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EBookClubs

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Book Kinetics of Low Pressure Chemical Vapor Deposition of Tungsten

Download or read book Kinetics of Low Pressure Chemical Vapor Deposition of Tungsten written by Kumar P. Krishnamani and published by . This book was released on 1985 with total page 246 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI  ULSI Applications

Download or read book Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI ULSI Applications written by John E.J. Schmitz and published by William Andrew. This book was released on 1992-12-31 with total page 264 pages. Available in PDF, EPUB and Kindle. Book excerpt: Publisher description.

Book Chemical Vapor Deposition for Microelectronics

Download or read book Chemical Vapor Deposition for Microelectronics written by Arthur Sherman and published by William Andrew. This book was released on 1987 with total page 240 pages. Available in PDF, EPUB and Kindle. Book excerpt: Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.

Book Modeling of Chemical Vapor Deposition of Tungsten Films

Download or read book Modeling of Chemical Vapor Deposition of Tungsten Films written by Chris R. Kleijn and published by Birkhäuser. This book was released on 2013-11-11 with total page 138 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity of all the assumptions made in his work. On the other side, Christoph Werner, working in the context of an industrial research lab, was able to closely interact with manufacturing and development engineers in a modern submicron semiconductor processing line. Because of these different approaches, the informal collaboration during the course of the projects proved to be extremely helpful to both sides, even though - or perhaps because - different computer codes, different CVD reactors and also slightly different models were used. In spite of the inconsistencies which might arise from this double approach, we feel that the presentation of both sets of results in one book will be very useful for people working in similar projects.

Book Proceedings of the Tenth International Conference on Chemical Vapor Deposition  1987

Download or read book Proceedings of the Tenth International Conference on Chemical Vapor Deposition 1987 written by Electrochemical Society. High Temperature Materials Division and published by . This book was released on 1987 with total page 1296 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Plasma enhanced Chemical Vapor Deposition of Tungsten Silicide

Download or read book Plasma enhanced Chemical Vapor Deposition of Tungsten Silicide written by Andris Edgar Petriceks and published by . This book was released on 1986 with total page 326 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book The Kinetics of Chemical Vapor Deposition of Tungsten

Download or read book The Kinetics of Chemical Vapor Deposition of Tungsten written by H. CHEUNG and published by . This book was released on 1971 with total page 14 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book A Methodology to Characterize Tungsten Low Pressure Chemical Vapor Deposition from Silane Reduction of Tungsten Hexafluoride

Download or read book A Methodology to Characterize Tungsten Low Pressure Chemical Vapor Deposition from Silane Reduction of Tungsten Hexafluoride written by Srikanth Bolnedi and published by . This book was released on 1995 with total page 558 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Analysis of Low Pressure Chemical Vapor Deposition Processes

Download or read book Analysis of Low Pressure Chemical Vapor Deposition Processes written by Karl Frederick Roenigk and published by . This book was released on 1987 with total page 726 pages. Available in PDF, EPUB and Kindle. Book excerpt: