Download or read book High rate Deposition of Hydrogenated Amorphous Silicon by the VHF GD Method written by and published by . This book was released on with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book High rate growth of hydrogenated amorphous and microcrystalline silicon for thin film silicon solar cells using dynamic very high frequency plasma enhanced chemical vapor deposition written by Thomas Zimmermann and published by Forschungszentrum Jülich. This book was released on 2013 with total page 143 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Thin Film Silicon Solar Cells written by Arvind Victor Shah and published by CRC Press. This book was released on 2010-08-19 with total page 438 pages. Available in PDF, EPUB and Kindle. Book excerpt: Photovoltaic technology has now developed to the extent that it is close to fulfilling the vision of a "solar-energy world," as devices based on this technology are becoming efficient, low-cost and durable. This book provides a comprehensive treatment of thin-film silicon, a prevalent PV material, in terms of its semiconductor nature, startin
Download or read book Growth and Characterization of Hydrogenated Amorphous Silicon Prepared Using a Combined Hot Wire and Electron Cyclotron Resonance Plasma Deposition Technique written by Matthew Alan Ring and published by . This book was released on 2003 with total page 94 pages. Available in PDF, EPUB and Kindle. Book excerpt: Hot Wire Chemical Vapor Deposition (HWCVD) is an emerging technology in semiconductor materials thin film deposition due to the high growth rates and reasonable electronic properties attainable using this method. To improve the electronic characteristics of material grown by the HWCVD method, neutral ion bombardment during growth was introduced as it is shown to be beneficial in Plasma Enhanced Chemical Vapor Deposition (PECVD). Neutral ion bombardment was accomplished by using remote Electron Cyclotron Resonance (ECR) plasma and the entire deposition technique is termed ECR-HWCVD. The ECR-HWCVD films were compared to HWCVD materials deposited without ion bombardment grown at similar conditions in the same reactor using a 10.5 cm filament to substrate distance to minimize substrate heating by radiation during deposition. The growth rate is halved when ion bombardment is added to HWCVD, however it remains four times greater than the highest quality ECR-PECVD films. Also, ECR-HWCVD material exhibited better electronic properties as shown by Urbach energy, photosensitivity, hydrogen content, microstructure parameters, and space charge limited current defect measurements. In addition, the effect of substrate temperature on hydrogen content and material microstructure was investigated. Both hydrogen content and the microstructure parameter R decreased as substrate temperature increased; and when ion bombardment was added to the deposition conditions, the microstructure parameter decreased regardless of substrate temperature.
Download or read book Amorphous Silicon Semiconductors pure and Hydrogenated written by and published by . This book was released on 1987 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Thin film transistors 1 Amorphous silicon thin film transistors written by Yue Kuo and published by Springer Science & Business Media. This book was released on 2004 with total page 538 pages. Available in PDF, EPUB and Kindle. Book excerpt: This is the first reference on amorphous silicon and polycrystalline silicon thin film transistors that gives a systematic global review of all major topics in the field. These volumes include sections on basic materials and substrates properties, fundamental device physics, critical fabrication processes (structures, a-Si: H, dielectric, metallization, catalytic CVD), and existing and new applications. The chapters are written by leading researchers who have extensive experience with reputed track records. Thin Film Transistors provides practical information on preparing individual functional a-Si: H TFTs and poly-Si TFTs as well as large-area TFT arrays. Also covered are basic theories on the a-Si: H TFT operations and unique material characteristics. Readers are also exposed to a wide range of existing and new applications in industries.
Download or read book Clean Electricity From Photovoltaics 2nd Edition written by Mary D Archer and published by World Scientific. This book was released on 2014-10-17 with total page 706 pages. Available in PDF, EPUB and Kindle. Book excerpt: The second edition of Clean Electricity from Photovoltaics, first published in 2001, provides an updated account of the underlying science, technology and market prospects for photovoltaics. All areas have advanced considerably in the decade since the first edition was published, which include: multi-crystalline silicon cell efficiencies having made impressive advances, thin-film CdTe cells having established a decisive market presence, and organic photovoltaics holding out the prospect of economical large-scale power production.
Download or read book Deposition of Hydrogenated Amorphous Silicon with the Hot Wire Technique written by Edith C. Molenbroek and published by . This book was released on 1995 with total page 320 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book The Conference Record of the Nineteenth IEEE Photovoltaic Specialists Conference 1987 written by and published by . This book was released on 1987 with total page 1626 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book The Physics of Hydrogenated Amorphous Silicon I written by J.D. Joannopoulos and published by Springer. This book was released on 1984 with total page 312 pages. Available in PDF, EPUB and Kindle. Book excerpt: With contributions by numerous experts
Download or read book Deposition Techniques of Hydrogenated Amorphous Silicon Using Modulated Radio frequency Plasmas written by Adriana Catharina Wilhelmina Biebericher and published by . This book was released on 2002 with total page 128 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Deposition of Device Quality Low Hydrogen Content Hydrogenated Amorphous Silicon at High Deposition Rates with Increased Stability Using the Hot Wire Filament Technique written by and published by . This book was released on 2000 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: A method or producing hydrogenated amorphous silicon on a substrate, comprising the steps of: positioning the substrate in a deposition chamber at a distance of about 0.5 to 3.0 cm from a heatable filament in the deposition chamber; maintaining a pressure in said deposition chamber in the range of about 10 to 100 millitorr and pressure times substrate-filament spacing in the range of about 10 to 100 millitorr-cm, heating the filament to a temperature in the range of about 1,500 to 2,000.degree. C., and heating the substrate to a surface temperature in the range of about 280 to 475.degree. C.; and flowing silicohydride gas into the deposition chamber with said heated filament, decomposing said silicohydride gas into silicon and hydrogen atomic species and allowing products of gas reactions between said atomic species and the silicohydride gas to migrate to and deposit on said substrate while adjusting and maintaining said pressure times substrate-filament spacing in said deposition chamber at a value in said 10 to 100 millitorr range to produce statistically about 3 to 50 atomic collisions between the silicon and hydrogen atomic species migrating to said substrate and undecomposed molecules of the silane or other silicohydride gas in the deposition chamber.
Download or read book Silicon Based Thin Film Solar Cells written by Roberto Murri and published by Bentham Science Publishers. This book was released on 2013-03-20 with total page 524 pages. Available in PDF, EPUB and Kindle. Book excerpt: Silicon Based Thin Film Solar Cells explains concepts related to technologies for silicon (Si) based photovoltaic applications. Topics in this book focus on ‘new concept’ solar cells. These kinds of cells can make photovoltaic power production an economically viable option in comparison to the bulk crystalline semiconductor technology industry. A transition from bulk crystalline Si solar cells toward thin-film technologies reduces usage of active material and introduces new concepts based on nanotechnologies. Despite its importance, the scientific development and understanding of new solar cells is not very advanced, and educational resources for specialized engineers and scientists are required. This textbook presents the fundamental scientific aspects of Si thin films growth technology, together with a clear understanding of the properties of the material and how this is employed in new generation photovoltaic solar cells. The textbook is a valuable resource for graduate students working on their theses, young researchers and all people approaching problems and fundamental aspects of advanced photovoltaic conversion.
Download or read book Growth Related Material Properties of Hydrogenated Amorphous Silicon written by Arno Hendrikus Marie Smets and published by . This book was released on 2002 with total page 175 pages. Available in PDF, EPUB and Kindle. Book excerpt: The realization of ultra high hydrogenated amorphous silicon (a-Si:H) growth rates (>10 A/s) is one of the main issues affecting cost reduction in the production process of thin film a-Si:H solar cells. Until now, the expanding thermal plasma (ETP) deposition technique and the hot-wire chemical deposition (HWCVD) technique are the only two techniques which have obtained good materials properties at ultra high growth rates of 100 A/s. To optimize the a-Si:H growth rate and the material properties, more insight into the a-Si:H growth is required. In this thesis the a-Si:H film properties deposited by means of the ETP technique are studied. Furthermore, the relation of the material properties with a-Si:H growth from the remote ETP deposition is studied.
Download or read book A Simple Method for Preparing Hydrogenated Amorphous Silicon Films by Chemical Vapor Deposition at Atmospheric Pressure written by Frank Browning Ellis and published by . This book was released on 1983 with total page 400 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Hydrogenated Amorphous Silicon Alloy Deposition Processes written by Werner Luft and published by CRC Press. This book was released on 1993-05-24 with total page 344 pages. Available in PDF, EPUB and Kindle. Book excerpt: This reference reviews common film and plasma diagnostic techniques and the deposition and film properties of various hydrogenated amorphous silicon alloys (a-Si:H).;Drawing heavily from studies on a-Si:H solar cells and offering valuable insights into other semiconductor applications of a-Si:H and related alloys, Hydrogenated Amorphous Silicon Alloy Deposition Processes: describes conventional as well as alternative, deposition processes and compares the resulting material properties; systematically categorizes various a-Si:H deposition techniques; details the characteristics of a-Si:H and related alloys with both high and low optical bandgap, including a-SiC:H, a-SiGe:H, and a-SiSn:H; discusses basic designs of glow discharge deposition reactors; evaluates the etching properties of amorphous silicon-based alloys; and examines microcrystalline silicon and silicon carbide.;Providing over 825 literature citations for further study, Hydrogenated Amorphous Silicon Alloy Deposition Processes is an incomparable resource for physicists; materials scientists; chemical, process and production engineers; electrical engineers and technicians in the semiconductor industry; and upper-level undergraduate and graduate students in these disciplines.
Download or read book Method of Controllong the Deposition of Hydrogenated Amorphous Silicon and Apparatus Therefor written by and published by . This book was released on 1985 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: An improved method and apparatus for the controlled deposition of a layer of hydrogenated amorphous silicon on a substrate. Means is provided for the illumination of the coated surface of the substrate and measurement of the resulting photovoltage at the outermost layer of the coating. Means is further provided for admixing amounts of p type and n type dopants to the reactant gas in response to the measured photovoltage to achieve a desired level and type of doping of the deposited layer.
