Download or read book Patterning of Microstructures on SU 8 Coated Flexible Polymer Substrates Using Roll to roll Ultraviolet Nanoimprint Lithography written by Nazrin Kooy and published by . This book was released on 2012 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Micro Nanolithography written by Jagannathan Thirumalai and published by BoD – Books on Demand. This book was released on 2018-05-02 with total page 136 pages. Available in PDF, EPUB and Kindle. Book excerpt: The main objective of this book is to give proficient people a comprehensive review of up-to-date global improvements in hypothetical and experimental evidences, perspectives and prospects of some newsworthy instrumentation and its numerous technological applications for a wide range of lithographic fabrication techniques. The present theme of this book is concomitant with the lithographic ways and means of deposition, optimization parameters and their wide technological applications. This book consists of six chapters comprehending with eminence of lithography, fabrication and reproduction of periodic nanopyramid structures using UV nanoimprint lithography for solar cell applications, large-area nanoimprint lithography and applications, micro-/nanopatterning on polymers, OPC under immersion lithography associated to novel luminescence applications, achromatic Talbot lithography (ATL) and the soft X-ray interference lithography. Individual chapters provide a base for a wide range of readers from different fiels, students and researchers, who may be doing research pertinent to the topics discussed in this book and find basic as well as advanced principles of designated subjects related to these phenomena explained plainly. The book contains six chapters by experts in different fields of lithographic fabrication and technology from over 15 research institutes across the globe.
Download or read book Self aligned Integrated Nanostructures Fabricated by UV nanoimprint Lithography written by Praveen Joseph and published by . This book was released on 2017 with total page 328 pages. Available in PDF, EPUB and Kindle. Book excerpt: Fabricating large-area multilevel integrated nanostructures and 3D nanoshapes are of tremendous importance for applications in the fields of nanoelectronics, nanophotonics, semiconductor memory, biosensors, and high density displays. As the dimensions of such nanostructures are driven-down by design, in order to drive-up the performance of the overall device, we run into challenges such as nanoscale overlay and level-to-level alignment during the lithography process. State-of-the-art nanolithography tools can achieve a certain level of nanoscale overlay with their optical and thermo-mechanical mechanisms. But these tools are expensive and they have a limit to the best possible nanoscale overlay achievable. In particular, if integrated nanostructures are needed on a large area such as an entire wafer (without having to step-and-repeat), or on non-conventional substrates such as flexible substrates, nanoscale alignment cannot be achieved using these tools. Jet and Flash Imprint Lithography (J-FIL) is a high-throughput, inexpensive, mechanical nanopatterning technique that uses a mold or imprint template to create nanostructures by causing a polymer resist to flow into its etched shapes by capillary action. The imprint template is typically fabricated using available lithography techniques and hence there is a limitation on the achievable nanoscale overlay. In this research, methods are developed to fabricate large-area, multilevel nanostructures and 3D nanoshapes on nanoimprint templates without the need for level-to-level alignment and nanoscale overlay. These nanoimprint templates are essential to explore large-area multilevel integrated nanostructures and 3D nanoshapes by J-FIL replication. The general methodology for fabrication of multilevel nanoimprint templates relies on a combination of nanoscale lithography, atomic layer deposition’s (ALD) atomic precision, and choice of highly etch selective materials, to ensure precise self-alignment of multiple levels in the nanoscale. Such templates fabricated in this work are named self-aligned multilevel templates (SAMTs). Five specific self-aligned multilevel fabrication techniques have been demonstrated that result in symmetric multilevel structures, bilaterally symmetric multilevel structures, nanotube structures, asymmetric multilevel structures, and asymmetric sloped structures on SAMTs. When used in conjunction with a nanoimprint lithography process, the SAMTs can enable high-throughput patterning of various nanoelectronic and nanophotonic devices using a single patterning step with perfect alignment and overlay. SAMTs further enable large area patterning, such as wafer-scale patterning and roll-to-roll patterning on flexible substrates, without compromising perfect overlay.
Download or read book Investigation of a Roll to roll Nanoimprinting Process Utilizing Inkjet Based Resist Deposition written by Matthew Michael Kincaid and published by . This book was released on 2011 with total page 236 pages. Available in PDF, EPUB and Kindle. Book excerpt: A high-speed, large-area technique capable of nanopatterning flexible substrates is highly desirable in several applications such as; 1) thin film photovoltaics (TFPV's), 2) flexible electronics, 3) optoelectronics, 4) energy storage devices and 5) biological applications. Flexible substrates are attractive as they can be lower in cost than traditional substrates, and provide the ability to perform continuous processing both of which are valuable for cost sensitive applications such as TFPVs. Also, flexible substrates can conform to non-planar surfaces and therefore provide versatility in applications such as wearable electronics and biomedical devices. In this thesis, a patterning approach known as Jet and Flash Imprint Lithography (J-FIL) is explored for flexible substrates. J-FIL uses inkjets to deposit low-viscosity UV curable polymer materials (resists) that are molded by a template at room temperature and low pressures prior to UV cross-linking. There are inherent advantages to the J-FIL process that lends itself to patterning flexible substrates. The room temperature and low pressure process makes it more compatible with flexible substrates which tend to become dimensionally unstable at elevated temperatures and pressure. The extension of J-FIL to flexible substrates involves the following key challenges: (i) Understanding the level of precision required in roll-to-roll machine systems to ensure that these systems can facilitate imprint and separation of nano-scale features; (ii) The substrate surface should be controlled to initiate and maintain proper interface with the template and avoid formation of bubbles; (iii) The tension in the film should be controlled to ensure that the discrete resist drops are coerced to form a uniform contiguous residual film underneath the patterns; (iv) The fluid filling time - that is representative of the process throughput - should be low; and (v) After UV curing and separation, the nanoscale patterns should not be deformed or damaged. The above challenges were addressed by developing a roll-to-roll test bed to imprint flexible polycarbonate films using the J-FIL process. The test bed has the capability of controllably varying a number of web tension parameters as well as process variables in order to calibrate machine precision and establish control schemes for a robust process. Process metrics such as RLT uniformity, target RLT accuracy, feature filling and feature distortion were measured and quantified. A design of experiments was performed on the test bed for the purposes tuning the process variables as well as developing a model of process performance, with respect to critical process parameters. A two-level design, with three input variables, is utilized in this experimental process. The process yielded blank imprints with mean thickness of 70.5 nm, and a standard deviation of 3.9 nm. The sensitivity of the mean thickness and uniformity to process variables were quantified. The best performing set of input parameters were then used during patterned imprints, to determine if any pattern filling issues or pattern deformation would take place. The patterned imprints, made up of an array of hexagonal pillars (125nm tall, by 240 nm wide, by 450 nm pitch) showed no sign of fluid filling voids, or deformation due to separation. Given this result, the feasibility of implementing J-FIL on a roll-to-roll prototype system was established. A proposed next generation flexible substrate J-FIL tool is presented, along with the expected challenges associated with metrology and dynamic noise. Future work entails the design and qualification of a full scale roll-based imprint tool, capable of meeting throughput metrics established for industrial applications.
Download or read book Ultraviolet Nanoimprint Lithography written by Elisabeth Lausecker and published by Sudwestdeutscher Verlag Fur Hochschulschriften AG. This book was released on 2012 with total page 276 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanoimprint lithography (NIL) is a lithographic technique that allows the patterning of substrates with nanostructures over large areas with high density. NIL relies on the simplicity of mechanically deforming a polymeric resist layer by a patterned mold. The author gives a detailed introduction to NIL and developed ultraviolet NIL for the pit-patterning of substrate surfaces. By combining the self-assembled growth of silicon-germanium (SiGe) islands by molecular-beam epitaxy with the pit-patterning of the Si substrate, an ordering of the islands is achieved. Both, a position-control of the SiGe islands and an improvement of their homogeneity and emission efficiency is accomplished. Moreover, the work towards integrating these ordered SiGe islands into a two-dimensional photonic crystal slab was pursued, demanding a second imprinted layer precisely aligned to the first one. Finally, self-aligned imprint lithography was developed at Princeton University, USA, for the fabrication of the first top-gate amorphous Si thin-film transistor. The book contains detailed descriptions of executed process steps.
Download or read book Hot Embossing written by Matthias Worgull and published by William Andrew. This book was released on 2009-09-28 with total page 368 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is an overview of replication technology for micro- and nanostructures, focusing on the techniques and technology of hot embossing, a scaleable and multi-purpose technology for the manufacture of devices such as BioMEMS and microfluidic devices which are expected to revolutionize a wide range of medical and industrial processes over the coming decade.The hot embossing process for replicating microstructures was developed by the Forschungszentrum Karlsruhe (Karlsruhe Institute of Technology) where the author is head of the Nanoreplication Group. Worgull fills a gap in existing information by fully detailing the technology and techniques of hot embossing. He also covers nanoimprinting, a process related to hot embossing, with examples of actual research topics and new applications in nanoreplication. A practical and theoretical guide to selecting the materials, machinery and processes involved in microreplication using hot embossing techniques Compares different replication processes such as: micro injection molding, micro thermoforming, micro hot embossing, and nanoimprinting Details commercially available hot embossing machinery and components like tools and mold inserts
Download or read book Simulation of UV Nanoimprint Lithography on Rigid and Flexible Substrates written by Akhilesh Jain and published by . This book was released on 2016 with total page 352 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanoimprint lithography (NIL) is a low cost, high throughput process used to replicate sub-20 nm feature from a patterned template to a rigid or flexible substrate. Various configurations for NIL are analyzed and classified based on type of template and substrate. The steps involved in pattern transfer using roller template based NIL are identified and models to study these steps are proposed. Important process parameters such as maximum web speed possible, required UV intensity, minimum droplet size and pitch and required force on the roller are calculated. The advantages, disadvantages and optimal process window for the different configurations are identified. Droplet spreading is simulated in NIL with rigid substrates in order to study the effect of droplet size, droplet placement error, gas diffusion and template pattern on throughput and defectivity. Square arrangement is found to be the optimum arrangement for achieving minimum throughput. Large droplet-free regions on the substrate edge and error in droplet placement error have significant impact on the throughput. A fluid flow model with average flow permeability is presented to account for flow in the template patterns. Optimum droplet dispensing for multi-patterned templates is achieved by distributing droplet volume according to local filling requirements. Non-fill defects in NIL are classified into pocket, edge and channel defects. A model to predict the size of non-fill defects based on imprint time and droplet size is presented. Defect characterization is presented for various pattern-types. A model is presented to determine the time required for the encapsulated gas to diffuse into the resist. The coupled fluid-structure interaction in NIL with flexible substrate is studied by simulating the web deformation as the droplet spreads on the substrate. It is found that the flexible substrate can be modeled as a membrane due to the lack of rigidity. RLT variation reduces as the number of droplets or the web tension increases. For the magnitude of RLT variation, thinner residual layers require higher web tension. The position of the template on the substrate is important and template positioned at the corner of the substrate is found to provide the least RLT variation.
Download or read book Lithography written by Michael Wang and published by IntechOpen. This book was released on 2010-02-01 with total page 678 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography, the fundamental fabrication process of semiconductor devices, plays a critical role in micro- and nano-fabrications and the revolution in high density integrated circuits. This book is the result of inspirations and contributions from many researchers worldwide. Although the inclusion of the book chapters may not be a complete representation of all lithographic arts, it does represent a good collection of contributions in this field. We hope readers will enjoy reading the book as much as we have enjoyed bringing it together. We would like to thank all contributors and authors of this book.
Download or read book High Resolution Nano patterning Using Roller Type Soft Mold UV Nanoimprint Lithography written by Yinsheng Zhong and published by . This book was released on 2016 with total page 100 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Ultraviolet nanoimprint lithography using flexible molds Process development and applications written by Namil Koo and published by . This book was released on 2012 with total page 113 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Nanofabrication written by Maria Stepanova and published by Springer Science & Business Media. This book was released on 2011-11-08 with total page 344 pages. Available in PDF, EPUB and Kindle. Book excerpt: Intended to update scientists and engineers on the current state of the art in a variety of key techniques used extensively in the fabrication of structures at the nanoscale. The present work covers the essential technologies for creating sub 25 nm features lithographically, depositing layers with nanometer control, and etching patterns and structures at the nanoscale. A distinguishing feature of this book is a focus not on extension of microelectronics fabrication, but rather on techniques applicable for building NEMS, biosensors, nanomaterials, photonic crystals, and other novel devices and structures that will revolutionize society in the coming years.
Download or read book Nanoimprint Lithography written by Hongbo Lan and published by Nova Science Publishers. This book was released on 2011 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography, the fundamental fabrication process of semiconductor devices, has been playing a critical role in micro-nanofabrication technologies and manufacturing of Integrated Circuits (IC). Traditional optical lithography including contact and project photolithography has contributed significantly to the semiconductor device advancements. Currently, maintaining the rapid pace of half-pitch reduction requires overcoming the challenge of improving and extending the incumbent optical projection lithography technology while simultaneously developing alternative, next generation lithography (NGL) technologies to be used when optical projection lithography is no longer more economical than the alternatives. Furthermore, NIL is also one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures as this highly technical book will give new insight to.
Download or read book Photonic Microresonator Research and Applications written by Ioannis Chremmos and published by Springer. This book was released on 2010-06-09 with total page 515 pages. Available in PDF, EPUB and Kindle. Book excerpt: The technology surrounding the design and fabrication of optical microresonators has matured to a point where there is a need for commercialization. Consequently, there is a need for device research involving more advanced architectures and more esoteric operating principles. Photonic Microresonator Research and Applications explores advances in the fabrication process that enable nanometer waveguide separations, exceptionally smooth surfaces essential to reach Q factors in the order of 106- 108 and high index contrast materials.
Download or read book Glassy Materials Based Microdevices written by Giancarlo C. Righini and published by MDPI. This book was released on 2019-02-28 with total page 284 pages. Available in PDF, EPUB and Kindle. Book excerpt: Microtechnology has changed our world since the last century, when silicon microelectronics revolutionized sensor, control and communication areas, with applications extending from domotics to automotive, and from security to biomedicine. The present century, however, is also seeing an accelerating pace of innovation in glassy materials; as an example, glass-ceramics, which successfully combine the properties of an amorphous matrix with those of micro- or nano-crystals, offer a very high flexibility of design to chemists, physicists and engineers, who can conceive and implement advanced microdevices. In a very similar way, the synthesis of glassy polymers in a very wide range of chemical structures offers unprecedented potential of applications. The contemporary availability of microfabrication technologies, such as direct laser writing or 3D printing, which add to the most common processes (deposition, lithography and etching), facilitates the development of novel or advanced microdevices based on glassy materials. Biochemical and biomedical sensors, especially with the lab-on-a-chip target, are one of the most evident proofs of the success of this material platform. Other applications have also emerged in environment, food, and chemical industries. The present Special Issue of Micromachines aims at reviewing the current state-of-the-art and presenting perspectives of further development. Contributions related to the technologies, glassy materials, design and fabrication processes, characterization, and, eventually, applications are welcome.
Download or read book Sol Gel Technologies for Glass Producers and Users written by Michel Andre Aegerter and published by Springer Science & Business Media. This book was released on 2013-03-19 with total page 474 pages. Available in PDF, EPUB and Kindle. Book excerpt: Sol-Gel Techniques for Glass Producers and Users provides technological information, descriptions and characterizations of prototypes, or products already on the market, and illustrates advantages and disadvantages of the sol-gel process in comparison to other methods. The first chapter entitled "Wet Chemical Technology" gives a summary of the basic principles of the sol-gel chemistry. The most promising applications are related to coatings. Chapter 2 describes the various "Wet Chemical Coating Technologies" from glass cleaning to many deposition and post-coating treatment techniques. These include patterning of coatings through direct or indirect techniques which have became very important and for which the sol-gel processing is particularly well adapted. Chapter 3 entitled "Bulk Glass Technologies" reports on the preparation of special glasses for different applications. Chapter 4 entitled "Coatings and Materials Properties" describes the properties of the different coatings and the sol-gel materials, fibers and powders. The chapter also includes a section dedicated to the characterization techniques especially applied to sol-gel coatings and products.
Download or read book Integrated Ring Resonators written by Dominik G. Rabus and published by Springer. This book was released on 2007-04-26 with total page 270 pages. Available in PDF, EPUB and Kindle. Book excerpt: The optical filter is resonator based. The required passband shape of ring resonator-filters can be custom designed by the use of configurations of various ring coupled resonators. This book describes the current state-of-the-art on these devices. It provides an in-depth knowledge of the simulation, fabrication and characterization of ring resonators for use as example filters, lasers, sensors.
Download or read book Micro and Nano Fabrication written by Hans H. Gatzen and published by Springer. This book was released on 2015-01-02 with total page 537 pages. Available in PDF, EPUB and Kindle. Book excerpt: For Microelectromechanical Systems (MEMS) and Nanoelectromechanical Systems (NEMS) production, each product requires a unique process technology. This book provides a comprehensive insight into the tools necessary for fabricating MEMS/NEMS and the process technologies applied. Besides, it describes enabling technologies which are necessary for a successful production, i.e., wafer planarization and bonding, as well as contamination control.
