Download or read book Integrated Circuit Metrology Inspection and Process Control V written by William H. Arnold and published by SPIE-International Society for Optical Engineering. This book was released on 1991 with total page 648 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Integrated Circuit Metrology Inspection and Process Control written by and published by . This book was released on 1994 with total page 576 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Integrated Circuit Metrology Inspection and Process Control written by Kevin M. Monahan and published by . This book was released on 1987 with total page 340 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Integrated Circuit Metrology Inspection and Process Control III written by Kevin M. Monahan and published by . This book was released on 1989 with total page 556 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Integrated Circuit Metrology Inspection and Process Control VI written by Michael T. Postek and published by SPIE-International Society for Optical Engineering. This book was released on 1992 with total page 716 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Integrated Circuit Metrology Inspection and Process Control II written by Kevin M. Monahan and published by . This book was released on 1988 with total page 476 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Handbook of Silicon Semiconductor Metrology written by Alain C. Diebold and published by CRC Press. This book was released on 2001-06-29 with total page 703 pages. Available in PDF, EPUB and Kindle. Book excerpt: Containing more than 300 equations and nearly 500 drawings, photographs, and micrographs, this reference surveys key areas such as optical measurements and in-line calibration methods. It describes cleanroom-based measurement technology used during the manufacture of silicon integrated circuits and covers model-based, critical dimension, overlay

Download or read book National Semiconductor Metrology Program written by National Semiconductor Metrology Program (U.S.) and published by . This book was released on 1998 with total page 136 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book National Semiconductor Metrology Program written by National Institute of Standards and Technology (U.S.) and published by . This book was released on 2000 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book National Semiconductor Metrology Program NIST List OF Publications LP 103 May 2000 written by and published by . This book was released on 2000 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Proceedings of the Electrochemical Society Symposium on Diagnostic Techniques for Semiconductor Materials and Devices written by P. Rai-Choudhury and published by The Electrochemical Society. This book was released on 1997 with total page 496 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book National Semiconductor Metrology Program Semiconductor Electronics Division NIST List Of Publications LP 103 March 1999 written by and published by . This book was released on 1999 with total page 148 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Confocal Scanning Optical Microscopy and Related Imaging Systems written by Gordon S. Kino and published by Academic Press. This book was released on 1996-09-18 with total page 353 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a comprehensive introduction to the field of scanning optical microscopy for scientists and engineers. The book concentrates mainly on two instruments: the Confocal Scanning Optical Microscope (CSOM), and the Optical Interference Microscope (OIM). A comprehensive discussion of the theory and design of the Near-Field Scanning Optical Microscope (NSOM) is also given. The text discusses the practical aspects of building a confocal scanning optical microscope or optical interference microscope, and the applications of these microscopes to phase imaging, biological imaging, and semiconductor inspection and metrology.A comprehensive theoretical discussion of the depth and transverse resolution is given with emphasis placed on the practical results of the theoretical calculations and how these can be used to help understand the operation of these microscopes. - Provides a comprehensive introduction to the field of scanning optical microscopy for scientists and engineers - Explains many practical applications of scanning optical and interference microscopy in such diverse fields as biology and semiconductor metrology - Discusses in theoretical terms the origin of the improved depth and transverse resolution of scanning optical and interference microscopes with emphasis on the practical results of the theoretical calculations - Considers the practical aspects of building a confocal scanning or interference microscope and explores some of the design tradeoffs made for microscopes used in various applications - Discusses the theory and design of near-field optical microscopes - Explains phase imaging in the scanning optical and interference microscopes

Download or read book Semiconductor Measurement Technology written by National Institute of Standards and Technology (U.S.) and published by . This book was released on with total page 72 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Handbook of VLSI Microlithography written by John N. Helbert and published by William Andrew. This book was released on 2001-04-01 with total page 1025 pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production.Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.

Download or read book Pattern Recognition and Machine Intelligence written by Sanghamitra Bandyopadhyay and published by Springer Science & Business Media. This book was released on 2005-12-09 with total page 831 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book constitutes the refereed proceedings of the First International Conference on Pattern Recognition and Machine Intelligence, PReMI 2005, held in Kolkata, India in December 2005. The 108 revised papers presented together with 6 keynote talks and 14 invited papers were carefully reviewed and selected from 250 submissions. The papers are organized in topical sections on clustering, feature selection and learning, classification, neural networks and applications, fuzzy logic and applications, optimization and representation, image processing and analysis, video processing and computer vision, image retrieval and data mining, bioinformatics application, Web intelligence and genetic algorithms, as well as rough sets, case-based reasoning and knowledge discovery.

Download or read book Progress in Optics written by Emil Wolf and published by Elsevier. This book was released on 2012-09-05 with total page 378 pages. Available in PDF, EPUB and Kindle. Book excerpt: In the 50 years since the first volume of Progress in Optics was published, optics has become one of the most dynamic fields of science. The volumes in this series that have appeared up to now contain more than 300 review articles by distinguished research workers, which have become permanent records for many important developments, helping optical scientists and optical engineers stay abreast of their fields. Comprehensive, in-depth reviews Edited by the leading authority in the field