Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2020-05-01 with total page 913 pages. Available in PDF, EPUB and Kindle. Book excerpt: The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.

Download or read book Proceedings of the 4th International Conference on the Industry 4 0 Model for Advanced Manufacturing written by Laszlo Monostori and published by Springer. This book was released on 2019-04-30 with total page 259 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book gathers the proceedings of the 4th International Conference on the Industry 4.0 Model for Advanced Manufacturing (AMP 2019), held in Belgrade, Serbia, on 3–6 June 2019. The event marks the latest in a series of high-level conferences that bring together experts from academia and industry to exchange knowledge, ideas, experiences, research findings, and information in the field of manufacturing. The book addresses a wide range of topics, including: design of smart and intelligent products, developments in CAD/CAM technologies, rapid prototyping and reverse engineering, multistage manufacturing processes, manufacturing automation in the Industry 4.0 model, cloud-based products, and cyber-physical and reconfigurable manufacturing systems. By providing updates on key issues and highlighting recent advances in manufacturing engineering and technologies, the book supports the transfer of vital knowledge to the next generation of academics and practitioners. Further, it will appeal to anyone working or conducting research in this rapidly evolving field.

Download or read book Handbook of Optical Dimensional Metrology written by Kevin Harding and published by Taylor & Francis. This book was released on 2016-04-19 with total page 497 pages. Available in PDF, EPUB and Kindle. Book excerpt: Due to their speed, data density, and versatility, optical metrology tools play important roles in today's high-speed industrial manufacturing applications. Handbook of Optical Dimensional Metrology provides useful background information and practical examples to help readers understand and effectively use state-of-the-art optical metrology methods

Download or read book Optical Microlithography written by and published by . This book was released on 2001 with total page 878 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Progress in Optics written by Emil Wolf and published by Elsevier. This book was released on 2012-09-05 with total page 378 pages. Available in PDF, EPUB and Kindle. Book excerpt: In the 50 years since the first volume of Progress in Optics was published, optics has become one of the most dynamic fields of science. The volumes in this series that have appeared up to now contain more than 300 review articles by distinguished research workers, which have become permanent records for many important developments, helping optical scientists and optical engineers stay abreast of their fields. Comprehensive, in-depth reviews Edited by the leading authority in the field

Download or read book Recent Topics on Modeling of Semiconductor Processes Devices and Circuits written by Rasit Onur Topaloglu and published by Bentham Science Publishers. This book was released on 2011-09-09 with total page 200 pages. Available in PDF, EPUB and Kindle. Book excerpt: "The last couple of years have been very busy for the semiconductor industry and researchers. The rapid speed of production channel length reduction has brought lithographic challenges to semiconductor modeling. These include stress optimization, transisto"

Download or read book Optical Microlithography XVII written by and published by . This book was released on 2004 with total page 718 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Design Rules in a Semiconductor Foundry written by Eitan N. Shauly and published by CRC Press. This book was released on 2022-11-30 with total page 831 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nowadays over 50% of integrated circuits are fabricated at wafer foundries. This book presents a foundry-integrated perspective of the field and is a comprehensive and up-to-date manual designed to serve process, device, layout, and design engineers. It comprises chapters carefully selected to cover topics relevant for them to deal with their work. The book provides an insight into the different types of design rules (DRs) and considerations for setting new DRs. It discusses isolation, gate patterning, S/D contacts, metal lines, MOL, air gaps, and so on. It explains in detail the layout rules needed to support advanced planarization processes, different types of dummies, and related utilities as well as presents a large set of guidelines and layout-aware modeling for RF CMOS and analog modules. It also discusses the layout DRs for different mobility enhancement techniques and their related modeling, listing many of the dedicated rules for static random-access memory (SRAM), embedded polyfuse (ePF), and LogicNVM. The book also provides the setting and calibration of the process parameters set and describes the 28~20 nm planar MOSFET process flow for low-power and high-performance mobile applications in a step-by-step manner. It includes FEOL and BEOL physical and environmental tests for qualifications together with automotive qualification and design for automotive (DfA). Written for the professionals, the book belongs to the bookshelf of microelectronic discipline experts.

Download or read book Optical laser Microlithography written by and published by . This book was released on 1990 with total page 604 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Springer Handbook of Semiconductor Devices written by Massimo Rudan and published by Springer Nature. This book was released on 2022-11-10 with total page 1680 pages. Available in PDF, EPUB and Kindle. Book excerpt: This Springer Handbook comprehensively covers the topic of semiconductor devices, embracing all aspects from theoretical background to fabrication, modeling, and applications. Nearly 100 leading scientists from industry and academia were selected to write the handbook's chapters, which were conceived for professionals and practitioners, material scientists, physicists and electrical engineers working at universities, industrial R&D, and manufacturers. Starting from the description of the relevant technological aspects and fabrication steps, the handbook proceeds with a section fully devoted to the main conventional semiconductor devices like, e.g., bipolar transistors and MOS capacitors and transistors, used in the production of the standard integrated circuits, and the corresponding physical models. In the subsequent chapters, the scaling issues of the semiconductor-device technology are addressed, followed by the description of novel concept-based semiconductor devices. The last section illustrates the numerical simulation methods ranging from the fabrication processes to the device performances. Each chapter is self-contained, and refers to related topics treated in other chapters when necessary, so that the reader interested in a specific subject can easily identify a personal reading path through the vast contents of the handbook.

Download or read book Extending Moore s Law through Advanced Semiconductor Design and Processing Techniques written by Wynand Lambrechts and published by CRC Press. This book was released on 2018-09-13 with total page 345 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a methodological understanding of the theoretical and technical limitations to the longevity of Moore’s law. The book presents research on factors that have significant impact on the future of Moore’s law and those factors believed to sustain the trend of the last five decades. Research findings show that boundaries of Moore’s law primarily include physical restrictions of scaling electronic components to levels beyond that of ordinary manufacturing principles and approaching the bounds of physics. The research presented in this book provides essential background and knowledge to grasp the following principles: Traditional and modern photolithography, the primary limiting factor of Moore’s law Innovations in semiconductor manufacturing that makes current generation CMOS processing possible Multi-disciplinary technologies that could drive Moore's law forward significantly Design principles for microelectronic circuits and components that take advantage of technology miniaturization The semiconductor industry economic market trends and technical driving factors The complexity and cost associated with technology scaling have compelled researchers in the disciplines of engineering and physics to optimize previous generation nodes to improve system-on-chip performance. This is especially relevant to participate in the increased attractiveness of the Internet of Things (IoT). This book additionally provides scholarly and practical examples of principles in microelectronic circuit design and layout to mitigate technology limits of previous generation nodes. Readers are encouraged to intellectually apply the knowledge derived from this book to further research and innovation in prolonging Moore’s law and associated principles.

Download or read book Tailored Light 2 written by Reinhart Poprawe and published by Springer Nature. This book was released on 2023-11-05 with total page 894 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book covers the application technology of lasers, focusing more on the vast range of processes than on individual applications, in order to motivate and enable future innovations. The physical basics are presented in the first half of the book. The following examination of application categories and their processes is documented by experts from their practical points of view but always refers back to the underlying physical principles. In this way, readers are free to choose their own individual level of depth in understanding this globally relevant field of innovation. This new edition of Tailored Light 2: Laser Applications birings the book up to date with the latest applications of laster technology.

Download or read book Optical laser Microlithography II written by Burn Jeng Lin and published by . This book was released on 1989 with total page 588 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Functional Thin Films and Nanostructures for Sensors written by Anis Zribi and published by Springer Science & Business Media. This book was released on 2009-04-05 with total page 224 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book discusses advances in functional thin films for sensors and novel concepts for future breakthroughs. The focus is on guidelines and design rules for sensor systems, interaction between functional thin films and other sensor subsystems, fundamentals behind the intrinsic functionality in sensing thin films and nanostructures, state-of-the-art technologies used to develop sensors today and concrete examples of sensor designs.

Download or read book Energy Efficient Fault Tolerant Systems written by Jimson Mathew and published by Springer Science & Business Media. This book was released on 2013-09-07 with total page 347 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book describes the state-of-the-art in energy efficient, fault-tolerant embedded systems. It covers the entire product lifecycle of electronic systems design, analysis and testing and includes discussion of both circuit and system-level approaches. Readers will be enabled to meet the conflicting design objectives of energy efficiency and fault-tolerance for reliability, given the up-to-date techniques presented.

Download or read book Optical Microlithography XXII written by and published by . This book was released on 2009 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Handbook of VLSI Microlithography written by William B. Glendinning and published by William Andrew. This book was released on 2012-12-02 with total page 672 pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered -- including an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.