Download or read book Computational Lithography written by Xu Ma and published by John Wiley & Sons. This book was released on 2011-01-06 with total page 225 pages. Available in PDF, EPUB and Kindle. Book excerpt: A Unified Summary of the Models and Optimization Methods Used in Computational Lithography Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting mask (PSM), and off-axis illumination (OAI) RET tools that use model-based mathematical optimization approaches. The book starts with an introduction to optical lithography systems, electric magnetic field principles, and the fundamentals of optimization from a mathematical point of view. It goes on to describe in detail different types of optimization algorithms to implement RETs. Most of the algorithms developed are based on the application of the OPC, PSM, and OAI approaches and their combinations. Algorithms for coherent illumination as well as partially coherent illumination systems are described, and numerous simulations are offered to illustrate the effectiveness of the algorithms. In addition, mathematical derivations of all optimization frameworks are presented. The accompanying MATLAB® software files for all the RET methods described in the book make it easy for readers to run and investigate the codes in order to understand and apply the optimization algorithms, as well as to design a set of optimal lithography masks. The codes may also be used by readers for their research and development activities in their academic or industrial organizations. An accompanying MATLAB® software guide is also included. An accompanying MATLAB® software guide is included, and readers can download the software to use with the guide at ftp://ftp.wiley.com/public/sci_tech_med/computational_lithography. Tailored for both entry-level and experienced readers, Computational Lithography is meant for faculty, graduate students, and researchers, as well as scientists and engineers in industrial organizations whose research or career field is semiconductor IC fabrication, optical lithography, and RETs. Computational lithography draws from the rich theory of inverse problems, optics, optimization, and computational imaging; as such, the book is also directed to researchers and practitioners in these fields.
Download or read book Istc cstic 2009 cistc written by David Huang and published by The Electrochemical Society. This book was released on 2009-03 with total page 1124 pages. Available in PDF, EPUB and Kindle. Book excerpt: ISTC/CSTIC is an annual semiconductor technology conference covering all the aspects of semiconductor technology and manufacturing, including devices, design, lithography, integration, materials, processes, manufacturing as well as emerging semiconductor technologies and silicon material applications. ISTC/CSTIC 2009 was merged by ISTC (International Semiconductor Technology Conference) and CSTIC (China Semiconductor Technology International Conference), the two industry leading technical conferences in China, and consisted of one plenary session and nine technical symposia. This issue of ECS Transactions contains 159 papers from the conference.
Download or read book Fundamental Principles of Optical Lithography written by Chris Mack and published by John Wiley & Sons. This book was released on 2011-08-10 with total page 503 pages. Available in PDF, EPUB and Kindle. Book excerpt: The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
Download or read book Journal of Micro nanolithography MEMS and MOEMS written by and published by . This book was released on 2008 with total page 688 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Nanofabrication written by Zheng Cui and published by Springer Science & Business Media. This book was released on 2009-01-01 with total page 350 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides the reader with the most up-to-date information and development in the Nanofabrication area. It presents a one-stop description at the introduction level on most of the technologies that have been developed which are capable of making structures below 100nm. Principles of each technology are introduced and illustrated with minimum mathematics involved. The book serves as a practical guide and first hand reference for those working in nanostructure fabrication.
Download or read book Nanolithography written by M. Gentili and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 214 pages. Available in PDF, EPUB and Kindle. Book excerpt: Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).
Download or read book Encyclopedia of Nanotechnology written by Bharat Bhushan and published by Springer. This book was released on 2013-04-29 with total page 2868 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Encyclopedia of Nanotechnology provides a comprehensive and multi-disciplinary reference to the many fields relevant to the general field of nanotechnology. It aims to be a comprehensive and genuinely international reference work and will be aimed at graduate students, researchers, and practitioners. The Encyclopedia of Nanotechnology introduces a large number of terms, devices and processes which are related to the multi-disciplinary field of Nanotechnology. For each entry in this 4 volume set a 4-10 page description is provided by an expert in the field. Contributions are made by experts from the US, Europe and Asia, making this a comprehensive and truly international Reference Work. The authors are typically from academia, however one quarter of all entries were written by persons from industry. Topics covered in the Reference Work include: - Nano- Microfabrication Processes and Materials for Fabrication - Nanoscale Measurement Techniques - Nanostructures - Nanomaterials - Nanomechanics - Molecular Modeling and Its Role in Advancing Nanotechnology - MEMS/NEMS - Microfluidics and Nanofluidics - Biomedical Engineering and Biodevices - Bio/Nanotechnology and Nanomedicine - Bio/Nanotechnology for cellular engineering - Drug Delivery – Technology and Applications - Assembly - Organic Electronics - Nano-optical Devices - Micro/nano Integration - Materials, Coatings and Surface Treatments for Nanotribology - Micro/NanoReliability – thermal, mechanical etc. - Biomimetics
Download or read book Fourier Ptychographic Imaging written by Guoan Zheng and published by Morgan & Claypool Publishers. This book was released on 2016-06-30 with total page 94 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book demonstrates the concept of Fourier ptychography, a new imaging technique that bypasses the resolution limit of the employed optics. In particular, it transforms the general challenge of high-throughput, high-resolution imaging from one that is coupled to the physical limitations of the optics to one that is solvable through computation. Demonstrated in a tutorial form and providing many MATLAB® simulation examples for the reader, it also discusses the experimental implementation and recent developments of Fourier ptychography. This book will be of interest to researchers and engineers learning simulation techniques for Fourier optics and the Fourier ptychography concept.
Download or read book Journal of the Optical Society of America written by and published by . This book was released on 2001 with total page 542 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Resolution Enhancement Techniques in Optical Lithography written by Alfred Kwok-Kit Wong and published by SPIE Press. This book was released on 2001 with total page 238 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers
Download or read book Plasmonics Fundamentals and Applications written by Stefan Alexander Maier and published by Springer Science & Business Media. This book was released on 2007-05-16 with total page 234 pages. Available in PDF, EPUB and Kindle. Book excerpt: Considered a major field of photonics, plasmonics offers the potential to confine and guide light below the diffraction limit and promises a new generation of highly miniaturized photonic devices. This book combines a comprehensive introduction with an extensive overview of the current state of the art. Coverage includes plasmon waveguides, cavities for field-enhancement, nonlinear processes and the emerging field of active plasmonics studying interactions of surface plasmons with active media.
Download or read book Nanofabrication written by José María de Teresa and published by . This book was released on 2020 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: A comprehensive edited volume on important and up-to-date nanolithography techniques and applications. The book includes an introduction on the importance of nanolithography in today's research and technology, providing examples of its applications. The remainder of the book is split into two sections. The first section contains the most important and established nanolithography techniques. As well as a detailed description of each technique, the reader can obtain useful information about the main advantages and drawbacks of each technique in terms of resolution, throughput, number of steps needed, cost, etc. At the end of this section, the reader will be able to decide which technique to use for different applications. The second section explores more specific applications of the nanolithography techniques previously described; as well as new techniques and applications. In some cases, the processes described in these chapters involve a combination of several nanolithography techniques. This section is less general but provides the reader with real examples.
Download or read book Optical Imaging in Projection Microlithography written by Alfred Kwok-Kit Wong and published by SPIE Press. This book was released on 2005 with total page 280 pages. Available in PDF, EPUB and Kindle. Book excerpt: Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system-level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists.
Download or read book Bits on Chips written by Harry Veendrick and published by Springer. This book was released on 2018-06-21 with total page 287 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides readers with a broad overview of integrated circuits, also generally referred to as micro-electronics. The presentation is designed to be accessible to readers with limited, technical knowledge and coverage includes key aspects of integrated circuit design, implementation, fabrication and application. The author complements his discussion with a large number of diagrams and photographs, in order to reinforce the explanations. The book is divided into two parts, the first of which is specifically developed for people with almost no or little technical knowledge. It presents an overview of the electronic evolution and discusses the similarity between a chip floor plan and a city plan, using metaphors to help explain concepts. It includes a summary of the chip development cycle, some basic definitions and a variety of applications that use integrated circuits. The second part digs deeper into the details and is perfectly suited for professionals working in one of the semiconductor disciplines who want to broaden their semiconductor horizon.
Download or read book Nanofabrication written by Ampere A. Tseng and published by World Scientific. This book was released on 2008 with total page 583 pages. Available in PDF, EPUB and Kindle. Book excerpt: Many of the devices and systems used in modern industry are becoming progressively smaller and have reached the nanoscale domain. Nanofabrication aims at building nanoscale structures, which can act as components, devices, or systems, in large quantities at potentially low cost. Nanofabrication is vital to all nanotechnology fields, especially for the realization of nanotechnology that involves the traditional areas across engineering and science. This is the first book solely dedicated to the manufacturing technology in nanoscale structures, devices, and systems and is designed to satisfy the growing demands of researchers, professionals, and graduate students. Both conventional and non-conventional fabrication technologies are introduced with emphasis on multidisciplinary principles, methodologies, and practical applications. While conventional technologies consider the emerging techniques developed for next generation lithography, non-conventional techniques include scanning probe microscopy lithography, self-assembly, and imprint lithography, as well as techniques specifically developed for making carbon tubes and molecular circuits and devices. Sample Chapter(s). Chapter 1: Atom, Molecule, and Nanocluster Manipulations for Nanostructure Fabrication Using Scanning Probe Microscopy (3,320 KB). Contents: Atomic Force Microscope Lithography (N Kawasegi et al.); Nanowire Assembly and Integration (Z Gu & D H Gracias); Extreme Ultraviolet Lithography (H Kinoshita); Electron Projection Lithography (T Miura et al.); Electron Beam Direct Writing (K Yamazaki); Electron Beam Induced Deposition (K Mitsuishi); Focused Ion Beams and Interaction with Solids (T Ishitani et al.); Nanofabrication of Nanoelectromechanical Systems (NEMS): Emerging Techniques (K L Ekinci & J Brugger); and other papers. Readership: Researchers, professionals, and graduate students in the fields of nanoengineering and nanoscience.
Download or read book Atomic Layer Deposition for Semiconductors written by Cheol Seong Hwang and published by Springer Science & Business Media. This book was released on 2013-10-18 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt: Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Download or read book Surface Enhanced Vibrational Spectroscopy written by Ricardo Aroca and published by John Wiley & Sons. This book was released on 2006-05-01 with total page 260 pages. Available in PDF, EPUB and Kindle. Book excerpt: Surface Enhanced Vibrational Spectroscopy (SEVS) has reached maturity as an analytical technique, but until now there has been no single work that describes the theory and experiments of SEVS. This book combines the two important techniques of surface-enhanced Raman scattering (SERS) and surface-enhanced infrared (SEIR) into one text that serves as the definitive resource on SEVS. Discusses both the theory and the applications of SEVS and provides an up-to-date study of the state of the art Offers interpretations of SEVS spectra for practicing analysts Discusses interpretation of SEVS spectra, which can often be very different to the non-enhanced spectrum - aids the practicing analyst
