Download or read book High Interaction Parameter Block Copolymers for Advanced Lithography written by Julia Dianne Cushen and published by . This book was released on 2013 with total page 450 pages. Available in PDF, EPUB and Kindle. Book excerpt: Block copolymers demonstrate potential in next-generation lithography as a solution for overcoming the limitations of conventional lithographic techniques. Ideal block copolymer materials for this application can be synthesized on a commercial scale, have high [chi]-parameters promoting self-assembly into sub-20 nm pitch domains, have controllable alignment and orientation, and have high etch contrast between the domains for facilitating pattern transfer into the underlying substrate. Block copolymers that contain silicon in one domain are attractive for nanopatterning since they often fulfill at least three of these requirements. However, silicon-containing materials are notoriously difficult to orient in thin films due to the low surface energy of the silicon-containing block, which typically wets the free surface interface. In this work, the methodology behind material choice and the synthesis of new silicon-containing block copolymers by a variety of polymerization techniques will be described. Thin film self-assembly of the block copolymers with domains oriented perpendicular to the plane of the substrate is achieved using different solvent annealing and neutral surface treatments with thermal annealing conditions. Block copolymer patterns are transferred to the underlying substrate by reactive ion etching and directed self-assembly of the polymers is demonstrated using chemical contrast patterns. Interesting thermodynamics governing the self-assembly of block copolymers with solvent annealing will also be discussed. Finally, new amphiphilic block copolymers will be described that were created with lithographic applications in mind but that are most useful for biological applications in drug delivery.
Download or read book Design Synthesis and Engineering of Advanced Materials for Block Copolymer Lithography written by William John Durand and published by . This book was released on 2015 with total page 400 pages. Available in PDF, EPUB and Kindle. Book excerpt: Block copolymers (BCPs) are an attractive alternative for patterning applications used to produce next-generation microelectronic devices. Advancements require the development of high interaction parameter [chi] BCPs that enable patterning at the sub-10 nm length scale. Several organosilicon BCPs were designed to both enhance [chi] and impart an inherent etch selectivity that facilitates pattern transfer processes. Increasing the BCP silicon content both increases [chi] and bolsters the etch resistance, providing a pathway to designing new high-[chi] materials. Unfortunately, the BCPs investigated are not amenable to thermal annealing because the organosilicon block preferentially segregates to an air/vacuum interface and drives orientation parallel to the surface. A series of spin-coatable, polarity-switching top coats (as well as other strategies) were developed to provide a "neutral" top interface and promote the perpendicular orientation of BCP domains. In addition, a methodology for evaluating the neutral condition, relying on thickness quantization and the corresponding wetting behavior (i.e. island/hole topography) of lamellae. The top coat strategy was demonstrated for several BCP systems, and perpendicular structures can successfully be etched on commercial tools and be transferred into underlying substrates. The interaction parameter [chi] was evaluated using two methods to compare the performance of several BCPs: the order-disorder transition (ODT) of symmetric diblock copolymers, and the absolute scattering profile of a disordered BCP melt. Both methods, while severely limited for quantitative comparison, indicate trends towards higher [chi] with additional appended polar and organosilicon functional groups. Furthermore, the pattern fidelity is shown to be a function of the overall BCP segregation strength. The free energy of confined lamella was modeled algebraically to produce response surface plots capable of identifying process conditions favorable for perpendicular orientation. Thickness independent perpendicular orientation is only favorable using two neutral interfaces. Incommensurate film thicknesses are the most favorable, with commensurability conditions dependent on the wetting behavior at each interface. The modeling was supplemented with an extensive body of thin film experimental work that qualitatively agrees well with the above conclusions.
Download or read book Advanced Materials for Block Copolymer Lithography written by Christopher Martin Bates and published by . This book was released on 2013 with total page 464 pages. Available in PDF, EPUB and Kindle. Book excerpt: The multi-billion dollar per year lithography industry relies on the fusion of chemistry, materials science, and engineering to produce technological innovations that enable continual improvements in the speed and storage density of microelectronic devices. A critical prerequisite to improving the computers of today relies on the ability to economically and controllably form thin film structures with dimensions on the order of tens of nanometers. One class of materials that potentially meets these requirements is block copolymers since they can self-assemble into structures with characteristic dimensions circa three to hundreds of nanometers. The different aspects of the block copolymer lithographic process are the subject of this dissertation. A variety of interrelated material requirements virtually necessitate the synthesis of block copolymers specifically designed for lithographic applications. Key properties for the ideal block copolymer include etch resistance to facilitate thin film processing, a large interaction parameter to enable the formation of high resolution structures, and thin film orientation control. The unifying theme for the materials synthesized herein is the presence of silicon in one block, which imparts oxygen etch resistance to just that domain. A collection of silicon-containing block copolymers was synthesized and characterized, many of which readily form features on approximately the length scale required for next-generation microelectronic devices. The most important thin film processing step biases the orientation of block copolymer domains perpendicular to the substrate by control of interfacial interactions. Both solvent and thermal annealing techniques were extensively studied to achieve orientation control. Ultimately, a dual top and bottom surface functionalization strategy was developed that utilizes a new class of "top coats" and cross-linkable substrate surface treatments. Perpendicular block copolymer features can now be produced quickly with a process amenable to existing manufacturing technology, which was previously impossible. The development of etching recipes and pattern transfer processes confirmed the through-film nature of the features and the efficacy of both the block copolymer design and the top coat process.
Download or read book Polyhydroxystyrene based Block Copolymers for Next Generation Lithography written by Jian Sun (Ph.D.) and published by . This book was released on 2022 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Studies on block copolymer (BCP) materials and their phase separation in bulk and thin-film forms have exploded over the last decades, due to the wide range of accessible morphologies (e.g. spheres, cylinders, gyroid, and lamellae) and feature sizes (5-200 nm). BCPs are advantageous in generating periodic patterns at nanoscale over a large area. Hence, BCP lithography is considered to be a promising candidate for microelectronics as sub-10 nm feature sizes can be achieved in a scalable manner. It is also considered to be more cost-effective and less tedious compared to patterning methods such as electron-beam lithography and extreme ultraviolet lithography. While accessing sub-5 nm feature size is no longer a challenge utilizing BCP self-assembly, transferring the self-assembled BCP features to a substrate with high fidelity presents enormous challenges, especially at the 10 nm length scale. The work presented in this thesis focuses on rational design, synthesis and self-assembly studies of BCPs with high interaction parameters to address the outstanding challenges in BCP lithography at very small length scales, namely aligning BCP films vertically oriented to the substrate and imparting sufficient etch contrast to achieve pattern transfer. In this thesis, a new family of BCPs is designed and synthesized by combining poly(3-hydroxystyrene) (P3HS) and poly(dimethylsiloxnae) (PDMS) as the two blocks. We develop synthetic routes to generate both diblock (P3HS-b-PDMS) and triblock (P3HS-b-PDMS-b-P3HS) architectures. This is achieved by polymerizing tetrahydropyran-protected hydroxystyrene and subsequent deprotection under mild condition, which prevents the decomposition of acid-sensitive PDMS. Self-assembly behavior in bulk and thin-film of diblocks and triblocks are studied and compared. The functionality provided by the hydroxystyrene and siloxane blocks is further exploited to demonstrate a path to pattern transfer. The major contributions of this thesis are 1) development of a synthetic route that is compatible for BCPs with acid-sensitive Si-containing block, 2) development of non-equilibrium processing protocols based on solvent annealing to align the ultrahigh interaction parameter BCPs vertically to the substrate, and 3) deciphering the effect of architecture and dispersity on the BCP self-assembly.
Download or read book Directed Self assembly Strategies for Orientation controlled Block Copolymers for Advanced Lithography written by Cindy Gomes Correia and published by . This book was released on 2019 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: L'objectif de ce travail était de mettre en évidence le potentiel du PDMSBb-PS pour des applications en nanolithographie avancée. Pour cela, nous avons fourni une compréhension du comportement d'auto-assemblage du PDMSB-b-PS en masse et en film mince. Nous avons réalisé l'auto-assemblage de ce copolymère semicristallin en cylindre et gyroïde bien définis avec des périodicités inférieures à 20 nm grâce à un paramètre d'interaction de Flory-Huggins élevé (Chapitre 2). Nous avons par la suite proposé une approche pour obtenir des lamelles perpendiculaires du PDMSB-b-PS en film mince grâce à l'utilisation de sur-couches neutres réticulables. La polyvalence de cette approche a été démontrée à l'aide de CPBs de masses moléculaires différentes et s'est ensuite étendue à la formation d'empilements via un processus d'auto-assemblage itératif (chapitre 3). Enfin, nous avons réticulé la surcouche neutre à l'aide d'agents photo-sensibles ce qui nous a permis d'obtenir un motif par photolithographie au-dessus du film CPB. Ainsi, il a été possible de contrôler l'orientation du CPB à des endroits spécifiques du film (Chapitre 4).
Download or read book High Block Copolymers for Sub 20 Nm Pitch Patterning written by Nathan D. Jarnagin and published by . This book was released on 2013 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Introduction to Microlithography written by L. F. Thompson and published by Academic. This book was released on 1994 with total page 568 pages. Available in PDF, EPUB and Kindle. Book excerpt: Reviews the theory, materials, and processes used in the lithographic process by which circuit elements are fabricated (it is these elements' decreasing size that has made possible the miniaturization of electronic devices). After a brief historical introduction, four major topics are discussed: the physics of the lithographic process, organic resist materials, resist processing, and plasma etching. The new edition reflects the many changes that have occurred since the 1983 publication of this tutorial/reference. Annotation copyright by Book News, Inc., Portland, OR
Download or read book Block Copolymers II written by Volker Abetz and published by Springer Science & Business Media. This book was released on 2005-12-02 with total page 272 pages. Available in PDF, EPUB and Kindle. Book excerpt: . A.J. M ller, V. Balsamo, M.L. Arnal: Nucleation and Crystallization in Diblock and Triblock Copolymers.- 2 J.-F. Gohy: Block Copolymer Micelles.- 3 M.A. Hillmyer: Nanoporous Materials from Block Copolymer Precursors.- 4 M. Li, C. Coenjarts, C.K. Ober: Patternable Block Copolymers.-
Download or read book Developments in Block Copolymer Science and Technology written by Ian W. Hamley and published by John Wiley & Sons. This book was released on 2004-03-05 with total page 388 pages. Available in PDF, EPUB and Kindle. Book excerpt: Focuses on recent advances in research on block copolymers, covering chemistry (synthesis), physics (phase behaviors, rheology, modeling), and applications (melts and solutions). Written by a team of internationally respected scientists from industry and academia, this text compiles and reviews the expanse of research that has taken place over the last five years into one accessible resource. Ian Hamley is the world-leading scientist in the field of block copolymer research Presents the recent advances in the area, covering chemistry, physics and applications. Provides a broad coverage from synthesis to fundamental physics through to applications Examines the potential of block copolymers in nanotechnology as self-assembling soft materials
Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2020-05-01 with total page 770 pages. Available in PDF, EPUB and Kindle. Book excerpt: The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Download or read book Block Copolymers written by Nikos Hadjichristidis and published by John Wiley & Sons. This book was released on 2003-04-28 with total page 445 pages. Available in PDF, EPUB and Kindle. Book excerpt: Polymers may be classified as either homopolymers, consisting of one single repeating unit, or copolymers, consisting of two or more distinct repeating units. Block copolymers contain long contiguous blocks of two or more repeating units in the same polymer chain. Covering one of the hottest topics in polymer chemistry, Block Copolymers provides a coherent overview of the synthetic routes, physical properties, and applications of block copolymers. This pioneering text provides not only a guideline for developing synthetic strategies for creating block copolymers with defined characteristics, but also a key to the relationship between the physical properties of block copolymers and the structure and dynamics of materials. Covering features of the chemistry and physics of block copolymers that are not found in comparable texts, Block Copolymers illustrates the structure-activity relationship of block copolymers and offers suggestions for the design of specific applications. Divided into five sections-Block Copolymers includes chapters on: * Block Copolymers by Chemical Modification of Precursor Polymers * Nonlinear Block Copolymers * Adsorption of Block Copolymers at Solid-Liquid Interfaces * Theory of Block Copolymer Segregation * Phase Transformation Kinetics * Block Copolymer Morphology * Block Copolymer Dynamics Polymer chemists, physicists, chemical engineers, and materials scientists, as well as graduate students in polymer science, will find Block Copolymers to be an invaluable text.
Download or read book Directed Self assembly of High 1D7C0 Block Copolymers for Advanced Patterning Applications written by Gabriela Alva and published by . This book was released on 2016 with total page 78 pages. Available in PDF, EPUB and Kindle. Book excerpt: High-{1D7C0} block copolymers (BCP) have gained interest to be used as an alternative to currently used multiple patterning techniques for obtaining sub-lithographic features due to their ability to self-assemble at the nanoscale. However, there is a challenge in controlling the orientation of high-{1D7C0} BCPs at the air interface. This work describes the use of a formulation-based approach wherein different surface active polymers (SAP) were added as additives to control the orientation of poly(styrene-b-methyl carbonate) (PS-b-PMeCAR) lamellae at the air interface. The resulting thin films made from these formulations showed successful formation of perpendicular lamellae on neutral underlayer substrates upon thermal annealing. The higher surface active SAP demonstrated better orientation control with lower loadings and on thicker films. These films were characterized by atomic force microscopy, grazing incidence small angle x-ray spectroscopy, and x-ray photoelectron spectroscopy to confirm the perpendicular orientation of the lamellar domains and the distribution of the SAP in the BCP thin film. The vertically oriented BCP domains were used as an etch mask by selectively removing the more etch labile PMeCAR block by reactive ion etching using oxygen plasma. A technique called sequential infiltration synthesis (SIS), followed by removing the PS block to obtain ~9.5 nm half pitch domains, was also used. Directed self-assembly via graphoepitaxy was also successfully demonstrated. Future work includes investigation of different BCP platforms and morphologies other than lamellae for patterning work.
Download or read book Next Generation Materials for Block Copolymer Lithography written by Michael Joseph Maher and published by . This book was released on 2016 with total page 576 pages. Available in PDF, EPUB and Kindle. Book excerpt: The electronics industry is a trillion dollar industry that has drastically changed everyday life. Advances in lithography have enabled manufacturers to continually shrink the dimensions of microelectronic components, which has resulted in devices that outperform previous generations. Unfortunately, conventional patterning techniques are approaching their physical resolution limits. The ability to economically pattern sub-10 nm features is necessary for the future growth of the industry. Block copolymer self-assembly has emerged as a leading candidate for next generation lithography and nanofabrication because block copolymers self-assemble into periodic nanostructures (e.g. cylinders and lamellae) on a length scale that exceeds the physical limits of optical lithography. However, for block copolymer lithography to be realized, the block copolymer domains need to form sub-10 nm features and display etch resistance for pattern transfer. Additionally, the orientation, alignment, and placement of block copolymer domains must be carefully controlled. This dissertation discusses the synthesis, orientation and alignment of silicon-containing BCPs that are inherently etch resistant and provide access to nanostructures in the sub-10 nm regime. The orientation of domains is controlled by interactions between each block copolymer domain and each interface. Preferential interactions between the block copolymer domains and the either the substrate or air interface lead to a parallel orientation of domains, which is not useful for lithography. Non-preferential (“neutral”) interactions are needed to promote the desired perpendicular orientation. The synthesis of surface treatments and top coats is described, and methods to determine the preferential and non-preferential interactions are reported. Orientation control is demonstrated via rapid thermal annealing between two neutral surfaces. Combining orientation control of block copolymer domains with well established directed self-assembly strategies was used to produce perpendicular domains with long range order. Chapter 1 provides an introduction to lithography and block copolymer self-assembly. Chapter 2 discusses the synthesis of silicon-containing block copolymers. Chapters 4-6 focus on controlling block copolymer domain orientation, and Chapter 7 focuses on directed self-assembly. Chapter 8 covers spatial orientation control of domains using photopatternable interfaces. Finally, Chapter 9 covers tin-containing polymers that are resistant to fluorine-containing etch chemistries and can be used to pattern silicon oxide.
Download or read book Block Copolymers and Ion Beam Analysis in Lithography written by Narayanan Sundararajan and published by . This book was released on 1999 with total page 382 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Optical Metamaterials by Block Copolymer Self Assembly written by Stefano Salvatore and published by Springer. This book was released on 2014-07-11 with total page 89 pages. Available in PDF, EPUB and Kindle. Book excerpt: Metamaterials are artificially designed materials engineered to acquire their properties by their specific structure rather than their composition. They are considered a major scientific breakthrough and have attracted enormous attention over the past decade. The major challenge in obtaining an optical metamaterial active at visible frequencies is the fabrication of complex continuous metallic structures with nano metric features. This thesis presents the fabrication and characterization of optical metamaterials made by block copolymer self assembly. This approach allows fabrication of an intriguing and complex continuous 3D architecture called a gyroid, which is replicated into active plasmonic materials such as gold. The optical properties endowed by this particular gyroid geometry include reduction of plasma frequency, extraordinarily enhanced optical transmission, and a predicted negative refractive index. To date, this is the 3D optical metamaterial with the smallest features ever made.
Download or read book Cyclic Polymers written by J. A. Semlyen and published by Springer Science & Business Media. This book was released on 2000-08-31 with total page 804 pages. Available in PDF, EPUB and Kindle. Book excerpt: Cyclic Polymers (Second Edition) reviews the many recent advances in this rapidly expanding subject since the publication of the first edition in 1986. The preparation, characterisation, properties and applications of a wide range of organic and inorganic cyclic oligomers and polymers are described in detail, together with many examples of catenanes and rotaxanes. The importance of large cyclics in biological chemistry and molecular biology is emphasised by a wide coverage of circular DNA, cyclic peptides and cyclic oligosaccharides and polysaccharides. Experimental techniques and theoretical aspects of cyclic polymers are included, as well as examples of their uses such as ring opening polymerisation reactions to give commercially important materials. This book covers a wide range of topics which should be of interest to many scientific research workers (for example, in polymer science, chemistry and molecular biology), as well as providing a reference text for undergraduate and graduate students.
Download or read book Hansen Solubility Parameters written by Charles M. Hansen and published by CRC Press. This book was released on 2007-06-15 with total page 546 pages. Available in PDF, EPUB and Kindle. Book excerpt: Hansen solubility parameters (HSPs) are used to predict molecular affinities, solubility, and solubility-related phenomena. Revised and updated throughout, Hansen Solubility Parameters: A User's Handbook, Second Edition features the three Hansen solubility parameters for over 1200 chemicals and correlations for over 400 materials including p
