Download or read book Numerical Simulation of Chemical Vapor Deposition written by Tak-Leung Cheung and published by . This book was released on 1999 with total page 184 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Modeling of Chemical Vapor Deposition of Tungsten Films written by Chris R. Kleijn and published by Birkhäuser. This book was released on 2013-11-11 with total page 138 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity of all the assumptions made in his work. On the other side, Christoph Werner, working in the context of an industrial research lab, was able to closely interact with manufacturing and development engineers in a modern submicron semiconductor processing line. Because of these different approaches, the informal collaboration during the course of the projects proved to be extremely helpful to both sides, even though - or perhaps because - different computer codes, different CVD reactors and also slightly different models were used. In spite of the inconsistencies which might arise from this double approach, we feel that the presentation of both sets of results in one book will be very useful for people working in similar projects.

Download or read book Numerical Simulation of Chemical Vapor Deposition of Carbon on Graphite written by Sreekanth Bammidipati and published by . This book was released on 1995 with total page 218 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Numerical Simulation of a Vertical Impinging Type Chemical Vapor Deposition Reactor written by Rajib SenGupta and published by . This book was released on 1998 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Numerical Modeling Tools for Chemical Vapor Deposition written by National Aeronautics and Space Adm Nasa and published by Independently Published. This book was released on 2018-11-07 with total page 102 pages. Available in PDF, EPUB and Kindle. Book excerpt: Development of general numerical simulation tools for chemical vapor deposition (CVD) was the objective of this study. Physical models of important CVD phenomena were developed and implemented into the commercial computational fluid dynamics software FLUENT. The resulting software can address general geometries as well as the most important phenomena occurring with CVD reactors: fluid flow patterns, temperature and chemical species distribution, gas phase and surface deposition. The physical models are documented which are available and examples are provided of CVD simulation capabilities. Jasinski, Thomas J. and Childs, Edward P. Unspecified Center...

Download or read book Numerical Simulation of Fiber Formation by Laser assisted Chemical Vapor Deposition written by David D. Yu and published by . This book was released on 1999 with total page 302 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Numerical Simulation of an Arc Heated Plasma Process for Diamond Chemical Vapor Deposition written by Christopher David Moen and published by . This book was released on 1994 with total page 540 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Numerical Simulation of Supersonic Internal Flow for an Arc heated Chemical Vapor Deposition Reactor written by Christopher D. Moen and published by . This book was released on 1995 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Numerical Modeling Tools for Chemical Vapor Deposition written by Thomas John Jasinski and published by . This book was released on 1992 with total page 106 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Chemical Vapor Deposition Fluid Flow Simulation Modelling Tool written by National Aeronautics and Space Administration NASA and published by . This book was released on 2018-11-13 with total page 138 pages. Available in PDF, EPUB and Kindle. Book excerpt: Accurate numerical simulation of chemical vapor deposition (CVD) processes requires a general purpose computational fluid dynamics package combined with specialized capabilities for high temperature chemistry. In this report, we describe the implementation of these specialized capabilities in the spectral element code NEKTON. The thermal expansion of the gases involved is shown to be accurately approximated by the low Mach number perturbation expansion of the incompressible Navier-Stokes equations. The radiative heat transfer between multiple interacting radiating surfaces is shown to be tractable using the method of Gebhart. The disparate rates of reaction and diffusion in CVD processes are calculated via a point-implicit time integration scheme. We demonstrate the use above capabilities on prototypical CVD applications. Bullister, Edward T. Unspecified Center FLUID DYNAMICS; FLUID MECHANICS; GAS EXPANSION; HIGH TEMPERATURE; INCOMPRESSIBLE FLOW; MATHEMATICAL MODELS; NAVIER-STOKES EQUATION; RADIATIVE HEAT TRANSFER; REACTION KINETICS; THERMAL EXPANSION; VAPOR DEPOSITION; COMPUTATIONAL FLUID DYNAMICS; COMPUTERIZED SIMULATION; DIFFUSION...

Download or read book Numerical Modeling Tools for Chemical Vapor Deposition written by Thomas J. Jasinski and published by . This book was released on 1992 with total page 104 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Numerical Simulation of Plasma Spray physical Vapor Deposition written by Panpan Wang and published by . This book was released on 2018 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Chemical Vapor Deposition written by Pradeep George and published by VDM Publishing. This book was released on 2008 with total page 112 pages. Available in PDF, EPUB and Kindle. Book excerpt: The deposition of thin films on to a solid substrate has become an important materials processing technique and is of interest in many applications such as those involved with the fabrication of micro-electronic circuits, optical and magnetic devices, etc. Thin films are generally deposited by the process of Chemical Vapor Deposition (CVD).This work is directed at the simulation and optimization of the CVD process in a vertical impinging CVD reactor for material fabrication, focusing on the rate of deposition and on the uniformity of the thin film obtained. This work considers the deposition of Silicon from Silane. Numerical simulations are used to determine the effect of important design variables on the deposition rate and film characteristics. Then Response surfaces are created using the Compromise Response Surface Method (CRSM) to approximate the responses for the range of design variables considered. Then stochastic optimization is performed using the Mean Value Method (MVM) on the resulting response surfaces to find the optimal values of the design variables for various levels of uncertainty.

Download or read book Chemical Vapor Deposition written by Electrochemical Society. High Temperature Materials Division and published by The Electrochemical Society. This book was released on 1997 with total page 1686 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Semi empirical and Numerical Modeling of Metal organic Chemical Vapor Deposition written by Ziba Nami and published by . This book was released on 1996 with total page 458 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Proceedings of the Thirteenth International Conference on Chemical Vapor Deposition written by Theodore M. Besmann and published by The Electrochemical Society. This book was released on 1996 with total page 922 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Full Simulation of Silicon Chemical Vapor Deposition Process written by and published by . This book was released on 2000 with total page 9 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemical vapor deposition (CVD) process composes a complex system, where chemical reaction and heat and mass transfer interact with each other. And these macro-scale phenomena are deeply related to micro-scale mechanics. Hence multi-scale analysis is required to understand these complicated phenomena and to develop full-scale simulator of the CVD reactor. In this paper, we present the macro-scale simulation by the DSMC method. In those reactors, sometime the important species such as the reactive intermediates have extremely low density ratio. This causes the large statistical fluctuation in the DSMC method, where the number of particles and the calculation time are limited. We propose a new numerical method for this kind of problem and the whole process of silicon CVD is simulated by the new method. We simulate the following CVD process: the gas mixture of silane and hydrogen forms a free expansion jet through a nozzle orifice at the top of the reactor and interact with the heated substrate that is set vertical to flow, where silane decomposes into silylene and silane and silylene deposit onto the surface. It is confirmed that the new method is very effective and make it possible to analyze the CVD process more precisely.