Download or read book Mask Inspection Microscopy with 13 2 Nm Table top Laser Illumination written by and published by . This book was released on 2008 with total page 13 pages. Available in PDF, EPUB and Kindle. Book excerpt: We report the demonstration of a reflection microscope that operates at 13.2-nm wavelength with a spatial resolution of 55 ± 3 nm. The microscope uses illumination from a table-top EUV laser to acquire aerial images of photolithography masks with a 20 second exposure time. The modulation transfer function of the optical system was characterized.
Download or read book X Ray Lasers 2010 written by Jongmin Lee and published by Springer Science & Business Media. This book was released on 2012-06-01 with total page 368 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a thorough account of the current status of achievements made in the area of soft X-Ray laser source development and of the increasingly diverse applications being demonstrated using such radiation sources. There is significant effort worldwide to develop very bright, short duration radiation sources in the X-Ray spectral region – driven by the multitude of potential applications in all branches of science. This book contains updates on several different approaches for comparative purposes but concentrates on developments in the area of laser-produced plasmas, whereby transient population inversion and gain between ion states is pumped by optical lasers interacting with pre-formed plasmas. Topics covered will include Laser-driven XRLs, Collisional XRLs, Recombination XRLs, Transient Inversion Collisional XRLs, Optical Field Ionization XRLs, Alternative XRL, pumping schemes Theory and simulations of XRL gain media and beam properties High order harmonic sources of XUV radiation, Free-electron lasers and other accelerator based X-Ray sources, X-Ray Laser drives, X-Ray optics and instrumentation Spectroscopy, and other diagnostics of laser media Applications of XRLs.
Download or read book 13 2 Nm Table Top Inspection Microscope for Extreme Ultraviolet Lithography Mask Defect Characterization written by and published by . This book was released on 2009 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: We report on a reflection microscope that operates at 13.2-nm wavelength with a spatial resolution of 55±3 nm. The microscope uses a table-top EUV laser to acquire images of photolithography masks in 20 seconds.
Download or read book Inspection 13 2 Nm Table top Full field Microscope written by and published by . This book was released on 2009 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: We present results on a table-top microscope that uses an EUV stepper geometry to capture full-field images with a halfpitch spatial resolution of 55 nm. This microscope uses a 13.2 nm wavelength table-top laser for illumination and acquires images of reflective masks with exposures of 20 seconds. These experiments open the path to the realization of high resolution table-top imaging systems for actinic defect characterization.
Download or read book Soft X Rays and Extreme Ultraviolet Radiation written by David Attwood and published by Cambridge University Press. This book was released on 2007-02-22 with total page 611 pages. Available in PDF, EPUB and Kindle. Book excerpt: This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.
Download or read book Jena Review written by and published by . This book was released on 1989 with total page 220 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Handbook of Biological Confocal Microscopy written by James Pawley and published by Springer Science & Business Media. This book was released on 2010-08-04 with total page 1014 pages. Available in PDF, EPUB and Kindle. Book excerpt: Once the second edition was safely off to the printer, the 110 larger world of micro-CT and micro-MRI and the smaller world authors breathed a sigh of relief and relaxed, secure in the belief revealed by the scanning and transmission electron microscopes. that they would “never have to do that again. ” That lasted for 10 To round out the story we even have a chapter on what PowerPoint years. When we ?nally awoke, it seemed that a lot had happened. does to the results, and the annotated bibliography has been In particular, people were trying to use the Handbook as a text- updated and extended. book even though it lacked the practical chapters needed. There As with the previous editions, the editor enjoyed a tremendous had been tremendous progress in lasers and ?ber-optics and in our amount of good will and cooperation from the 124 authors understanding of the mechanisms underlying photobleaching and involved. Both I, and the light microscopy community in general, phototoxicity. It was time for a new book. I contacted “the usual owe them all a great debt of gratitude. On a more personal note, I suspects” and almost all agreed as long as the deadline was still a would like to thank Kathy Lyons and her associates at Springer for year away.
Download or read book Lithography Process Control written by Harry J. Levinson and published by SPIE Press. This book was released on 1999 with total page 210 pages. Available in PDF, EPUB and Kindle. Book excerpt: This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines.
Download or read book Handbook of Photomask Manufacturing Technology written by Syed Rizvi and published by CRC Press. This book was released on 2018-10-03 with total page 728 pages. Available in PDF, EPUB and Kindle. Book excerpt: As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with these demands. Photomask technology is one of the key areas to achieving this goal. Although brief overviews of photomask technology exist in the literature, the Handbook of Photomask Manufacturing Technology is the first in-depth, comprehensive treatment of existing and emerging photomask technologies available. The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography. The book begins with an overview of the history of photomask development. It then demonstrates the steps involved in designing, producing, testing, inspecting, and repairing photomasks, following the sequences observed in actual production. The text also includes sections on materials used as well as modeling and simulation. Continued refinements in the photomask-making process have ushered in the sub-wavelength era in nanolithography. This invaluable handbook synthesizes these refinements and provides the tools and possibilities necessary to reach the next generation of microfabrication technologies.
Download or read book EUV Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2009 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt: Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Download or read book Science written by John Michels (Journalist) and published by . This book was released on 2002 with total page 1082 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book The Fingerprint written by U. S. Department Justice and published by Createspace Independent Publishing Platform. This book was released on 2014-08-02 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: The idea of The Fingerprint Sourcebook originated during a meeting in April 2002. Individuals representing the fingerprint, academic, and scientific communities met in Chicago, Illinois, for a day and a half to discuss the state of fingerprint identification with a view toward the challenges raised by Daubert issues. The meeting was a joint project between the International Association for Identification (IAI) and West Virginia University (WVU). One recommendation that came out of that meeting was a suggestion to create a sourcebook for friction ridge examiners, that is, a single source of researched information regarding the subject. This sourcebook would provide educational, training, and research information for the international scientific community.
Download or read book High Resolution Imaging in Microscopy and Ophthalmology written by Josef F. Bille and published by Springer. This book was released on 2019-08-13 with total page 407 pages. Available in PDF, EPUB and Kindle. Book excerpt: This open access book provides a comprehensive overview of the application of the newest laser and microscope/ophthalmoscope technology in the field of high resolution imaging in microscopy and ophthalmology. Starting by describing High-Resolution 3D Light Microscopy with STED and RESOLFT, the book goes on to cover retinal and anterior segment imaging and image-guided treatment and also discusses the development of adaptive optics in vision science and ophthalmology. Using an interdisciplinary approach, the reader will learn about the latest developments and most up to date technology in the field and how these translate to a medical setting. High Resolution Imaging in Microscopy and Ophthalmology – New Frontiers in Biomedical Optics has been written by leading experts in the field and offers insights on engineering, biology, and medicine, thus being a valuable addition for scientists, engineers, and clinicians with technical and medical interest who would like to understand the equipment, the applications and the medical/biological background. Lastly, this book is dedicated to the memory of Dr. Gerhard Zinser, co-founder of Heidelberg Engineering GmbH, a scientist, a husband, a brother, a colleague, and a friend.
Download or read book Cell Biological Applications of Confocal Microscopy written by and published by Academic Press. This book was released on 2003-01-03 with total page 521 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume of the acclaimed Methods in Cell Biology series provides specific examples of applications of confocal microscopy to cell biological problems. It is an essential guide for students and scientists in cell biology, neuroscience, and many other areas of biological and biomedical research, as well as research directors and technical staff of microscopy and imaging facilities. An integrated and up-to-date coverage on the many various techniques and uses of the confocal microscope (CM). Includes detailed protocols accessible to new users Details how to set up and run a "Confocal Microscope Core Facility" Contains over 170 figures
Download or read book EUV Sources for Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2006 with total page 1104 pages. Available in PDF, EPUB and Kindle. Book excerpt: This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.
Download or read book Principles of Lithography written by Harry J. Levinson and published by SPIE Press. This book was released on 2005 with total page 446 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.
