Download or read book Nanoscale Photonic Imaging written by Tim Salditt and published by Springer Nature. This book was released on 2020-06-09 with total page 634 pages. Available in PDF, EPUB and Kindle. Book excerpt: This open access book, edited and authored by a team of world-leading researchers, provides a broad overview of advanced photonic methods for nanoscale visualization, as well as describing a range of fascinating in-depth studies. Introductory chapters cover the most relevant physics and basic methods that young researchers need to master in order to work effectively in the field of nanoscale photonic imaging, from physical first principles, to instrumentation, to mathematical foundations of imaging and data analysis. Subsequent chapters demonstrate how these cutting edge methods are applied to a variety of systems, including complex fluids and biomolecular systems, for visualizing their structure and dynamics, in space and on timescales extending over many orders of magnitude down to the femtosecond range. Progress in nanoscale photonic imaging in Göttingen has been the sum total of more than a decade of work by a wide range of scientists and mathematicians across disciplines, working together in a vibrant collaboration of a kind rarely matched. This volume presents the highlights of their research achievements and serves as a record of the unique and remarkable constellation of contributors, as well as looking ahead at the future prospects in this field. It will serve not only as a useful reference for experienced researchers but also as a valuable point of entry for newcomers.

Download or read book Synchrotron Light Sources and Free Electron Lasers written by Eberhard J. Jaeschke and published by Springer. This book was released on 2016-05-27 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Hardly any other discovery of the nineteenth century did have such an impact on science and technology as Wilhelm Conrad Röntgen’s seminal find of the X-rays. X-ray tubes soon made their way as excellent instruments for numerous applications in medicine, biology, materials science and testing, chemistry and public security. Developing new radiation sources with higher brilliance and much extended spectral range resulted in stunning developments like the electron synchrotron and electron storage ring and the freeelectron laser. This handbook highlights these developments in fifty chapters. The reader is given not only an inside view of exciting science areas but also of design concepts for the most advanced light sources. The theory of synchrotron radiation and of the freeelectron laser, design examples and the technology basis are presented. The handbook presents advanced concepts like seeding and harmonic generation, the booming field of Terahertz radiation sources and upcoming brilliant light sources driven by laser-plasma accelerators. The applications of the most advanced light sources and the advent of nanobeams and fully coherent x-rays allow experiments from which scientists in the past could not even dream. Examples are the diffraction with nanometer resolution, imaging with a full 3D reconstruction of the object from a diffraction pattern, measuring the disorder in liquids with high spatial and temporal resolution. The 20th century was dedicated to the development and improvement of synchrotron light sources with an ever ongoing increase of brilliance. With ultrahigh brilliance sources, the 21st century will be the century of x-ray lasers and their applications. Thus, we are already close to the dream of condensed matter and biophysics: imaging single (macro)molecules and measuring their dynamics on the femtosecond timescale to produce movies with atomic resolution.

Download or read book EUV Sources for Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2006 with total page 1104 pages. Available in PDF, EPUB and Kindle. Book excerpt: This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.

Download or read book X Ray Lasers 2018 written by Michaela Kozlová and published by Springer Nature. This book was released on 2020-03-06 with total page 207 pages. Available in PDF, EPUB and Kindle. Book excerpt: These proceedings gather a selection of invited and contributed papers presented during the 16th International Conference on X-Ray Lasers (ICXRL 2018), held in Prague, Czech Republic, from 7 to 12 October 2018. The conference is part of an ongoing series dedicated to recent developments in the science and technology of X-ray lasers and other coherent X-ray sources, with an additional focus on supporting technologies, instrumentation and applications. The book highlights advances in a wide range of fields including laser and discharge-pumped plasma X-ray lasers, the injection and seeding of X-ray amplifiers, high-order harmonic generation and ultrafast phenomena, X-ray free electron lasers, novel schemes for (in)coherent XUV, X-ray and γ-ray generation, XUV and X-ray imaging, optics and metrology, X-rays and γ-rays for fundamental science, the practical implementation of X-ray lasers, XFELs and super-intense lasers, and the applications and industrial uses of X-ray lasers.

Download or read book Coherent X Ray Optics written by David Paganin and published by Oxford University Press on Demand. This book was released on 2006-01-12 with total page 424 pages. Available in PDF, EPUB and Kindle. Book excerpt: X-ray optics is undergoing a renaissance, which may be paralleled to that experienced by visible-light optics following the invention of the laser. The associated surge of activity in "coherent" x-ray optics has been documented in this monograph, the first of its type in the field.

Download or read book Lithography Process Control written by Harry J. Levinson and published by SPIE Press. This book was released on 1999 with total page 210 pages. Available in PDF, EPUB and Kindle. Book excerpt: This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines.

Download or read book Physics of and Science with X Ray Free Electron Lasers written by J. Hastings and published by IOS Press. This book was released on 2020-12-18 with total page 272 pages. Available in PDF, EPUB and Kindle. Book excerpt: Many X-Ray Free-Electron Lasers (X-FELs) have been designed, built and commissioned since the first lasing of the Linac Coherent Light Source in the hard and soft X-ray regions, and great progress has been made in improving their performance and extending their capabilities. Meanwhile, experimental techniques to exploit the unique properties of X-FELs to explore atomic and molecular systems of interest to physics, chemistry, biology and the material sciences have also been developed. As a result, our knowledge of atomic and molecular science has been greatly extended. Nevertheless, there is still much to be accomplished, and the potential for discovery with X-FELs is still largely unexplored. The next generation of scientists will need to be well versed in both particle beams/FEL physics and X-ray photon science. This book presents material from the Enrico Fermi summer school: Physics of and Science with X-Ray Free-Electron Lasers, held at the Enrico Fermi International School of Physics in Varenna, Italy, from 26 June - 1 July 2017. The lectures presented at the school were aimed at introducing graduate students and young scientists to this fast growing and exciting scientific area, and subjects covered include basic accelerator and FEL physics, as well as an introduction to the main research topics in X-FEL-based biology, atomic molecular optical science, material sciences, high-energy density physics and chemistry. Bridging the gap between accelerator/FEL physicists and scientists from other disciplines, the book will be of interest to all those working in the field.

Download or read book Elements of Modern X ray Physics written by Jens Als-Nielsen and published by John Wiley & Sons. This book was released on 2011-04-04 with total page 440 pages. Available in PDF, EPUB and Kindle. Book excerpt: Eagerly awaited, this second edition of a best-selling text comprehensively describes from a modern perspective the basics of x-ray physics as well as the completely new opportunities offered by synchrotron radiation. Written by internationally acclaimed authors, the style of the book is to develop the basic physical principles without obscuring them with excessive mathematics. The second edition differs substantially from the first edition, with over 30% new material, including: A new chapter on non-crystalline diffraction - designed to appeal to the large community who study the structure of liquids, glasses, and most importantly polymers and bio-molecules A new chapter on x-ray imaging - developed in close cooperation with many of the leading experts in the field Two new chapters covering non-crystalline diffraction and imaging Many important changes to various sections in the book have been made with a view to improving the exposition Four-colour representation throughout the text to clarify key concepts Extensive problems after each chapter There is also supplementary book material for this title available online (http://booksupport.wiley.com). Praise for the previous edition: "The publication of Jens Als-Nielsen and Des McMorrow's Elements of Modern X-ray Physics is a defining moment in the field of synchrotron radiation... a welcome addition to the bookshelves of synchrotron–radiation professionals and students alike.... The text is now my personal choice for teaching x-ray physics...." —Physics Today, 2002

Download or read book Principles of Lithography written by Harry J. Levinson and published by SPIE Press. This book was released on 2005 with total page 446 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.

Download or read book Multiphoton Lithography written by Jürgen Stampfl and published by John Wiley & Sons. This book was released on 2016-09-12 with total page 408 pages. Available in PDF, EPUB and Kindle. Book excerpt: This first book on this fascinating, interdisciplinary topic meets the much-felt need for an up-to-date overview of the field. Written with both beginners and professionals in mind, this ready reference begins with an introductory section explaining the basics of the various multi-photon and photochemical processes together with a description of the equipment needed. A team of leading international experts provides the latest research results on such materials as new photoinitiators, hybrid photopolymers, and metallic carbon nanotube composites. They also cover promising applications and prospective trends, including photonic crystals, microfluidic devices, biological scaffolds, metamaterials, waveguides, and functionalized hydrogels. By bringing together the essentials for both industrial and academic researchers, this is an invaluable companion for materials scientists, polymer chemists, surface chemists, surface physicists, biophysicists, and medical scientists working with 3D micro- and nanostructures.

Download or read book X Ray Metrology in Semiconductor Manufacturing written by D. Keith Bowen and published by CRC Press. This book was released on 2018-10-03 with total page 296 pages. Available in PDF, EPUB and Kindle. Book excerpt: The scales involved in modern semiconductor manufacturing and microelectronics continue to plunge downward. Effective and accurate characterization of materials with thicknesses below a few nanometers can be achieved using x-rays. While many books are available on the theory behind x-ray metrology (XRM), X-Ray Metrology in Semiconductor Manufacturing is the first book to focus on the practical aspects of the technology and its application in device fabrication and solving new materials problems. Following a general overview of the field, the first section of the book is organized by application and outlines the techniques that are best suited to each. The next section delves into the techniques and theory behind the applications, such as specular x-ray reflectivity, diffraction imaging, and defect mapping. Finally, the third section provides technological details of each technique, answering questions commonly encountered in practice. The authors supply real examples from the semiconductor and magnetic recording industries as well as more than 150 clearly drawn figures to illustrate the discussion. They also summarize the principles and key information about each method with inset boxes found throughout the text. Written by world leaders in the field, X-Ray Metrology in Semiconductor Manufacturing provides real solutions with a focus on accuracy, repeatability, and throughput.

Download or read book Optics and Photonics written by National Research Council and published by National Academies Press. This book was released on 2013-03-19 with total page 280 pages. Available in PDF, EPUB and Kindle. Book excerpt: Optics and photonics technologies are ubiquitous: they are responsible for the displays on smart phones and computing devices, optical fiber that carries the information in the internet, advanced precision manufacturing, enhanced defense capabilities, and a plethora of medical diagnostics tools. The opportunities arising from optics and photonics offer the potential for even greater societal impact in the next few decades, including solar power generation and new efficient lighting that could transform the nation's energy landscape and new optical capabilities that will be essential to support the continued exponential growth of the Internet. As described in the National Research Council report Optics and Photonics: Essential Technologies for our Nation, it is critical for the United States to take advantage of these emerging optical technologies for creating new industries and generating job growth. The report assesses the current state of optical science and engineering in the United States and abroad-including market trends, workforce needs, and the impact of photonics on the national economy. It identifies the technological opportunities that have arisen from recent advances in, and applications of, optical science and engineering. The report also calls for improved management of U.S. public and private research and development resources, emphasizing the need for public policy that encourages adoption of a portfolio approach to investing in the wide and diverse opportunities now available within photonics. Optics and Photonics: Essential Technologies for our Nation is a useful overview not only for policymakers, such as decision-makers at relevant Federal agencies on the current state of optics and photonics research and applications but also for individuals seeking a broad understanding of the fields of optics and photonics in many arenas.

Download or read book Fundamental Principles of Optical Lithography written by Chris Mack and published by John Wiley & Sons. This book was released on 2011-08-10 with total page 503 pages. Available in PDF, EPUB and Kindle. Book excerpt: The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.

Download or read book Optics and Nonlinear Optics of Liquid Crystals written by Iam-Choon Khoo and published by World Scientific. This book was released on 1993 with total page 442 pages. Available in PDF, EPUB and Kindle. Book excerpt: This is a monograph/text devoted to a detailed treatment of the optical, electro-optical and nonlinear optical properties of all the mesophases of liquid crystals and related processes, phenomena and application principles. Quantitative data on material and optical parameters spanning the ultraviolet, visible, infrared as well as the microwave regimes are presented along with detailed theoretical treatments of basic liquid crystal physics, material properties and nonlinear optics.Starting with a discussion on the basic building blocks of liquid crystalline molecules, the authors proceed to present in a pedagogical manner current theories, experiments, and applications of these unique and important optical properties of liquid crystals. Numerous tables of hard-to-find liquid crystalline parameters, a self-contained chapter on general nonlinear optics, and comprehensive literature review are also included.

Download or read book Sneaking a Look at God s Cards written by Giancarlo Ghirardi and published by Princeton University Press. This book was released on 2007-03-25 with total page 511 pages. Available in PDF, EPUB and Kindle. Book excerpt: This ed. of this translation originally published: 2005.

Download or read book EUV Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2009 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt: Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.

Download or read book An Introduction to Synchrotron Radiation written by Philip Willmott, PhD and published by John Wiley & Sons. This book was released on 2011-06-15 with total page 370 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book introduces the reader to the basic concepts of the generation and manipulation of synchrotron light, its interaction with matter, and the application of synchrotron light in the “classical” techniques, while including some of the most modern technological developments. As much as possible, complicated mathematical derivations and formulas are avoided. A more heuristic approach is adopted, whereby the general physical reasoning behind the equations is highlighted. Key features: A general introduction to synchrotron radiation and experimental techniques using synchrotron radiation Contains many detailed “worked examples” from the literature Of interest for a broad audience - synchrotrons are possibly one of the best examples of multidisciplinary research Four-colour presentation throughout