Download or read book Microscopy of Semiconducting Materials 1987 Proceedings of the Institute of Physics Conference Oxford University April 1987 written by A.G. Cullis and published by CRC Press. This book was released on 2021-02-01 with total page 836 pages. Available in PDF, EPUB and Kindle. Book excerpt: The various forms of microscopy and related microanalytical techniques are making unique contributions to semiconductor research and development that underpin many important areas of microelectronics technology. Microscopy of Semiconducting Materials 1987 highlights the progress that is being made in semiconductor microscopy, primarily in electron probe methods as well as in light optical and ion scattering techniques. The book covers the state of the art, with sections on high resolution microscopy, epitaxial layers, quantum wells and superlattices, bulk gallium arsenide and other compounds, properties of dislocations, device silicon and dielectric structures, silicides and contacts, device testing, x-ray techniques, microanalysis, and advanced scanning microscopy techniques. Contributed by numerous international experts, this volume will be an indispensable guide to recent developments in semiconductor microscopy for all those who work in the field of semiconducting materials and research development.
Download or read book Microscopy of Semiconducting Materials written by A.G Cullis and published by CRC Press. This book was released on 2000-01-01 with total page 782 pages. Available in PDF, EPUB and Kindle. Book excerpt: With IC technology continuing to advance, the analysis of very small structures remains critically important. Microscopy of Semiconducting Materials provides an overview of advances in semiconductor studies using microscopy. The book explores the use of transmission and scanning electron microscopy, ultrafine electron probes, and EELS to investigate semiconducting structures. It also covers specimen preparation using focused ion beam milling and advances in microscopy techniques using different types of scanning probes, such as AFM, STM, and SCM. In addition, the book discusses a range of materials, from finished devices to partly processed materials and structures, including nanoscale wires and dots. This volume provides an authoritative reference for all academics and researchers in materials science, electrical and electronic engineering and instrumentation, and condensed matter physics.
Download or read book Microscopy of Semiconducting Materials 2001 written by A.G. Cullis and published by CRC Press. This book was released on 2018-01-18 with total page 626 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Institute of Physics Conference Series is a leading International medium for the rapid publication of proceedings of major conferences and symposia reviewing new developments in physics and related areas. Volumes in the series comprise original refereed papers and are regarded as standard referee works. As such, they are an essential part of major libration collections worldwide. The twelfth conference on the Microscopy of Semiconducting Materials (MSM) was held at the University of Oxford, 25-29 March 2001. MSM conferences focus on recent international advances in semiconductor studies carried out by all forms of microscopy. The event was organized with scientific sponsorship by the Royal Microscopical Society, The Electron Microscopy and Analysis Group of the Institute of Physics and the Materials Research Society. With the continual shrinking of electronic device dimensions and accompanying enhancement in device performance, the understanding of semiconductor microscopic properties at the nanoscale (and even at the atomic scale) is increasingly critical for further progress to be achieved. This conference proceedings provides an overview of the latest instrumentation, analysis techniques and state-of-the-art advances in semiconducting materials science for solid state physicists, chemists, and materials scientists.
Download or read book Microscopy of Semiconducting Materials 1987 Proceedings of the Institute of Physics Conference Oxford University April 1987 written by Cullis and published by CRC Press. This book was released on 1987-10-01 with total page 820 pages. Available in PDF, EPUB and Kindle. Book excerpt: The various forms of microscopy and related microanalytical techniques are making unique contributions to semiconductor research and development that underpin many important areas of microelectronics technology. Microscopy of Semiconducting Materials 1987 highlights the progress that is being made in semiconductor microscopy, primarily in electron probe methods as well as in light optical and ion scattering techniques. The book covers the state of the art, with sections on high resolution microscopy, epitaxial layers, quantum wells and superlattices, bulk gallium arsenide and other compounds, properties of dislocations, device silicon and dielectric structures, silicides and contacts, device testing, x-ray techniques, microanalysis, and advanced scanning microscopy techniques. Contributed by numerous international experts, this volume will be an indispensable guide to recent developments in semiconductor microscopy for all those who work in the field of semiconducting materials and research development.
