spectroscopy (OES, AOES), and describes special deposition techniques such as atmospheric pressure glow discharge. Important issues for applications such as degradation and stability are treated in detail, and structural characterization, basic electrical and optical properties and biomedical applications are discussed.

Book Plasma Deposition  Treatment  and Etching of Polymers

Download or read book Plasma Deposition Treatment and Etching of Polymers written by Riccardo d'Agostino and published by Elsevier. This book was released on 2012-12-02 with total page 544 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma Deposition, Treatment, and Etching of Polymers takes a broad look at the basic principles, the chemical processes, and the diagnostic procedures in the interaction of plasmas with polymer surfaces. This recent technology has yielded a large class of new materials offering many applications, including their use as coatings for chemical fibers and films. Additional applications include uses for the passivation of metals, the surface hardening of tools, increased biocompatibility of biomedical materials, chemical and physical sensors, and a variety of micro- and optoelectronic devices. Appeals to a broad range of industries from microelectronics to space technology Discusses a wide array of new uses for plasma polymers Provides a tutorial introduction to the field Surveys various classes of plasma polymers, their chemical and morphological properties, effects of plasma process parameters on the growth and structure of these synthetic materials, and techniques for characterization Interests scientists, engineers, and students alike

Book Plasma Deposition of Polymeric Thin Films

Download or read book Plasma Deposition of Polymeric Thin Films written by Roger E. Marchant and published by . This book was released on 1994 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Plasma Deposition of Polymeric Thin Films

Download or read book Plasma Deposition of Polymeric Thin Films written by Michael J. Danilich and published by . This book was released on 1994 with total page 216 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Plasma Deposition of Polymeric Thin Films

Download or read book Plasma Deposition of Polymeric Thin Films written by and published by . This book was released on 1994 with total page 196 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Chemical Vapor Deposition Polymerization

Download or read book Chemical Vapor Deposition Polymerization written by Jeffrey B. Fortin and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 112 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemical Vapor Deposition Polymerization - The Growth and Properties of Parylene Thin Films is intended to be valuable to both users and researchers of parylene thin films. It should be particularly useful for those setting up and characterizing their first research deposition system. It provides a good picture of the deposition process and equipment, as well as information on system-to-system variations that is important to consider when designing a deposition system or making modifications to an existing one. Also included are methods to characterizae a deposition system's pumping properties as well as monitor the deposition process via mass spectrometry. There are many references that will lead the reader to further information on the topic being discussed. This text should serve as a useful reference source and handbook for scientists and engineers interested in depositing high quality parylene thin films.

Book Plasma Deposited Thin Films

Download or read book Plasma Deposited Thin Films written by Mort and published by CRC Press. This book was released on 2018-05-04 with total page 253 pages. Available in PDF, EPUB and Kindle. Book excerpt: In Summary, the objective of this book is to present in one volume a review of the plasma deposition process and the present understanding of the most important and widely used plasma deposited thin film materials, devices and their applications.

Book The Deposition of Inorganic Thin Films on Polymer Substrates by Plasma enhanced Chemical Vapor Deposition

Download or read book The Deposition of Inorganic Thin Films on Polymer Substrates by Plasma enhanced Chemical Vapor Deposition written by Daniel Christian Guerin and published by . This book was released on 2001 with total page 296 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Thin Films by Chemical Vapour Deposition

Download or read book Thin Films by Chemical Vapour Deposition written by C.E. Morosanu and published by Elsevier. This book was released on 2016-06-22 with total page 720 pages. Available in PDF, EPUB and Kindle. Book excerpt: The explosive growth in the semiconductor industry has caused a rapid evolution of thin film materials that lend themselves to the fabrication of state-of-the-art semiconductor devices. Early in the 1960s an old research technique named chemical vapour phase deposition (CVD), which has several unique advantages, developed into the most widely used technique for thin film preparation in electronics technology. In the last 25 years, tremendous advances have been made in the science and technology of thin films prepared by means of CVD. This book presents in a single volume, an up-to-date overview of the important field of CVD processes which has never been completely reviewed previously. Contents: Part I. 1. Evolution of CVD Films. Introductory remarks. Short history of CVD thin films. II. Fundamentals. 2. Techniques of Preparing Thin Films. Electrolytic deposition techniques. Vacuum deposition techniques. Plasma deposition techniques. Liquid-phase deposition techniques. Solid-phase deposition techniques. Chemical vapour conversion of substrate. Chemical vapour deposition. Comparison between CVD and other thin film deposition techniques. 3. Chemical Processes Used in CVD. Introduction. Description of chemical reactions used in CVD. 4. Thermodynamics of CVD. Feasibility of a CVD process. Techniques for equilibrium calculations in CVD systems. Examples of thermodynamic studies of CVD systems. 5. Kinetics of CVD. Steps and control type of a CVD heterogeneous reaction. Influence of experimental parameters on thin film deposition rate. Continuous measurement of the deposition rate. Experimental methods for studying CVD kinetics. Role of homogeneous reactions in CVD. Mechanism of CVD processes. Kinetics and mechanism of dopant incorporation. Transport phenomena in CVD. Status of kinetic and mechanism investigations in CVD systems. 6. Measurement of Thin Film Thickness. Mechanical methods. Mechanical-optical methods. Optical methods. Electrical methods. Miscellaneous methods. 7. Nucleation and Growth of CVD Films. Stages in the nucleation and growth mechanism. Regimes of nucleation and growth. Nucleation theory. Dependence of nucleation on deposition parameters. Heterogeneous nucleation and CVD film structural forms. Homogeneous nucleation. Experimental techniques. Experimental results of CVD film nucleation. 8. Thin Film Structure. Techniques for studying thin film structure. Structural defects in CVD thin films. 9. Analysis of CVD Films. Analysis techniques of thin film bulk. Analysis techniques of thin film surfaces. Film composition measurement. Depth concentration profiling. 10. Properties of CVD Films. Mechanical properties. Thermal properties. Optical properties. Photoelectric properties. Electrical properties. Magnetic properties. Chemical properties. Part III. 11. Equipment and Substrates. Equipment for CVD. Safety in CVD. Substrates. 12. Preparation and Properties of Semiconducting Thin Films. Homoepitaxial semiconducting films. Heteroepitaxial semiconducting films. 13. Preparation and Properties of Amorphous Insulating Thin Films. Oxides. Nitrides and Oxynitrides. Polymeric thin films. 14. Preparation and Properties of Conductive Thin Films. Metals and metal alloys. Resistor materials. Transparent conducting films. Miscellaneous materials. 15. Preparation and Properties of Superconducting and Magnetic Thin Films. Superconducting materials. Magnetic materials. 16. Uses of CVD Thin Films. Applications in electronics and microelectronics. Applications in the field of microwaves and optoelectronics. Miscellaneous applications. Artificial heterostructures (Quantum wells, superlattices, monolayers, two-dimensional electron gases). Part V. 17. Present and Future Importance of CVD Films.

Book Plasma Processing of Polymers

Download or read book Plasma Processing of Polymers written by Ricardo d'Agostino and published by Springer Science & Business Media. This book was released on 1997-11-30 with total page 554 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of the NATO Advanced Study Institute on Plasma Treatments and Deposition of Polymers, Acquafredda di Maratea, Italy, May 19-June 2, 1996

Book Film Deposition by Plasma Techniques

Download or read book Film Deposition by Plasma Techniques written by Mitsuharu Konuma and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 234 pages. Available in PDF, EPUB and Kindle. Book excerpt: Properties of thin films depend strongly upon the deposition technique and conditions chosen. In order to achieve the desired film, optimum deposition conditions have to be found by carrying out experiments in a trial-and error fashion with varying parameters. The data obtained on one growth apparatus are often not transferable to another. This is especially true for film deposition processes using a cold plasma because of our poor under standing of the mechanisms. Relatively precise studies have been carried out on the role that physical effects play in film formation such as sputter deposition. However, there are many open questions regarding processes that involve chemical reactions, for example, reactive sputter deposition or plasma enhanced chemical vapor deposition. Much further research is re quired in order to understand the fundamental deposition processes. A sys tematic collection of basic data, some of which may be readily available in other branches of science, for example, reaction cross sections for gases with energetic electrons, is also required. The need for pfasma deposition techniques is felt strongly in industrial applications because these techniques are superior to traditional thin-film deposition techniques in many ways. In fact, plasma deposition techniques have developed rapidly in the semiconductor and electronics industries. Fields of possible application are still expanding. A reliable plasma reactor with an adequate in situ system for monitoring the deposition conditions and film properties must be developed to improve reproducibility and pro ductivity at the industrial level.

Book Thin Films and Coatings

    Book Details:
  • Author : B. M. Caruta
  • Publisher : Nova Publishers
  • Release : 2005
  • ISBN : 9781594545177
  • Pages : 240 pages

Download or read book Thin Films and Coatings written by B. M. Caruta and published by Nova Publishers. This book was released on 2005 with total page 240 pages. Available in PDF, EPUB and Kindle. Book excerpt: The broad field of thin film technology is based first of all on the film growth processes in general. The concepts of crystal structure and defects in crystalline thin films such as grain boundaries, dislocations and vacancies are examined. The general nature of film growth from atoms equilibrating with the service, through the initial stages of growth to film coalescence and zone models is also within the scope of this book as are evaporation, sputter deposition and chemical vapour deposition. Thin films are widely used in microelectronics, chemistry and a wide array of related fields. This book offers new research in this exploding field.

Book Plasma Deposition and Treatment of Polymers  Volume 544

Download or read book Plasma Deposition and Treatment of Polymers Volume 544 written by Wei William Lee and published by . This book was released on 1999-09 with total page 320 pages. Available in PDF, EPUB and Kindle. Book excerpt: There is immense interest, both industrial and academic, in developing processes for plasma deposition and modification of polymers. These polymers and treatments have wide-ranging applications in electronics, protective coatings, optical coatings, biomaterials, ophthalmics, corrosion protection, tribology, surface mechanics, membranes, food and pharmaceutical packaging, and sensors. In addition, fundamentals of plasma processes and technology are also of critical importance in many semiconductor processing operations such as etching and treatment of polymers, deposition of low-dielectric constant materials, and dry photoresist. The understanding of plasma polymer deposition in various technical fields, as well as in the treatment methods of polymers, have become critical. This book focuses on the deposition, modification and characterization of polymeric materials which are important for advanced technologies. Particular emphasis is placed on materials and synthesis concepts. Topics include: plasma processes for biomaterials; fundamentals of plasma processing; plasma processing for electronics and optics; and plasma treatments and functional coatings.

