Download or read book Opening the Extreme Ultraviolet Lithography Source Bottleneck written by John White (Ph.D.) and published by . This book was released on 2006 with total page 251 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book X Rays and Extreme Ultraviolet Radiation written by David Attwood and published by Cambridge University Press. This book was released on 2017-02-16 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: With this fully updated second edition, readers will gain a detailed understanding of the physics and applications of modern X-ray and EUV radiation sources. Taking into account the most recent improvements in capabilities, coverage is expanded to include new chapters on free electron lasers (FELs), laser high harmonic generation (HHG), X-ray and EUV optics, and nanoscale imaging; a completely revised chapter on spatial and temporal coherence; and extensive discussion of the generation and applications of femtosecond and attosecond techniques. Readers will be guided step by step through the mathematics of each topic, with over 300 figures, 50 reference tables and 600 equations enabling easy understanding of key concepts. Homework problems, a solutions manual for instructors, and links to YouTube lectures accompany the book online. This is the 'go-to' guide for graduate students, researchers and industry practitioners interested in X-ray and EUV interaction with matter.
Download or read book EUV Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2009 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt: Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Download or read book Index to Theses with Abstracts Accepted for Higher Degrees by the Universities of Great Britain and Ireland and the Council for National Academic Awards written by and published by . This book was released on 2007 with total page 694 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Extreme Ultraviolet Lithography written by Harry J. Levinson and published by . This book was released on 2020 with total page 245 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Extreme Ultraviolet EUV Lithography III written by and published by . This book was released on 2012 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Extreme Ultraviolet Lithography written by Banqiu Wu and published by Wiley-VCH. This book was released on 2009-04-01 with total page 650 pages. Available in PDF, EPUB and Kindle. Book excerpt: Explains the most promising innovation in microlithography. today. . This landmark resource provides the first complete guide to. extreme ultraviolet lithography (EUVL), covering the latest scientific. theory, processing methods, applications, and future. directions. Edited by two renowned EUVL experts, the reference. contains contributions by prominent engineers at leading semiconductor. manufacturers such as Intel and ASM Lithography.. Designed to help you optimize. EUVL, Extreme Ultraviolet Lithography covers EUV. lithography tools, EUV printer, EUV sources, multilayer EUV, EUV. optics, defect control, resist, mask techniques, and more.
Download or read book Nanolithography written by M Feldman and published by Woodhead Publishing. This book was released on 2014-02-13 with total page 599 pages. Available in PDF, EPUB and Kindle. Book excerpt: Integrated circuits, and devices fabricated using the techniques developed for integrated circuits, have steadily gotten smaller, more complex, and more powerful. The rate of shrinking is astonishing – some components are now just a few dozen atoms wide. This book attempts to answer the questions, "What comes next? and "How do we get there?Nanolithography outlines the present state of the art in lithographic techniques, including optical projection in both deep and extreme ultraviolet, electron and ion beams, and imprinting. Special attention is paid to related issues, such as the resists used in lithography, the masks (or lack thereof), the metrology needed for nano-features, modeling, and the limitations caused by feature edge roughness. In addition emerging technologies are described, including the directed assembly of wafer features, nanostructures and devices, nano-photonics, and nano-fluidics.This book is intended as a guide to the researcher new to this field, reading related journals or facing the complexities of a technical conference. Its goal is to give enough background information to enable such a researcher to understand, and appreciate, new developments in nanolithography, and to go on to make advances of his/her own. - Outlines the current state of the art in alternative nanolithography technologies in order to cope with the future reduction in size of semiconductor chips to nanoscale dimensions - Covers lithographic techniques, including optical projection, extreme ultraviolet (EUV), nanoimprint, electron beam and ion beam lithography - Describes the emerging applications of nanolithography in nanoelectronics, nanophotonics and microfluidics
Download or read book Extreme Ultraviolet Lithography written by and published by . This book was released on 2009 with total page 465 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book EUV Lithography written by Vivek Bakshi and published by . This book was released on 2018 with total page 726 pages. Available in PDF, EPUB and Kindle. Book excerpt: "Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This book covers the fundamental and latest status of all aspects of EUVL in field. It thoroughly covers the current in-field version of EUVL plus related topics, including light sources, optics, mask, photoresists, contamination, imaging and scanners. In the nine years since SPIE Press published the first edition of EUVL Lithography, much progress has taken place in the development of EUVL as the choice technology for NGL. In 2008, EUVL was a prime contender to replace 193 nm based optical lithography in leading edge computer chipmaking, but not everyone was convinced at that point. Switching from 193 nm to 13.5 nm wavelengths was a much bigger jump than the industry had attempted before. It brought several difficult challenges in all areas of lithography - light source, scanner, mask, mask handling, optics, optics metrology, resist, computation, materials and optics contamination. These challenges have been effectively resolved, and several leading-edge chipmakers have announced dates, starting in 2018, for inserting EUVL into high-volume manufacturing"--
Download or read book Handbook of Emerging Materials for Semiconductor Industry written by Young Suh Song and published by Springer Nature. This book was released on with total page 930 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Nanomaterials and Devices written by Donglu Shi and published by Elsevier. This book was released on 2014-09-18 with total page 358 pages. Available in PDF, EPUB and Kindle. Book excerpt: Introducing the fields of nanomaterials and devices, and their applications across a wide range of academic disciplines and industry sectors, Donglu Shi bridges knowledge acquisition and practical work, providing a starting point for the research and development of applications. The book describes characterization of nanomaterials, their preparation methods and performance testing techniques; the design and development of nano-scale devices; and the applications of nanomaterials, with examples taken from different industry sectors, such as lighting, energy, bioengineering and medicine / medical devices. Key nanomaterial types are covered, such as carbon nanotubes, nanobiomaterials, nano-magnetic materials, semiconductor materials and nanocomposites. Shi also provides detailed coverage of key emerging technologies such as DNA nanotechnology and spintronics. The resulting text is equally relevant for advanced students (senior and graduate) and for engineers and scientists from a variety of different academic backgrounds working in the multi-disciplinary field of nanotechnology. - Provides detailed guidance for the characterization of nanomaterials, their preparation, and performance testing - Explains the principles and challenges of the design and development of nano-scale devices - Explores applications through cases taken from a range of different sectors, including electronics, energy and medicine.
Download or read book Soft X Rays and Extreme Ultraviolet Radiation written by David Attwood and published by Cambridge University Press. This book was released on 2007-02-22 with total page 611 pages. Available in PDF, EPUB and Kindle. Book excerpt: This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.
Download or read book IST 2001 written by and published by . This book was released on 2001 with total page 216 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Information Society is taking shape around us. Already, information society technologies (IST) affect every aspect of how we live, work and play, and they seem set to have an even greater impact in the future. To realise the full potential of the Information Society, however, its benefits should be accessible to all. The Information Society Technologies Programme, part of the EU's Fifth Framework Programme for research and technological development, is working towards a vision of the future that puts the user at the centre of IST development. In this vision, the technology is almost invisible as it blends into our everday environment. People are able to access IST applications and services wherever they are, whenever they want, and in the form that is most natural for them. This book presents a snapshot of the IST Programme at the present time, describing technical challenges and policy issues addressed by the work programme and highlighting some of the on-going RTD projects. It focuses on the use of IST within three key settings: by individuals and in personal spaces; by enterprises and in the workplace; and by public services and society at large. Enabling technologies which underpin future applications and services across these scenarios are also described. Covering IST development from many different perspectives, the book shows how the Programme is contributing to an Information Society where technology serves the needs of people.
Download or read book Frontiers of Materials Research written by National Academies of Sciences, Engineering, and Medicine and published by National Academies Press. This book was released on 2019-09-12 with total page 295 pages. Available in PDF, EPUB and Kindle. Book excerpt: Modern materials science builds on knowledge from physics, chemistry, biology, mathematics, computer and data science, and engineering sciences to enable us to understand, control, and expand the material world. Although it is anchored in inquiry-based fundamental science, materials research is strongly focused on discovering and producing reliable and economically viable materials, from super alloys to polymer composites, that are used in a vast array of products essential to today's societies and economies. Frontiers of Materials Research: A Decadal Survey is aimed at documenting the status and promising future directions of materials research in the United States in the context of similar efforts worldwide. This third decadal survey in materials research reviews the progress and achievements in materials research and changes in the materials research landscape over the last decade; research opportunities for investment for the period 2020-2030; impacts that materials research has had and is expected to have on emerging technologies, national needs, and science; and challenges the enterprise may face over the next decade.
Download or read book Materials and Processes for Next Generation Lithography written by and published by Elsevier. This book was released on 2016-11-08 with total page 636 pages. Available in PDF, EPUB and Kindle. Book excerpt: As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. - Assembles up-to-date information from the world's premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation - Includes information on processing and metrology techniques - Brings together multiple approaches to litho pattern recording from academia and industry in one place
Download or read book Controlling the Quantum World written by National Research Council and published by National Academies Press. This book was released on 2007-06-21 with total page 245 pages. Available in PDF, EPUB and Kindle. Book excerpt: As part of the Physics 2010 decadal survey project, the Department of Energy and the National Science Foundation requested that the National Research Council assess the opportunities, over roughly the next decade, in atomic, molecular, and optical (AMO) science and technology. In particular, the National Research Council was asked to cover the state of AMO science, emphasizing recent accomplishments and identifying new and compelling scientific questions. Controlling the Quantum World, discusses both the roles and challenges for AMO science in instrumentation; scientific research near absolute zero; development of extremely intense x-ray and laser sources; exploration and control of molecular processes; photonics at the nanoscale level; and development of quantum information technology. This book also offers an assessment of and recommendations about critical issues concerning maintaining U.S. leadership in AMO science and technology.
