Download or read book Large solid angle Illuminators for Extreme Ultraviolet Lithography with Laser Plasmas written by and published by . This book was released on 1995 with total page 30 pages. Available in PDF, EPUB and Kindle. Book excerpt: Laser Plasma Sources (LPSS) of extreme ultraviolet radiation are an attractive alternative to synchrotron radiation sources for extreme ultraviolet lithography (EUVL) due to their modularity, brightness, and modest size and cost. To fully exploit the extreme ultraviolet power emitted by such sources, it is necessary to capture the largest possible fraction of the source emission half-sphere while simultaneously optimizing the illumination stationarity and uniformity on the object mask. In this LDRD project, laser plasma source illumination systems for EUVL have been designed and then theoretically and experimentally characterized. Ellipsoidal condensers have been found to be simple yet extremely efficient condensers for small-field EUVL imaging systems. The effects of aberrations in such condensers on extreme ultraviolet (EUV) imaging have been studied with physical optics modeling. Lastly, the design of an efficient large-solid-angle condenser has been completed. It collects 50% of the available laser plasma source power at 14 nm and delivers it properly to the object mask in a wide-arc-field camera.
Download or read book Excimer Laser Technology written by Dirk Basting and published by Springer Science & Business Media. This book was released on 2005-12-05 with total page 437 pages. Available in PDF, EPUB and Kindle. Book excerpt: A timely and comprehensive survey, Excimer Laser Technology reports on the current status and range of the underlying technology, applications and devices of this commonly used laser source, as well as the future of new technologies, such as F2 laser technology.
Download or read book Industrial Plasma Technology written by Yoshinobu Kawai and published by John Wiley & Sons. This book was released on 2010-04-26 with total page 467 pages. Available in PDF, EPUB and Kindle. Book excerpt: Clearly structured in five major sections on applications, this monograph covers such hot technologies as nanotechnology, solar cell technology, biomedical and clinical applications, and sustainability. Since the topic, applications and readers are highly interdisciplinary, the book bridges materials science, industrial chemistry, physics, and engineering -- making it a must-have for researchers in industry and academia, as well as those working in application-oriented plasma technology.
Download or read book Energy Research Abstracts written by and published by . This book was released on 1995 with total page 1028 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiannual, with semiannual and annual indexes. References to all scientific and technical literature coming from DOE, its laboratories, energy centers, and contractors. Includes all works deriving from DOE, other related government-sponsored information, and foreign nonnuclear information. Arranged under 39 categories, e.g., Biomedical sciences, basic studies; Biomedical sciences, applied studies; Health and safety; and Fusion energy. Entry gives bibliographical information and abstract. Corporate, author, subject, report number indexes.
Download or read book EMLC 2005 written by Uwe Behringer and published by Margret Schneider. This book was released on 2005 with total page 301 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2020-05-01 with total page 838 pages. Available in PDF, EPUB and Kindle. Book excerpt: The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Download or read book Emerging Lithographic Technologies written by and published by . This book was released on 2003 with total page 628 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book INIS Atomindex written by and published by . This book was released on 1996 with total page 730 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Journal of Physics written by and published by . This book was released on 2004 with total page 500 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Illuminators for Extreme Ultraviolet Lithography Cameras with Ring Fields written by and published by . This book was released on 1994 with total page 6 pages. Available in PDF, EPUB and Kindle. Book excerpt: Scanning, ring-field lithographic cameras designed for 14-nm radiation can print 100-nm features on large chips. Mating high-efficiency illuminators are described.
Download or read book Laser generated and Other Laboratory X ray and EUV Sources Optics and Applications written by George A. Kyrala and published by SPIE-International Society for Optical Engineering. This book was released on 2004 with total page 468 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Download or read book Solid State Laser Driver for Extreme Ultraviolet Lithography written by and published by . This book was released on 1994 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book EUV Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2009 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt: Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Download or read book Government Reports Announcements Index written by and published by . This book was released on 1996 with total page 740 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Advanced Solid State Lasers Extreme ultraviolet lithography written by Stephen A. Payne and published by . This book was released on 1996 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Harnessing Light written by National Research Council and published by National Academies Press. This book was released on 1998-09-25 with total page 358 pages. Available in PDF, EPUB and Kindle. Book excerpt: Optical science and engineering affect almost every aspect of our lives. Millions of miles of optical fiber carry voice and data signals around the world. Lasers are used in surgery of the retina, kidneys, and heart. New high-efficiency light sources promise dramatic reductions in electricity consumption. Night-vision equipment and satellite surveillance are changing how wars are fought. Industry uses optical methods in everything from the production of computer chips to the construction of tunnels. Harnessing Light surveys this multitude of applications, as well as the status of the optics industry and of research and education in optics, and identifies actions that could enhance the field's contributions to society and facilitate its continued technical development.
Download or read book Frontiers in High Energy Density Physics written by National Research Council and published by National Academies Press. This book was released on 2003-05-11 with total page 177 pages. Available in PDF, EPUB and Kindle. Book excerpt: Recent scientific and technical advances have made it possible to create matter in the laboratory under conditions relevant to astrophysical systems such as supernovae and black holes. These advances will also benefit inertial confinement fusion research and the nation's nuclear weapon's program. The report describes the major research facilities on which such high energy density conditions can be achieved and lists a number of key scientific questions about high energy density physics that can be addressed by this research. Several recommendations are presented that would facilitate the development of a comprehensive strategy for realizing these research opportunities.
