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Book Ion Beam Modification and Characterization of Metal silicon Structures

Download or read book Ion Beam Modification and Characterization of Metal silicon Structures written by Babak Mohadjeri and published by . This book was released on 1995 with total page 150 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Ion Beam Modification and Characterization of Silicon Germanium Carbon Heteroepitaxial Layers on  001  Silicon Substrates

Download or read book Ion Beam Modification and Characterization of Silicon Germanium Carbon Heteroepitaxial Layers on 001 Silicon Substrates written by Roger Garcia and published by . This book was released on 1995 with total page 232 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Ion Beam Modification of Solids

Download or read book Ion Beam Modification of Solids written by Werner Wesch and published by Springer. This book was released on 2016-07-14 with total page 547 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book presents the method of ion beam modification of solids in realization, theory and applications in a comprehensive way. It provides a review of the physical basics of ion-solid interaction and on ion-beam induced structural modifications of solids. Ion beams are widely used to modify the physical properties of materials. A complete theory of ion stopping in matter and the calculation of the energy loss due to nuclear and electronic interactions are presented including the effect of ion channeling. To explain structural modifications due to high electronic excitations, different concepts are presented with special emphasis on the thermal spike model. Furthermore, general concepts of damage evolution as a function of ion mass, ion fluence, ion flux and temperature are described in detail and their limits and applicability are discussed. The effect of nuclear and electronic energy loss on structural modifications of solids such as damage formation, phase transitions and amorphization is reviewed for insulators and semiconductors. Finally some selected applications of ion beams are given.

Book Ion Beam Modification of Metal silicon Contacts

Download or read book Ion Beam Modification of Metal silicon Contacts written by Christopher R. Gardner and published by . This book was released on 1984 with total page 316 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Ion Implantation and Synthesis of Materials

Download or read book Ion Implantation and Synthesis of Materials written by Michael Nastasi and published by Springer Science & Business Media. This book was released on 2007-05-16 with total page 271 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. Controlled doping at controlled depths is an essential feature of implantation. Ion beam processing can also be used to improve corrosion resistance, to harden surfaces, to reduce wear and, in general, to improve materials properties. This book presents the physics and materials science of ion implantation and ion beam modification of materials. It covers ion-solid interactions used to predict ion ranges, ion straggling and lattice disorder. Also treated are shallow-junction formation and slicing silicon with hydrogen ion beams. Topics important for materials modification, such as ion-beam mixing, stresses, and sputtering, are also described.

Book Ion Beam Modification of Metals  Mechanical Properties and Structure

Download or read book Ion Beam Modification of Metals Mechanical Properties and Structure written by James W. Mayer and published by . This book was released on 1989 with total page 9 pages. Available in PDF, EPUB and Kindle. Book excerpt: The objective of this work was to study the phase transformations and property changes of metals bought about by ion beam induced materials modification and then to use this information to produce stable surface layers exhibiting optimal chemical and mechanical integrity. Summary of Most significant Results: 1) Amorphous alloys can be formed by ion mixing a wide variety of metal systems within defined regions of atomic composition. 2) Two step processing such as implanting Carbon and Nitrogen into ion beam mixed layers improves the friction behavior. 3) Iron-Titanium mixed on stainless steel and implanted with N and C results in a wear resistant layer that deforms to depths greater than the thickness of the modified layer. 4) These novel structures on stainless steel were used to demonstrate a technique for distinguishing between deformation and material removal on worn surfaces. 5) Mixing substantial amounts of gold into Ti improves corrosion resistance of the Ti without appreciably degrading the wear and friction behavior. (aw).

Book Ion Beam Modification of Metals

Download or read book Ion Beam Modification of Metals written by Fadeĭ Fadeevich Komarov and published by Routledge. This book was released on 1992 with total page 272 pages. Available in PDF, EPUB and Kindle. Book excerpt: Translated from the 1990 Russian work published by Metallurgiya (Moscow). Komarov draws largely on his own research (and 590 references) to address the problems associated with directional ion beam modification of the physicochemical properties of the near- surface regions of metal and alloys. He examines the primary processes accompanying the passage of fast ions in crystals and secondary processes such as annealing and ageing; and he shows the possibilities for using ion beam alloying for controlling the mechanical, tribological, corrosion, and catholytic properties of metals and alloys. Annotation copyrighted by Book News, Inc., Portland, OR

Book Ion Beam Modification of Insulators

Download or read book Ion Beam Modification of Insulators written by Paolo Mazzoldi and published by Elsevier Publishing Company. This book was released on 1987 with total page 778 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume provides a current treatise on the chemical and physical property modifications induced by ion beams in insulators, including applications in astrophysics, geophysics, material technology, optoelectronics, memory devices and polymers. An extensive review is given of experimental methods for the analysis of ion bombarded insulators, including optical and structural methods, resonance, energetic ion methods and surface techniques. An appendix of more than 90 pages presents the most extensive ion-range tables for insulators so far. These tables cover a wide regime of energies and a wide variety of insulating targets, including glasses and many organic and ceramics materials. The book will be of particular value to research physicists, chemists, astrophysicists and geophysicists as well as engineers interested in optoelectronics, polymers, nuclear energy and material technology.

Book Beam Solid Interactions for Materials Synthesis and Characterization  Volume 354

Download or read book Beam Solid Interactions for Materials Synthesis and Characterization Volume 354 written by Dale C. Jacobson and published by . This book was released on 1995-11-20 with total page 776 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of the title symposium, held at the 1994 MRS Fall Meeting in Boston, 28 November-2 December 1994. Selected papers that were presented in both oral and poster sessions are divided into six topical groups: ion beam processing; defects and diffusion; ion-beam modification of polymers; analysis and characterization; sputtering; and laser-assisted and induced processes. Annotation copyright by Book News, Inc., Portland, OR

Book Ion Beam Applications

    Book Details:
  • Author : Ishaq Ahmad
  • Publisher : BoD – Books on Demand
  • Release : 2018-07-18
  • ISBN : 178923414X
  • Pages : 190 pages

Download or read book Ion Beam Applications written by Ishaq Ahmad and published by BoD – Books on Demand. This book was released on 2018-07-18 with total page 190 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion beam of various energies is a standard research tool in many areas of science, from basic physics to diverse areas in space science and technology, device fabrications, materials science, environment science, and medical sciences. It is an advance and versatile tool to frequently discover applications across a broad range of disciplines and fields. Moreover, scientists are continuously improving the ion beam sources and accelerators to explore ion beam at the forefront of scientific endeavours. This book provides a glance view on MeV ion beam applications, focused ion beam generation and its applications as well as practical applications of ion implantation.

Book Silicon Processing and Characterization with Ion Beams  microform

Download or read book Silicon Processing and Characterization with Ion Beams microform written by Mengbing Huang and published by National Library of Canada = Bibliothèque nationale du Canada. This book was released on 1997 with total page 150 pages. Available in PDF, EPUB and Kindle. Book excerpt: The continuous shrinkage of silicon devices is presenting challenges to ion beam processing and characterization of Si materials. In this thesis, we have studied some issues related to ion beam analysis and processing of silicon materials. First, we demonstrate the use of nuclear reaction analysis (NRA) combined with oxidation/etching to obtain the boron depth profile in a $\delta$-doped Si structure. Our measurements show very sharp interfaces between doped and undoped layers, with the attainable depth resolution of $\sim$0.7 nm. The technique is further applied to examine the B redistribution in the $\delta$-doped Si structure after solid phase epitaxial growth. Second, we study the effects of temperature and flux on the lattice damage induced by 1.0 MeV Si ion self-implantation. The decreasing rate of near-surface damage with implant temperature is distinctly different from that of end-of-range damage, suggesting that different mechanisms for damage formation are involved along the ion track. The flux effect on lattice damage is found to vary with temperature. Finally, we study boron transient enhanced diffusion (TED) under P and B isotope doping conditions. The effective boron diffusivity and the immobile boron density decrease with increasing P doping concentrations. This is consistent with the clustering model and suggests that the occurrence of TED for low boron concentration cannot be explained by the Fermi-level model. Compared to $\sp$B-free Si, $\sp$B TED in the $\sp$B-doped Si is retarded after the initial low-temperature annealing, while more broadening of the $\sp$B profile occurs in the $\sp$B-doped sample after a second annealing at high temperature. This phenomenon is discussed in terms of trapping of Si interstitials in $\sp$B doping background. This study also provides a means for testing the "+1" model which is important for TED modeling.

Book Preparation and Properties of Thin Films

Download or read book Preparation and Properties of Thin Films written by K. N. Tu and published by Elsevier. This book was released on 2013-10-22 with total page 351 pages. Available in PDF, EPUB and Kindle. Book excerpt: Treatise on Materials Science and Technology, Volume 24: Preparation and Properties of Thin Films covers the progress made in the preparation of thin films and the corresponding study of their properties. The book discusses the preparation and property correlations in thin film; the variation of microstructure of thin films; and the molecular beam epitaxy of superlattices in thin film. The text also describes the epitaxial growth of silicon structures (thermal-, laser-, and electron-beam-induced); the characterization of grain boundaries in bicrystalline thin films; and the mechanical properties of thin films on substrates. The ion beam modification of thin film; the use of thin alloy films for metallization in microelectronic devices; and the fabrication and physical properties of ultrasmall structures are also encompassed. Materials scientists and materials engineers will find the book invaluable.

Book Ion Beams in Materials Processing and Analysis

Download or read book Ion Beams in Materials Processing and Analysis written by Bernd Schmidt and published by Springer Science & Business Media. This book was released on 2012-12-13 with total page 425 pages. Available in PDF, EPUB and Kindle. Book excerpt: A comprehensive review of ion beam application in modern materials research is provided, including the basics of ion beam physics and technology. The physics of ion-solid interactions for ion implantation, ion beam synthesis, sputtering and nano-patterning is treated in detail. Its applications in materials research, development and analysis, developments of special techniques and interaction mechanisms of ion beams with solid state matter result in the optimization of new material properties, which are discussed thoroughly. Solid-state properties optimization for functional materials such as doped semiconductors and metal layers for nano-electronics, metal alloys, and nano-patterned surfaces is demonstrated. The ion beam is an important tool for both materials processing and analysis. Researchers engaged in solid-state physics and materials research, engineers and technologists in the field of modern functional materials will welcome this text.

Book Ion Beam Modification of Materials

Download or read book Ion Beam Modification of Materials written by T. E. Felter and published by . This book was released on 2005 with total page 6 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume contains the proceedings of the 14th International Conference on Ion Beam Modification of Materials, IBMM 2004, and is published by Elsevier-Science Publishers as a special issue of Nuclear Instruments and Methods B. The conference series is the major international forum to present and discuss recent research results and future directions in the field of ion beam modification, synthesis and characterization of materials. The first conference in the series was held in Budapest, Hungary, 1978, and subsequent conferences were held every two years at locations around the Globe, most recently in Japan, Brazil, and the Netherlands. The series brings together physicists, materials scientists, and ion beam specialists from all over the world. The official conference language is English. IBMM 2004 was held on September 5-10, 2004. The focus was on materials science involving both basic ion-solid interaction processes and property changes occurring either during or subsequent to ion bombardment and ion beam processing in relation to materials and device applications. Areas of research included Nanostructures, Multiscale Modeling, Patterning of Surfaces, Focused Ion Beams, Defects in Semiconductors, Insulators and Metals, Cluster Beams, Radiation Effects in Materials, Photonic Devices, Ion Implantation, Ion Beams in Biology and Medicine including New Materials, Imaging, and Treatment.

Book Ion Beam Modification of Materials

Download or read book Ion Beam Modification of Materials written by J.S. Williams and published by Newnes. This book was released on 2012-12-02 with total page 1157 pages. Available in PDF, EPUB and Kindle. Book excerpt: This conference consisted of 15 oral sessions, including three plenary papers covering areas of general interest, 22 specialist invited papers and 51 contributed presentations as well as three poster sessions. There were several scientific highlights covering a diverse spectrum of materials and ion beam processing methods. These included a wide range of conventional and novel applications such as: optical displays and opto-electronics, motor vehicle and tooling parts, coatings tailored for desired properties, studies of fundamental defect properties, the production of novel (often buried) compounds, and treating biomedical materials. The study of nanocrystals produced by ion implantation in a range of host matrices, particularly for opto-electronics applications, was one especially new and exciting development. Despite several decades of study, major progress was reported at the conference in understanding defect evolution in semiconductors and the role of defects in transient impurity diffusion. The use of implantation to tune or isolate optical devices and in forming optically active centres and waveguides in semiconductors, polymers and oxide ceramics was a major focus of several presentations at the conference. The formation of hard coatings by ion assisted deposition or direct implantation was also an area which showed much recent progress. Ion beam techniques had also developed apace, particularly those based on plasma immersion ion implantation or alternative techniques for large area surface treatment. Finally, the use of ion beams for the direct treatment of cancerous tissue was a particularly novel and interesting application of ion beams.

Book Ion Beam Modification of Silicon and Metal Silicides

Download or read book Ion Beam Modification of Silicon and Metal Silicides written by Babak Mohadjeri and published by . This book was released on 1992 with total page 13 pages. Available in PDF, EPUB and Kindle. Book excerpt: