Download or read book Nanolithography written by M Feldman and published by Woodhead Publishing. This book was released on 2014-02-13 with total page 599 pages. Available in PDF, EPUB and Kindle. Book excerpt: Integrated circuits, and devices fabricated using the techniques developed for integrated circuits, have steadily gotten smaller, more complex, and more powerful. The rate of shrinking is astonishing – some components are now just a few dozen atoms wide. This book attempts to answer the questions, “What comes next? and “How do we get there? Nanolithography outlines the present state of the art in lithographic techniques, including optical projection in both deep and extreme ultraviolet, electron and ion beams, and imprinting. Special attention is paid to related issues, such as the resists used in lithography, the masks (or lack thereof), the metrology needed for nano-features, modeling, and the limitations caused by feature edge roughness. In addition emerging technologies are described, including the directed assembly of wafer features, nanostructures and devices, nano-photonics, and nano-fluidics. This book is intended as a guide to the researcher new to this field, reading related journals or facing the complexities of a technical conference. Its goal is to give enough background information to enable such a researcher to understand, and appreciate, new developments in nanolithography, and to go on to make advances of his/her own. Outlines the current state of the art in alternative nanolithography technologies in order to cope with the future reduction in size of semiconductor chips to nanoscale dimensions Covers lithographic techniques, including optical projection, extreme ultraviolet (EUV), nanoimprint, electron beam and ion beam lithography Describes the emerging applications of nanolithography in nanoelectronics, nanophotonics and microfluidics
Download or read book Nanofabrication written by José María de Teresa and published by . This book was released on 2020 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: A comprehensive edited volume on important and up-to-date nanolithography techniques and applications. The book includes an introduction on the importance of nanolithography in today's research and technology, providing examples of its applications. The remainder of the book is split into two sections. The first section contains the most important and established nanolithography techniques. As well as a detailed description of each technique, the reader can obtain useful information about the main advantages and drawbacks of each technique in terms of resolution, throughput, number of steps needed, cost, etc. At the end of this section, the reader will be able to decide which technique to use for different applications. The second section explores more specific applications of the nanolithography techniques previously described; as well as new techniques and applications. In some cases, the processes described in these chapters involve a combination of several nanolithography techniques. This section is less general but provides the reader with real examples.
Download or read book Nano Lithography written by Stefan Landis and published by John Wiley & Sons. This book was released on 2013-03-04 with total page 424 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography is an extremely complex tool – based on the concept of “imprinting” an original template version onto mass output – originally using relatively simple optical exposure, masking, and etching techniques, and now extended to include exposure to X-rays, high energy UV light, and electron beams – in processes developed to manufacture everyday products including those in the realms of consumer electronics, telecommunications, entertainment, and transportation, to name but a few. In the last few years, researchers and engineers have pushed the envelope of fields including optics, physics, chemistry, mechanics and fluidics, and are now developing the nanoworld with new tools and technologies. Beyond the scientific challenges that are endemic in this miniaturization race, next generation lithography techniques are essential for creating new devices, new functionalities and exploring new application fields. Nanolithography is the branch of nanotechnology concerned with the study and application of fabricating nanometer-scale structures − meaning the creation of patterns with at least one lateral dimension between the size of an individual atom and approximately 100 nm. It is used in the fabrication of leading-edge semiconductor integrated circuits (nanocircuitry) or nanoelectromechanical systems (NEMS). This book addresses physical principles as well as the scientific and technical challenges of nanolithography, covering X-ray and NanoImprint lithography, as well as techniques using scanning probe microscopy and the optical properties of metal nanostructures, patterning with block copolymers, and metrology for lithography. It is written for engineers or researchers new to the field, and will help readers to expand their knowledge of technologies that are constantly evolving.
Download or read book Laser Based Nano Fabrication and Nano Lithography written by Koji Sugioka and published by MDPI. This book was released on 2018-12-07 with total page 155 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is a printed edition of the Special Issue "Laser-Based Nano Fabrication and Nano Lithography" that was published in Nanomaterials
Download or read book Nanoimprint Lithography An Enabling Process for Nanofabrication written by Weimin Zhou and published by Springer Science & Business Media. This book was released on 2013-01-04 with total page 270 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It provides the exciting, multidisciplinary field, offering a wide range of topics covering: principles, process, material and application. This book would be of specific interest for researchers and graduate students in the field of nanoscience, nanotechnology and nanofabrication, material, physical, chemical, electric engineering and biology. Dr. Weimin Zhou is an associate professor at Shanghai Nanotechnology Promotion Center, China.
Download or read book Materials and Processes for Next Generation Lithography written by and published by Elsevier. This book was released on 2016-11-08 with total page 634 pages. Available in PDF, EPUB and Kindle. Book excerpt: As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. Assembles up-to-date information from the world’s premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation Includes information on processing and metrology techniques Brings together multiple approaches to litho pattern recording from academia and industry in one place
Download or read book Nanolithography written by M. Gentili and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 214 pages. Available in PDF, EPUB and Kindle. Book excerpt: Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).
Download or read book Scanning Probe Lithography written by Yu Kyoung Ryu and published by CRC Press. This book was released on 2022-12-22 with total page 145 pages. Available in PDF, EPUB and Kindle. Book excerpt: The most complete book available on scanning probe lithography (SPL), this work details the modalities, mechanisms, and current technologies, applications, and materials on which SPL can be performed. It provides a comprehensive overview of this simple and cost-effective technique, which does not require clean room conditions and can be performed in any lab or industry facility to achieve high-resolution and high-quality patterns on a wide range of materials: biological, semiconducting, polymers, and 2D materials. • Introduces historical background of SPL, including evolution of the technique and tools • Explains the mechanism of sample modification/manipulation, types of AFM tips, technical parts of the experimental setup, and materials on which the technique can be applied • Shows the different types of devices and structures fabricated by SPL, together with the processing steps • Contains a complete and state-of-the art package of examples and different approaches, performed by different international research groups • Summarizes strengths, limitations, and potential of SPL This book is aimed at advanced students, technicians, and researchers in materials science, microelectronics, and others working with lithographic techniques and fabrication processes.
Download or read book Micro Nanolithography written by Jagannathan Thirumalai and published by BoD – Books on Demand. This book was released on 2018-05-02 with total page 136 pages. Available in PDF, EPUB and Kindle. Book excerpt: The main objective of this book is to give proficient people a comprehensive review of up-to-date global improvements in hypothetical and experimental evidences, perspectives and prospects of some newsworthy instrumentation and its numerous technological applications for a wide range of lithographic fabrication techniques. The present theme of this book is concomitant with the lithographic ways and means of deposition, optimization parameters and their wide technological applications. This book consists of six chapters comprehending with eminence of lithography, fabrication and reproduction of periodic nanopyramid structures using UV nanoimprint lithography for solar cell applications, large-area nanoimprint lithography and applications, micro-/nanopatterning on polymers, OPC under immersion lithography associated to novel luminescence applications, achromatic Talbot lithography (ATL) and the soft X-ray interference lithography. Individual chapters provide a base for a wide range of readers from different fiels, students and researchers, who may be doing research pertinent to the topics discussed in this book and find basic as well as advanced principles of designated subjects related to these phenomena explained plainly. The book contains six chapters by experts in different fields of lithographic fabrication and technology from over 15 research institutes across the globe.
Download or read book Nanolithography and Patterning Techniques in Microelectronics written by D Bucknall and published by Elsevier. This book was released on 2005-09-30 with total page 424 pages. Available in PDF, EPUB and Kindle. Book excerpt: Techniques such as surface patterning have facilitated the emergence of advanced polymers with applications in areas such as microelectronics. Surface patterning of polymers has conventionally been undertaken by optical lithography. However, a new generation of nanolithographic and patterning techniques has made it possible to develop complex patterns at the nanoscale. Non-conventional lithography and patterning summarises this new range of techniques and their industrial applications. A number of chapters look at ways of forming and modifying surfaces for patterning. These are complemented by chapters on particular patterning techniques such as soft lithography, ion beam patterning, the use of nanostencils, photolithography and inkjet printing. The book also discusses prototyping and the manufacture of particular devices. With its distinguished international team of contributors, Non-conventional lithography and patterning is a standard reference for both those researching and using advanced polymers in such areas as microelectronics and biomedical devices. Looks at alternative approaches used to develop complex patterns at the nanoscale Concentrates on state of the art nanolithographic methods Written by a distinguished international team of contributors
Download or read book Optical Physics for Nanolithography written by Anthony Yen and published by . This book was released on 2018 with total page 352 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides an in-depth, self-contained introduction of partially coherent imaging theory for researchers and engineers working on optical lithography for semiconductor manufacturing, including those in the EDA industry. It is mathematically complete: the opening chapters discuss the essential principles, and all derivations are presented with their intermediate steps. For increased accessibility, simplified and consistent notations are used throughout the text. Full-color pages illustrate the connections between figures and equations.
Download or read book Characterization of Patterned Magnetic Media Prepared Via Nano lithography written by Mladen Barbic and published by . This book was released on 2000 with total page 556 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Nanoimprint Lithography written by Hongbo Lan and published by Nova Science Publishers. This book was released on 2011 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography, the fundamental fabrication process of semiconductor devices, has been playing a critical role in micro-nanofabrication technologies and manufacturing of Integrated Circuits (IC). Traditional optical lithography including contact and project photolithography has contributed significantly to the semiconductor device advancements. Currently, maintaining the rapid pace of half-pitch reduction requires overcoming the challenge of improving and extending the incumbent optical projection lithography technology while simultaneously developing alternative, next generation lithography (NGL) technologies to be used when optical projection lithography is no longer more economical than the alternatives. Furthermore, NIL is also one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures as this highly technical book will give new insight to.
Download or read book Alternative Lithography written by Clivia M. Sotomayor Torres and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 343 pages. Available in PDF, EPUB and Kindle. Book excerpt: Good old Gutenberg could not have imagined that his revolutionary printing concept which so greatly contributed to dissemination of knowledge and thus today 's wealth, would have been a source of inspiration five hundred years later. Now, it seems intuitive that a simple way to produce a large number of replicates is using a mold to emboss pattern you need, but at the nanoscale nothing is simple: the devil is in the detail. And this book is about the "devil". In the following 17 chapters, the authors-all of them well recognized and active actors in this emerging field-describe the state-of-the-art, today 's technological bottlenecks and the prospects for micro-contact printing and nanoimprint lithography. Many results of this book originate from projects funded by the European Com mission through its "Nanotechnology Information Devices" (NID) initiative. NID was launched with the objective to develop nanoscale devices for the time when the red brick scenario of the ITRS roadmap would be reached. It became soon clear however, that there was no point to investigate only alternative devices to CMOS, but what was really needed was an integrated approach that took into account more facets of this difficult undertaking. Technologically speaking , this meant to have a coherent strategy to develop novel devices, nanofabrication tools and circuit & system architectures at the same time.
Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2018-10-03 with total page 864 pages. Available in PDF, EPUB and Kindle. Book excerpt: This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts. New in the Second Edition In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including: Immersion Lithography 157nm Lithography Electron Projection Lithography (EPL) Extreme Ultraviolet (EUV) Lithography Imprint Lithography Photoresists for 193nm and Immersion Lithography Scatterometry Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.
Download or read book Tip Based Nanofabrication written by Ampere A. Tseng and published by Springer Science & Business Media. This book was released on 2011-07-25 with total page 468 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanofabrication is critical to the realization of potential benefits in the field of electronics, bioengineering and material science. One enabling technology in nanofabrication is Tip-Based Nanofabrication, which makes use of functionalized micro-cantilevers with nanoscale tips. Tip-Based Nanofabrication: Fundamentals and Applications discusses the development of cantilevered nanotips and how they evolved from scanning probe microscopy and are able to manipulate environments at nanoscale on substrates generating different nanoscale patterns and structures. Also covered are the advantages of ultra-high resolution capability, how to use tip based nanofabrication technology as a tool in the manufacturing of nanoscale structures, single-probe tip technologies, multiple-probe tip methodology, 3-D modeling using tip based nanofabrication and the latest in imaging technology.
Download or read book Recent Advances in Nanofabrication Techniques and Applications written by Bo Cui and published by BoD – Books on Demand. This book was released on 2011-12-02 with total page 630 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanotechnology has experienced a rapid growth in the past decade, largely owing to the rapid advances in nanofabrication techniques employed to fabricate nano-devices. Nanofabrication can be divided into two categories: "bottom up" approach using chemical synthesis or self assembly, and "top down" approach using nanolithography, thin film deposition and etching techniques. Both topics are covered, though with a focus on the second category. This book contains twenty nine chapters and aims to provide the fundamentals and recent advances of nanofabrication techniques, as well as its device applications. Most chapters focus on in-depth studies of a particular research field, and are thus targeted for researchers, though some chapters focus on the basics of lithographic techniques accessible for upper year undergraduate students. Divided into five parts, this book covers electron beam, focused ion beam, nanoimprint, deep and extreme UV, X-ray, scanning probe, interference, two-photon, and nanosphere lithography.
