Download or read book Nanoscale CMOS VLSI Circuits Design for Manufacturability written by Sandip Kundu and published by McGraw Hill Professional. This book was released on 2010-06-22 with total page 316 pages. Available in PDF, EPUB and Kindle. Book excerpt: Cutting-Edge CMOS VLSI Design for Manufacturability Techniques This detailed guide offers proven methods for optimizing circuit designs to increase the yield, reliability, and manufacturability of products and mitigate defects and failure. Covering the latest devices, technologies, and processes, Nanoscale CMOS VLSI Circuits: Design for Manufacturability focuses on delivering higher performance and lower power consumption. Costs, constraints, and computational efficiencies are also discussed in the practical resource. Nanoscale CMOS VLSI Circuits covers: Current trends in CMOS VLSI design Semiconductor manufacturing technologies Photolithography Process and device variability: analyses and modeling Manufacturing-Aware Physical Design Closure Metrology, manufacturing defects, and defect extraction Defect impact modeling and yield improvement techniques Physical design and reliability DFM tools and methodologies

Download or read book Nanoscale CMOS written by Francis Balestra and published by John Wiley & Sons. This book was released on 2013-03-01 with total page 518 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a comprehensive review of the state-of-the-art in the development of new and innovative materials, and of advanced modeling and characterization methods for nanoscale CMOS devices. Leading global industry bodies including the International Technology Roadmap for Semiconductors (ITRS) have created a forecast of performance improvements that will be delivered in the foreseeable future – in the form of a roadmap that will lead to a substantial enlargement in the number of materials, technologies and device architectures used in CMOS devices. This book addresses the field of materials development, which has been the subject of a major research drive aimed at finding new ways to enhance the performance of semiconductor technologies. It covers three areas that will each have a dramatic impact on the development of future CMOS devices: global and local strained and alternative materials for high speed channels on bulk substrate and insulator; very low access resistance; and various high dielectric constant gate stacks for power scaling. The book also provides information on the most appropriate modeling and simulation methods for electrical properties of advanced MOSFETs, including ballistic transport, gate leakage, atomistic simulation, and compact models for single and multi-gate devices, nanowire and carbon-based FETs. Finally, the book presents an in-depth investigation of the main nanocharacterization techniques that can be used for an accurate determination of transport parameters, interface defects, channel strain as well as RF properties, including capacitance-conductance, improved split C-V, magnetoresistance, charge pumping, low frequency noise, and Raman spectroscopy.

Download or read book Low Power High Level Synthesis for Nanoscale CMOS Circuits written by Saraju P. Mohanty and published by Springer Science & Business Media. This book was released on 2008-05-31 with total page 325 pages. Available in PDF, EPUB and Kindle. Book excerpt: This self-contained book addresses the need for analysis, characterization, estimation, and optimization of the various forms of power dissipation in the presence of process variations of nano-CMOS technologies. The authors show very large-scale integration (VLSI) researchers and engineers how to minimize the different types of power consumption of digital circuits. The material deals primarily with high-level (architectural or behavioral) energy dissipation.

Download or read book Nano CMOS Circuit and Physical Design written by Ban Wong and published by John Wiley & Sons. This book was released on 2005-04-08 with total page 413 pages. Available in PDF, EPUB and Kindle. Book excerpt: Based on the authors' expansive collection of notes taken over the years, Nano-CMOS Circuit and Physical Design bridges the gap between physical and circuit design and fabrication processing, manufacturability, and yield. This innovative book covers: process technology, including sub-wavelength optical lithography; impact of process scaling on circuit and physical implementation and low power with leaky transistors; and DFM, yield, and the impact of physical implementation.

Download or read book Parametric Analog Signal Amplification Applied to Nanoscale CMOS Technologies written by Joao Oliveira and published by Springer Science & Business Media. This book was released on 2012-01-06 with total page 204 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is dedicated to the analysis of parametric amplification with special emphasis on the MOS discrete-time implementation. This implementation is demonstrated by the presentation of several circuits where the MOS parametric amplifier cell is used: small gain amplifier, comparator with embedded pre-amplification, discrete-time mixer/IIR-Filter, and analog-to-digital converter (ADC). Experimental results are shown to validate the overall design technique.

Download or read book Testing for Small Delay Defects in Nanoscale CMOS Integrated Circuits written by Sandeep K. Goel and published by CRC Press. This book was released on 2017-12-19 with total page 259 pages. Available in PDF, EPUB and Kindle. Book excerpt: Advances in design methods and process technologies have resulted in a continuous increase in the complexity of integrated circuits (ICs). However, the increased complexity and nanometer-size features of modern ICs make them susceptible to manufacturing defects, as well as performance and quality issues. Testing for Small-Delay Defects in Nanoscale CMOS Integrated Circuits covers common problems in areas such as process variations, power supply noise, crosstalk, resistive opens/bridges, and design-for-manufacturing (DfM)-related rule violations. The book also addresses testing for small-delay defects (SDDs), which can cause immediate timing failures on both critical and non-critical paths in the circuit. Overviews semiconductor industry test challenges and the need for SDD testing, including basic concepts and introductory material Describes algorithmic solutions incorporated in commercial tools from Mentor Graphics Reviews SDD testing based on "alternative methods" that explores new metrics, top-off ATPG, and circuit topology-based solutions Highlights the advantages and disadvantages of a diverse set of metrics, and identifies scope for improvement Written from the triple viewpoint of university researchers, EDA tool developers, and chip designers and tool users, this book is the first of its kind to address all aspects of SDD testing from such a diverse perspective. The book is designed as a one-stop reference for current industrial practices, research challenges in the domain of SDD testing, and recent developments in SDD solutions.

Download or read book Nano scale CMOS Analog Circuits written by Soumya Pandit and published by CRC Press. This book was released on 2018-09-03 with total page 397 pages. Available in PDF, EPUB and Kindle. Book excerpt: Reliability concerns and the limitations of process technology can sometimes restrict the innovation process involved in designing nano-scale analog circuits. The success of nano-scale analog circuit design requires repeat experimentation, correct analysis of the device physics, process technology, and adequate use of the knowledge database. Starting with the basics, Nano-Scale CMOS Analog Circuits: Models and CAD Techniques for High-Level Design introduces the essential fundamental concepts for designing analog circuits with optimal performances. This book explains the links between the physics and technology of scaled MOS transistors and the design and simulation of nano-scale analog circuits. It also explores the development of structured computer-aided design (CAD) techniques for architecture-level and circuit-level design of analog circuits. The book outlines the general trends of technology scaling with respect to device geometry, process parameters, and supply voltage. It describes models and optimization techniques, as well as the compact modeling of scaled MOS transistors for VLSI circuit simulation. • Includes two learning-based methods: the artificial neural network (ANN) and the least-squares support vector machine (LS-SVM) method • Provides case studies demonstrating the practical use of these two methods • Explores circuit sizing and specification translation tasks • Introduces the particle swarm optimization technique and provides examples of sizing analog circuits • Discusses the advanced effects of scaled MOS transistors like narrow width effects, and vertical and lateral channel engineering Nano-Scale CMOS Analog Circuits: Models and CAD Techniques for High-Level Design describes the models and CAD techniques, explores the physics of MOS transistors, and considers the design challenges involving statistical variations of process technology parameters and reliability constraints related to circuit design.

Download or read book Nano CMOS Gate Dielectric Engineering written by Hei Wong and published by CRC Press. This book was released on 2017-12-19 with total page 251 pages. Available in PDF, EPUB and Kindle. Book excerpt: According to Moore’s Law, not only does the number of transistors in an integrated circuit double every two years, but transistor size also decreases at a predictable rate. At the rate we are going, the downsizing of CMOS transistors will reach the deca-nanometer scale by 2020. Accordingly, the gate dielectric thickness will be shrunk to less than half-nanometer oxide equivalent thickness (EOT) to maintain proper operation of the transistors, leaving high-k materials as the only viable solution for such small-scale EOT. This comprehensive, up-to-date text covering the physics, materials, devices, and fabrication processes for high-k gate dielectric materials, Nano-CMOS Gate Dielectric Engineering systematically describes how the fundamental electronic structures and other material properties of the transition metals and rare earth metals affect the electrical properties of the dielectric films, the dielectric/silicon and the dielectric/metal gate interfaces, and the resulting device properties. Specific topics include the problems and solutions encountered with high-k material thermal stability, defect density, and poor initial interface with silicon substrate. The text also addresses the essence of thin film deposition, etching, and process integration of high-k materials in an actual CMOS process. Fascinating in both content and approach, Nano-CMOS Gate Dielectric Engineering explains all of the necessary physics in a highly readable manner and supplements this with numerous intuitive illustrations and tables. Covering almost every aspect of high-k gate dielectric engineering for nano-CMOS technology, this is a perfect reference book for graduate students needing a better understanding of developing technology as well as researchers and engineers needing to get ahead in microelectronic engineering and materials science.

Download or read book Electronic Devices Architectures for the NANO CMOS Era written by Simon Deleonibus and published by CRC Press. This book was released on 2019-05-08 with total page 332 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this book, internationally recognized researchers give a state-of-the-art overview of the electronic device architectures required for the nano-CMOS era and beyond. Challenges relevant to the scaling of CMOS nanoelectronics are addressed through different core CMOS and memory device options in the first part of the book. The second part reviews new device concepts for nanoelectronics beyond CMOS. The book covers the fundamental limits of core CMOS, improving scaling by the introduction of new materials or processes, new architectures using SOI, multigates and multichannels, and quantum computing.

Download or read book Integrated Nanoelectronics written by Vinod Kumar Khanna and published by Springer. This book was released on 2016-09-16 with total page 451 pages. Available in PDF, EPUB and Kindle. Book excerpt: Keeping nanoelectronics in focus, this book looks at interrelated fields namely nanomagnetics, nanophotonics, nanomechanics and nanobiotechnology, that go hand-in-hand or are likely to be utilized in future in various ways for backing up or strengthening nanoelectronics. Complementary nanosciences refer to the alternative nanosciences that can be combined with nanoelectronics. The book brings students and researchers from multiple disciplines (and therefore with disparate levels of knowledge, and, more importantly, lacunae in this knowledge) together and to expose them to the essentials of integrative nanosciences. The central idea is that the five identified disciplines overlap significantly and arguably cohere into one fundamental nanotechnology discipline. The book caters to interdisciplinary readership in contrast to many of the existing nanotechnology related books that relate to a specific discipline. The book lays special emphasis on nanoelectronics since this field has advanced most rapidly amongst all the nanotechnology disciplines and with significant commercial pervasion. In view of the significant impact that nanotechnology is predicted to have on society, the topics and their interrelationship in this book are of considerable interest and immense value to students, professional engineers, and reserachers.

Download or read book High Speed Optical Receivers with Integrated Photodiode in Nanoscale CMOS written by Filip Tavernier and published by Springer Science & Business Media. This book was released on 2011-06-20 with total page 231 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book describes the design of optical receivers that use the most economical integration technology, while enabling performance that is typically only found in very expensive devices. To achieve this, all necessary functionality, from light detection to digital output, is integrated on a single piece of silicon. All building blocks are thoroughly discussed, including photodiodes, transimpedance amplifiers, equalizers and post amplifiers.

Download or read book Design for Manufacturability and Yield for Nano Scale CMOS written by Charles Chiang and published by Springer Science & Business Media. This book was released on 2007-06-15 with total page 277 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process. It covers all CAD/CAE aspects of a SOC design flow and addresses a new topic (DFM/DFY) critical at 90 nm and beyond. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development.

Download or read book Nanoscale CMOS Modeling written by Mohan Vamsi Dunga and published by . This book was released on 2008 with total page 440 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Advanced Materials and Structures for Nanoscale CMOS Devices written by Dae-Won Ha and published by . This book was released on 2004 with total page 334 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Introduction to Nanoscale Science and Technology written by Massimiliano Ventra and published by Springer Science & Business Media. This book was released on 2006-04-11 with total page 608 pages. Available in PDF, EPUB and Kindle. Book excerpt: From the reviews: "...A class in nanoscale science and technology is daunting for the educator, who must organize a large collection of materials to cover the field, and for the student, who must absorb all the new concepts. This textbook is an excellent resource that allows students from any engineering background to quickly understand the foundations and exciting advances of the field. The example problems with answers and the long list of references in each chapter are a big plus for course tutors. The book is organized into seven sections. The first, nanoscale fabrication and characterization, covers nanolithography, self-assembly, and scanning probe microscopy. Of these, we enjoyed the section on nanolithography most, as it includes many interesting details from industrial manufacturing processes. The chapter on self-assembly also provides an excellent overview by introducing six types of intermolecular interactions and the ways these can be employed to fabricate nanostructures. The second section covers nanomaterials and nanostructures. Out of its 110 pages, 45 are devoted to carbon nanotubes. Fullerenes and quantum dots each have their own chapter that focuses on the properties and applications of these nanostructures. Nanolayer, nanowire, and nanoparticle composites of metals and semiconductors are briefly covered (just 12 pages), with slightly more discussion of specific applications. The section on nanoscale electronics begins with a history of microelectronics before discussing the difficulties in shrinking transistor size further. The discussion of problems (leakage current, hot electrons, doping fluctuations, etc.) and possible solutions (high- k dielectrics, double-gate devices) could easily motivate deeper discussions of nanoscale electrical transport. A chapter on molecular electronics considers transport through alkanes, molecular transistors, and DNA in a simple, qualitative manner we found highly instructive. Nanoscale magnetic systems are examined in the fourth section. The concept of quantum computation is nicely presented, although the discussion of how this can be achieved with controlled spin states is (perhaps necessarily) not clear. We found the chapter on magnetic storage to be one of the most lucid in the book. The giant magnetoresistive effect, operation of spin valves, and issues in magnetic scaling are easier to understand when placed in the context of the modern magnetic hard disk drive. Micro- and nanoelectromechanical systems are covered with an emphasis on the integration of sensing, computation, and communication. Here, the student can see advanced applications of lithography. The sixth section, nanoscale optoelectronics, describes quantum dots, organic optoelectronics, and photonic crystals. The chapter on organic optoelectronics is especially clear in its discussion of the fundamentals of this complicated field. The book concludes with an overview of nanobiotechnology that covers biomimetics, biomolecular motors, and nanofluidics. Because so many authors have contributed to this textbook, it suffers a bit from repetition. However, this also allows sections to be omitted without any adverse effect on student comprehension. We would have liked to see more technology to balance the science; apart from the chapters on lithography and magnetic storage, little more than an acknowledgment is given to commercial applications. Overall, this book serves as an excellent starting point for the study of nanoscale science and technology, and we recommend it to anyone with a modest scientific background. It is also a great vehicle to motivate the study of science at a time when interest is waning. Nanotechnology educators should look no further." (MATERIALS TODAY, June 2005)

Download or read book Advanced Source drain Technologies for Nanoscale CMOS written by Pankaj Kalra and published by . This book was released on 2008 with total page 354 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Circuits at the Nanoscale written by Krzysztof Iniewski and published by CRC Press. This book was released on 2018-10-08 with total page 602 pages. Available in PDF, EPUB and Kindle. Book excerpt: Circuits for Emerging Technologies Beyond CMOS New exciting opportunities are abounding in the field of body area networks, wireless communications, data networking, and optical imaging. In response to these developments, top-notch international experts in industry and academia present Circuits at the Nanoscale: Communications, Imaging, and Sensing. This volume, unique in both its scope and its focus, addresses the state-of-the-art in integrated circuit design in the context of emerging systems. A must for anyone serious about circuit design for future technologies, this book discusses emerging materials that can take system performance beyond standard CMOS. These include Silicon on Insulator (SOI), Silicon Germanium (SiGe), and Indium Phosphide (InP). Three-dimensional CMOS integration and co-integration with Microelectromechanical (MEMS) technology and radiation sensors are described as well. Topics in the book are divided into comprehensive sections on emerging design techniques, mixed-signal CMOS circuits, circuits for communications, and circuits for imaging and sensing. Dr. Krzysztof Iniewski is a director at CMOS Emerging Technologies, Inc., a consulting company in Vancouver, British Columbia. His current research interests are in VLSI ciruits for medical applications. He has published over 100 research papers in international journals and conferences, and he holds 18 international patents granted in the United States, Canada, France, Germany, and Japan. In this volume, he has assembled the contributions of over 60 world-reknown experts who are at the top of their field in the world of circuit design, advancing the bank of knowledge for all who work in this exciting and burgeoning area.