Download or read book Flow Controlled Solvent Vapor Annealing of Block Copolymers for Lithographic Applications written by Kevin Willy Gotrik and published by . This book was released on 2013 with total page 192 pages. Available in PDF, EPUB and Kindle. Book excerpt: Self-assembly of block copolymer thin-films may provide an inexpensive alternative to patterning lithographic features below the resolution limits of traditional optical methods. Block copolymers (BCPs) are polymers made of two or more distinct monomer/block units that are covalently bonded. Due to their differences in surface energy, the different blocks tend to phase segregate like oil and water; but because of the covalent linkage, this segregation is practically limited to size scales ranging from only a few nm to ~ 100 nm. A thin film of a BCP can be used in much the same way as a photoresist in the lithographic process, whereas a desired pattern morphology can be obtained by etching one block away and leaving behind a self-assembled hard mask for the underlying substrate. After a thin film of BCP is coated onto a given substrate, the BCP must be given an annealing step, where the disordered entangled polymer networks can be allowed to diffuse and equilibrate into lower free energy configurations which result in periodic patterns of micelles with different morphologies such as spheres, in/out of plane cylinders, etc. This work explored the technique of solvent vapor annealing, where organic solvents were allowed to interact with BCP thin films to facilitate annealing and act as surrogates for the different BCP polymer blocks. This allowed for a wide range of control over the BCP self-assembly (morphology, periodicity, etc.) for a given molecular weight BCP. Additionally, by adding heat at critical times during the self-assembly, time scales for solvent vapor enhanced self-assembly could be reduced from hours to seconds making the prospects for this technology to become industrially applicable more promising.

Download or read book Solvent Vapor Assisted Self Assembly of Patternable Block Copolymers written by Joan K. Bosworth and published by . This book was released on 2009 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Block copolymer self assembly presents a method for patterning and templating applications on the 10-50 nm length scale, a smaller scale than can be easily achieved by photolithography. Here we investigate the use of functionalized polar-nonpolar block copolymers both as photopatternable self-assembling materials and for selective infiltration of one block for patterning. Block copolymer thin films with defect-free self-assembled morphology over large domains combined with careful control of the orientation of the morphology are critical for these patterning applications. Self assembly of block copolymers is facilitated by polymer chain mobility, commonly achieved by heating block copolymer films above the glass transition temperature of the blocks. However, many block copolymer systems, including those discussed here, are thermally incompatible. Swelling in a solvent vapor, called solvent annealing, provides sufficient mobility for self assembly. Solvent annealing proved critical to forming ordered structures of functional polar-nonpolar block copolymer thin films. Thermal instability initially led to limited self assembly of combined topdown/bottom-up block copolymer systems. In this case, photolithographic functionality has been designed into block copolymers, allowing the majority component of a block copolymer to behave as a negative-tone photoresist. Solvent vapor annealing has provided a simple and inexpensive method for allowing the bottom-up self assembly of these top-down photopatternable materials. An additional benefit of solvent annealing is the ability to reversibly tune the morphology formed using the selectivity of different swelling solvents to the two blocks: that is, the choice of solvent for annealing directs the formation of different morphologies in the dried film, here spherical and cylindrical. This behavior is reversible, alternating annealing sessions lead to switching of the morphology in the film. Secondary ordering techniques applied in tandem with solvent annealing can be used to further control the self assembly and give highly ordered block copolymer domains. Here we demonstrate the use of graphoepitaxy to align block copolymer self assembly to patterns in substrates. The combination of block copolymer self assembly with lithographic crosslinking in films was initially pursued to allow precise location of assembled patterns. Taking this behavior a step further, we combine solvent annealing, used to reversibly tune the self-assembled morphology, and lithographic patterning, used to prevent switching in exposed regions. This combined process has provided a method for selectively patterning 100 nm-wide domains of spherical morphology within regions of parallel-oriented cylindrical morphology. We also investigate solvent annealing of a block copolymer blended with a hydrogen bonding material that selectively segregates into the polar block. Blending provides a method of tuning the periodicity upon solvent annealing for self assembly, with morphology control again possible by solvent selectivity. Selective extraction of the blended material forms voids displaying the tunable periodicity, and the pattern is then transferred by templating to inorganic materials.

Download or read book Self assembly of Block Copolymers by Solvent Vapor Annealing Mechanism and Lithographic Applications written by Xiaodan Gu and published by . This book was released on 2014 with total page 135 pages. Available in PDF, EPUB and Kindle. Book excerpt: Block copolymers (BCP) are a unique class of polymers, which can self-assemble into ordered microdomains with sizes from 3 nm to about 50 nm making BCPs an appealing meso-scale material. In thin films, arrays of BCP microdomains with longrange lateral order can serve as ideal templates or scaffolds for patterning nano-scale functional materials and synthesizing nanostructured materials with size scales that exceed the reach of photolithography. Among many annealing methods, solvent vapor annealing (SVA) is a low-cost, highly efficient way to annihilate defects in BCP thin films and facilitates the formation of highly ordered microdomains within minutes. Directing the self-assembly of BCPs could, in principle, lead to the formation of domains with near perfect lateral ordering. The mechanism of SVA of BCPs, however, is still illunderstood, albeit it has been widely adopted in research laboratories around the world for the past decade. In the first part of this thesis, the ordering process of BCP thin films during annealing in neutral solvents was investigated mainly by in situ synchrotron X-ray scattering. Briefly, the solvent molecules impart mobility to the BCP and enable a marked improvement in the lateral ordering of the BCP microdomains. Both, BCP concentration in the swollen film and the rate of solvent removal play a key role in obtaining films with well-ordered microdomains. The amount of swelling in a BCP thin film during SVA depends on the chemical nature of the blocks, the quality of the solvent, and the molecular weight of the BCP. A high degree of swelling - still low enough to prevent solvent-induced mixing (disordering) of BCP microdomains, - provides a high chain mobility, and thus results in the formation of arrays of ordered microdomains with large grain sizes after SVA in neutral solvents. The rate of solvent removal is another critical parameter for obtaining long-range lateral order in BCP thin films after SVA in neutral solvents. While in the swollen state ordered structures form with exceptional order, removal of the solvent results in a deterioration of order due to the confinement imposed to a BCP in a thin film by the rigid silicon substrate. It was found, however, that an instantaneous solvent removal can minimize disordering to preserve the order formed in the swollen state. Self-assembled BCP microdomains also serve as ideal template to pattern other materials with exceptional lateral resolution. In this thesis, two examples of BCP lithography was also demonstrated. A reconstruction process was used to enhance the etch contrast between two organic blocks. In one example, a BCP pattern was transferred to a silicon substrate to form high aspect ratio, 5:1, sub-10nm silicon lines or holes with high fidelity. While in a second example, I demonstrated the fabrication of silicon oxide dots with an areal density as high as 2 Tera dots per inch2 by BCP templates, which has the potential to serve as etch mask for bit pattern media applications.

Download or read book Solvent Annealing and Thickness Control for the Orientation of Silicon containing Block Copolymers for Nanolithographic Applications written by Logan Joseph Santos and published by . This book was released on 2012 with total page 192 pages. Available in PDF, EPUB and Kindle. Book excerpt: Block copolymers are an ideal solution for a wide variety of nanolithographic opportunities due to their tendency to self-assemble on nanoscopic length scales. High etch selectivity and thin-film orientation are crucial to the success of this technology. Most conventional block copolymers have poor etch selectivity; however, incorporating silicon into one block produces the desired etch selectivity. A positive side effect of the silicon addition is that the X value (a block-to-block interaction parameter) of the block copolymer increases. This decreases the critical dimension of potential features. Unfortunately, one negative side effect is the increase in the surface energy difference between the blocks. Incorporating silicon decreases the surface energy of that block. Typically, annealing is used to induce the chain mobility that is required for the block copolymer to reach its minimum thermodynamic energy state. Thermal annealing is the easiest annealing technique; however, if the glass transition temperature (Tg) of one block is above the thermal decomposition temperature of the other block, the latter will degrade before the former can reorient. In addition, annealing silicon-containing block copolymers usually results in a wetting layer and parallel orientation since the lower surface energy block favors the air interface, minimizing the free energy. Solvent annealing replaces the air interface with a solvent, thereby changing the surface energy. The solvent plasticizes the block copolymer, effectively decreasing the Tgs of both blocks. Another benefit is the ability to reversibly alter the orientation by changing the solvent or solvent concentration. The challenge with solvent annealing is that it depends on a number of parameters including: solvent selection, annealing time, and vapor concentration, which generate a very large variable space that must be searched to find optimum screening conditions.

Download or read book Orthogonal Patterning of Block Copolymer written by Yefei Zhang and published by . This book was released on 2012 with total page 79 pages. Available in PDF, EPUB and Kindle. Book excerpt: Block copolymer self-assembly presents a method for pattern and template application on the 10 to 50 nm length scale. However, the research in this area has been limited to the use of only one block copolymer per layer due to the damage and intermixing when spin coating of a second polymer layer. Here we propose a new method that neatly solves the intermixing problem by using a fluorinate photoresist and solvent system. The microdomain orientation within the block copolymer film can be controlled by solvent vapor annealing. And we also observed an improvement of the long-rang order of the microdomains by depositing the block copolymer into lithographical patterned trenches. This orthogonal patterning method allows for the deposition of multiple block copolymers, with ordered microdomains, adjacent to each other on the same layer. The self-assembled patterns can be transferred to the substrate and propose a potential route for the next-generation lithography.

Download or read book Block Copolymer Self assembly written by Gayashani Kanchana Ginige and published by . This book was released on 2022 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Molecular self-assembly is the basis of structure in nature. While of far less complexity than a natural system, the same physical rules apply to simple synthetic designed systems that spontaneously form self-assembled structures and patterns. The self-assembly of block copolymers (BCPs) is an interesting example, as it can be harnessed to form both 2D (in thin films) and 3D (in bulk) porous and chemically controlled morphologies at scale. The self-assembly of BCPs on surfaces is of interest for a range of applications, but due to the enormous economic driver that is the computer industry, this direction has been pushed most strongly. Self-assembly of BCPs has been described in the International Technology Roadmap for Semiconductors (the ITRS, and now the IDRS) for almost two decades for lithography on semiconductors and for patterning the magnetic material of hard drives. As a result, there has been much academic interest, both fundamental and applied, to meet the challenges as outlined in the ITRS/IDRS due to the promise of this scalable and low-cost nanopatterning approach. More recently, the remarkable work harnessing BCP self-assembly has been directed to other applications, one being optical metamaterials; this thesis will add to this growing body of science. One aspect holding BCP self-assembly back is the defectivity in the patterned material or surface; some applications are more defect tolerant than others, but hard drive and other computer-industry applications have very low tolerance for defects. It is, therefore, important to have systematic control over the self-assembly process as well as quality of the final patterns generated by BCP self-assembly for these applications and others not yet imagined. This thesis examines the defectivity of the hexagonal nanoscale patterns derived from BCP self-assembly and looks at extending them to produce nanoscale patterns of native and non-native morphologies that have plasmonic properties. This thesis is divided into two parts. The first part deals with optimization of solvent vapor annealing of BCP self-assembly, the critical step in which the actual nanoscale phase segregation takes place; in this case, it uses a controlled solvent vapor flow annealing apparatus, design of experiment and machine learning approaches. In this work, it was discovered that slight variations in the initial film thickness on the order of even a couple of nanometers and the final swelling degree have a huge influence on the defectivity and the quality of the resulting patterns. Next, machine learning approaches are applied to compile qualitative and quantitative defect analysis into a single figure of merit that is mapped across an experimental parameter space. This approach enables faster convergence of results to arrive at the optimum annealing conditions for the annealing of thin films of BCPs of PS-b-PDMS that generate nanoscale hexagonal patterns of silica dots with a minimum number of defects. In the second part of the thesis, mixed metal/oxide double layer patterning was studied using sequential self-assembly of BCPs. The second part of the thesis starts with optimization of reactive ion etching (RIE) for producing single layer metal nanopatterns from metal ion-loaded thin films of PS-b-P2VP BCPs to generate single layers of hexagonal metal nanopatterns that can withstand a second consecutive reactive ion etching step. The goal of this work is to enable density doubled and/or Moiré pattern formation via self-assembly of a second layer of BCP on the initial pattern prepared by self assembly of either the same or different BCP, as will be described in Chapter 4. Therefore, the initial pattern produced via BCP self-assembly and RIE etching would need to withstand a second treatment step of BCP self-assembly and RIE. While single layer nanopatterns of Au and Pt nanoparticles can be produced without much trouble, these resulting patterns could not be applied for density multiplication of metal-metal nanopatterns since the metal dots become too small and disordered. To demonstrate that metal nanoparticles derived from BCPs could be used, at least, to produce a mixed metal oxide/metal patterns, arrays of SiOx dots were first produced from PS-b-PDMS BCPs and then layered a BCP of PS-b-P2VP that was subsequently loaded with gold or platinum ions. Upon RIE etching, the BCP is removed and the SiOx/Au or Pt nanoparticle arrays were produced. Based upon the outcomes of the optimization of the etching work, mixed Au-Pt commensurate and incommensurate hexagonal lattice patterns were produced on both silicon and quartz substrates. Finally, the optical properties of these mixed metal Pt-Au bilayer patterns were studied. They demonstrated interesting plasmonic properties of the bilayer patterns, including consistent observation of extended plasmon bands that suggest coupling of the localized surface plasmon resonances (LSPRs) of the gold nanoparticles through proximal platinum nanoparticles when arrayed in periodic patterns.

Download or read book Advanced Materials for Block Copolymer Lithography written by Christopher Martin Bates and published by . This book was released on 2013 with total page 464 pages. Available in PDF, EPUB and Kindle. Book excerpt: The multi-billion dollar per year lithography industry relies on the fusion of chemistry, materials science, and engineering to produce technological innovations that enable continual improvements in the speed and storage density of microelectronic devices. A critical prerequisite to improving the computers of today relies on the ability to economically and controllably form thin film structures with dimensions on the order of tens of nanometers. One class of materials that potentially meets these requirements is block copolymers since they can self-assemble into structures with characteristic dimensions circa three to hundreds of nanometers. The different aspects of the block copolymer lithographic process are the subject of this dissertation. A variety of interrelated material requirements virtually necessitate the synthesis of block copolymers specifically designed for lithographic applications. Key properties for the ideal block copolymer include etch resistance to facilitate thin film processing, a large interaction parameter to enable the formation of high resolution structures, and thin film orientation control. The unifying theme for the materials synthesized herein is the presence of silicon in one block, which imparts oxygen etch resistance to just that domain. A collection of silicon-containing block copolymers was synthesized and characterized, many of which readily form features on approximately the length scale required for next-generation microelectronic devices. The most important thin film processing step biases the orientation of block copolymer domains perpendicular to the substrate by control of interfacial interactions. Both solvent and thermal annealing techniques were extensively studied to achieve orientation control. Ultimately, a dual top and bottom surface functionalization strategy was developed that utilizes a new class of "top coats" and cross-linkable substrate surface treatments. Perpendicular block copolymer features can now be produced quickly with a process amenable to existing manufacturing technology, which was previously impossible. The development of etching recipes and pattern transfer processes confirmed the through-film nature of the features and the efficacy of both the block copolymer design and the top coat process.

Download or read book Gradient Methods for Exploring Block Copolymer Thin Film Phase Behavior written by Julie Nicole Lawson Albert and published by . This book was released on 2011 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: A block copolymer consists of chemically different polymer fragments, or blocks, covalently bonded together. The nanoscale self-assembly and physical properties of these materials make them desirable candidates for emerging nanotechnologies such as nanotemplates, nanoporous membranes, and organic optoelectronics. Understanding the factors that affect thin film phase behavior is essential to realizing the full potential of these unique materials. Specifically, compared to bulk systems, thin film self-assembly is additionally affected by film thickness and surface energetics at the substrate and free air interfaces. By taking advantage of gradient methods, these effects can be investigated quickly to screen the phase behavior of new materials for nanotechnology applications. This thesis work explored three aspects of block copolymer thin film self-assembly. First, a controlled vapor deposition method and custom-built setup were developed to generate surface energy/chemistry gradients on silicon substrates for thin film studies; phase transformations between substrate-perpendicular and substrate-parallel nanostructures were identified on these surfaces. Second, a solvent-resistant microfluidic mixing device was fabricated and applied to solvent vapor annealing thin films in a gradient fashion such that the effects of solvent vapor composition and concentration could be assessed. Finally, the effect of solvent removal rate on the morphology of solvent vapor annealed block copolymer thin films was investigated. Throughout this work, surface and thin film characterization techniques such as contact angle, X-ray photoelectron spectroscopy, and optical and atomic force microscopy (AFM) were employed. Additionally, the use of a successive AFM/ultraviolet ozone (UVO) etching technique for probing through-film morphology was validated. The block copolymer thin film phase behavior and phase transformations identified in this thesis work have implications for the nanotemplating industry, where identification of substrate and/or free surface conditions that promote perpendicular nanostructure orientations is important. Furthermore, the techniques developed in this work for gradient generation (controlled vapor deposition, gradient solvent vapor annealing) and block copolymer thin film morphology characterization (UVO etching/AFM) will be useful tools for researchers not only within the block copolymer thin films community, but also for other scientists involved in organic thin film technologies, such as lithographic templates, conducting membranes, and platforms for biological surface studies.

Download or read book Controlling the Microstructure and Kinetics of Block Copolymer Self assembly by Direct Immersion Annealing written by Melanie J. Longanecker and published by . This book was released on 2017 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: The self-assembly of block copolymers into periodic nanostructures has long been studied for their potential use in integrated circuits, nanofiltration devices, metamaterials, energy and data storage devices, and many more applications. Their use, however, is limited by a number of structural and kinetics challenges. The present research describes how a recently developed annealing technique, direct immersion annealing, can be used to address these challenges. The mechanism that leads to a change in domain size of up to 64% for a single molecular weight during direct immersion annealing is examined for one, two, and three-dimensional morphologies. It was found that the chain orientation within a structure has a significant impact on the structural rearrangements that occur as the result of constrained swelling. This leads to a reduction of the domain size for out-of-plane structure and an increase in domain size for in-plane structure. The non-equilibrium state of the morphology that leads to the reduced domain size leaves the chains in a non-equilibrium conformation that deviates from the tear-drop shape traditionally observed in block copolymers. SANS analysis confirms that the chains take on a flattened disc-like shape in this state. The solvent presence during direct immersion annealing also presents the ability to tune the interaction parameter of the block, where it is shown that the diffuse interface between domains can be improved by 27% using a selective solvent. The kinetics of direct immersion annealing are examined for its ability to order neat and filled block copolymer systems in rapid times. It was found that direct immersion annealing can order much faster than solvent vapor annealing due to the difference in chemical potential of bulk solvent vs. vapors. This has a significant impact on the film swelling rate, where a film submerged in bulk solvent during direct immersion annealing swells to its equilibrium thickness instantaneously, while the vapor annealed film had still not reached equilibrium after 4 h. Further, it was determined that the rapid ordering kinetics of direct immersion annealing are limited to the molecular weight regime where chains are unentangled. At higher molecular weights, the ordering diffusion coefficient scales as N-2.9.

Download or read book Nucleic Acid Transfection written by Wolfgang Bielke and published by Springer Science & Business Media. This book was released on 2010-10-21 with total page 316 pages. Available in PDF, EPUB and Kindle. Book excerpt: Gene Delivery into Mammalian Cells: An Overview on Existing Approaches Employed In Vitro and In Vivo, by Peter Hahn and Elizabeth Scanlan * Strategies for the Preparation of Synthetic Transfection Vectors, by Asier Unciti-Broceta, Matthew N. Bacon, and Mark Bradley * Cationic Lipids: Molecular Structure/Transfection Activity Relationships and Interactions with Biomembranes, by Rumiana Koynova and Boris Tenchov * Hyperbranched Polyamines for Transfection, by Wiebke Fischer, Marcelo Calderon, and Rainer Haag * Carbohydrate Polymers for Nonviral Nucleic Acid Delivery, by Antons Sizovs, Patrick M. McLendon, Sathya Srinivasachari, and Theresa M. Reineke * Cationic Liposome–Nucleic Acid Complexes for Gene Delivery and Silencing: Pathways and Mechanisms for Plasmid DNA and siRNA, by Kai K. Ewert, Alexandra Zidovska, Ayesha Ahmad, Nathan F. Bouxsein, Heather M. Evans, Christopher S. McAllister, Charles E. Samuel, and Cyrus R. Safinya * Chemically Programmed Polymers for Targeted DNA and siRNA Transfection, by Eveline Edith Salcher and Ernst Wagner * Photochemical Internalization: A New Tool for Gene and Oligonucleotide Delivery, by Kristian Berg, Maria Berstad, Lina Prasmickaite, Anette Weyergang, Pål K. Selbo, Ida Hedfors, and Anders Høgset * Visualizing Uptake and Intracellular Trafficking of Gene Carriers by Single-Particle Tracking, by N. Ruthardt and C. Bräuchle

Download or read book Thermal Modulation During Solvent Annealing of PS PDMS Block Copolymer written by An N. Pan and published by . This book was released on 2015 with total page 40 pages. Available in PDF, EPUB and Kindle. Book excerpt: The self-assembly of block copolymers (BCP) has been a promising area of research for nanolithography applications in microelectronics because of their ability to produce nano-scale level periodic structures with long-range order. Ideal BCPs for generating these nano-scale patterns fall within the strong segregation limit (SSL) and have a high interaction parameter to drive BCP phase transitions. BCP morphologies can vary from equilibrium structures such as spheres, cylinders, and gyroid, to metastable structures such as hexagonal perforated lamellar (HPL). A variety of processing techniques including solvent vapor annealing (SVA) have been developed in order to facilitate the phase transitions of BCPs from disordered to ordered states. SVA parameters which can affect the final film morphology include the swelling thickness of the film and solvent removal rate. Thermal modulation of the substrate was used to explore the effects of rapid solvent evaporation during the annealing process on the morphologies of the PS16-b-PDMS37 system. Additional cycles of solvent update and film reswelling were introduced into the annealing procedure to induce greater long-range ordering of film morphologies. Although a range of morphologies were explored, there was special focus on developing a procedure for mono-layer HPL structures for nanolithography applications.

Download or read book Polymer Thin Films written by Ophelia Kwan Chui Tsui and published by World Scientific. This book was released on 2008 with total page 312 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ch. 1. Block copolymer thin films / J.-Y. Wang, S. Park and T. P. Russell -- ch. 2. Equilibration of block copolymer films on chemically patterned surfaces / G. S. W. Craig, H. Kang and P. F. Nealey -- ch. 3. Structure formation and evolution in confined cylinder-forming block copolymers / G. J. A. Sevink and J. G. E. M. Fraaije -- ch. 4. Block copolymer lithography for magnetic device fabrication / J. Y. Cheng and C. A. Ross -- ch. 5. Hierarchical structuring of polymer nanoparticles by self-organization / M. Shimomura ... [et al.] -- ch. 6. Wrinkling polymers for surface structure control and functionality / E. P. Chan and A. J. Crosby -- ch. 7. Crystallization in polymer thin films: morphology and growth / R. M. Van Horn and S. Z. D. Cheng -- ch. 8. Friction at soft polymer surface / M. K. Chaudhury, K. Vorvolakos and D. Malotky -- ch. 9. Relationship between molecular architecture, large-strain mechanical response and adhesive performance of model, block copolymer-based pressure sensitive adhesives / C. Creton and K. R. Shull -- ch. 10. Stability and dewetting of thin liquid films / K. Jacobs, R. Seemann and S. Herminghaus -- ch. 11. Anomalous dynamics of polymer Films / O. K. C. Tsui.

Download or read book Directed Self assembly of Block Co polymers for Nano manufacturing written by Roel Gronheid and published by Woodhead Publishing. This book was released on 2015-07-17 with total page 328 pages. Available in PDF, EPUB and Kindle. Book excerpt: The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques. Authoritative outlining of theoretical principles and modeling techniques to give a thorough introdution to the topic Discusses a broad range of practical applications for directed self-assembly in nano-manufacturing Highlights the importance of this technology to both the present and future of nano-manufacturing by exploring its potential use in a range of fields

Download or read book Effect of Nanoparticle Inclusions and Solvent Annealing on Block Copolymer Morphology written by Deepali Palta and published by . This book was released on 2007 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Using block copolymers for large-area periodic structure fabrication is of great interest because of the potential for low fabrication costs and simplicity of the processing. The concept is that by selective inclusion of the nanoparticles into one of the blocks of a self-assembling copolymer, the nanoparticles are forced into a defined spatial arrangement determined by the phase morphology of the copolymer. Although copolymers can form well defined structures, they inherently have a 'polycrystalline' structure in the bulk, meaning that there is no long-range order of the domains. This thesis addresses both the effect of inclusion of the nanoparticles and the long range ordering of block copolymer domains. The first part of the thesis focuses on the study of the effect of nanoparticle inclusions on the phase morphology of the poly(styrene-butadiene) diblock and poly(styrene-butadiene-styrene) triblock copolymers. For gold inclusions, it was found that even at relatively low concentrations of inclusions (less than 1 wt./vol.%) the block copolymer phase morphology is altered from that of the native copolymer. By contrast to the block copolymer-gold system, no significant changes in bulk morphology is observed for similar fullerene concentrations. In the second part of the thesis, the evolution of the order in cylinder forming poly(styrene-butadiene-styrene) triblock copolymer thin films as a function of the type of solvent vapor, exposure time to the saturated vapors and substrate surface energy is discussed. Solvent vapors of dimethoxyethane, ethyl acetate and cyclohexanone were found to be the most effective for our polymer films. Solvent vapors differing in their selectivity towards the block copolymer domains have different kinetics of ordering which is explained in terms of the difference in the interaction of the solvent between the two different copolymer blocks.

Download or read book Nanofabrication written by Zheng Cui (author) and published by Springer Nature. This book was released on with total page 418 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Block Copolymers and Ion Beam Analysis in Lithography written by Narayanan Sundararajan and published by . This book was released on 1999 with total page 382 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Block Copolymers written by Kenneth J. Hanley and published by . This book was released on 2001 with total page 916 pages. Available in PDF, EPUB and Kindle. Book excerpt: