Download or read book Ion Optics Design for a Maskless Ion Projection Lithography System written by Vinh Van Ngo and published by . This book was released on 2000 with total page 164 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Experimental Demonstration of a Prototype Maskless Micro ion beam Reduction Lithography System written by Vinh Van Ngo and published by . This book was released on 2004 with total page 412 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Maskless Resistless Ion Beam Lithography Processes written by Qing Ji (Ph.D.) and published by . This book was released on 2003 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book The Physics of Submicron Lithography written by Kamil A. Valiev and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 502 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is devoted to the physics of electron-beam, ion-beam, optical, and x-ray lithography. The need for this book results from the following considerations. The astonishing achievements in microelectronics are in large part connected with successfully applying the relatively new technology of processing (changing the prop erties of) a material into a device whose component dimensions are submicron, called photolithography. In this method the device is imaged as a pattern on a metal film that has been deposited onto a transparent substrate and by means of a broad stream of light is transferred to a semiconductor wafer within which the physical structure of the devices and the integrated circuit connections are formed layer by layer. The smallest dimensions of the device components are limited by the diffraction of the light when the pattern is transferred and are approximately the same as the wavelength of the light. Photolithography by light having a wavelength of A ~ 0.4 flm has made it possible to serially produce integrated circuits having devices whose minimal size is 2-3 flm in the 4 pattern and having 10-105 transistors per circuit.
Download or read book Nanofabrication Using Focused Ion and Electron Beams written by Ivo Utke and published by OUP USA. This book was released on 2012-05 with total page 830 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book comprehensively reviews the achievements and potentials of a minimally invasive, three-dimensional, and maskless surface structuring technique operating at nanometer scale by using the interaction of focused ion and electron beams (FIB/FEB) with surfaces and injected molecules.
Download or read book Nanolithography written by M Feldman and published by Woodhead Publishing. This book was released on 2014-02-13 with total page 599 pages. Available in PDF, EPUB and Kindle. Book excerpt: Integrated circuits, and devices fabricated using the techniques developed for integrated circuits, have steadily gotten smaller, more complex, and more powerful. The rate of shrinking is astonishing – some components are now just a few dozen atoms wide. This book attempts to answer the questions, "What comes next? and "How do we get there?Nanolithography outlines the present state of the art in lithographic techniques, including optical projection in both deep and extreme ultraviolet, electron and ion beams, and imprinting. Special attention is paid to related issues, such as the resists used in lithography, the masks (or lack thereof), the metrology needed for nano-features, modeling, and the limitations caused by feature edge roughness. In addition emerging technologies are described, including the directed assembly of wafer features, nanostructures and devices, nano-photonics, and nano-fluidics.This book is intended as a guide to the researcher new to this field, reading related journals or facing the complexities of a technical conference. Its goal is to give enough background information to enable such a researcher to understand, and appreciate, new developments in nanolithography, and to go on to make advances of his/her own. - Outlines the current state of the art in alternative nanolithography technologies in order to cope with the future reduction in size of semiconductor chips to nanoscale dimensions - Covers lithographic techniques, including optical projection, extreme ultraviolet (EUV), nanoimprint, electron beam and ion beam lithography - Describes the emerging applications of nanolithography in nanoelectronics, nanophotonics and microfluidics
Download or read book EUV Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2009 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt: Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Download or read book Proceedings of the Symposium on Electron and Ion Beam Science and Technology International Conference written by and published by . This book was released on 1982 with total page 536 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Charged particle Optics written by and published by . This book was released on 1999 with total page 294 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book VLSI Design written by K. Lal Kishore and published by I. K. International Pvt Ltd. This book was released on 2013-12-30 with total page 415 pages. Available in PDF, EPUB and Kindle. Book excerpt: Aimed primarily for undergraduate students pursuing courses in VLSI design, the book emphasizes the physical understanding of underlying principles of the subject. It not only focuses on circuit design process obeying VLSI rules but also on technological aspects of Fabrication. VHDL modeling is discussed as the design engineer is expected to have good knowledge of it. Various Modeling issues of VLSI devices are focused which includes necessary device physics to the required level. With such an in-depth coverage and practical approach practising engineers can also use this as ready reference. Key features: Numerous practical examples. Questions with solutions that reflect the common doubts a beginner encounters. Device Fabrication Technology. Testing of CMOS device BiCMOS Technological issues. Industry trends. Emphasis on VHDL.
Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2020-05-01 with total page 913 pages. Available in PDF, EPUB and Kindle. Book excerpt: The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Download or read book Nanofabrication Handbook written by Stefano Cabrini and published by CRC Press. This book was released on 2012-02-24 with total page 546 pages. Available in PDF, EPUB and Kindle. Book excerpt: While many books are dedicated to individual aspects of nanofabrication, there is no single source that defines and explains the total vision of the field. Filling this gap, Nanofabrication Handbook presents a unique collection of new and the most important established approaches to nanofabrication. Contributors from leading research facilities and
Download or read book Design Fabrication and Optical Analysis of Nanomirrors for Maskless EUV Lithography written by Yashesh Ajitbhai Shroff and published by . This book was released on 2003 with total page 344 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Insulated Gate Bipolar Transistor IGBT Theory and Design written by Vinod Kumar Khanna and published by John Wiley & Sons. This book was released on 2004-04-05 with total page 648 pages. Available in PDF, EPUB and Kindle. Book excerpt: A comprehensive and "state-of-the-art" coverage of the design and fabrication of IGBT. All-in-one resource Explains the fundamentals of MOS and bipolar physics. Covers IGBT operation, device and process design, power modules, and new IGBT structures.
Download or read book Nanofinishing Science and Technology written by Vijay Kumar Jain and published by CRC Press. This book was released on 2016-12-12 with total page 487 pages. Available in PDF, EPUB and Kindle. Book excerpt: Finishing is the final operation after a part is sized and shaped. Currently in high tech industries, there is a demand for nano level surface finishing of components. This process is done to improve the surface finish, to remove the recast layer, or to remove surface and sub-surface defects. The result is low friction, longer product life, and low power requirements. Equally important is the aesthetic aspect of the product. This subject is growing very fast from the technology as well as a science point of view. Books on this subject are very limited, particularly those ones that deal with both the science as well as the technology aspects.
Download or read book Three Dimensional Microfabrication Using Two Photon Polymerization written by Tommaso Baldacchini and published by William Andrew. This book was released on 2019-10-31 with total page 762 pages. Available in PDF, EPUB and Kindle. Book excerpt: Three-Dimensional Microfabrication Using Two-Photon Polymerization, Second Edition offers a comprehensive guide to TPP microfabrication and a unified description of TPP microfabrication across disciplines. It offers in-depth discussion and analysis of all aspects of TPP, including the necessary background, pros and cons of TPP microfabrication, material selection, equipment, processes and characterization. Current and future applications are covered, along with case studies that illustrate the book's concepts. This new edition includes updated chapters on metrology, synthesis and the characterization of photoinitiators used in TPP, negative- and positive-tone photoresists, and nonlinear optical characterization of polymers. This is an important resource that will be useful for scientists involved in microfabrication, generation of micro- and nano-patterns and micromachining. - Discusses the major types of nanomaterials used in the agriculture and forestry sectors, exploring how their properties make them effective for specific applications - Explores the design, fabrication, characterization and applications of nanomaterials for new Agri-products - Offers an overview of regulatory aspects regarding the use of nanomaterials for agriculture and forestry
Download or read book Nuclear Methods in Semiconductor Physics written by G. Langouche and published by Elsevier. This book was released on 1992-04-01 with total page 270 pages. Available in PDF, EPUB and Kindle. Book excerpt: The two areas of experimental research explored in this volume are: the Hyperfine Interaction Methods, focusing on the microscopic configuration surrounding radioactive probe atoms in semiconductors, and Ion Beam Techniques using scattering, energy loss and channeling properties of highly energetic ions penetrating in semiconductors. A large area of interesting local defect studies is discussed. Less commonly used methods in the semiconductor field, such as nuclear magnetic resonance, electron nuclear double resonance, muon spin resonance and positron annihilation, are also reviewed. The broad scope of the contributions clearly demonstrates the growing interest in the use of sometimes fairly unconventional nuclear methods in the field of semiconductor physics.
