Download or read book Investigations of Surface Interactions and Deposition Mechanisms in Plasma Enhanced Chemical Vapor Deposition of Silicon based Materials written by Patrick R. McCurdy and published by . This book was released on 1999 with total page 384 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Plasma Deposition of Amorphous Silicon Based Materials written by Pio Capezzuto and published by Elsevier. This book was released on 1995-10-10 with total page 339 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. Focuses on the plasma chemistry of amorphous silicon-based materials Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced Features an international group of contributors Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices
Download or read book Surface Reactions During Plasma Enhanced Chemical Vapor Deposition of Silicon and Silicon Based Dielectrics written by Atul Gupta and published by . This book was released on 2001 with total page 163 pages. Available in PDF, EPUB and Kindle. Book excerpt: Keywords: Plasma deposition, Surface chemistry, Ab-initio calculations, Reaction mechanisms, Kinetics, Amorphous silicon, Silicon dioxide.
Download or read book High Density Plasma Enhanced Chemical Vapor Deposition of Si Based Materials for Solar Cell Applications written by H. P. Zhou and published by . This book was released on 2016 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: High-quality and low-cost fabrication of Si-based materials, in which many fundamental and technology problems still remain, have attracted tremendous interests due to their wide applications in solar cell area. Low-frequency inductively coupled plasma (LFICP) provides a new and competitive solution, thanks to its inherent advantages of high-density plasma, low sheath potential, and low electron temperature, et cetera The plasma characteristic-dependent microstructures, optical and electronic properties of the LFICP CVD-based hydrogenated amorphous/microcrystalline silicon and silicon oxides are systematically studied. Remote-LFICP combing the high-density plasma nature of ICP and mild ion bombardment on growing surface in remote plasma allows the deposition of high-quality Si-based materials providing excellent c-Si surface passivation. The mechanism of surface passivation by LFICP CVD Si-based materials, interaction between plasma species and growing surface are analyzed in terms of the plasma properties. These results pave the way for LFICP CVD utilization in Si-based high-efficiency and low-cost solar cell fabrication.
Download or read book Proceedings of the International Symposium on Thin Film Materials Processes Reliability and Applications Thin Film Processes written by G. S. Mathad and published by The Electrochemical Society. This book was released on 1998 with total page 388 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chemical Vapor Deposition for Microelectronics written by Arthur Sherman and published by William Andrew. This book was released on 1987 with total page 240 pages. Available in PDF, EPUB and Kindle. Book excerpt: Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
Download or read book Energy Research Abstracts written by and published by . This book was released on 1993 with total page 654 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chemical Vapor Deposition written by Srinivasan Sivaram and published by Springer Science & Business Media. This book was released on 2013-11-11 with total page 302 pages. Available in PDF, EPUB and Kindle. Book excerpt: In early 1987 I was attempting to develop a CVD-based tungsten process for Intel. At every step ofthe development, information that we were collecting had to be analyzed in light of theories and hypotheses from books and papers in many unrelated subjects. Thesesources were so widely different that I came to realize there was no unifying treatment of CVD and its subprocesses. More interestingly, my colleagues in the industry were from many disciplines (a surface chemist, a mechanical engineer, a geologist, and an electrical engineer werein my group). To help us understand the field of CVD and its players, some of us organized the CVD user's group of Northern California in 1988. The idea for writing a book on the subject occurred to me during that time. I had already organized my thoughts for a course I taught at San Jose State University. Later Van Nostrand agreed to publish my book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition. On the other hand, it does present the principles of CVD at a fundamental level while uniting them with the needs of the microelectronics industry.
Download or read book Dissertation Abstracts International written by and published by . This book was released on 2006 with total page 884 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Plasma Enhanced Chemical Vapor Deposition of Silicon Based Thin Film Materials written by Ashfaqul Islam Chowdhury and published by . This book was released on 1999 with total page 374 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book ERDA Energy Research Abstracts written by and published by . This book was released on 1983 with total page 1048 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chemical Vapor Deposition written by Electrochemical Society. High Temperature Materials Division and published by The Electrochemical Society. This book was released on 1997 with total page 1686 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chemical Physics of Thin Film Deposition Processes for Micro and Nano Technologies written by Y. Pauleau and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 372 pages. Available in PDF, EPUB and Kindle. Book excerpt: An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.
Download or read book Chemical Vapor Deposition written by Jong-Hee Park and published by ASM International. This book was released on 2001 with total page 477 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Fundamental Gas phase and Surface Chemistry of Vapor phase Deposition II and Process Control Diagnostics and Modeling in Semiconductor Manufacturing IV written by Electrochemical Society. High Temperature Materials Division and published by The Electrochemical Society. This book was released on 2001 with total page 526 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Solar Energy Update written by and published by . This book was released on 1983-11 with total page 196 pages. Available in PDF, EPUB and Kindle. Book excerpt:
