Download or read book Current Catalog written by National Library of Medicine (U.S.) and published by . This book was released on 1979 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: First multi-year cumulation covers six years: 1965-70.
Download or read book NBS Technical Note written by and published by . This book was released on 1959 with total page 904 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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Download or read book Solid Waste Management Available Information Materials written by United States. Environmental Protection Agency and published by . This book was released on 1976 with total page 116 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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Download or read book U S Environmental Protection Agency Library System Book Catalog written by United States. Environmental Protection Agency. Library Systems Branch and published by . This book was released on 1975 with total page 490 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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Download or read book Handbook for Cleaning for Semiconductor Manufacturing written by Karen A. Reinhardt and published by John Wiley & Sons. This book was released on 2011-04-12 with total page 596 pages. Available in PDF, EPUB and Kindle. Book excerpt: Provides an In-depth discussion of surface conditioning for semiconductor applications The Handbook of Cleaning for Semiconductor Manufacturing: Fundamentals and Applications provides an in-depth discussion of surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet processing is reviewed as well as surface and colloidal aspects of cleaning and etching. Topics covered in this new reference include: Front end line (FEOL) and back end of line (BEOL) cleaning applications such as high-k/metal gate post-etch cleaning and pore sealing, high-dose implant stripping and cleaning, and germanium, and silicon passivation Formulation development practices, methodology and a new directions are presented including chemicals used for preventing corrosion of copper lines, cleaning aluminium lines, reclaiming wafers, and water bonding, as well as the filtering and recirculating of chemicals including reuse and recycling Wetting, cleaning, and drying of features, such as high aspect ratio features and hydrophilic surface states, especially how to dry without watermarks, the abilities to wet hydrophobic surfaces and to remove liquid from deep features The chemical reactions and mechanisms of silicon dioxide etching with hydrofluoric acid, particle removal with ammonium hydroxide/hydrogen peroxide mixture, and metal removal with hydrochloric acid The Handbook of Cleaning for Semiconductor Manufacturing: Fundamentals and Applications is a valuable resource for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing. Engineers working for semiconductor manufacturing, capital equipment, chemicals, or other industries that assures cleanliness of chemicals, material, and equipment in the manufacturing area will also find this handbook an indispensible reference.
Download or read book REALISM assessment of Career Education in the Environmental Sciences written by Institute of Environmental Sciences and published by . This book was released on 1973 with total page 120 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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