Download or read book Optical Imaging in Projection Microlithography written by Alfred Kwok-Kit Wong and published by SPIE Press. This book was released on 2005 with total page 280 pages. Available in PDF, EPUB and Kindle. Book excerpt: Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system-level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists.
Download or read book Handbook of Algorithms for Physical Design Automation written by Charles J. Alpert and published by CRC Press. This book was released on 2008-11-12 with total page 1044 pages. Available in PDF, EPUB and Kindle. Book excerpt: The physical design flow of any project depends upon the size of the design, the technology, the number of designers, the clock frequency, and the time to do the design. As technology advances and design-styles change, physical design flows are constantly reinvented as traditional phases are removed and new ones are added to accommodate changes in
Download or read book Fundamental Principles of Optical Lithography written by Chris Mack and published by John Wiley & Sons. This book was released on 2011-08-10 with total page 503 pages. Available in PDF, EPUB and Kindle. Book excerpt: The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
Download or read book Matrix Methods for Optical Layout written by Gerhard Kloos and published by SPIE Press. This book was released on 2007 with total page 144 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is intended to familiarize the reader with the method of Gaussian matrices and some related tools of optical design. The matrix method provides a means to study an optical system in the paraxial approximation. This text contains new results such as theorems on the design of variable optics, on integrating rods, on the optical layout of prism devices, etc. The results are derived in a step-by-step way so that the reader might apply the methods presented here to resolve design problems with ease.
Download or read book Handbook of Microlithography Micromachining and Microfabrication Microlithography written by P. Rai-Choudhury and published by SPIE Press. This book was released on 1997 with total page 780 pages. Available in PDF, EPUB and Kindle. Book excerpt: The dynamic field of lithography demands an authoritative handbook for process development and production, and to aid in the training of scientists and engineers. It contains process details, recipes, tables, charts, etc., and is useful as a reference book or as a textbook. Copublished with IEE.
Download or read book Fundamentals of Polarimetric Remote Sensing written by John Robert Schott and published by SPIE Press. This book was released on 2009 with total page 270 pages. Available in PDF, EPUB and Kindle. Book excerpt: This text is for those who need an introduction to polarimetric signals to begin working in the field of polarimetric remote sensing, particularly where the contrast between manmade objects and natural backgrounds are the subjects of interest. The book takes a systems approach to the physical processes involved with formation, collection, and analysis of polarimetric remote sensing data in the visible through longwave infrared. (pBRDF) is then introduced as a way to characterize the reflective and emissive polarimetric behavior of materials. With Dr. Schott's text, you will gain an introduction to polarimetric remote sensing, an appreciation of its issues, and the tools to begin to work in the field.
Download or read book Computational Lithography written by Xu Ma and published by John Wiley & Sons. This book was released on 2011-01-06 with total page 225 pages. Available in PDF, EPUB and Kindle. Book excerpt: A Unified Summary of the Models and Optimization Methods Used in Computational Lithography Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting mask (PSM), and off-axis illumination (OAI) RET tools that use model-based mathematical optimization approaches. The book starts with an introduction to optical lithography systems, electric magnetic field principles, and the fundamentals of optimization from a mathematical point of view. It goes on to describe in detail different types of optimization algorithms to implement RETs. Most of the algorithms developed are based on the application of the OPC, PSM, and OAI approaches and their combinations. Algorithms for coherent illumination as well as partially coherent illumination systems are described, and numerous simulations are offered to illustrate the effectiveness of the algorithms. In addition, mathematical derivations of all optimization frameworks are presented. The accompanying MATLAB® software files for all the RET methods described in the book make it easy for readers to run and investigate the codes in order to understand and apply the optimization algorithms, as well as to design a set of optimal lithography masks. The codes may also be used by readers for their research and development activities in their academic or industrial organizations. An accompanying MATLAB® software guide is also included. An accompanying MATLAB® software guide is included, and readers can download the software to use with the guide at ftp://ftp.wiley.com/public/sci_tech_med/computational_lithography. Tailored for both entry-level and experienced readers, Computational Lithography is meant for faculty, graduate students, and researchers, as well as scientists and engineers in industrial organizations whose research or career field is semiconductor IC fabrication, optical lithography, and RETs. Computational lithography draws from the rich theory of inverse problems, optics, optimization, and computational imaging; as such, the book is also directed to researchers and practitioners in these fields.
Download or read book Applied Digital Optics written by Bernard C. Kress and published by John Wiley & Sons. This book was released on 2009-11-04 with total page 638 pages. Available in PDF, EPUB and Kindle. Book excerpt: Miniaturization and mass replications have begun to lead the optical industry in the transition from traditional analog to novel digital optics. As digital optics enter the realm of mainstream technology through the worldwide sale of consumer electronic devices, this timely book aims to present the topic of digital optics in a unified way. Ranging from micro-optics to nanophotonics, and design to fabrication through to integration in final products, it reviews the various physical implementations of digital optics in either micro-refractives, waveguide (planar lightwave chips), diffractive and hybrid optics or sub-wavelength structures (resonant gratings, surface plasmons, photonic crystals and metamaterials). Finally, it presents a comprehensive list of industrial and commercial applications that are taking advantage of the unique properties of digital optics. Applied Digital Optics is aimed primarily at optical engineers and product development and technical marketing managers; it is also of interest to graduate-level photonics students and micro-optic foundries. Helps optical engineers review and choose the appropriate software tools to design, model and generate fabrication files. Gives product managers access to an exhaustive list of applications available in today’s market for integrating such digital optics, as well as where the next potential application of digital optics might be. Provides a broad view for technical marketing managers in all aspects of digital optics, and how such optics can be classified. Explains the numerical implementation of optical design and modelling techniques. Enables micro-optics foundries to integrate the latest fabrication and replication techniques, and accordingly fine tune their own fabrication processes.
Download or read book Istc cstic 2009 cistc written by David Huang and published by The Electrochemical Society. This book was released on 2009-03 with total page 1124 pages. Available in PDF, EPUB and Kindle. Book excerpt: ISTC/CSTIC is an annual semiconductor technology conference covering all the aspects of semiconductor technology and manufacturing, including devices, design, lithography, integration, materials, processes, manufacturing as well as emerging semiconductor technologies and silicon material applications. ISTC/CSTIC 2009 was merged by ISTC (International Semiconductor Technology Conference) and CSTIC (China Semiconductor Technology International Conference), the two industry leading technical conferences in China, and consisted of one plenary session and nine technical symposia. This issue of ECS Transactions contains 159 papers from the conference.
Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2020-05-01 with total page 851 pages. Available in PDF, EPUB and Kindle. Book excerpt: The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Download or read book The Physics and Engineering of Solid State Lasers written by Yehoshua Y. Kalisky and published by SPIE Press. This book was released on 2006 with total page 226 pages. Available in PDF, EPUB and Kindle. Book excerpt: Explains the mutual influences between the physical and dynamic processes in solids and their lasing properties. This book provides insight into the physics and engineering of solid state lasers by integrating information from several disciplines, including solid state physics, materials science, photophysics, and dynamic processes in solids.
Download or read book Nanofabrication written by Zheng Cui and published by Springer. This book was released on 2016-08-10 with total page 442 pages. Available in PDF, EPUB and Kindle. Book excerpt: This second edition of Nanofabrication is one of the most comprehensive introductions on nanofabrication technologies and processes. A practical guide and reference, this book introduces readers to all of the developed technologies that are capable of making structures below 100nm. The principle of each technology is introduced and illustrated with minimum mathematics involved. Also analyzed are the capabilities of each technology in making sub-100nm structures, and the limits of preventing a technology from going further down the dimensional scale. This book provides readers with a toolkit that will help with any of their nanofabrication challenges.
Download or read book Advances in FDTD Computational Electrodynamics written by Allen Taflove and published by Artech House. This book was released on 2013 with total page 640 pages. Available in PDF, EPUB and Kindle. Book excerpt: Advances in photonics and nanotechnology have the potential to revolutionize humanitys ability to communicate and compute. To pursue these advances, it is mandatory to understand and properly model interactions of light with materials such as silicon and gold at the nanoscale, i.e., the span of a few tens of atoms laid side by side. These interactions are governed by the fundamental Maxwells equations of classical electrodynamics, supplemented by quantum electrodynamics. This book presents the current state-of-the-art in formulating and implementing computational models of these interactions. Maxwells equations are solved using the finite-difference time-domain (FDTD) technique, pioneered by the senior editor, whose prior Artech House books in this area are among the top ten most-cited in the history of engineering. This cutting-edge resource helps readers understand the latest developments in computational modeling of nanoscale optical microscopy and microchip lithography, as well as nanoscale plasmonics and biophotonics.
Download or read book Logic based Nonlinear Image Processing written by Stephen Marshall and published by SPIE Press. This book was released on 2007 with total page 168 pages. Available in PDF, EPUB and Kindle. Book excerpt: This text provides insight into the design of optimal image processing operators for implementation directly into digital hardware. Starting with simple restoration examples and using the minimum of statistics, the book provides a design strategy for a wide range of image processing applications. The text is aimed principally at electronics engineers and computer scientists, but will also be of interest to anyone working with digital images.
Download or read book Handbook of Optical Systems Volume 4 written by Herbert Gross and published by Wiley-VCH. This book was released on 2005 with total page 1106 pages. Available in PDF, EPUB and Kindle. Book excerpt: The state-of-the-art full-colored handbook gives a comprehensive introduction to the principles and the practice of calculation, layout, and understanding of optical systems and lens design. Written by reputed industrial experts in the field, this text introduces the user to the basic properties of optical systems, aberration theory, classification and characterization of systems, advanced simulation models, measuring of system quality and manufacturing issues. In this Volume Volume 4 presents a survey of optical systems, based on the principles of image formation, optical system setup and quality control which are covered by the first three volumes. Starting with the human eye, the chapters discuss all systems, from telescopes and binoculars to projection, spectroscopic and illumination systems. All these systems are characterized and described using coherent schemes and criteria to provide readers with a thorough background for their own developments. Other Volumes Volume 1: Fundamentals of Technical Optics Volume 2: Physical Image Formation Volume 3: Aberration Theory and Correction of Optical Systems Volume 5: Advanced Physical Optics
Download or read book Miniaturized Transistors written by Lado Filipovic and published by MDPI. This book was released on 2019-06-24 with total page 202 pages. Available in PDF, EPUB and Kindle. Book excerpt: What is the future of CMOS? Sustaining increased transistor densities along the path of Moore's Law has become increasingly challenging with limited power budgets, interconnect bandwidths, and fabrication capabilities. In the last decade alone, transistors have undergone significant design makeovers; from planar transistors of ten years ago, technological advancements have accelerated to today's FinFETs, which hardly resemble their bulky ancestors. FinFETs could potentially take us to the 5-nm node, but what comes after it? From gate-all-around devices to single electron transistors and two-dimensional semiconductors, a torrent of research is being carried out in order to design the next transistor generation, engineer the optimal materials, improve the fabrication technology, and properly model future devices. We invite insight from investigators and scientists in the field to showcase their work in this Special Issue with research papers, short communications, and review articles that focus on trends in micro- and nanotechnology from fundamental research to applications.
Download or read book Labs on Chip written by Eugenio Iannone and published by CRC Press. This book was released on 2018-09-03 with total page 1143 pages. Available in PDF, EPUB and Kindle. Book excerpt: Labs on Chip: Principles, Design and Technology provides a complete reference for the complex field of labs on chip in biotechnology. Merging three main areas— fluid dynamics, monolithic micro- and nanotechnology, and out-of-equilibrium biochemistry—this text integrates coverage of technology issues with strong theoretical explanations of design techniques. Analyzing each subject from basic principles to relevant applications, this book: Describes the biochemical elements required to work on labs on chip Discusses fabrication, microfluidic, and electronic and optical detection techniques Addresses planar technologies, polymer microfabrication, and process scalability to huge volumes Presents a global view of current lab-on-chip research and development Devotes an entire chapter to labs on chip for genetics Summarizing in one source the different technical competencies required, Labs on Chip: Principles, Design and Technology offers valuable guidance for the lab-on-chip design decision-making process, while exploring essential elements of labs on chip useful both to the professional who wants to approach a new field and to the specialist who wants to gain a broader perspective.
