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Book Gallium arsenide Metalorganic Chemical Vapor Deposition with Alkyl Arsenic Sources

Download or read book Gallium arsenide Metalorganic Chemical Vapor Deposition with Alkyl Arsenic Sources written by Dietrich W. Vook and published by . This book was released on 1989 with total page 212 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Epitaxial Growth and Doping of Indium Gallium Arsenide and Gallium Arsenide with Carbon Tetrachloride and Silane Using Metalorganic Chemical Vapor Deposition

Download or read book Epitaxial Growth and Doping of Indium Gallium Arsenide and Gallium Arsenide with Carbon Tetrachloride and Silane Using Metalorganic Chemical Vapor Deposition written by Brian T. Hemmelman and published by . This book was released on 1996 with total page 310 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Scientific and Technical Aerospace Reports

Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Advanced III V Compound Semiconductor Growth  Processing and Devices  Volume 240

Download or read book Advanced III V Compound Semiconductor Growth Processing and Devices Volume 240 written by S. J. Pearton and published by Mrs Proceedings. This book was released on 1992-04-10 with total page 944 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Book CVD XV

    Book Details:
  • Author : Mark Donald Allendorf
  • Publisher : The Electrochemical Society
  • Release : 2000
  • ISBN : 9781566772785
  • Pages : 826 pages

Download or read book CVD XV written by Mark Donald Allendorf and published by The Electrochemical Society. This book was released on 2000 with total page 826 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book A Characterization of the Chemical Vapor Deposition of Gallium Arsenide and Indium Phosphide in the Hydride and Chloride Systems

Download or read book A Characterization of the Chemical Vapor Deposition of Gallium Arsenide and Indium Phosphide in the Hydride and Chloride Systems written by Douglas John Meyer and published by . This book was released on 1984 with total page 410 pages. Available in PDF, EPUB and Kindle. Book excerpt: The fundamental chemistry surrounding the chemical vapor deposition of GaAs and InP in the hydride and chloride processes was investigated. Chemical equilibrium calculations showed that ICl, V4 and V2 were the dominant group III and V species in the vapor phase. These calculations also demonstrated that vapor phase silicon species, formed by the interaction of H2 and HCl with the reactor wall, may be present at compositions up to 1 ppm under typical operation conditions. It was shown that the formation of vapor phase silicon species can be suppressed by the addition of small amounts of H20 or by replacing the H2 carrier gas with an inert. The unintentional incorporation of silicon into III-V epitaxial layers may be decreased by reducing the amount of silicon species in the vapor phase or by shifting these silicon species from hydrogen rich to chlorine rich species through the addition of HCl or VCl3. The use of solid and liquid group III sources in the chloride process was compared. In the GaAs system, the liquid source yielded a much greater degree of supersaturation than did the solid source. This difference was much less pronounced for the InP system. The equilibrium chemistry of the hydride process was found to behave similarly to that of the chloride process. The degree of supersaturation present in the hydride process was found to be lower than that in the chloride process. The thermal decompositions of NH3, PH3, and Ash3 were studied in a constant volume reactor using a mass spectrometer. Keywords: III - V semiconductors.

Book Crystalline Growth of Gallium Arsenide by Chemical Vapor Deposition Using the Compound Monochlorodiethylgallium triethylarsine

Download or read book Crystalline Growth of Gallium Arsenide by Chemical Vapor Deposition Using the Compound Monochlorodiethylgallium triethylarsine written by A. Zaouk and published by . This book was released on 1979 with total page 14 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Epitaxial Growth and Characterization of Indium Phosphide and Gallium Indium Arsenide by Metalorganic Chemical Vapor Deposition

Download or read book Epitaxial Growth and Characterization of Indium Phosphide and Gallium Indium Arsenide by Metalorganic Chemical Vapor Deposition written by Kam Tai Chan and published by . This book was released on 1986 with total page 450 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Electrical   Electronics Abstracts

Download or read book Electrical Electronics Abstracts written by and published by . This book was released on 1997 with total page 2304 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Handbook of Thin Films

Download or read book Handbook of Thin Films written by Hari Singh Nalwa and published by Elsevier. This book was released on 2001-11-17 with total page 3436 pages. Available in PDF, EPUB and Kindle. Book excerpt: This five-volume handbook focuses on processing techniques, characterization methods, and physical properties of thin films (thin layers of insulating, conducting, or semiconductor material). The editor has composed five separate, thematic volumes on thin films of metals, semimetals, glasses, ceramics, alloys, organics, diamonds, graphites, porous materials, noncrystalline solids, supramolecules, polymers, copolymers, biopolymers, composites, blends, activated carbons, intermetallics, chalcogenides, dyes, pigments, nanostructured materials, biomaterials, inorganic/polymer composites, organoceramics, metallocenes, disordered systems, liquid crystals, quasicrystals, and layered structures.Thin films is a field of the utmost importance in today's materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices.Advanced, high-performance computers, high-definition TV, digital camcorders, sensitive broadband imaging systems, flat-panel displays, robotic systems, and medical electronics and diagnostics are but a few examples of miniaturized device technologies that depend the utilization of thin film materials. The Handbook of Thin Films Materials is a comprehensive reference focusing on processing techniques, characterization methods, and physical properties of these thin film materials.

Book Residual Impurity Incorporation in the Growth of High Purity Gallium Arsenide by Metalorganic Chemical Vapor Deposition

Download or read book Residual Impurity Incorporation in the Growth of High Purity Gallium Arsenide by Metalorganic Chemical Vapor Deposition written by Andrew Dean Reed and published by . This book was released on 1988 with total page 210 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Identification of Defects in Semiconductors

Download or read book Identification of Defects in Semiconductors written by and published by Academic Press. This book was released on 1998-10-27 with total page 449 pages. Available in PDF, EPUB and Kindle. Book excerpt: GENERAL DESCRIPTION OF THE SERIESSince its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The "Willardson and Beer" Series, as it is widely known, has succeeded in publishing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, and others promise indeed that this tradition will be maintained and even expanded.Reflecting the truly interdisciplinary nature of the field that the series covers, the volumes in Semiconductors and Semimetals have been and will continue to be of great interest to physicists, chemists, materials scientists, and device engineers in modern industry. GENERAL DESCRIPTION OF THE VOLUMEThis volume has contributions on Advanced Characterization Techniques with a focus on defect identification. The combination of beam techniques with electrical and optical characterization has not been discussed elsewhere.