Download or read book In Situ Investigation of Temperature and Bias Dependent Effects on the Oxide Growth of Si and Ge in an ECR Plasma written by and published by . This book was released on 1993 with total page 21 pages. Available in PDF, EPUB and Kindle. Book excerpt: The electron cyclotron resonance, ECR, plasma oxidation of Si and Ge was investigated using in-situ spectroscopic ellipsometry at substrate temperatures of 80 to 400 deg C and at bias voltages of -30 to +60 V.A study of the oxide growth kinetics by ECR plasma oxidation results in three distinct regions of growth with the first two being linear and the last parabolic. At the earliest linear stage the rate of oxide growth is the fastest, and corresponds to around 3 nm film thickness which is not dependent on bias. Following this, the second linear region displays an oxide growth rate proportional to the bias with typical growth rates, of 0.10, 0.32 and 0.60 nm/min for 0, +30 and +60V, respectively, at 300 deg C. The third region displays parabolic kinetics and corresponds to the Cabrera-Mott, C-M, theory for the oxidation by charged species in the limit of a low electric field. Activation energies of 0.19 and 0. 28 eV are obtained using the C-M model for the ECR plasma oxidation of Si and Ge, respectively ... Oxide growth, Plasma.

Download or read book IBM Journal of Research and Development written by and published by . This book was released on 1999 with total page 958 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Novel Control Diagnostics for Plasma Processing written by Helen Louise Maynard and published by . This book was released on 1993 with total page 380 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Government Reports Annual Index written by and published by . This book was released on 1994 with total page 1828 pages. Available in PDF, EPUB and Kindle. Book excerpt: Sections 1-2. Keyword Index.--Section 3. Personal author index.--Section 4. Corporate author index.-- Section 5. Contract/grant number index, NTIS order/report number index 1-E.--Section 6. NTIS order/report number index F-Z.

Download or read book Physics Briefs written by and published by . This book was released on 1994 with total page 1162 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book China written by World Bank and published by World Bank Publications. This book was released on 1993 with total page 1422 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Republic of Korea's industrial policy has directed that nation's economy through nearly three decades of spectacular growth. But the authors of this paper maintain that this policy is showing signs of being outmoded. The time has come, the authors argue, for the Korean government to stop managing the economy's structural development and to redefine the responsibilities of business and government. Under this proposed compact, the allocation of resources would shift from the government to the private industrial and financial sectors. The transformation of the government bureaucracy from an ad hoc policy role to one of a transparent and predictable regulator is a key to the success of this undertaking. These new directions would present the government with enormous challenges. Greater competitive discipline and regulatory oversight would be required. While dealing with the complexities of the transition, the government would have to maintain macroeconomic stability and the momentum of savings and investment. For comparison, the study examines the industrial economies of France, Germany, Japan, and the United States, which underwent similar shifts.

Download or read book Ceramic Abstracts written by American Ceramic Society and published by . This book was released on 1995 with total page 1150 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Government Reports Announcements Index written by and published by . This book was released on 1993 with total page 1030 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Argon germane in Situ Plasma Clean for Reduced Temperature Ge on Si Epitaxy by High Density Plasma Chemical Vapor Deposition written by and published by . This book was released on 2015 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: We found that the demand for integration of near infrared optoelectronic functionality with silicon complementary metal oxide semiconductor (CMOS) technology has for many years motivated the investigation of low temperature germanium on silicon deposition processes. Our work describes the development of a high density plasma chemical vapor deposition process that uses a low temperature (

Download or read book Electrical Electronics Abstracts written by and published by . This book was released on 1997 with total page 1860 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Argon u2013 germane in Situ Plasma Clean for Reduced Temperature Ge on Si Epitaxy by High Density Plasma Chemical Vapor Deposition written by and published by . This book was released on 2015 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: We found that the demand for integration of near infrared optoelectronic functionality with silicon complementary metal oxide semiconductor (CMOS) technology has for many years motivated the investigation of low temperature germanium on silicon deposition processes. Our work describes the development of a high density plasma chemical vapor deposition process that uses a low temperature (460 °C) in situ germane/argon plasma surface preparation step for epitaxial growth of germanium on silicon. It is shown that the germane/argon plasma treatment sufficiently removes SiOsubx

Download or read book ECR Plasma Analysis written by Marsela Pontoh and published by . This book was released on 2002 with total page 108 pages. Available in PDF, EPUB and Kindle. Book excerpt: ECR plasma has been used to deposit silicon, silicon germanium, silicon carbides, oxides and nitrides films. In this research, we study the correlation between amorphous silicon growth rate and plasma properties. Optical Emission Spectroscopy (OES), Mass Spectroscopy (MS) and Langmuir Probe are used to perform plasma analysis. We investigate the effect of microwave power, pressure, substrate bias and H2/He dilution on plasma composition. UV/VIS/NIR photospectroscopy is used to measure film thickness and to calculate film growth rate. We find a good correlation between amorphous silicon growth rate and SiH emission intensity.

Download or read book International Aerospace Abstracts written by and published by . This book was released on 1998 with total page 920 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Metals Abstracts Index written by and published by . This book was released on 1996 with total page 1622 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Science Abstracts written by and published by . This book was released on 1993 with total page 948 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Metals Abstracts written by and published by . This book was released on 1996 with total page 1628 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Atomic Layer Deposition for Semiconductors written by Cheol Seong Hwang and published by Springer Science & Business Media. This book was released on 2013-10-18 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt: Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.