Download or read book Modeling Innovations in EUV and Nanoimprint Lithography written by Yunfei Deng and published by . This book was released on 2005 with total page 326 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Optical and Euv Lithography written by Andreas Erdmann and published by . This book was released on 2021-02 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Fast Simulation Methods for Non planar Phase and Multilayer Defects in DUV and EUV Photomasks for Lithography written by Michael Christopher Lam and published by . This book was released on 2005 with total page 436 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Dissertation Abstracts International written by and published by . This book was released on 2006 with total page 780 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Modeling Template Distortion During Step and flash Imprint Lithography written by Scott D. Schuetter and published by . This book was released on 2005 with total page 246 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Journal of the Physical Society of Japan written by and published by . This book was released on 2004 with total page 1074 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Microfabrication for Industrial Applications written by Regina Luttge and published by William Andrew. This book was released on 2011-09-14 with total page 314 pages. Available in PDF, EPUB and Kindle. Book excerpt: Microfabrication for Industrial Applications focuses on the industrial perspective for micro- and nanofabrication methods including large-scale manufacturing, transfer of concepts from lab to factory, process tolerance, yield, robustness, and cost. It gives a history of miniaturization, micro- and nanofabrication, and surveys industrial fields of application, illustrating fabrication processes of relevant micro and nano devices. Concerning sub-micron feature manufacture, the book explains: the philosophy of micro/ nanofabrication for integrated circuit industry; thin film deposition; (waveguide, plastic, semiconductor) material processing; packaging; interconnects; stress (e.g., thin film residual); economic; and environmental aspects. Micro/nanomechanical sensors and actuators are explained in depth with information on applications, materials (incl. functional polymers), methods, testing, fabrication, integration, reliability, magnetic microstructures, etc. Shows engineers & students how to evaluate the potential value of current and nearfuture manufacturing processes for miniaturized systems in industrial environments Explains the top-down and bottom up approaches to nanotechnology, nanostructures fabricated with beams, nano imprinting methods, nanoparticle manufacturing (and their health aspects), nanofeature analysis, and connecting nano to micro to macro Discusses issues for practical application cases; possibilities of dimension precision; large volume manufacturing of micro- & nanostructures (machines, materials, costs) Explains applications of Microsystems for information technology, e.g.: data recording (camera, microphone), storage (memories, CDs), communication; computing; and displays (beamers, LCD, TFT) Case studies are given for sensors, resonators, probes, transdermal medical systems, micro- pumps & valves, inkjets, DNA-analysis, lab-on-a-chip, & micro-cooling
Download or read book Nanoimprint Lithography written by Hongbo Lan and published by Nova Science Publishers. This book was released on 2011 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography, the fundamental fabrication process of semiconductor devices, has been playing a critical role in micro-nanofabrication technologies and manufacturing of Integrated Circuits (IC). Traditional optical lithography including contact and project photolithography has contributed significantly to the semiconductor device advancements. Currently, maintaining the rapid pace of half-pitch reduction requires overcoming the challenge of improving and extending the incumbent optical projection lithography technology while simultaneously developing alternative, next generation lithography (NGL) technologies to be used when optical projection lithography is no longer more economical than the alternatives. Furthermore, NIL is also one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures as this highly technical book will give new insight to.
Download or read book Nanofabrication written by Maria Stepanova and published by Springer Science & Business Media. This book was released on 2011-11-08 with total page 344 pages. Available in PDF, EPUB and Kindle. Book excerpt: Intended to update scientists and engineers on the current state of the art in a variety of key techniques used extensively in the fabrication of structures at the nanoscale. The present work covers the essential technologies for creating sub 25 nm features lithographically, depositing layers with nanometer control, and etching patterns and structures at the nanoscale. A distinguishing feature of this book is a focus not on extension of microelectronics fabrication, but rather on techniques applicable for building NEMS, biosensors, nanomaterials, photonic crystals, and other novel devices and structures that will revolutionize society in the coming years.
Download or read book Chips and Change written by Clair Brown and published by MIT Press. This book was released on 2011-08-19 with total page 272 pages. Available in PDF, EPUB and Kindle. Book excerpt: How the chip industry has responded to a series of crises over the past twenty-five years, often reinventing itself and shifting the basis for global competitive advantage. For decades the semiconductor industry has been a driver of global economic growth and social change. Semiconductors, particularly the microchips essential to most electronic devices, have transformed computing, communications, entertainment, and industry. In Chips and Change, Clair Brown and Greg Linden trace the industry over more than twenty years through eight technical and competitive crises that forced it to adapt in order to continue its exponential rate of improved chip performance. The industry's changes have in turn shifted the basis on which firms hold or gain global competitive advantage. These eight interrelated crises do not have tidy beginnings and ends. Most, in fact, are still ongoing, often in altered form. The U.S. semiconductor industry's fear that it would be overtaken by Japan in the 1980s, for example, foreshadows current concerns over the new global competitors China and India. The intersecting crises of rising costs for both design and manufacturing are compounded by consumer pressure for lower prices. Other crises discussed in the book include the industry's steady march toward the limits of physics, the fierce competition that keeps its profits modest even as development costs soar, and the global search for engineering talent. Other high-tech industries face crises of their own, and the semiconductor industry has much to teach about how industries are transformed in response to such powerful forces as technological change, shifting product markets, and globalization. Chips and Change also offers insights into how chip firms have developed, defended, and, in some cases, lost global competitive advantage.
Download or read book Nanofabrication written by José María de Teresa and published by . This book was released on 2020 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: A comprehensive edited volume on important and up-to-date nanolithography techniques and applications. The book includes an introduction on the importance of nanolithography in today's research and technology, providing examples of its applications. The remainder of the book is split into two sections. The first section contains the most important and established nanolithography techniques. As well as a detailed description of each technique, the reader can obtain useful information about the main advantages and drawbacks of each technique in terms of resolution, throughput, number of steps needed, cost, etc. At the end of this section, the reader will be able to decide which technique to use for different applications. The second section explores more specific applications of the nanolithography techniques previously described; as well as new techniques and applications. In some cases, the processes described in these chapters involve a combination of several nanolithography techniques. This section is less general but provides the reader with real examples.
Download or read book EUV Sources for Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2006 with total page 1104 pages. Available in PDF, EPUB and Kindle. Book excerpt: This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.
Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2018-10-03 with total page 864 pages. Available in PDF, EPUB and Kindle. Book excerpt: This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts. New in the Second Edition In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including: Immersion Lithography 157nm Lithography Electron Projection Lithography (EPL) Extreme Ultraviolet (EUV) Lithography Imprint Lithography Photoresists for 193nm and Immersion Lithography Scatterometry Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.
Download or read book Nanolithography written by M Feldman and published by Woodhead Publishing. This book was released on 2014-02-13 with total page 599 pages. Available in PDF, EPUB and Kindle. Book excerpt: Integrated circuits, and devices fabricated using the techniques developed for integrated circuits, have steadily gotten smaller, more complex, and more powerful. The rate of shrinking is astonishing – some components are now just a few dozen atoms wide. This book attempts to answer the questions, "What comes next? and "How do we get there?Nanolithography outlines the present state of the art in lithographic techniques, including optical projection in both deep and extreme ultraviolet, electron and ion beams, and imprinting. Special attention is paid to related issues, such as the resists used in lithography, the masks (or lack thereof), the metrology needed for nano-features, modeling, and the limitations caused by feature edge roughness. In addition emerging technologies are described, including the directed assembly of wafer features, nanostructures and devices, nano-photonics, and nano-fluidics.This book is intended as a guide to the researcher new to this field, reading related journals or facing the complexities of a technical conference. Its goal is to give enough background information to enable such a researcher to understand, and appreciate, new developments in nanolithography, and to go on to make advances of his/her own. - Outlines the current state of the art in alternative nanolithography technologies in order to cope with the future reduction in size of semiconductor chips to nanoscale dimensions - Covers lithographic techniques, including optical projection, extreme ultraviolet (EUV), nanoimprint, electron beam and ion beam lithography - Describes the emerging applications of nanolithography in nanoelectronics, nanophotonics and microfluidics
Download or read book Principles of Lithography written by Harry J. Levinson and published by SPIE Press. This book was released on 2005 with total page 446 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.
Download or read book Nanotechnology Research Directions IWGN Workshop Report written by R.S. Williams and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 367 pages. Available in PDF, EPUB and Kindle. Book excerpt: energy production, environmental management, transportation, communication, computation, and education. As the twenty-first century unfolds, nanotechnology's impact on the health, wealth, and security of the world's people is expected to be at least as significant as the combined influences in this century of antibiotics, the integrated circuit, and human-made polymers. Dr. Neal Lane, Advisor to the President for Science and Technology and former National Science Foundation (NSF) director, stated at a Congressional hearing in April 1998, "If I were asked for an area of science and engineering that will most likely produce the breakthroughs of tomorrow, I would point to nanoscale science and engineering. " Recognizing this potential, the White House Office of Science and Technology Policy (OSTP) and the Office of Management and Budget (OMB) have issued a joint memorandum to Federal agency heads that identifies nanotechnology as a research priority area for Federal investment in fiscal year 2001. This report charts "Nanotechnology Research Directions," as developed by the Interagency W orking Group on Nano Science, Engineering, and Technology (IWGN) of the National Science and Technology Council (NSTC). The report incorporates the views of leading experts from government, academia, and the private sector. It reflects the consensus reached at an IWGN-sponsored workshop held on January 27-29, 1999, and detailed in contributions submitted thereafter by members of the V. S. science and engineering community. (See Appendix A for a list of contributors.
Download or read book Nanotechnology Enabled Sensors written by Kourosh Kalantar-zadeh and published by Springer Science & Business Media. This book was released on 2007-09-19 with total page 502 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanotechnology provides tools for creating functional materials, devices, and systems by controlling materials at the atomic and molecular scales and making use of novel properties and phenomena. Nanotechnology-enabled sensors find applications in several fields such as health and safety, medicine, process control and diagnostics. This book provides the reader with information on how nanotechnology enabled sensors are currently being used and how they will be used in the future in such diverse fields as communications, building and facilities, medicine, safety, and security, including both homeland defense and military operations.