Download or read book Microscopy of Semiconducting Materials 1987 Proceedings of the Institute of Physics Conference Oxford University April 1987 written by Cullis and published by CRC Press. This book was released on 1987-10-01 with total page 836 pages. Available in PDF, EPUB and Kindle. Book excerpt: The various forms of microscopy and related microanalytical techniques are making unique contributions to semiconductor research and development that underpin many important areas of microelectronics technology. Microscopy of Semiconducting Materials 1987 highlights the progress that is being made in semiconductor microscopy, primarily in electron probe methods as well as in light optical and ion scattering techniques. The book covers the state of the art, with sections on high resolution microscopy, epitaxial layers, quantum wells and superlattices, bulk gallium arsenide and other compounds, properties of dislocations, device silicon and dielectric structures, silicides and contacts, device testing, x-ray techniques, microanalysis, and advanced scanning microscopy techniques. Contributed by numerous international experts, this volume will be an indispensable guide to recent developments in semiconductor microscopy for all those who work in the field of semiconducting materials and research development.
Download or read book Microscopy of Semiconducting Materials 1995 Proceedings of the Institute of Physics Conference Held at Oxford University 20 23 March 1995 written by A. G. Cullis and published by CRC Press. This book was released on 1995 with total page 824 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume continues the tradition of previous meetings in the series and provides researchers with an overview of recent developments in the field. Contains invited review papers together with in-depth coverage of the latest research results. Encompassing techniques from transmission and scanning electron microscopy, X-ray topography and diffraction, scanning probe microscopy and atom probe microanalysis, as applied to the whole range of semiconducting materials.
Download or read book Microscopy of Semiconducting Materials 1987 Proceedings of the Institute of Physics Conference Oxford University April 1987 written by A.G. Cullis and published by CRC Press. This book was released on 2021-01-31 with total page 819 pages. Available in PDF, EPUB and Kindle. Book excerpt: The various forms of microscopy and related microanalytical techniques are making unique contributions to semiconductor research and development that underpin many important areas of microelectronics technology. Microscopy of Semiconducting Materials 1987 highlights the progress that is being made in semiconductor microscopy, primarily in electron probe methods as well as in light optical and ion scattering techniques. The book covers the state of the art, with sections on high resolution microscopy, epitaxial layers, quantum wells and superlattices, bulk gallium arsenide and other compounds, properties of dislocations, device silicon and dielectric structures, silicides and contacts, device testing, x-ray techniques, microanalysis, and advanced scanning microscopy techniques. Contributed by numerous international experts, this volume will be an indispensable guide to recent developments in semiconductor microscopy for all those who work in the field of semiconducting materials and research development.
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Download or read book Microscopy of Semiconducting Materials 1993 Proceedings of the Royal Microscopical Society Conference Held at Oxford University 5 8 April 1993 Oxford UK written by A. G. Cullis and published by CRC Press. This book was released on 1993-11-25 with total page 818 pages. Available in PDF, EPUB and Kindle. Book excerpt: These proceedings contain the invited and contributed papers from the international MSM conference and present the work of many leaders in the field. The papers provide information on the most up-to-date advances in semiconductor microscopy spanning both fundamental research areas and developments in device processing technologies. As the major forum for the presentation of worldwide research papers in this field, this volume will be essential reading for all researchers probing the characteristics of semiconducting materials.
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Download or read book Microscopy of Semiconducting Materials 1989 Proceedings of the Royal Microscopical Society Conference Held at Oxford University 10 13 April 1989 written by A. G. Cullis and published by CRC Press. This book was released on 1989 with total page 856 pages. Available in PDF, EPUB and Kindle. Book excerpt: Microscopy of Semiconducting Materials 1989 brings together both the invited and contributed papers from this conference. The main subject areas covered include: high resolution microscopy, microanalysis, epitaxial layers, quantum wells and superlattices, bulk GaAs, X-ray studies, dielectric structures, silicides and metal-semiconductor contacts, device studies and advanced scanning microscopy techniques. This volume provides an indispensable guide for researchers in physics, materials science, electronics and electrical engineering.
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