EBookClubs

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EBookClubs

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Book Proceedings

Download or read book Proceedings written by and published by . This book was released on 2005 with total page 696 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Comparison of On Orbit and Ground Based Hollow Cathode Operation

Download or read book Comparison of On Orbit and Ground Based Hollow Cathode Operation written by and published by . This book was released on 2003 with total page 16 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Fundamentals of Electric Propulsion

Download or read book Fundamentals of Electric Propulsion written by Dan M. Goebel and published by John Wiley & Sons. This book was released on 2023-10-25 with total page 564 pages. Available in PDF, EPUB and Kindle. Book excerpt: Fundamentals of Electric Propulsion Understand the fundamental basis of spaceflight with this cutting-edge guide As spacecraft engineering continues to advance, so too do the propulsion methods by which human beings can seek out the stars. Ion thrusters and Hall thrusters have been the subject of considerable innovation in recent years, and spacecraft propulsion has never been more efficient. For professionals within and adjacent to spacecraft engineering, this is critical knowledge that can alter the future of space flight. Fundamentals of Electric Propulsion offers a thorough grounding in electric propulsion for spacecraft, particularly the features and mechanisms underlying Ion and Hall thrusters. Updated in the light of rapidly expanding knowledge, the second edition of this essential guide detailed coverage of thruster principles, plasma physics, and more. It reflects the historic output of the legendary Jet Propulsion Laboratory and promises to continue as a must-own volume for spacecraft engineering professionals. Readers of the second edition of Fundamentals of Electric Propulsion readers will also find: Extensive updates to chapters covering hollow cathodes and Hall thrusters, based on vigorous recent research New sections covering magnetic shielding, cathode plume instabilities, and more Figures and homework problems in each chapter to facilitate learning and retention Fundamentals of Electric Propulsion is an essential work for spacecraft engineers and researchers working in spacecraft propulsion and related fields, as well as graduate students in electric propulsion, aerospace science, and space science courses.

Book Scientific and Technical Aerospace Reports

Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1973 with total page 1040 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lists citations with abstracts for aerospace related reports obtained from world wide sources and announces documents that have recently been entered into the NASA Scientific and Technical Information Database.

Book CRC Handbook of Metal Etchants

Download or read book CRC Handbook of Metal Etchants written by Perrin Walker and published by CRC Press. This book was released on 1990-12-11 with total page 1434 pages. Available in PDF, EPUB and Kindle. Book excerpt: This publication presents cleaning and etching solutions, their applications, and results on inorganic materials. It is a comprehensive collection of etching and cleaning solutions in a single source. Chemical formulas are presented in one of three standard formats - general, electrolytic or ionized gas formats - to insure inclusion of all necessary operational data as shown in references that accompany each numbered formula. The book describes other applications of specific solutions, including their use on other metals or metallic compounds. Physical properties, association of natural and man-made minerals, and materials are shown in relationship to crystal structure, special processing techniques and solid state devices and assemblies fabricated. This publication also presents a number of organic materials which are widely used in handling and general processing...waxes, plastics, and lacquers for example. It is useful to individuals involved in study, development, and processing of metals and metallic compounds. It is invaluable for readers from the college level to industrial R & D and full-scale device fabrication, testing and sales. Scientific disciplines, work areas and individuals with great interest include: chemistry, physics, metallurgy, geology, solid state, ceramic and glass, research libraries, individuals dealing with chemical processing of inorganic materials, societies and schools.

Book Ionized Physical Vapor Deposition

Download or read book Ionized Physical Vapor Deposition written by and published by Academic Press. This book was released on 1999-10-14 with total page 268 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and memory chips.For the first time, the most recent developments in thin film deposition using ionized physical vapor deposition (I-PVD) are presented in a single coherent source. Readers will find detailed descriptions of relevant plasma source technology, specific deposition systems, and process recipes. The tools and processes covered include DC hollow cathode magnetrons, RF inductively coupled plasmas, and microwave plasmas that are used for depositing technologically important materials such as copper, tantalum, titanium, TiN, and aluminum. In addition, this volume describes the important physical processes that occur in I-PVD in a simple and concise way. The physical descriptions are followed by experimentally-verified numerical models that provide in-depth insight into the design and operation I-PVD tools.Practicing process engineers, research and development scientists, and students will find that this book's integration of tool design, process development, and fundamental physical models make it an indispensable reference.Key Features:The first comprehensive volume on ionized physical vapor depositionCombines tool design, process development, and fundamental physical understanding to form a complete picture of I-PVDEmphasizes practical applications in the area of IC fabrication and interconnect technologyServes as a guide to select the most appropriate technology for any deposition application*This single source saves time and effort by including comprehensive information at one's finger tips*The integration of tool design, process development, and fundamental physics allows the reader to quickly understand all of the issues important to I-PVD*The numerous practical applications assist the working engineer to select and refine thin film processes