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Book Metalorganic Chemical Vapour Deposited Titanium Dioxide Thin Films

Download or read book Metalorganic Chemical Vapour Deposited Titanium Dioxide Thin Films written by Ispran S. Kandasamy and published by . This book was released on 1988 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Low Pressure Metal Organic Chemical Vapor Deposition of Titanium Dioxide Thin Films in Conjunction with Photocatalytic Investigations

Download or read book Low Pressure Metal Organic Chemical Vapor Deposition of Titanium Dioxide Thin Films in Conjunction with Photocatalytic Investigations written by Abon Jason Manuel del Rosario and published by . This book was released on 2003 with total page 324 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Ultrahigh Vacuum Metalorganic Chemical Vapor Deposition and in Situ Characterization of Nanoscale Titanium Dioxide Films

Download or read book Ultrahigh Vacuum Metalorganic Chemical Vapor Deposition and in Situ Characterization of Nanoscale Titanium Dioxide Films written by Polly Wanda Chu and published by . This book was released on 1994 with total page 434 pages. Available in PDF, EPUB and Kindle. Book excerpt: Thin titanium dioxide films were produced by metalorganic chemical vapor deposition on sapphire(0001) in an ultrahigh vacuum (UHV) chamber. A method was developed for producing controlled submonolayer depositions from titanium isopropoxide precursor. Film thickness ranged from 0.1 to 2.7 nm. In situ X-ray photoelectron spectroscopy (XPS) was used to determine film stoichiometry with increasing thickness. The effect of isothermal annealing on desorption was evaluated. Photoelectron peak shapes and positions from the initial monolayers were analyzed for evidence of interface reaction. Deposition from titanium isopropoxide is divided into two regimes: depositions below and above the pyrolysis temperature. This temperature was determined to be 300 deg C. Controlled submonolayers of titanium oxide were produced by cycles of dosing with titanium isopropoxide vapor below and annealing above 300 deg C. Precursor adsorption below the pyrolysis temperature was observed to saturate after 15 minutes of dosing. The quantity absorbed was shown to have an upper limit of one monolayer. The stoichiometry of thin films grown by the cycling method were determined to be TiO2. Titanium dioxide film stoichiometry was unaffected by isothermal annealing at 700 deg C. Annealing produced a decrease in film thickness. This was explained as due to desorption. Desorption ceased at approximately 2.5 to 3 monolayers, suggesting bonding of the initial monolayers of film to sapphire is stronger than to itself. Evidence of sapphire reduction at the interface by the depositions was not observed. The XPS O is peak shifted with increased film thickness. The shifts were consistent with oxygen in sapphire and titanium dioxide having different O is photoelectron peak positions. Simulations showed the total shifts for thin films ranging in thickness of 0.1 to 2.7 nm to be -0.99 to -1.23 eV. Thick films were produced for comparison.

Book Metalorganic Chemical Vapor Deposition of Titanium Oxide Thin Films at Atmospheric Pressure with Analysis Via X ray Photoelectron Spectroscopy

Download or read book Metalorganic Chemical Vapor Deposition of Titanium Oxide Thin Films at Atmospheric Pressure with Analysis Via X ray Photoelectron Spectroscopy written by Anuj K. Basil and published by . This book was released on 2005 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Characterisation of Step Coverage by Pulsed pressure Metalorganic Chemical Vapour Deposition

Download or read book Characterisation of Step Coverage by Pulsed pressure Metalorganic Chemical Vapour Deposition written by Vilailuck Siriwongrungson and published by . This book was released on 2010 with total page 206 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Chemical Vapor Deposition and Characterization of Titanium Dioxide Thin Films

Download or read book Chemical Vapor Deposition and Characterization of Titanium Dioxide Thin Films written by David Christopher Gilmer and published by . This book was released on 1998 with total page 314 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Selective Light Induced Chemical Vapour Deposition of Titanium Dioxide Thin Films

Download or read book Selective Light Induced Chemical Vapour Deposition of Titanium Dioxide Thin Films written by Estelle Wagner and published by . This book was released on 2003 with total page 198 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book High k Gate Dielectrics

Download or read book High k Gate Dielectrics written by Michel Houssa and published by CRC Press. This book was released on 2003-12-01 with total page 614 pages. Available in PDF, EPUB and Kindle. Book excerpt: The drive toward smaller and smaller electronic componentry has huge implications for the materials currently being used. As quantum mechanical effects begin to dominate, conventional materials will be unable to function at scales much smaller than those in current use. For this reason, new materials with higher electrical permittivity will be requ

Book Thin Film Titanium Dioxide by Chemical Vapor Deposition

Download or read book Thin Film Titanium Dioxide by Chemical Vapor Deposition written by Dale Ralph Harbison and published by . This book was released on 1969 with total page 102 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book ASSESSMENT OF PHOTOCATALYTIC PERFORMANCE OF ALUMINUM SUPPORTED TITANIUM DIOXIDE THIN FILMS PRODUCED BY FLAME ASSISTED CHEMICAL VAPOUR DEPOSITION

Download or read book ASSESSMENT OF PHOTOCATALYTIC PERFORMANCE OF ALUMINUM SUPPORTED TITANIUM DIOXIDE THIN FILMS PRODUCED BY FLAME ASSISTED CHEMICAL VAPOUR DEPOSITION written by ERIC E. POTTER and published by . This book was released on 2015 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Dielectrics in Emerging Technologies

Download or read book Dielectrics in Emerging Technologies written by D. Misra and published by The Electrochemical Society. This book was released on 2003 with total page 450 pages. Available in PDF, EPUB and Kindle. Book excerpt: "Papers presented at the First International Symposium on Science and Technology of Dielectrics in Emerging Fields, held from 27th April to 2nd May, 2003 in Paris, France"--Pref.