Download or read book On Submicron Electron Beam Lithography Using Field Emission Cathodes written by Göran Stille and published by . This book was released on 1980 with total page 20 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book On submicron electron beam lithography using field emission cathodes written by and published by . This book was released on 1980 with total page 10 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book The Physics of Submicron Lithography written by Kamil A. Valiev and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 502 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is devoted to the physics of electron-beam, ion-beam, optical, and x-ray lithography. The need for this book results from the following considerations. The astonishing achievements in microelectronics are in large part connected with successfully applying the relatively new technology of processing (changing the prop erties of) a material into a device whose component dimensions are submicron, called photolithography. In this method the device is imaged as a pattern on a metal film that has been deposited onto a transparent substrate and by means of a broad stream of light is transferred to a semiconductor wafer within which the physical structure of the devices and the integrated circuit connections are formed layer by layer. The smallest dimensions of the device components are limited by the diffraction of the light when the pattern is transferred and are approximately the same as the wavelength of the light. Photolithography by light having a wavelength of A ~ 0.4 flm has made it possible to serially produce integrated circuits having devices whose minimal size is 2-3 flm in the 4 pattern and having 10-105 transistors per circuit.

Download or read book An Investigation of the Proximity Effect in Submicron Pattern Exposure written by Jo Allyson McMillan and published by . This book was released on 1989 with total page 254 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Proceedings of the Symposium on Electron and Ion Beam Science and Technology International Conference written by and published by . This book was released on 1980 with total page 676 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Field Emission in Vacuum Microelectronics written by George N. Fursey and published by Springer Science & Business Media. This book was released on 2007-12-24 with total page 216 pages. Available in PDF, EPUB and Kindle. Book excerpt: Field emission is a phenomenon described by quantum mechanics. Its emission capability is millions times higher than that of any other known types of electron emission. Nowadays this phenomenon is experiencing a new life due to wonderful applications in the atomic resolution microscopy, in electronic holography, and in the vacuum micro- and nanoelectronics in general. The main field emission properties, and some most remarkable experimental facts and applications, are described in this book.

Download or read book Patterning of Material Layers in Submicron Region written by U. S. Tandon and published by John Wiley & Sons. This book was released on 1993 with total page 206 pages. Available in PDF, EPUB and Kindle. Book excerpt: It invokes the interests of the reader into the wonderland of nanominiaturization for industrial, biological and fundamental applications. Its contents portray the advent and relevance of submicron structures and proffer a perception of materials, modules and schemes for preparing them.

Download or read book The Physics of Microfabrication written by Ivor Brodie and published by Springer Science & Business Media. This book was released on 2013-11-11 with total page 518 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Physical Electronics Department of SRI International (formerly Stanford Research Institute) has been pioneering the development of devices fabricated to submicron tolerances for well over 20 years. In 1961, a landmark paper on electron-beam lithography and its associated technologies was published by K. R. Shoulderst (then at SRI), which set the stage for our subsequent efforts in this field. He had the foresight to believe that the building of such small devices was actually within the range of human capabilities. As a result of this initial momentum, our experience in the technologies associated with microfabrication has become remarkably comprehensive, despite the relatively small size of our research activity. We have frequently been asked to deliver seminars or provide reviews on various aspects of micro fabrication. These activities made us aware of the need for a comprehensive overview of the physics of microfabrication. We hope that this book will fill that need.

Download or read book High Speed Electron Beam Lithographic Resists for Micron and Submicron Integrated Circuits written by John N. Helbert and published by . This book was released on 1978 with total page 11 pages. Available in PDF, EPUB and Kindle. Book excerpt: Next-generation RADAR and ELINT systems are planned to provide the field commander with comprehensive intelligence on the disposition of enemy weapons and electronics equipment. Ultra-compact signal processors with unprecedented capabilities are the heart of these systems. Fabrication of the required high-density integrated circuits (IC's), with elements in the micron to submicron range, is beyond the resolution limit of state-of-the-art optical photolithography. Electrons with 10-20 keV energies can be accurately focused to beam diameters much less than a micron. Electron-beam lithography (EBL) meets the projected resolution requirements, and is expected to be a key technology for the production of sophisticated new digital communications systems for the Army.

Download or read book The Research and Development of Sub micron Gap Nanodiamond Lateral Field Emission Diodes written by Xuan-Anh Celestina LeQuan and published by . This book was released on 2010 with total page 95 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Official Gazette of the United States Patent and Trademark Office written by and published by . This book was released on 2002 with total page 746 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Computer Visualisation and Proximity Effect Correction for Submicron Electron Beam Lithography written by Raju Gurung and published by . This book was released on 1995 with total page 260 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Electron beam X ray and Ion beam Technology written by Arnold W. Yanof and published by . This book was released on 1988 with total page 340 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Nanosources and Manipulation of Atoms Under High Fields and Temperatures Applications written by Vu Thien Binh and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 320 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume contains the proceedings of the NATO-Advanced Research Workshop (ARW) "Manipulation of atoms under high fields and temperatures: Applications", sponsored by the NATO Scientific Affairs Division, Special Programme on Nanoscale Science. This ARW took place in Summer '92, in the pleasant surroundings of the Hotel des Thermes at Charbonnieres les Bains -Lyon, France. Gathering some fifty experts from different fields, the ARW provided an opportunity to review the basic principles and to highlight the progress made during the last few years on the nanosources and the interactions between atomic-scale probes and samples. The motivation is to use the novel properties attached to the atomic dimensions to develop nanoscale technologies. The perception of the atomic-scale world has greatly changed since the discovery and development, in the early 80's, of Scanning Tunneling Microscopy (STM) by Binnig and Rohrer. Beyond the observation of individual atoms, which is now routine, the concept of playing with atoms has become commonplace. This has lead to the fashioning of tools at the atomic scale, to the deposition, the displacement and the creation of atomic structures and also to the knowledge of interactions and contacts between atoms. Nanotips ending with a single atom are sources of ultra-fine charged beams. They can be unique tools for high resolution observations, for micro fabrications by micro-machining and deposition at a scale not previously attainable, with a working distance less stringent than with STM devices.

Download or read book Proceedings of the Symposia on Electrochemical Processing in ULSI Fabrication I written by Electrochemical Society. Dielectric Science and Technology Division and published by . This book was released on 1999 with total page 290 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Electron Beam Lithography and Dry Processing for Submicron Fabrication written by and published by . This book was released on 1990 with total page 414 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Submicron Lithography written by Phillip D. Blais and published by . This book was released on 1982 with total page 200 pages. Available in PDF, EPUB and Kindle. Book excerpt: