Download or read book Low Frequency Noise and Electromigration Damage in Thin Film Aluminum written by Thomas William Altshuler and published by . This book was released on 1987 with total page 180 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book On the 1 f Noise of Atomic layer deposition Metal Films written by Xiawa Wang and published by . This book was released on 2011 with total page 81 pages. Available in PDF, EPUB and Kindle. Book excerpt: This thesis presents the measurement techniques and results of low-frequency noise for atomic-layer-deposition Pt films. Atomic-layer-deposition has been developed as an approach to make ultra-thin and conformal films. It has been employed to make detectors of bolometers. 1/f noise is a fundamental limit to the resolution. The experiments are designed to characterize the 1/f noise of the ALD fabricated Pt films. The measurement results show that for 7nm and 13nm ALD fabricated Pt films, 1/f noise is about two orders of magnitude larger than reported for continuous Pt films in literature. The thin film is also very likely to suffer from electromigration damage.

Download or read book Investigation of Electromigration in Thin Film Aluminum at Low Temperatures written by David W. Banton (CAPT, USAF.) and published by . This book was released on 1986 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Quantum 1 F Noise Other Low Frequency Fluctuations in Electronic Devices written by American Institute of Physics and published by A I P Press. This book was released on 1993 with total page 216 pages. Available in PDF, EPUB and Kindle. Book excerpt: This text contains the papers from the fifth Symposium in the sequence of quantum 1/f noise. The scope of the conference includes quantum 1/f noise, other low frequency fluctuations in electronic devices and their relation to fundamental 1/f noise.

Download or read book Investigation of Electromigration in Thin Film Aluminum at Low Temperatures written by David W. Banton and published by . This book was released on 1986 with total page 109 pages. Available in PDF, EPUB and Kindle. Book excerpt: This thesis project collects electromigration induced time to failure data from unglassed and glassed one percent silicon doped aluminum test patterns at four current densities: 4.5, 4.75, 5.5, and 6.25 mega-amps per square centimeter. At 4.5 mega-amps per square centimeter, unglassed pattern time to failure data is collected between negative thirteen and seventy degrees centigrade. From the data, the activation energy is calculated to be approximately 0.3 electron-volts. At 4.75 mega-amps per square centimeter, unglassed pattern time to failure data is collected between negative fifty and eighty degrees centigrade. From the data, the activation energy is calculated to be between approximately 0.3 electron-volts between ten and eighty degrees centigrade. At 5.5 mega-amps per square centimeter, unglassed pattern time to failure data is collected between negative fifty and twenty degrees centigrade. From the data, the activation energy is calculated to be between 0.35 and 0.43 volts for temperatures between negative seven and twenty degrees centigrade. At 6.25 mega-amps per square centimeter, glassed pattern time to failure data is collected between negative thirteen and eighty degrees centigrade. From the data, the activation energy is calculated to be approximately 0.3 electronvolts at temperatures between twenty and eighty degress centigrade. These ranges of activation energies indicate that surface electromigration is the dominant failure mechanism. Keywords: Electromigration; Low temperature; Silicon doped aluminum; Thin films; Aluminum.

Download or read book Japanese Journal of Applied Physics written by and published by . This book was released on 1991 with total page 972 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book JJAP written by and published by . This book was released on 1991 with total page 1016 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Microstructural Science for Thin Film Metallizations in Electronic Applications written by John Sanchez and published by Minerals, Metals, & Materials Society. This book was released on 1988 with total page 208 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Electromigration in Thin Film Aluminum Alloy Interconnects written by Lawrence Edward Felton and published by . This book was released on 1986 with total page 220 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Research in Materials written by and published by . This book was released on 1989 with total page 450 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Research in Materials written by Massachusetts Institute of Technology and published by . This book was released on 1988 with total page 532 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Ninth International Conference on Noise in Physical Systems written by Carolyn M. Van Vliet and published by . This book was released on 1987 with total page 648 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Measurement of Electromigration in Aluminum Thin Films Using Resistive Techniques written by Lawrence Stearns Potter and published by . This book was released on 1968 with total page 82 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Conference Proceedings IEEE Southeastcon 87 written by and published by . This book was released on 1987 with total page 360 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Electromigration of Thin Film Aluminium Interconnects written by O. F. Carr and published by . This book was released on 1994 with total page 142 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Proceedings International IEEE VLSI Multilevel Interconnection Conference written by and published by . This book was released on 1987 with total page 502 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Effect of Electromigration of 1 f Noise of Thin Film Conductor written by Tuck Pao Djeu and published by . This book was released on 1984 with total page 130 pages. Available in PDF, EPUB and Kindle. Book excerpt: