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Book Ion Implantation Metallurgy  A Study of the Composition  Structure and Corrosion Behavior of Surface Alloys Formed by Ion Implantation and Ion Beam Mixing

Download or read book Ion Implantation Metallurgy A Study of the Composition Structure and Corrosion Behavior of Surface Alloys Formed by Ion Implantation and Ion Beam Mixing written by C. R. Clayton and published by . This book was released on 1984 with total page 16 pages. Available in PDF, EPUB and Kindle. Book excerpt: DIGM(Diffusion Induced Grain Boundary Migration) is necessarily a near surface phenomenon, as may be visualized by artificially separating the process into discreet steps (which, it should be emphasized, occur continuously and simutaneously in practice). The first step is the diffusion of a small amount of solute into a stationary grain boundary, Cb, above that in the adjacent matrix. Immediately following this step, the boundary moves sideways by means of some atomic shuffling cross the boundary plane: This deposits the solute from the boundary into the volume of matrix through which it sweeps. After this second step, the concentration of solute in the boundary is restored to its original level, and so, therefore, is the driving force for grain boundary diffusion, assuming that the source concentration remains constant, and that there is no effect of strain in the alloyed region. The process should then continue, if the boundary continues to move in the same direction and and the depth and concentration of the allowed zone should both be related to the grain boundary diffusivity and the grain boundary mobility. Since the ability to control the depth and concentration of an alloyed zone is potentially useful for the purpose of tailing surface properties to service needs, a study of the exact relationships is desirable, however, much of the necessary information is not yet available, and complicated relationships may exist between grain boundary diffusivity and mobility.

Book Ion Implantation Metallurgy

Download or read book Ion Implantation Metallurgy written by Clive R. Clayton and published by . This book was released on 1980 with total page 116 pages. Available in PDF, EPUB and Kindle. Book excerpt: The ion implantation technique was used in order to improve the surface mechanical properties and corrosion resistance of iron and steel. Nitrogen implantation was found to improve the fatigue lifetime and cavitation resistance of 1018 steel. TEM and internal friction studies were carried out in order to determine the nature of this strengthening mechanism. Phosphorous implantation into 304 stainless steel was shown to produce a microcrystalline surface alloy saturated with P. Combined electrochemical and XPS studies revealed that the general corrosion of 304 in deaerated 1N H2SO4 is improved, this effect being due to the formation of a modified passive film. Finally, a study is reported of the radiation effects resulting from the ion implantation AS(+)yields Au and Fe(+) yields Al. The resulting surface alloys were studied using HVEM.

Book Scientific and Technical Aerospace Reports

Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Ion Implantation Into Metals

Download or read book Ion Implantation Into Metals written by V. Ashworth and published by Elsevier. This book was released on 2016-04-20 with total page 385 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion Implantation into Metals presents the proceedings of the 3rd International Conference on the Modification of Surface Properties of Metals by Ion Implantation, held at UMIST, Manchester, UK on June 23-26, 1981. The book includes papers on aqueous corrosion of ion-implanted iron; the mechanical properties and high temperature oxidation behavior in aqueous corrosion; and the potential of ion beam processing in this field of materials science and engineering. The text also presents papers on the important scientific progress in metal physics and related subjects.

Book Passive Mechanisms of Surfaces Produced by Ion Beam Mixing and Ion Implantation

Download or read book Passive Mechanisms of Surfaces Produced by Ion Beam Mixing and Ion Implantation written by P. M. Natishan and published by . This book was released on 1990 with total page 27 pages. Available in PDF, EPUB and Kindle. Book excerpt: The corrosion behavior of Mo-Al, Cr-Al and Cr-Mo-Al surface alloys produced by ion implantation and ion beam mixing was examined in deaerated, 0.1M NaC1. The polarization behavior of the ion implanted samples was similar to that of Al and the pitting potentials of the ion implanted samples were 115 to 155 mV higher than that of Al. From the standpoint of the Ph sub pzc model this behavior would be explained by the presence of the implanted cations in the stable oxide lattice. There was incomplete mixing of the coating and substrate for the ion beam mixed samples, and the mixed elements remained almost entirely in the metallic state so that the desired mixed oxide films were not formed. Ion beam mixing did impart additional stability compared to as-deposited samples since the mixing process produced more compact coatings. (KR).

Book Ion Implantation and Synthesis of Materials

Download or read book Ion Implantation and Synthesis of Materials written by Michael Nastasi and published by Springer Science & Business Media. This book was released on 2007-05-16 with total page 271 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. Controlled doping at controlled depths is an essential feature of implantation. Ion beam processing can also be used to improve corrosion resistance, to harden surfaces, to reduce wear and, in general, to improve materials properties. This book presents the physics and materials science of ion implantation and ion beam modification of materials. It covers ion-solid interactions used to predict ion ranges, ion straggling and lattice disorder. Also treated are shallow-junction formation and slicing silicon with hydrogen ion beams. Topics important for materials modification, such as ion-beam mixing, stresses, and sputtering, are also described.

Book Effect of Ion Irradiation on the Properties of Metals and Alloys

Download or read book Effect of Ion Irradiation on the Properties of Metals and Alloys written by Piotr Budzyński and published by Taylor & Francis. This book was released on 2024-07-31 with total page 175 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book describes the interaction between ions and metallic targets as well as energy loss processes during ion implantation and irradiation. Ion bombardments of targets cause changes in surface layer chemical composition, radiation defect formation, sputtering, blistering, swelling and ion mixing. These effects modify surface topography, crystalline structure, electrical and tribological properties of metals and alloys. The book presents research on the effects of the implantation and irradiation on the friction and wear of modified materials, as well as practical applications of ion implantation and irradiation. It offers a review of current problems related to the modification of materials via irradiation. In addition, computer programs for modeling the depth of ions and vacancies in a sample are presented, and potential causes of disagreement between modeling and experimental results are described. Finally, the book provides evidence of the long-range effect. Effect of Ion Irradiation on the Properties of Metals and Alloys is aimed at academics investigating the properties of metals and alloys after irradiation and/or implantation as well as for students of engineering and physical and chemical sciences. The book is also useful for those looking for up-to-date information on these methods and ways of solving related problems, and for designers of equipment used in places exposed to high ion irradiation or to cosmic space.

Book Ion Implantation Metallurgy

Download or read book Ion Implantation Metallurgy written by C. R. Clayton and published by . This book was released on 1979 with total page 79 pages. Available in PDF, EPUB and Kindle. Book excerpt: A number of electrochemical studies have been carried out on surface alloys which have been produced by ion implantation (1-6). For the most part these studies have been concerned with realtively low energy implantation (ca. 25 KeV), yielding surface alloys in the depth range 50 - 150 angstroms. In an attempt to produce a surface alloy of more uniform composition with depth, extending to a level of at least 500 angstroms, we have carried out Ni-implantation into Type 430 ferritic stainless steel using a multi-implantation technique, at energies higher than are commonly used. We believe this level of implantation depth to be of technological significance as this is nearly two orders of magnitude thicker than most passive films. Reported here are results of structural, compositional and electrochemical analysis of the surface alloys formed. (Author).

Book Ion Implantation

    Book Details:
  • Author : James Karsten Hirvonen
  • Publisher :
  • Release : 1980
  • ISBN :
  • Pages : 528 pages

Download or read book Ion Implantation written by James Karsten Hirvonen and published by . This book was released on 1980 with total page 528 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book ERDA Energy Research Abstracts

Download or read book ERDA Energy Research Abstracts written by and published by . This book was released on 1989 with total page 848 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Technical Abstract Bulletin

Download or read book Technical Abstract Bulletin written by and published by . This book was released on 1981 with total page 228 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Ion Implantation Science and Technology

Download or read book Ion Implantation Science and Technology written by J.F. Ziegler and published by Elsevier. This book was released on 2012-12-02 with total page 509 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion Implantation Science and Technology: Second Edition, just like the first edition, serves as both an introduction and tutorial to the science, techniques, and machines involved in the subject. The book is divided into two parts - Part 1: Ion Implantation Science and Part 2: Ion Implantation Technology. Part 1 covers topics such as the stopping and range of ions in solids; ion implantation damage in silicon; experimental annealing and activation; and the measurement on ion implantation. Part 2 includes ion optics and focusing on implanter design; photoresist problems and particle contamination; ion implantation diagnostics and process control; and emission of ionizing radiation from ion implanters. The text is recommended for engineers who would like to be acquainted with the principles and processes behind ion implantation or make studies on the field.

Book Metals Abstracts

Download or read book Metals Abstracts written by and published by . This book was released on 1998 with total page 1076 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Ion Implantation for Materials Processing

Download or read book Ion Implantation for Materials Processing written by F. A. Smidt and published by William Andrew. This book was released on 1983 with total page 262 pages. Available in PDF, EPUB and Kindle. Book excerpt: Good,No Highlights,No Markup,all pages are intact, Slight Shelfwear,may have the corners slightly dented, may have slight color changes/slightly damaged spine.

Book Ion Implantation

    Book Details:
  • Author : Ishaq Ahmad
  • Publisher : BoD – Books on Demand
  • Release : 2017-06-14
  • ISBN : 9535132377
  • Pages : 154 pages

Download or read book Ion Implantation written by Ishaq Ahmad and published by BoD – Books on Demand. This book was released on 2017-06-14 with total page 154 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion implantation is one of the promising areas of sciences and technologies. It has been observed as a continuously evolving technology. In this book, there is a detailed overview of the recent ion implantation research and innovation along with the existing ion implantation technological issues especially in microelectronics. The book also reviews the basic knowledge of the radiation-induced defects production during the ion implantation in case of a semiconductor structure for fabrication and development of the required perfect microelectronic devices. The improvement of the biocompatibility of biomaterials by ion implantation, which is a hot research topic, has been summarized in the book as well. Moreover, advanced materials characterization techniques are also covered in this book to evaluate the ion implantation impact on the materials.

Book Ion Implantation  Basics to Device Fabrication

Download or read book Ion Implantation Basics to Device Fabrication written by Emanuele Rimini and published by Springer Science & Business Media. This book was released on 2013-11-27 with total page 400 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion implantation offers one of the best examples of a topic that starting from the basic research level has reached the high technology level within the framework of microelectronics. As the major or the unique procedure to selectively dope semiconductor materials for device fabrication, ion implantation takes advantage of the tremendous development of microelectronics and it evolves in a multidisciplinary frame. Physicists, chemists, materials sci entists, processing, device production, device design and ion beam engineers are all involved in this subject. The present monography deals with several aspects of ion implantation. The first chapter covers basic information on the physics of devices together with a brief description of the main trends in the field. The second chapter is devoted to ion im planters, including also high energy apparatus and a description of wafer charging and contaminants. Yield is a quite relevant is sue in the industrial surrounding and must be also discussed in the academic ambient. The slowing down of ions is treated in the third chapter both analytically and by numerical simulation meth ods. Channeling implants are described in some details in view of their relevance at the zero degree implants and of the available industrial parallel beam systems. Damage and its annealing are the key processes in ion implantation. Chapter four and five are dedicated to this extremely important subject.

Book Energy Research Abstracts

Download or read book Energy Research Abstracts written by and published by . This book was released on 1988 with total page 500 pages. Available in PDF, EPUB and Kindle. Book excerpt: