Download or read book Ion Beam Induced Modifications in Silicide silicon Material Systems written by Moira O'Connor and published by . This book was released on 1993 with total page 112 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Ion Beam Modification of Materials written by J.S. Williams and published by Newnes. This book was released on 2012-12-02 with total page 1157 pages. Available in PDF, EPUB and Kindle. Book excerpt: This conference consisted of 15 oral sessions, including three plenary papers covering areas of general interest, 22 specialist invited papers and 51 contributed presentations as well as three poster sessions. There were several scientific highlights covering a diverse spectrum of materials and ion beam processing methods. These included a wide range of conventional and novel applications such as: optical displays and opto-electronics, motor vehicle and tooling parts, coatings tailored for desired properties, studies of fundamental defect properties, the production of novel (often buried) compounds, and treating biomedical materials. The study of nanocrystals produced by ion implantation in a range of host matrices, particularly for opto-electronics applications, was one especially new and exciting development. Despite several decades of study, major progress was reported at the conference in understanding defect evolution in semiconductors and the role of defects in transient impurity diffusion. The use of implantation to tune or isolate optical devices and in forming optically active centres and waveguides in semiconductors, polymers and oxide ceramics was a major focus of several presentations at the conference. The formation of hard coatings by ion assisted deposition or direct implantation was also an area which showed much recent progress. Ion beam techniques had also developed apace, particularly those based on plasma immersion ion implantation or alternative techniques for large area surface treatment. Finally, the use of ion beams for the direct treatment of cancerous tissue was a particularly novel and interesting application of ion beams.
Download or read book Ion Beam Modification of Silicon and Metal Silicides written by Babak Mohadjeri and published by . This book was released on 1992 with total page 13 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Ion Implantation and Synthesis of Materials written by Michael Nastasi and published by Springer Science & Business Media. This book was released on 2007-05-16 with total page 271 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. Controlled doping at controlled depths is an essential feature of implantation. Ion beam processing can also be used to improve corrosion resistance, to harden surfaces, to reduce wear and, in general, to improve materials properties. This book presents the physics and materials science of ion implantation and ion beam modification of materials. It covers ion-solid interactions used to predict ion ranges, ion straggling and lattice disorder. Also treated are shallow-junction formation and slicing silicon with hydrogen ion beams. Topics important for materials modification, such as ion-beam mixing, stresses, and sputtering, are also described.
Download or read book Surface Modifications of Silicon Induced by Low Energy Reactive Ion Bombardment written by Wayne Harold Chang and published by . This book was released on 1993 with total page 464 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Ion Beam Modification of Solids written by Werner Wesch and published by Springer. This book was released on 2016-07-14 with total page 547 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book presents the method of ion beam modification of solids in realization, theory and applications in a comprehensive way. It provides a review of the physical basics of ion-solid interaction and on ion-beam induced structural modifications of solids. Ion beams are widely used to modify the physical properties of materials. A complete theory of ion stopping in matter and the calculation of the energy loss due to nuclear and electronic interactions are presented including the effect of ion channeling. To explain structural modifications due to high electronic excitations, different concepts are presented with special emphasis on the thermal spike model. Furthermore, general concepts of damage evolution as a function of ion mass, ion fluence, ion flux and temperature are described in detail and their limits and applicability are discussed. The effect of nuclear and electronic energy loss on structural modifications of solids such as damage formation, phase transitions and amorphization is reviewed for insulators and semiconductors. Finally some selected applications of ion beams are given.
Download or read book Ion beam mixing in Metal metal Systems and Metal silicon Systems written by Liang-Sun Hung and published by . This book was released on 1984 with total page 364 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Low Energy Ion Beam Modification of the Titanium Silicide 100 Reaction written by Philip Arthur Scott and published by . This book was released on 1992 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: This research investigated the effects of the ion beam assisted deposition process on the interdiffusion and reaction of Ti thin films deposited on Si (100). The analytical techniques employed for the characterization of these thin films included transmission electron microscopy, scanning electron microscopy, scanning transmission electron microscopy, Auger electron spectroscopy, x-ray energy dispersive spectroscopy, and x-ray diffraction. The ion assisted deposition parameters which were investigated in this study include: ion energy, ion flux, ion to depositing atom ratio, evaporant atom flux, deposition time, average energy of bombardment per depositing atom, and substrate temperature. This research successfully demonstrated that the selection of ion beam assisted deposition process parameters is critical to producing films of a particular structure and chemistry. These films consist of a partially reacted Ti rich overlayer on a Si (100) substrate. For the ion to depositing (neutral) atom ratio: (1) the amount of interdiffusion or mixing increases with increasing ion to neutral ratio (in the absense of efficient point defect sinks) and (2) the reaction between Ti and Si (100) can be stimulated at low temperature by sufficiently high bombardment energy per depositing atom and (3) increasing the time of deposition results in the formation of a crystalline phase within the amorphous Ti silicide phase. For the ion flux: the effect of increasing ion flux during deposition results in increasing vacancy fluxes through the film during growth which consumes more Si. For the ion energies investigated (100, 200, and 400 eV): the reaction between Ti and Si (100) was more significant than evaporated films although the amount of the reaction and interdiffusion was independent of ion energy. For films deposited with a constant average bombardment energy per depositing atom: (1) the average bombardment energy per depositing atom does not characterize the deposition process sufficiently to determine the resultant film structure, and (2) the deposition rate is important for coupling the effects of ion induced defect production to the growth of the amorphous Ti silicide phase (by radiation enhanced diffusion) to thicknesses far in excess of any reported thermal reaction.
Download or read book Swift Heavy Ions for Materials Engineering and Nanostructuring written by Devesh Kumar Avasthi and published by Springer Science & Business Media. This book was released on 2011-05-24 with total page 292 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion beams have been used for decades for characterizing and analyzing materials. Now energetic ion beams are providing ways to modify the materials in unprecedented ways. This book highlights the emergence of high-energy swift heavy ions as a tool for tailoring the properties of materials with nanoscale structures. Swift heavy ions interact with materials by exciting/ionizing electrons without directly moving the atoms. This opens a new horizon towards the 'so-called' soft engineering. The book discusses the ion beam technology emerging from the non-equilibrium conditions and emphasizes the power of controlled irradiation to tailor the properties of various types of materials for specific needs.
Download or read book Ion Beam Modification of Metal silicon Contacts written by Christopher R. Gardner and published by . This book was released on 1984 with total page 316 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Ion Beam Modification of Materials written by International Conference on Ion Beam Modification of Materials and published by . This book was released on 1985 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Pulsed Ion Beam Surface Modification of Materials written by Richard Marc Fastow and published by . This book was released on 1985 with total page 382 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Materials Modification and Synthesis by Ion Beam Volume 438 written by Dale E. Alexander and published by Materials Research Society. This book was released on 1997-03-12 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book offers an international discussion of materials science issues related to ion-beam modification and processing. In addition to work on optical materials, metals, insulators and polymers, two areas of considerable interest are electronic materials and hard coatings. Substantial attention is focused on silicon technology and critical microstructural issues pertaining to ion-beam processing of silicon, such as transient-enhanced diffusion (TED) and defect/damage behavior, are examined. The emergence of plasma ion implantation (PII) as a major breakthrough for shallow-implant, large-area processing togther with the issue of hard coatings is also featured. Considerable discussion centers on the synthesis of novel metastable materials such as carbon nitride, amorphous carbon (DLC), multilayers and nanophases. Topics include: silicon; compound semiconductors, wide bandgap materials, silicides; plasma ion implantation, low-energy deposition techniques; nanocrystalline and other optical materials; polymers; novel applications and techniques; nitride films and hard coatings and oxidation and corrosion behavior.
Download or read book Ion Beam Induced Damage Processes in Silicon written by Richard David Goldberg and published by . This book was released on 1995 with total page 356 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book The Induced Changes of Material Surfaces Due to Ion Beam Bombardment written by Ali Atta Mohamed Ahmed and published by . This book was released on 2011-11 with total page 80 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Proceedings of the Third International Conference on Ion Beam Modification of Materials Grenoble written by International Conference on Ion Beam Modification of Materials and published by . This book was released on 1983 with total page 652 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Molecular Dynamics Studies of the Ion Beam Induced Crystallization in Silicon written by and published by . This book was released on 1995 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
