Download or read book Neutron Transmutation Doping of Semiconductor Materials written by Robert D. Larrabee and published by Springer Science & Business Media. This book was released on 2013-11-11 with total page 337 pages. Available in PDF, EPUB and Kindle. Book excerpt: viii The growing use of NTD silicon outside the U. S. A. motivated an interest in having the next NTD conference in Europe. Therefore, the Third International Conference on Neutron Transmutation-Doped Silicon was organized by Jens Guldberg and held in Copenhagen, Denmark on August 27-29, 1980. The papers presented at this conference reviewed the developments which occurred during the t'A'O years since the previous conference and included papers on irradiation technology, radiation-induced defects, characteriza tion of NTD silicon, and the use of NTD silicon for device appli cations. The proceedings of this conference were edited by Jens Guldberg and published by Plenum Press in 1981. Interest in, and commercial use of, NTD silicon continued to grow after the Third NTD Conference, and research into neutron trans mutation doping of nonsilicon semiconductors had begun to accel erate. The Fourth International Transmutation Doping Conference reported in this volume includes invited papers summarizing the present and anticipated future of NTD silicon, the processing and characterization of NTD silicon, and the use of NTD silicon in semiconductor power devices. In addition, four papers were pre sented on NTD of nonsilicon semiconductors, five papers on irra diation technology, three papers on practical utilization of NTD silicon, four papers on the characterization of NTD silicon, and five papers on neutron damage and annealing. These papers indi cate that irradiation technology for NTD silicon and its use by the power-device industry are approaching maturity.
Download or read book Neutron Transmutation Doped Silicon written by Jens Guldberg and published by Springer Science & Business Media. This book was released on 2013-11-11 with total page 493 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume contains the papers presented at the Third International Conference on Neutron Transmutation Doping of Silicon held in Copenhagen on August 27-29, 1980. The first symposium associated with neutron transmutation doping technology as such was arranged in 1976 at Oak Ridge National Laboratory by John Cleland. At this time it had become clear that the technology could be implemented on a commercial scale and that several types of power devices in the electronic industry would benefit from employing neutron transmutation doped silicon in the fabrication proces's'. Two years later the Second International Conference on Neutron Transmutation Doping of Semiconductors was arranged at the University of Missouri, Columbia, by Jon Meese. On this occasion the various aspects of silicon fabrication were reviewed, including irradiation control, radiation induced defects, device optimization, and possible benefits of irradiating other semiconductor compounds. In view of the now wide spread acceptance of neutron doped silicon in the power device industry the present conference was largely directed towards the current status of transmutation doping of silicon. Accordingly, the scope of the three day confe rence was to review developments in the technology which had occurred during the two years which had passed since the previous conference. In addition, brief accounts were given with respect to other semiconducting compounds and emerging irradiation techniques which may impact on device design principles in the future.
Download or read book ERDA Energy Research Abstracts written by and published by . This book was released on 1977 with total page 742 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Proceedings of the National Workshop on Low Cost Polycrystalline Silicon Solar Cells May 18 19 1976 Southern Methodist University Dallas Texas written by Ting L. Chu and published by . This book was released on 1976 with total page 498 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book ERDA Energy Research Abstracts written by United States. Energy Research and Development Administration and published by . This book was released on with total page 600 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Technical Impediments to a More Effective Utilization of Neutron Transmutation Doped Silicon for High power Device Fabrication written by D. R. Meyers and published by . This book was released on 1980 with total page 40 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book ERDA Energy Research Abstracts written by United States. Energy Research and Development Administration. Technical Information Center and published by . This book was released on 1976 with total page 588 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book ERDA Research Abstracts written by United States. Energy Research and Development Administration and published by . This book was released on 1976 with total page 780 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Review written by Oak Ridge National Laboratory and published by . This book was released on 1975 with total page 398 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 692 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book NASA Conference Publication written by and published by . This book was released on 1977 with total page 740 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Energy Research Abstracts written by and published by . This book was released on 1995 with total page 782 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Solar Energy Update written by and published by . This book was released on 1978-10 with total page 338 pages. Available in PDF, EPUB and Kindle. Book excerpt:
- Author : Oak Ridge National Laboratory
- Publisher :
- Release : 1979
- ISBN :
- Pages : 872 pages
Inventory of Advanced Energy Technologies and Energy Conservation Research and Development 1976 1978
Download or read book Inventory of Advanced Energy Technologies and Energy Conservation Research and Development 1976 1978 written by Oak Ridge National Laboratory and published by . This book was released on 1979 with total page 872 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Official Gazette of the United States Patent and Trademark Office written by United States. Patent and Trademark Office and published by . This book was released on 1978 with total page 812 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Polycrystalline And Amorphous Thin Films And Devices written by Lawrence Kazmerski and published by Elsevier. This book was released on 2012-12-02 with total page 321 pages. Available in PDF, EPUB and Kindle. Book excerpt: Polycrystalline and Amorphous Thin Films and Devices is a compilation of papers that discusses the electronic, optical, and physical properties of thin material layers and films. This compilation reviews the different applications of thin films of various materials used as protective and optical coatings, thermal transfer layers, and selective membranes from submicron- area VLSI memory units to large-area energy conservation devices. Some papers discuss the basic properties, such as growth, structure, electrical, and optical mechanisms that are encountered in amorphous and polycrystalline thin semiconductor films. For example, experiments on electronic structure of dislocations have led to a model for the intrinsic properties of grain boundaries in polycrystalline semiconductor thin films that can have an impact on the designs of high-efficiency, thin-film solar cells. Other papers review the problems encountered in these thin layers in active semiconductor devices and passive technologies. Techniques in film growth and control variables of source, substrate temperature, and substrate properties will determine the successful performance of the devices installed with these thin film layers. This compilation can prove valuable for chemists, materials engineers, industrial technologists, and researchers in thin-film technology.