Download or read book Micro lithography and Fabrication of Submicron Diffraction Gratings on Silicon by Selective Photo electrolytic Etching written by H Sakaki and published by . This book was released on 1987 with total page 19 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Fabrication of Large Area Gratings with Sub micron Pitch Using Mold Micromachining written by and published by . This book was released on 1997 with total page 9 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this work, the authors have applied mold micromachining and standard photolithographic techniques to the fabrication of parts integrated with 0.4 micron pitch diffraction gratings. In principle, the approach should be scaleable to considerably finer pitches. They have achieved this by relying on the thickness of deposited or grown films, instead of photolithography, to determine the grating pitch. The gratings can be made to extend over large areas and the entire process is compatible with batch processing. Literally thousands of parts can be batch fabricated from a single lot of six inch wafers. In the first stage of the process they fabricate a planarized silicon dioxide pad over which the silicon nitride wave guide runs. The grating is formed by first patterning and etching single crystalline silicon to form a series of trenches with well defined pitch. The silicon bounding the trenches is then thinned by thermal oxidation followed by stripping of the silicon dioxide. The trenches are filled by a combination of polysilicon depositions and thermal oxidations. Chemical mechanical polishing (CMP) is used to polish back these structures resulting in a series of alternating 2000 Å wide lines of silicon and silicon dioxide. The thickness of the lines is determined by the oxidation time and the polysilicon deposition thickness. The silicon lines are selectively recessed by anisotropic reactive ion etching, thus forming the mold for the grating. The mold is filled with low stress silicon nitride deposited by chemical vapor deposition. A wave guide is then patterned into the silicon nitride and the mold is locally removed by a combination of deep silicon trench etching and wet KOH etching. This results in a suspended diffraction grating/membrane over the KOH generated pit.
Download or read book British Reports Translations and Theses written by British Library. Document Supply Centre and published by . This book was released on 1987 with total page 588 pages. Available in PDF, EPUB and Kindle. Book excerpt: Issue for Mar. 1981 contains index for Jan.-Mar. 1981 in microfiche form.
Download or read book British Reports Translations and Theses Received by the British Library Lending Division including Material from the Republic of Ireland written by British Library. Document Supply Centre and published by . This book was released on 1987-07 with total page 586 pages. Available in PDF, EPUB and Kindle. Book excerpt: Issue for Mar. 1981 contains index for Jan.-Mar. 1981 in microfiche form.
Download or read book Host Bibliographic Record for Boundwith Item Barcode 30112033097202 and Others written by and published by . This book was released on 2013 with total page 588 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Physics Briefs written by and published by . This book was released on 1992 with total page 864 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Electrical Electronics Abstracts written by and published by . This book was released on 1997 with total page 2304 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Manufacturing Techniques for Microfabrication and Nanotechnology written by Marc J. Madou and published by CRC Press. This book was released on 2011-06-13 with total page 672 pages. Available in PDF, EPUB and Kindle. Book excerpt: Designed for science and engineering students, this text focuses on emerging trends in processes for fabricating MEMS and NEMS devices. The book reviews different forms of lithography, subtractive material removal processes, and additive technologies. Both top-down and bottom-up fabrication processes are exhaustively covered and the merits of the different approaches are compared. Students can use this color volume as a guide to help establish the appropriate fabrication technique for any type of micro- or nano-machine.
Download or read book Fabrication Engineering at the Micro and Nanoscale written by Stephen A. Campbell and published by OUP USA. This book was released on 2008-01-10 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Designed for advanced undergraduate or first-year graduate courses in semiconductor or microelectronic fabrication, the third edition of Fabrication Engineering at the Micro and Nanoscale provides a thorough and accessible introduction to all fields of micro and nano fabrication.
Download or read book JJAP Letters written by and published by . This book was released on 1990 with total page 810 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Nanolithography written by M. Gentili and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 214 pages. Available in PDF, EPUB and Kindle. Book excerpt: Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).
Download or read book JJAP written by and published by . This book was released on 1990 with total page 1026 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Fundamental Principles of Optical Lithography written by Chris Mack and published by John Wiley & Sons. This book was released on 2011-08-10 with total page 503 pages. Available in PDF, EPUB and Kindle. Book excerpt: The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
Download or read book Journal of the Physical Society of Japan written by and published by . This book was released on 1990 with total page 760 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Science Abstracts written by and published by . This book was released on 1993 with total page 980 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Nanoimprint Lithography written by Hongbo Lan and published by Nova Science Publishers. This book was released on 2011 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography, the fundamental fabrication process of semiconductor devices, has been playing a critical role in micro-nanofabrication technologies and manufacturing of Integrated Circuits (IC). Traditional optical lithography including contact and project photolithography has contributed significantly to the semiconductor device advancements. Currently, maintaining the rapid pace of half-pitch reduction requires overcoming the challenge of improving and extending the incumbent optical projection lithography technology while simultaneously developing alternative, next generation lithography (NGL) technologies to be used when optical projection lithography is no longer more economical than the alternatives. Furthermore, NIL is also one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures as this highly technical book will give new insight to.
Download or read book Multiphoton Lithography written by Jürgen Stampfl and published by John Wiley & Sons. This book was released on 2016-12-19 with total page 408 pages. Available in PDF, EPUB and Kindle. Book excerpt: This first book on this fascinating, interdisciplinary topic meets the much-felt need for an up-to-date overview of the field. Written with both beginners and professionals in mind, this ready reference begins with an introductory section explaining the basics of the various multi-photon and photochemical processes together with a description of the equipment needed. A team of leading international experts provides the latest research results on such materials as new photoinitiators, hybrid photopolymers, and metallic carbon nanotube composites. They also cover promising applications and prospective trends, including photonic crystals, microfluidic devices, biological scaffolds, metamaterials, waveguides, and functionalized hydrogels. By bringing together the essentials for both industrial and academic researchers, this is an invaluable companion for materials scientists, polymer chemists, surface chemists, surface physicists, biophysicists, and medical scientists working with 3D micro- and nanostructures.
