Download or read book Metallo organic Low pressure Chemical Vapor Deposition of Ta sub 2 sub O sub 5 sub Using TaC sub 12 sub H sub 30 sub O sub 5 sub N as Precursor for Batch Fabrication of Microsystems written by and published by . This book was released on with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Ta2O5 thin films were produced by metallo-organic low pressure chemical vapor deposition using Tantalum(V) Tetraethoxydimethylaminoethoxide (TaC12H30O5N) as precursor. This liquid precursor at room temperature makes it possible to deposit thin films of Ta2O5 on wafer batches of up to 35 wafers. In this communication, we report on the processing and equipment development to achieve batch fabrication, and on the optimization of the deposited thin films properties for their application in microsystems. An evaporator was linked to a horizontal hot wall furnace. The deposition of Ta2O5 was performed at 425 °C and the influence of a post-annealing at higher temperatures on the chemical, electrical and optical properties of the films was evaluated. Annealing treatments in oxygen were found to reduce the amount of residual carbon and hydrogen in the films. An annealing in oxygen followed by an annealing in forming gas was used to improve the charge levels and hysteresis. The optical properties of the amorphous Ta2O5 films varied slightly with the annealing treatment. Annealing the films at a temperature of 700 °C and higher caused their crystallization, leading to a decrease of their optical bandgap. The processed films have found applications in microsystems as chemical resistant coatings, optical coatings for wave guides, and chemical sensitive layers for Ion-Sensitive Field-Effect Transistors.

Download or read book Low Temperature Atmospheric Pressure Chemical Vapor Deposition of Group 14 Oxide Films written by and published by . This book was released on 2005 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Depositions of high quality SiO[sub 2] and SnO[sub 2] films from the reaction of homoleptic amido precursors M(NMe[sub 2])4 (M = Si, Sn) and oxygen were carried out in an atmospheric pressure chemical vapor deposition r. The films were deposited on silicon, glass and quartz substrates at temperatures of 250 to 450C. The silicon dioxide films are stoichiometric (O/Si = 2.0) with less than 0.2 atom % C and 0.3 atom % N and have hydrogen contents of 9 [plus-minus] 5 atom %. They are deposited with growth rates from 380 to 900 [angstrom]/min. The refractive indexes of the SiO[sub 2] films are 1.46, and infrared spectra show a possible Si-OH peak at 950 cm[sup [minus]1]. X-Ray diffraction studies reveal that the SiO[sub 2] film deposited at 350C is amorphous. The tin oxide films are stoichiometric (O/Sn = 2.0) and contain less than 0.8 atom % carbon, and 0.3 atom % N. No hydrogen was detected by elastic recoil spectroscopy. The band gap for the SnO[sub 2] films, as estimated from transmission spectra, is 3.9 eV. The resistivities of the tin oxide films are in the range 10[sup [minus]2] to 10[sup [minus]3] [Omega]cm and do not vary significantly with deposition temperature. The tin oxide film deposited at 350C is cassitterite with some (101) orientation.

Download or read book Vapor Deposition of Thin Films written by and published by . This book was released on 1992 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: A highly pure thin metal film having a nanocrystalline structure and a process of preparing such highly pure thin metal films of, e.g., rhodium, iridium, molybdenum, tungsten, rhenium, platinum, or palladium by plasma assisted chemical vapor deposition of, e.g., rhodium(allyl).sub. 3, iridium(allyl).sub. 3, molybdenum(allyl).sub. 4, tungsten(allyl).sub. 4, rhenium(allyl).sub. 4, platinum(allyl).sub. 2, or palladium(allyl).sub. 2 are disclosed. Additionally, a general process of reducing the carbon content of a metallic film prepared from one or more organometallic precursor compounds by plasma assisted chemical vapor deposition is disclosed.

Download or read book Investigating Area Selective Chemical Vapor Deposition Achieved by Competitive Adsorption written by Vidyesh Parampalli Madhyastha and published by . This book was released on 2021 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: As device feature sizes shrink to single digit nanometer scale, researchers and industries are moving away from the conventional top-down approach and relying on a bottom-up approach for device fabrication. Contemporary top-down techniques involving photolithography and etching result in misalignment errors at sub-5 nm scales. Area selective deposition is a recent advanced bottom-up fabrication technique with the potential to sustain the trend as described by Moore's law. The approach involves a modified version of chemical vapor deposition (CVD) of a high dielectric constant metal oxide, Zirconia (ZrO2). High dielectric constant oxides such as Zirconia or Hafnia can replace conventional gate oxides such as silica in future generation CMOS devices. Three types of substrates namely SiO2, Cu, and Co are studied in this thesis. A procedure was identified to obtain an oxide-free surface of cobalt. Substrates are exposed to a precursor and a co-reactant, and thin film deposition was investigated using X-Ray Photoelectron Spectroscopy (XPS). A third gas phase molecule referred to as "co-adsorbate" was exploited to deposit ZrO2 thin films only on one type of surface in the presence of another. XPS was used to calculate the thickness of these thin films and to investigate their composition. Partial pressure of the co-adsorbate - 4-octyne, in the presence of N2, was measured under different flow conditions. Density Functional Theory (DFT) calculations suggest that 4-octyne binds to substrates as: Highest on Co and lowest on SiO2. Regarding Cu and SiO2, 4-octyne undergoes carbon bond rehybridization with Cu, whereas it only interacts with SiO2 by van der Waals forces. The difference in binding energies paves way to selective deposition between Cu and SiO2 at optimized substrate temperatures and vapor pressures of co-adsorbate. Preliminary AS-CVD studies were also performed between Co and Cu.

Download or read book CRC Handbook of Metal Etchants written by Perrin Walker and published by CRC Press. This book was released on 1990-12-11 with total page 1434 pages. Available in PDF, EPUB and Kindle. Book excerpt: This publication presents cleaning and etching solutions, their applications, and results on inorganic materials. It is a comprehensive collection of etching and cleaning solutions in a single source. Chemical formulas are presented in one of three standard formats - general, electrolytic or ionized gas formats - to insure inclusion of all necessary operational data as shown in references that accompany each numbered formula. The book describes other applications of specific solutions, including their use on other metals or metallic compounds. Physical properties, association of natural and man-made minerals, and materials are shown in relationship to crystal structure, special processing techniques and solid state devices and assemblies fabricated. This publication also presents a number of organic materials which are widely used in handling and general processing...waxes, plastics, and lacquers for example. It is useful to individuals involved in study, development, and processing of metals and metallic compounds. It is invaluable for readers from the college level to industrial R & D and full-scale device fabrication, testing and sales. Scientific disciplines, work areas and individuals with great interest include: chemistry, physics, metallurgy, geology, solid state, ceramic and glass, research libraries, individuals dealing with chemical processing of inorganic materials, societies and schools.

Download or read book Handbook of Chemical Vapor Deposition written by Hugh O. Pierson and published by William Andrew. This book was released on 1999-09-01 with total page 507 pages. Available in PDF, EPUB and Kindle. Book excerpt: Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.

Download or read book Handbook of Carbon Graphite Diamonds and Fullerenes written by Hugh O. Pierson and published by William Andrew. This book was released on 2012-12-02 with total page 420 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is a review of the science and technology of the element carbon and its allotropes: graphite, diamond and the fullerenes. This field has expanded greatly in the last three decades stimulated by many major discoveries such as carbon fibers, low-pressure diamond, and the fullerenes. The need for such a book has been felt for some time. These carbon materials are very different in structure and properties. Some are very old (charcoal), others brand new (the fullerenes). They have different applications and markets and are produced by different segments of the industry.Few studies are available that attempt to review the entire field of carbon as a whole discipline. Moreover these studies were written several decades ago and a generally outdated since the development of the technology is moving very rapidly and scope of applications is constantly expanding and reaching into new fields such as aerospace, automotive, semiconductors, optics, and electronics. In this book the author provides a valuable, up-to-date account of both the newer and traditional forms of carbon, both naturally occurring and man-made. This volume will be a valuable resource for both specialists in, and occasional users of carbon materials.

Download or read book Introduction to Surface Engineering written by P. A. Dearnley and published by Cambridge University Press. This book was released on 2017-01-16 with total page 798 pages. Available in PDF, EPUB and Kindle. Book excerpt: This highly illustrated reference work covers the three principal types of surface technologies that best protect engineering devices and products: diffusion technologies, deposition technologies, and other less commonly acknowledged surface engineering (SE) techniques. Various applications are noted throughout the text and additionally whole chapters are devoted to specific SE applications across the automotive, gas turbine engine (GTE), metal machining, and biomedical implant sectors. Along with the benefits of SE, this volume also critically examines SE's limitations. Materials degradation pathways - those which can and those which cannot be mitigated by SE - are rigorously explained. Written from a scientific, materials engineering perspective, this concise text is supported by high-quality images and photo-micrographs which show how surfaces can be engineered to overcome the limits of conventionally produced materials, even in complex or hostile operating environments. This book is a useful resource for undergraduate and postgraduate students as well as professional engineers.

Download or read book Chemical Process Design and Integration written by Robin Smith and published by John Wiley & Sons. This book was released on 2016-08-02 with total page 923 pages. Available in PDF, EPUB and Kindle. Book excerpt: Written by a highly regarded author with industrial and academic experience, this new edition of an established bestselling book provides practical guidance for students, researchers, and those in chemical engineering. The book includes a new section on sustainable energy, with sections on carbon capture and sequestration, as a result of increasing environmental awareness; and a companion website that includes problems, worked solutions, and Excel spreadsheets to enable students to carry out complex calculations.

Download or read book Cyclotron Produced Radionuclides written by International Atomic Energy Agency and published by . This book was released on 2009 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt: Application of radioisotopes has shown significant growth in the past decade, and a major factor contributing towards this growth is the availability of a large number of cyclotrons dedicated to the production of radioisotopes for medical applications. Although there are many articles in journals on cyclotrons and their use for radioisotope production, there is no single source of information for beginners on radioisotope production using cyclotrons. This publication attempts to address this deficiency. Its contains chapters on accelerator technology, theoretical considerations of nuclear reactions, the technology behind targetry, techniques on preparation of targets, irradiation of targets under high beam currents, target processing and target recovery.

Download or read book Engineering Materials 2 written by Michael F. Ashby and published by Elsevier. This book was released on 2014-06-28 with total page 380 pages. Available in PDF, EPUB and Kindle. Book excerpt: Provides a thorough explanation of the basic properties of materials; of how these can be controlled by processing; of how materials are formed, joined and finished; and of the chain of reasoning that leads to a successful choice of material for a particular application. The materials covered are grouped into four classes: metals, ceramics, polymers and composites. Each class is studied in turn, identifying the families of materials in the class, the microstructural features, the processes or treatments used to obtain a particular structure and their design applications. The text is supplemented by practical case studies and example problems with answers, and a valuable programmed learning course on phase diagrams.

Download or read book CVD Polymers written by Karen K. Gleason and published by John Wiley & Sons. This book was released on 2015-04-01 with total page 484 pages. Available in PDF, EPUB and Kindle. Book excerpt: The method of CVD (chemical vapor deposition) is a versatile technique to fabricate high-quality thin films and structured surfaces in the nanometer regime from the vapor phase. Already widely used for the deposition of inorganic materials in the semiconductor industry, CVD has become the method of choice in many applications to process polymers as well. This highly scalable technique allows for synthesizing high-purity, defect-free films and for systematically tuning their chemical, mechanical and physical properties. In addition, vapor phase processing is critical for the deposition of insoluble materials including fluoropolymers, electrically conductive polymers, and highly crosslinked organic networks. Furthermore, CVD enables the coating of substrates which would otherwise dissolve or swell upon exposure to solvents. The scope of the book encompasses CVD polymerization processes which directly translate the chemical mechanisms of traditional polymer synthesis and organic synthesis in homogeneous liquids into heterogeneous processes for the modification of solid surfaces. The book is structured into four parts, complemented by an introductory overview of the diverse process strategies for CVD of polymeric materials. The first part on the fundamentals of CVD polymers is followed by a detailed coverage of the materials chemistry of CVD polymers, including the main synthesis mechanisms and the resultant classes of materials. The third part focuses on the applications of these materials such as membrane modification and device fabrication. The final part discusses the potential for scale-up and commercialization of CVD polymers.

Download or read book Organic Electrochemistry written by Ole Hammerich and published by CRC Press. This book was released on 2015-09-22 with total page 1706 pages. Available in PDF, EPUB and Kindle. Book excerpt: Praise for the Fourth Edition"Outstanding praise for previous editions.the single best general reference for the organic chemist."-Journal of the Electrochemical Society"The cast of editors and authors is excellent, the text is, in general, easily readable and understandable, well documented, and well indexed those who purchase the book will be sa

Download or read book Advanced Techniques for Surface Engineering written by W. Gissler and published by Springer Science & Business Media. This book was released on 2013-04-17 with total page 402 pages. Available in PDF, EPUB and Kindle. Book excerpt: Today's shortages of resources make the search for wear and corrosion resistant materials one of the most important tasks of the next century. Since the surface of a material is the location where any interaction occurs, it is that there the hardest requirements on the material are imposed: to be wear resistant for tools and bearings; to be corrosion resistant for turbine blades and tubes in the petrochemical industry; to be antireflecting for solar cells; to be decorative for architectural panels and to combine several of these properties in other applications. Surface engineering is the general term that incorporates all the techniques by which a surface modification can be accomplished. These techniques include both coating and modification of the surface by ion implantation and laser beam melting. In recent years a continuously growing number of these techniques were developed to the extent that it became more and more difficult to maintain an overlook and to understand which of these highly differentiated techniques might be applied to resolve a given surface engineering problem. A similar development is also occuring for surface characterization techniques. This volume contains contributions from renowned scientists and engineers to the Eurocourse the aim of which was to inform about the various techniques and to give a comprehensive survey of the latest development on this subject.

Download or read book Coatings Technology Handbook written by Arthur A. Tracton and published by CRC Press. This book was released on 2005-07-28 with total page 930 pages. Available in PDF, EPUB and Kindle. Book excerpt: Serving as an all-in-one guide to the entire field of coatings technology, this encyclopedic reference covers a diverse range of topics-including basic concepts, coating types, materials, processes, testing and applications-summarizing both the latest developments and standard coatings methods. Take advantage of the insights and experience of over

Download or read book The Materials Science of Thin Films written by Milton Ohring and published by Academic Press. This book was released on 1992 with total page 744 pages. Available in PDF, EPUB and Kindle. Book excerpt: Prepared as a textbook complete with problems after each chapter, specifically intended for classroom use in universities.

Download or read book Water Quality Assessments written by Deborah V Chapman and published by CRC Press. This book was released on 1996-08-22 with total page 658 pages. Available in PDF, EPUB and Kindle. Book excerpt: This guidebook, now thoroughly updated and revised in its second edition, gives comprehensive advice on the designing and setting up of monitoring programmes for the purpose of providing valid data for water quality assessments in all types of freshwater bodies. It is clearly and concisely written in order to provide the essential information for all agencies and individuals responsible for the water quality.