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Book Heat Transfer in Horizontal and Vertical CVD Reactors

Download or read book Heat Transfer in Horizontal and Vertical CVD Reactors written by Wilson Kuo Sun Chiu and published by . This book was released on 1997 with total page 316 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Flow Structure and Heat Transfer in an Impinging Jet CVD Reactor

Download or read book Flow Structure and Heat Transfer in an Impinging Jet CVD Reactor written by Nasir Memon and published by . This book was released on 2009 with total page 67 pages. Available in PDF, EPUB and Kindle. Book excerpt: A detailed experimental study is undertaken to investigate the flow structure and heat transfer in an impinging jet Chemical Vapor Deposition (CVD) reactor at atmospheric pressure. It is critical to develop models that predict flow patterns in such a reactor to achieve uniform deposition across the substrate. Free convection can negatively affect the gas flow as cold inlet gas impinges on the heated substrate, leading to vortices and disturbances in the normal flow path. This experimental research will be used to understand the buoyancy-induced and momentum-driven flow structure encountered in an impinging jet CVD reactor. Investigations are conducted for various operational parameters such as substrate temperature and inlet velocity. In addition, different reactor geometries with varying inlet length and height between the substrate and inlet are included in the study. Experimental results obtained from the study provide information on the temperature distribution, heat transfer rates, and flow field. Such results validate the operation of the reactor at atmospheric pressure and provide valuable insight into future design of impinging jet CVD reactors.

Book Numerical Modeling of Chemical Vapor Deposition Processes in Horizontal Reactors

Download or read book Numerical Modeling of Chemical Vapor Deposition Processes in Horizontal Reactors written by Harry Keith Moffat and published by . This book was released on 1992 with total page 506 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book CVD XI

    Book Details:
  • Author : Karl E. Spear
  • Publisher :
  • Release : 1990
  • ISBN :
  • Pages : 762 pages

Download or read book CVD XI written by Karl E. Spear and published by . This book was released on 1990 with total page 762 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Experimental Study of Flow and Heat Transfer in a Rotating Chemical Vapor Deposition Reactor

Download or read book Experimental Study of Flow and Heat Transfer in a Rotating Chemical Vapor Deposition Reactor written by Sun Wong and published by . This book was released on 2015 with total page 54 pages. Available in PDF, EPUB and Kindle. Book excerpt: An experimental model was set up to study the rotating vertical impinging chemical vapor deposition reactor. Deposition occurs only when the system has enough thermal energy. Therefore, understanding the fluid characteristic and heat transfer of the system will provide a good basis to understand the full model. Growth rate and the uniformity of the film are the two most important factors in CVD process and it is depended on the flow and thermal characteristic within the system. Optimizing the operating parameters will result in better growth rate and uniformity. Operating parameters such as inflow velocity, inflow diameter and rotational speed are used to create different design simulations. Fluid velocities and various temperatures are recorded to see the effects of the different operating parameters. Velocities are recorded by using flow meter and hot wire anemometer. Temperatures are recorded by using various thermocouples and infrared thermometer. The result should provide a quantitative basis for the prediction, design and optimization of the system and process for design and fabrication of future CVD reactors. Further assessment of the system results will be discuss in detail such as effects of buoyancy and effects of rotation. The experimental study also coupled with a numerical study for further validation of both model. Comparisons between the two models are also presented.

Book A Numerical and Experimental Investigation of the Fluid Dynamics and Heat Transfer in a Barrel type Chemical Vapor Deposition  CVD  Reactor  microform

Download or read book A Numerical and Experimental Investigation of the Fluid Dynamics and Heat Transfer in a Barrel type Chemical Vapor Deposition CVD Reactor microform written by Shih, Ping-Ho Samuel and published by Ann Arbor, Mich. : University Microfilms International. This book was released on 1988 with total page 530 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Transport Phenomena in Materials Processing

Download or read book Transport Phenomena in Materials Processing written by and published by Academic Press. This book was released on 1996-06-25 with total page 447 pages. Available in PDF, EPUB and Kindle. Book excerpt: Materials processing and manufacturing are fields of growing importance whereby transport phenomena play a central role in many of the applications. This volume is one of the first collections of contributions on thesubject. The five papers cover a wide variety of applications

Book Journal of Heat Transfer

Download or read book Journal of Heat Transfer written by and published by . This book was released on 2002 with total page 416 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Heat and Mass Transfer

    Book Details:
  • Author : Alekseĭ Vasilʹevich Lykov
  • Publisher :
  • Release : 1967
  • ISBN :
  • Pages : 1210 pages

Download or read book Heat and Mass Transfer written by Alekseĭ Vasilʹevich Lykov and published by . This book was released on 1967 with total page 1210 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Convective Heat Transfer and Flow Stability in Rotating Disk CVD Reactors

Download or read book Convective Heat Transfer and Flow Stability in Rotating Disk CVD Reactors written by and published by . This book was released on 1998 with total page 8 pages. Available in PDF, EPUB and Kindle. Book excerpt: The flow and heat transfer of NH3 and He have been studied in a rotating disk system with applications to chemical vapor deposition reactors. Influence of the important operating parameters were studied numerically over ranges of the primary dimensionless variables: (1) the spin Reynolds number, Re{sub {omega}}, (2) the disk mixed convection parameter, MCP{sub d}, and (3) a new parameter, the wall mixed convection parameter, MCP{sub w}. Inlet velocities were set to the corresponding infinite rotating disk asymptotic velocity. Results were obtained primarily for NH3. Results show that increasing Re{sub {omega}} from 314.5 to 3,145 increases the uniformity of the rotating disk heat flux and results in thinner thermal boundary layers at the disk surface. At Re{sub {omega}} = 314.5, increasing MCP{sub d} to 15 leads to significant departure from the infinite disk result with nonuniform disk heat fluxes and recirculating flow patterns. At Re{sub {omega}} = 3,145, the results are closer to the infinite disk for MCP{sub d} up to 15. For large values of MCP{sub w}, the flow recirculates and there is significant deviation from the infinite disk result. The influence of MCP{sub w} on flow stability is increased at larger MCP{sub d} and lower Re{sub {omega}}. The results show that because of variable transport properties, the flow of NH3 is less stable than that of He as MCP{sub d} is increased for MCP{sub w} = 0 and Re{sub {omega}} = 314.5.

Book Two  and Three dimensional Finite Element Simulations of Reacting Flows in Chemical Vapor Deposition of Compound Semiconductors

Download or read book Two and Three dimensional Finite Element Simulations of Reacting Flows in Chemical Vapor Deposition of Compound Semiconductors written by Dimitrios Ioannou Fotiadis and published by . This book was released on 1990 with total page 718 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Chemical Physics of Thin Film Deposition Processes for Micro  and Nano Technologies

Download or read book Chemical Physics of Thin Film Deposition Processes for Micro and Nano Technologies written by Y. Pauleau and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 372 pages. Available in PDF, EPUB and Kindle. Book excerpt: An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.

Book Topics in Heat Transfer

Download or read book Topics in Heat Transfer written by and published by . This book was released on 1992 with total page 168 pages. Available in PDF, EPUB and Kindle. Book excerpt: