Download or read book Phase Behavior of Block Copolymers in Compressed CO2 and as Single Domain layer Nanolithographic Etch Resists for Sub 10 Nm Pattern Transfer written by Curran Matthew Chandler and published by . This book was released on 2011 with total page 159 pages. Available in PDF, EPUB and Kindle. Book excerpt: Diblock copolymers have many interesting properties, which first and foremost include their ability to self-assemble into various ordered, regularly spaced domains with nanometer-scale feature sizes. The work in this dissertation can be logically divided into two parts - the first and the majority of this work describes the phase behavior of certain block copolymer systems, and the second discusses real applications possible with block copolymer templates. Many compressible fluids have solvent-like properties dependent on fluid pressure and can be used as processing aids similar to liquid solvents. Here, compressed CO2 was shown to swell several thin homopolymer films, including polystyrene and polyisoprene, as measured by high pressure ellipsometry at elevated temperatures and pressures. The ellipsometric technique was modified to produce accurate data at these conditions through a custom pressure vessel design. The order-disorder transition (ODT) temperatures of several poly(styrene-b-isoprene) diblock copolymers were also investigated by static birefringence when dilated with compressed CO2. Sorption of CO2 in each copolymer resulted in significant depressions of the ODT temperature as a function of fluid pressure, and the data above was used to estimate the quantitative amount of solvent in each of the diblock copolymers. These depressions were not shown to follow dilution approximation, and showed interesting, exaggerated scaling of the ODT at near-bulk polymer concentrations. The phase behavior of block copolymer surfactants was studied when blended with polymer or small molecule additives capable of selective hydrogen bonds. This work used small angle X-ray scattering (SAXS) to identify several low molecular weight systems with strong phase separation and ordered domains as small as 2-3 nanometers upon blending. One blend of a commercially-available surfactant with a small molecule additive was further developed and showed promise as a thin-film pattern transfer template. In this scenario, block copolymer thin films on domain thick with self-assembled feature sizes of only 6-7 nm were used as plasma etch resists. Here the block copolymer's pattern was successfully transferred into the underlying SiO2 substrate using CF4-based reactive ion etching. The result was a parallel, cylindrical nanostructure etched into SiO2.
Download or read book Pattern Formation and Phase Behavior in PS B SI Containing Block Copolymer Thin Film written by I-Fan Hsieh and published by . This book was released on 2013 with total page 188 pages. Available in PDF, EPUB and Kindle. Book excerpt: Since the top-down approaches, such as the extremely ultraviolet (EUV) technique and the high-index fluid-based immersion ArF lithography, may be cover one or two generations, these lithography technologies are getting more severe for the feature size scaling down to sub 10 nm. The directed self-assembly technology of block copolymers is one of the candidates for next generation lithography which can afford feature sizes that are dictated by the molecular weight of the block copolymer and are typically 15 to 30 nm. Directed self-assembly of block copolymers has attracted attention as a technology to extend photoresist-based lithography to smaller dimensions. It has been demonstrated that the directed self assembly of block copolymer offers a new route to perfect nanolithographic pattering at sub-50 nm length scale with molecular scale precision. For application in electronic media, it requires large-area, long-range ordered structures, which is both a kinetic and thermodynamic problem and requires subtle balance of various parameters and processing conditions. So far, block copolymer thin films have already achieved certain success, mainly with higher molecular weights and a feature size of ~30 nm. Several challenges still remain, such as (a) the generation of long-range ordered structure with smaller feature sizes (domain size
Download or read book Next Generation Materials for Block Copolymer Lithography written by Michael Joseph Maher and published by . This book was released on 2016 with total page 576 pages. Available in PDF, EPUB and Kindle. Book excerpt: The electronics industry is a trillion dollar industry that has drastically changed everyday life. Advances in lithography have enabled manufacturers to continually shrink the dimensions of microelectronic components, which has resulted in devices that outperform previous generations. Unfortunately, conventional patterning techniques are approaching their physical resolution limits. The ability to economically pattern sub-10 nm features is necessary for the future growth of the industry. Block copolymer self-assembly has emerged as a leading candidate for next generation lithography and nanofabrication because block copolymers self-assemble into periodic nanostructures (e.g. cylinders and lamellae) on a length scale that exceeds the physical limits of optical lithography. However, for block copolymer lithography to be realized, the block copolymer domains need to form sub-10 nm features and display etch resistance for pattern transfer. Additionally, the orientation, alignment, and placement of block copolymer domains must be carefully controlled. This dissertation discusses the synthesis, orientation and alignment of silicon-containing BCPs that are inherently etch resistant and provide access to nanostructures in the sub-10 nm regime. The orientation of domains is controlled by interactions between each block copolymer domain and each interface. Preferential interactions between the block copolymer domains and the either the substrate or air interface lead to a parallel orientation of domains, which is not useful for lithography. Non-preferential (“neutral”) interactions are needed to promote the desired perpendicular orientation. The synthesis of surface treatments and top coats is described, and methods to determine the preferential and non-preferential interactions are reported. Orientation control is demonstrated via rapid thermal annealing between two neutral surfaces. Combining orientation control of block copolymer domains with well established directed self-assembly strategies was used to produce perpendicular domains with long range order. Chapter 1 provides an introduction to lithography and block copolymer self-assembly. Chapter 2 discusses the synthesis of silicon-containing block copolymers. Chapters 4-6 focus on controlling block copolymer domain orientation, and Chapter 7 focuses on directed self-assembly. Chapter 8 covers spatial orientation control of domains using photopatternable interfaces. Finally, Chapter 9 covers tin-containing polymers that are resistant to fluorine-containing etch chemistries and can be used to pattern silicon oxide.
Download or read book Block Copolymers written by Kenneth J. Hanley and published by . This book was released on 2001 with total page 916 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Controlling Sub microdomain Structure in Microphase ordered Block Copolymers and Their Nanocomposites written by Michelle Kathleen Bowman and published by . This book was released on 2008 with total page 244 pages. Available in PDF, EPUB and Kindle. Book excerpt: Keywords: phase behavior, nanoparticles, block copolymer.
Download or read book Probing the Phase Behavior of ABC Triblock Copolymers Near Network Phase Windows written by Maeva S. Tureau and published by . This book was released on 2012 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Block copolymers are one class of soft materials that consist of two or more covalently-bonded chains of chemically distinct monomers. Their ability to self-assemble into a variety of nanostructured materials with tailored chemical and physical properties has motivated extensive investigations for use in many emerging nanotechnologies such as nanotemplates, analytical separation membranes, and electrical and ionic conductors. Relative to cylindrical nanostructures that often require external alignment techniques to minimize structural defects, network structures possess co-continuous percolating domains in three-dimension and exhibit superior mechanical stability, short diffusion path lengths, and high internal interfacial areas, which can facilitate transport in applications such as water filtration and ion-conducting membranes. In this thesis project, the poly(ethylene- alt -propylene- b -styrene- b -methyl methacrylate) (EPSM) triblock copolymer system was produced from the selective poly(isoprene) hydrogenation of poly(isoprene- b -styrene- b -methyl methacrylate) (ISM) precursors. The EPSM system was selected due to the toughness given by the combined interactions of the glassy poly(styrene) (PS) and rubbery poly(ethylene- alt -propylene) (PEP) blocks, the mechanical strength provided by the PS block, and the ease of removal of the poly(methyl methacrylate) (PMMA) block. This dissertation first presents the phase behavioral exploration of anionically-synthesized ISM triblock copolymer precursors and associated ISM copolymer/homopolymer blends, which permitted the identification and refinement of network phase regions. The copolymer/homopolymer blending technique allowed for homopolymer-induced phase transformations to and from network structures where alternating gyroid (Q 214), core-shell gyroid (Q 230), and orthorhombic (O 70) network phases were identified. The ISM phase behavior was found to qualitatively match the predicted self-consistent mean field theory (SCFT) phase behavior of a model ABC triblock copolymer described by Tyler et al. Minor discrepancies in the size and location of the phase boundaries are rationalized on the basis of the block copolymer parameters. Second, this blending technique allowed for the precise targeting of multiple nanostructures from a single, low molecular weight disordered material. The latter finding is envisioned to be particularly useful for applications requiring materials of small feature sizes while retaining the ease of processability provided by the parent disordered copolymers. Finally, the PI hydrogenation of ISM precursors generated EPSM materials with enhanced resistance to oxidative, thermal, and UV degradation. Their initial morphological characterization permitted the identification of a relatively large Q 230 network phase region and highlighted the differences in phase behavior between the EPSM and ISM precursor systems. Altogether, this latter study established a foundation for generating environmentally-stable nanostructured materials, in view of creating functionalized nanoporous membranes able to capture and separate a wide range of biologically active molecules.
Download or read book Phase Behavior of Block Copolymers in Selective Solvents written by Yongsheng Liu and published by . This book was released on 2008 with total page 290 pages. Available in PDF, EPUB and Kindle. Book excerpt: Abstract: The goal of this research is to study the phase behavior and kinetics of order-order (OOT) and order-disorder (ODT) phase transitions in block copolymers in selective solvents. We focus on examining temperature and pressure dependence of the phase diagram and the kinetics of phase transitions using small angle x-ray scattering (SAXS). The kinetics of ODT and OOT was studied for two block copolymer solutions by time-resolved SAXS using temperature ramp and fast quench methods: (i) Poly(styrene- b -isoprene) (PS-PI) diblock copolymer in tetradecane, selective solvent for PI, which displayed face-centered-cubic (FCC) structure at low temperature, body-centered-cubic (BCC) at intermediate temperature, and was disordered at high temperature. Following a quench from 110 C to 50 C, a long-lived meta-stable BCC phase was detected prior to the formation of FCC. The data agrees very well with Cahn's model for nucleation and growth. (ii) Poly(styrene- b -ethylene- co -butylene- b -styrene) triblock copolymer in dibutyl phthaphate, selective solvent for PS, which displayed hexagonally packed cylinders (HEX) at low temperature and lamellar (LAM) phase at high temperatures. This is unusual because in most block copolymer melts LAM occurs at lower temperature than HEX. A geometric model was developed to understand the mechanism of the transition from LAM to HEX. The calculated scattering intensity agrees very well with the experimental data. A pressure network system for SAXS capable of operating in the range of 1-4000 bars with pressure jump capability was built to study the pressure dependence of phase behavior. The system was used to investigate PS-PI diblock copolymer in diethyl phthaphate. The BCC to disorder transition temperature increased with pressure at 20 C/kbar, and the lattice constant increased with pressure. Brownian Molecular Dynamics simulations were carried out to study the phase behavior of multiblock copolymers in a selective solvent. Disordered, BCC, HEX, and LAM phases were obtained depending on the concentration and number of blocks. This research provides detailed information of the kinetics of structural changes in block copolymers in selective solvents. The results provide a good understanding of the mechanism of order-disorder and order-order transitions, and are directly related to industrial applications of block copolymers.
Download or read book Laser induced Sub millisecond Structural Formation Kinetics in Block Copolymers written by Alan G. Jacobs and published by . This book was released on 2017 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Block copolymer (BCP) self-assembly has found broad use in applications ranging from nanocomposites to nanolithography by exploiting the precise control of nanoscale order possible over macroscopic length scales. One application garnering significant attention for commercialization uses this nanoscale order to augment current photolithography patterning to achieve sub-20 nm features through directed self assembly (DSA). Extending current lithography to these smaller length scales is critical to enable cost-effective next-generation semiconductor devices, furthering technological progress and maintaining the pace of Moore's law. As with many of these applications, DSA utilizes BCPs starting from deeply metastable states. Detail of the initial phase segregation process, structure formation, and refinement are critical to device function, efficacy, and yield. However, understanding of this initial phase segregation from deeply metastable states, especially the temporal evolution, is currently lacking. This ignorance stems in part from both a difficulty in experimentally measuring the short time structural response of polymers, and on the computational difficulty in modeling large enough systems at high fidelity over molecular timescales. Furthermore, for DSA, the anneal must achieve a near perfectly aligned equilibrium structure. The timescale required, and thus the cost, to reach the fully aligned state is dependent upon kinetic pathways, especially past any potential trapped defect states. Laser spike annealing (LSA) can achieve high temperatures for short durations allowing investigation of potential process windows in the microsecond to millisecond time scales. In this work, a CO2 gas laser (120 W, wavelength=10600 nm) and a solid state diode laser (250 W, wavelength=980 nm), were used to achieve peak temperatures up to ~1000 degrees C on time scales from 0.05 ms to 10 ms. Additionally, high throughput experiments of the lateral gradient LSA (lgLSA) method were used to fully explore these time and temperature regimes. This has enabled exploration of a previously inaccessible temperature regime and the determination of kinetic parameters that potentially offers access to new processing regimes and resulting structures. For these short duration anneals, it is shown that the thermal stability of typical organic materials is extended by over 450 degrees C compared to hot plate limits. This stability was quantified using Arrhenius kinetics with activation enthalpies ranging between 0.6 and 1.2 eV. The activation energies appear to scale with the primary (backbone) bond formation energy and inversely with the bond polarity. This extended thermal stability was exploited to probe the self-assembly kinetics of cylinder forming poly(styrene-block-methyl methacrylate) (PS-b-PMMA, 54 kg/mol, fraction PS=0.67) by annealing at temperatures up to 550 degrees C for timescales from 0.25 ms to 10 ms with heating and cooling rates in excess of 10^6 K/s. Segregation kinetics were quantified by X-ray scattering (micro-GISAXS) and electron microscopy (SEM), resulting in kinetic phase maps that describe the phase segregation behavior. The onset of phase segregation and of disordering were found to be kinetically suppressed for times below 1 ms, exceeding the exp...
Download or read book Studies of Block Copolymer Thin Films and Mixtures with an Ionic Liquid written by Justin Virgili and published by . This book was released on 2009 with total page 240 pages. Available in PDF, EPUB and Kindle. Book excerpt: Block copolymers are capable of self-assembling into structures on the 10-100 nm length scale. Structures of this size are attractive for applications such as nanopatterning and electrochemical membrane materials. However, block copolymer self-assembly in these examples is complicated by the presence of surfaces in the case of thin films and the presence of an additive, such as an ionic liquid, in the case of electrochemical membrane materials. Improved understanding of the structure and thermodynamics of such systems is necessary for the development of structure-property relationships in applications for block copolymers, such as nanopatterning and electrochemical devices. To address the challenge of block copolymer thin film characterization over large areas, resonant soft X-ray scattering (RSoXS) has been applied to characterize order formation in copolymer thin films. Using theory and experiment, the dramatic chemical sensitivity of RSoXS to subtle differences in the bonding energies of different blocks of a copolymer is demonstrated. The unambiguous identification of structure and domain size in block copolymer thin films using RSoXS enables a quantitative comparison of the bulk block copolymer structure and domain size, leading to improved understanding of the impact of surfaces on block copolymer self-assembly. The self-assembly of block copolymer/ionic liquid mixtures has been characterized as a function of block copolymer composition and molecular weight, mixture composition, and temperature using small-angle X-ray scattering (SAXS), optical transmission characterization, wide-angle X-ray scattering (WAXS), and differential scanning calorimetry (DSC). The resulting phase behavior is reminiscent to that of block copolymer mixtures with a selective molecular solvent and lamellar, cylindrical, ordered spherical micelles, and disordered phases are observed. Analysis of order-disorder transitions and molecular weight scaling analysis qualitatively indicates that the segregation strength between block copolymer phases increases with ionic liquid loading. DSC characterization of the thermal properties of the block copolymer/ionic liquid mixtures reveals two composition dependent regimes. At high block copolymer concentrations, a "salt-like" regime corresponding to an increase in the block copolymer glass transition temperature is observed, while at intermediate block copolymer concentrations, a "solvent-like" regime corresponding to a decrease in the block copolymer glass transition temperature is observed. The distribution of ionic liquid within microphase-separated domains of a block copolymer has been characterized using contrast matched small-angle neutron scattering (SANS) and DSC. The ionic liquid is shown to partition selectively into domains formed by one block of a block copolymer in agreement with studies of the phase behavior of ionic liquid/block copolymer mixtures. Unexpected differences in ionic liquid partitioning are observed in mixtures containing a deuterated versus hydrogenated ionic liquid.
Download or read book Advanced Materials for Block Copolymer Lithography written by Christopher Martin Bates and published by . This book was released on 2013 with total page 464 pages. Available in PDF, EPUB and Kindle. Book excerpt: The multi-billion dollar per year lithography industry relies on the fusion of chemistry, materials science, and engineering to produce technological innovations that enable continual improvements in the speed and storage density of microelectronic devices. A critical prerequisite to improving the computers of today relies on the ability to economically and controllably form thin film structures with dimensions on the order of tens of nanometers. One class of materials that potentially meets these requirements is block copolymers since they can self-assemble into structures with characteristic dimensions circa three to hundreds of nanometers. The different aspects of the block copolymer lithographic process are the subject of this dissertation. A variety of interrelated material requirements virtually necessitate the synthesis of block copolymers specifically designed for lithographic applications. Key properties for the ideal block copolymer include etch resistance to facilitate thin film processing, a large interaction parameter to enable the formation of high resolution structures, and thin film orientation control. The unifying theme for the materials synthesized herein is the presence of silicon in one block, which imparts oxygen etch resistance to just that domain. A collection of silicon-containing block copolymers was synthesized and characterized, many of which readily form features on approximately the length scale required for next-generation microelectronic devices. The most important thin film processing step biases the orientation of block copolymer domains perpendicular to the substrate by control of interfacial interactions. Both solvent and thermal annealing techniques were extensively studied to achieve orientation control. Ultimately, a dual top and bottom surface functionalization strategy was developed that utilizes a new class of "top coats" and cross-linkable substrate surface treatments. Perpendicular block copolymer features can now be produced quickly with a process amenable to existing manufacturing technology, which was previously impossible. The development of etching recipes and pattern transfer processes confirmed the through-film nature of the features and the efficacy of both the block copolymer design and the top coat process.
Download or read book Influence of Architecture on the Behavior of Microphase Separated Block Copolymers written by and published by . This book was released on 2015 with total page 243 pages. Available in PDF, EPUB and Kindle. Book excerpt: The nanoscale self–assembly of block copolymers at the ~10–100 nm length scale has exciting potential applications in next–generation nanolithography and nanotemplating, wherein the feature sizes are governed by the overall copolymer degree of polymerization, N. However, the thermodynamics of block copolymer microphase separation intrinsically limit the size of the smallest features accessible by this approach. This limitation stems from the fact that AB diblock copolymer self–assembly only occurs above a critical N that depends inversely on the magnitude of the effective interaction parameter cChi, which quantifies the energetic repulsions between the dissimilar monomer segments. In this dissertation, we first provide an overview of current routes to smaller periodicities in self-assembled block copolymers. While numerous reports have focused on developing “high Chi” AB diblocks that self–assemble at smaller values of N, the use of complex macromolecular architectures to stabilize ordered block copolymer nanostructures remains relatively unexplored. We report the melt–phase self–assembly behavior of block copolymer bottlebrushes derived from linking the block junctions of low molecular weight, symmetric poly(styrene–b–lactide) (PS-b-PLA) copolymers. These studies quantitatively demonstrate that increasing the bottlebrush backbone degree of polymerization (Nbackbone) reduces the critical PS-b-PLA copolymer arm degree of polymerization (Narm) required for self–assembly into lamellar mesophases by as much as 75%, thus reducing the nanoscale feature sizes accessible with this monomer chemistry. In studies of asymmetric block copolymer bottlebrushes, we observe a less significant reduction in the Narm required for self–assembly into a hexagonally-packed cylinders morphology. These results are rationalized in terms of how monomer concentration fluctuation effects manifest upon ordering a disordered copolymer into either a lamellar or cylindrical morphology. Finally, the chemistry and physics of two other block copolymer systems are explored: (1) the self-assembly, thin film template fabrication, and post fabrication-template modification of reactive poly(styrene-b-vinyl dimethyl azalactone) block copolymers, and (2) the synthesis and rheological characteristics of amphiphilic poly(vinyl alcohol)–based ABA triblock copolymer hydrogels.
Download or read book Manipulating Phase Behavior in Block Copolymers Using Polydispersity written by and published by . This book was released on 2013 with total page 231 pages. Available in PDF, EPUB and Kindle. Book excerpt: The effects of polydispersity, or broad molecular weight distributions, on the phase behavior of block copolymer melts and thin films are systematically explored. Linear AB diblock, ABA triblock, and BAB triblock copolymers are synthesized with continuous polydispersity in the B block (Mw/Mn 8́ơ 1.70́32.0) and relatively monodisperse A blocks (Mw/Mn 8́ơ 1.10́31.3) to understand how the self0́3assembly of polydisperse block copolymers can be altered with chain architecture and block connectivity. Broad dispersity in the M block of poly(styrene0́3b0́3methyl methacrylate) (SM) diblock copolymer melts induces domain dilation and morphological transitions to higher M block volume compositions with respect to predictions for monodisperse SM diblock copolymers. A comparison between poly(styrene0́3b0́31,40́3butadiene0́3b0́3styrene) triblock copolymers (SBS) with mid0́3block (B) polydispersity and poly(methyl methacrylate0́3b0́3styrene0́3b0́3methyl methacrylate) triblock copolymers (MSM) with outer0́3block (M) polydispersity reveals that the location of the polydisperse block and how it is connected to the other blocks is critical. Center block polydispersity in SBS, where one block is constrained at two block junctions, leads to a lamellar phase window shift to higher volume fractions of B, increases in domain periodicity, and the stabilization of a new, disordered bicontinuous morphology. The domain periodicity in the MSM triblocks with outer M block polydispersity is at least twice that predicted for monodisperse MSM triblock copolymers. However, in contrast to the SBS triblocks, the polydisperse MSM triblocks exhibit a lamellar phase window shift to lower M block compositions. The behavior of the SBS and MSM triblock copolymers is clarified in the context of the chain architectures present in the melts resulting from the block polydispersity. Preliminary studies of the thin film behavior of the SM diblock and MSM triblock copolymers revealed that despite the polydispersity of the M block, perpendicular microdomain orientation can be achieved. The MSM triblock copolymer thin films exhibit film thickness0́3dependent morphological behavior arising from a confluence of M outer0́3block polydispersity and the presence of a random brush0́3modified substrate. In summation, this dissertation demonstrates that polydispersity can be used to manipulate the phase behavior of block copolymer melts and thin films and may facilitate access to new materials with potentially useful properties.
Download or read book Block Copolymers II written by Volker Abetz and published by Springer Science & Business Media. This book was released on 2005-12-02 with total page 272 pages. Available in PDF, EPUB and Kindle. Book excerpt: . A.J. M ller, V. Balsamo, M.L. Arnal: Nucleation and Crystallization in Diblock and Triblock Copolymers.- 2 J.-F. Gohy: Block Copolymer Micelles.- 3 M.A. Hillmyer: Nanoporous Materials from Block Copolymer Precursors.- 4 M. Li, C. Coenjarts, C.K. Ober: Patternable Block Copolymers.-
Download or read book Synthesis and Applications of Copolymers written by Anbanandam Parthiban and published by John Wiley & Sons. This book was released on 2014-06-23 with total page 408 pages. Available in PDF, EPUB and Kindle. Book excerpt: Understanding the reactivity of monomers is crucial in creating copolymers and determining the outcome of copolymerization. Covering the fundamental aspects of polymerization, Synthesis and Applications of Copolymers explores the reactivity of monomers and reaction conditions that ensure that the newly formed polymeric materials exhibit desired properties. Referencing a wide-range of disciplines, the book provides researchers, students, and scientists with the preparation of a diverse variety of copolymers and their recent developments, with a particular focus on copolymerization, crystallization, and techniques like nanoimprinting and micropatterning.
Download or read book Hierarchically Structured Porous Materials written by B.-L. Su and published by John Wiley & Sons. This book was released on 2012-04-06 with total page 676 pages. Available in PDF, EPUB and Kindle. Book excerpt: This first book devoted to this hot field of science covers materials with bimodal, trimodal and multimodal pore size, with an emphasis on the successful design, synthesis and characterization of all kinds of hierarchically porous materials using different synthesis strategies. It details formation mechanisms related to different synthesis strategies while also introducing natural phenomena of hierarchy and perspectives of hierarchical science in polymers, physics, engineering, biology and life science. Examples are given to illustrate how to design an optimal hierarchically porous material for specific applications ranging from catalysis and separation to biomedicine, photonics, and energy conversion and storage. With individual chapters written by leading experts, this is the authoritative treatment, serving as an essential reference for researchers and beginners alike.
Download or read book Beyond the Molecular Frontier written by National Research Council and published by National Academies Press. This book was released on 2003-03-19 with total page 238 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemistry and chemical engineering have changed significantly in the last decade. They have broadened their scopeâ€"into biology, nanotechnology, materials science, computation, and advanced methods of process systems engineering and controlâ€"so much that the programs in most chemistry and chemical engineering departments now barely resemble the classical notion of chemistry. Beyond the Molecular Frontier brings together research, discovery, and invention across the entire spectrum of the chemical sciencesâ€"from fundamental, molecular-level chemistry to large-scale chemical processing technology. This reflects the way the field has evolved, the synergy at universities between research and education in chemistry and chemical engineering, and the way chemists and chemical engineers work together in industry. The astonishing developments in science and engineering during the 20th century have made it possible to dream of new goals that might previously have been considered unthinkable. This book identifies the key opportunities and challenges for the chemical sciences, from basic research to societal needs and from terrorism defense to environmental protection, and it looks at the ways in which chemists and chemical engineers can work together to contribute to an improved future.
Download or read book Lab on Fiber Technology written by Andrea Cusano and published by Springer. This book was released on 2014-07-29 with total page 377 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book focuses on a research field that is rapidly emerging as one of the most promising ones for the global optics and photonics community: the “lab-on-fiber” technology. Inspired by the well-established "lab on-a-chip" concept, this new technology essentially envisages novel and highly functionalized devices completely integrated into a single optical fiber for both communication and sensing applications. Based on the R&D experience of some of the world's leading authorities in the fields of optics, photonics, nanotechnology, and material science, this book provides a broad and accurate description of the main developments and achievements in the lab-on-fiber technology roadmap, also highlighting the new perspectives and challenges to be faced. This book is essential for scientists interested in the cutting-edge fiber optic technology, but also for graduate students.