Book Plasma Polymerization Processes

Download or read book Plasma Polymerization Processes written by Hynek Biederman and published by Elsevier Science & Technology. This book was released on 1992 with total page 228 pages. Available in PDF, EPUB and Kindle. Book excerpt: The aim of this book is to show how to make useful plasma polymerization processes resulting in polymeric (organic) materials - usually thin films of the desirable properties. The main emphasis is on the detailed discussion of the deposition apparatus, deposition parameters and properties of the obtained films. The historical background and the processes related to plasma polymerization are discussed. Fundamentals of plasma physics and plasma chemistry are concisely reviewed and used as a base for the explanation of plasma polymerization principles and its models. Special attention is devoted to the real plasma polymerization reactors and various polymer film deposition arrangements. Many technical details are examined including the influence of process parameters on the properties of the resulting plasma polymers. New systems based on a microwave discharge are also described. The properties of the most important plasma polymers - plasma polymerized organosilicons, halocarbons and composite metal/plasma polymers are reviewed. Finally, the applications of plasma polymers are presented, e.g. for passivation and protective coatings, lithography and optical beam recording, electrophotography, microelectronics, modifications of conventional polymer surfaces - biomedical uses, membranes, etc. Future prospects and developments in plasma polymerization e.g. for molecular electronics and other areas are also outlined.

Book Pulsed Laser Deposition of Thin Films

Download or read book Pulsed Laser Deposition of Thin Films written by Robert Eason and published by John Wiley & Sons. This book was released on 2007-12-14 with total page 754 pages. Available in PDF, EPUB and Kindle. Book excerpt: Edited by major contributors to the field, this text summarizes current or newly emerging pulsed laser deposition application areas. It spans the field of optical devices, electronic materials, sensors and actuators, biomaterials, and organic polymers. Every scientist, technologist and development engineer who has a need to grow and pattern, to apply and use thin film materials will regard this book as a must-have resource.

Book Plasma Sources for Thin Film Deposition and Etching

Download or read book Plasma Sources for Thin Film Deposition and Etching written by Maurice H. Francombe and published by Academic Press. This book was released on 2013-10-22 with total page 343 pages. Available in PDF, EPUB and Kindle. Book excerpt: This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing plasma. Chapter One develops a unified framework from which all "high-efficiency" sources may be viewed and compared; outlines key elements of source design affecting processing results; and highlights areas where additional research and development are needed Chapter Two reviews and analyzes the main types of electron cyclotron resonance (ECR) plasma sources suitable for ECR PACVD of thin films, mainly ECR sources using magnet coils Chapter Three examines the benefits and limitations of the new technique, unbalanced magnetron sputtering (UBM), along with the motivation for its development, the basic principles of its operation and commercial applications, and some speculations regarding the future of UBM technology Chapter Four describes general phenomena observed in connection with particle formation in thin film processing plasmas; discusses particles in PECVD plasmas, sputtering plasmas, and RIE plasmas; presents an overview of the theoretical modeling of various aspects of particles in processing plasmas; examines issues of equipment design affecting particle formation; and concludes with remarks about the implications of this work for the control of process-induced particle contamination

Book CVD Polymers

Download or read book CVD Polymers written by Karen K. Gleason and published by John Wiley & Sons. This book was released on 2015-04-01 with total page 484 pages. Available in PDF, EPUB and Kindle. Book excerpt: The method of CVD (chemical vapor deposition) is a versatile technique to fabricate high-quality thin films and structured surfaces in the nanometer regime from the vapor phase. Already widely used for the deposition of inorganic materials in the semiconductor industry, CVD has become the method of choice in many applications to process polymers as well. This highly scalable technique allows for synthesizing high-purity, defect-free films and for systematically tuning their chemical, mechanical and physical properties. In addition, vapor phase processing is critical for the deposition of insoluble materials including fluoropolymers, electrically conductive polymers, and highly crosslinked organic networks. Furthermore, CVD enables the coating of substrates which would otherwise dissolve or swell upon exposure to solvents. The scope of the book encompasses CVD polymerization processes which directly translate the chemical mechanisms of traditional polymer synthesis and organic synthesis in homogeneous liquids into heterogeneous processes for the modification of solid surfaces. The book is structured into four parts, complemented by an introductory overview of the diverse process strategies for CVD of polymeric materials. The first part on the fundamentals of CVD polymers is followed by a detailed coverage of the materials chemistry of CVD polymers, including the main synthesis mechanisms and the resultant classes of materials. The third part focuses on the applications of these materials such as membrane modification and device fabrication. The final part discusses the potential for scale-up and commercialization of CVD polymers.