Download or read book Ferroelectric Thin Films V Volume 433 written by Seshu B. Desu and published by . This book was released on 1996-11-08 with total page 480 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Download or read book Ferroelectric Thin Films written by and published by . This book was released on 1999 with total page 802 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Ferroelectric Thin Films VIII Volume 596 written by R. W. Schwartz and published by . This book was released on 2000-08-17 with total page 610 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book, the eighth in a popular series from MRS, features the latest technical information on ferroelectric thin films from an international mix of academia, industry and government organizations. Recent results for DRAM and FERAM devices, as well as enhancements in material performance for these applications, are presented. Significant advances in understanding leakage current, frequency dependence of the coercive field, hydrogen annealing effects, piezoelectric constants, and domain switching responses are highlighted. The development of ferroelectric thin films for piezoelectric applications are also reviewed, as are improved film-fabrication procedures including chemical vapor deposition and chemical solution deposition. Topics include: BST thin films and DRAM; integration and electrodes; Bi-based thin-film ferroelectrics; Pb-based thin-film ferroelectrics; fundamental properties of thin-film ferroelectrics; ferroelectric gate materials and devices; and piezoelectric, pyro-electric and capacitor devices and novel processing strategies.
Download or read book Microwave Processing of Materials V Volume 430 written by Materials Research Society. Meeting and published by . This book was released on 1996-10-28 with total page 696 pages. Available in PDF, EPUB and Kindle. Book excerpt: Based on an international gathering of scientists and engineers from 17 countries, this book, the fifth in a continuing series, assesses microwave processing of materials as an emerging technology. Significant advances in understanding and control of microwave energy and its use in the processing and testing of materials are outlined. Future research and development needs are also explored. Topics include: scale-up and commercialization; microwave nondestructive testing; microwave processing; microwave system design; dielectric properties measurements and analysis; modelling of microwave heating; microwave interactions and mechanisms; microwave processing using variable frequency sources; alternate microwave sources; remediation of hazardous waste; temperature modelling and measurements; microwave processing of polymers; and plasma processing.
Download or read book Rapid Thermal and Integrated Processing V Volume 429 written by J. C. Gelpey and published by . This book was released on 1996-10-14 with total page 416 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is the latest in a continuing series on rapid thermal processing and related topics. It embraces a diversity of research, development and manufacturing activities that require rapid thermal and integrated processing techniques which are recognized by their acronyms, such as rapid thermal annealing (RTA), rapid thermal processing (RTP), rapid thermal chemical vapor deposition (RTCVP), rapid thermal oxidation (RTO), and others. This fifth anniversary volume reports notable advances in the use of rapid thermal techniques in processing science and technology, and for process control in industrial fabrication facilities. It is organized around progress obtained through: evaluation methodology; equipment and process modelling; temperature control; defects and diffusion associated with annealing; metallizations such as silicidation; novel processing of sol-gel and magnetic films; dielectric growth and deposition; and silicon or silicon-germanium film deposition.
Download or read book Ferroelectric Thin Films IV Volume 361 written by Bruce Tuttle and published by . This book was released on 1995-08-08 with total page 658 pages. Available in PDF, EPUB and Kindle. Book excerpt: Papers from the fall 1994 symposium present research and developments from academia, government, organizations, and industry in ferroelectric thin films, organized in sections on characterization, layered structure ferroelectrics, photonic phenomena, process integration, dram thin film technology, solution deposition, and piezoelectric and IR thin film technology. Highlights include the first public technical disclosures of Y1 nonvolatile memory material. Annotation copyright by Book News, Inc., Portland, OR
Download or read book Ferroelectric Thin Films written by Carlos Paz de Araujo and published by Taylor & Francis. This book was released on 1996 with total page 596 pages. Available in PDF, EPUB and Kindle. Book excerpt: The impetus for the rapid development of thin film technology, relative to that of bulk materials, is its application to a variety of microelectronic products. Many of the characteristics of thin film ferroelectric materials are utilized in the development of these products - namely, their nonvolatile memory and piezoelectric, pyroelectric, and electro-optic properties. It is befitting, therefore, that the first of a set of three complementary books with the general title Integrated Ferroelectric Devices and Technologies focuses on the synthesis of thin film ferroelectric materials and their basic properties. Because it is a basic introduction to the chemistry, materials science, processing, and physics of the materials from which integrated ferroelectrics are made, newcomers to this field as well as veterans will find this book self-contained and invaluable in acquiring the diverse elements requisite to success in their work in this area. It is directed at electronic engineers and physicists as well as process and system engineers, ceramicists, and chemists involved in the research, design, development, manufacturing, and utilization of thin film ferroelectric materials.
Download or read book III V Nitrides written by Fernando A. Ponce and published by . This book was released on 1997 with total page 1290 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Low Dielectric Constant Materials II Volume 443 written by André Lagendijk and published by . This book was released on 1997-08-19 with total page 224 pages. Available in PDF, EPUB and Kindle. Book excerpt: Low-dielectric constant materials are needed to improve the performance and speed of future integrated circuits. In fact, the diversity of contributors to this book is testimony to the global significance of the topic to the future of semiconductor manufacturing. Presentations include those by semiconductor equipment manufacturers and chemical source suppliers, academia from six countries, four government laboratories and five major device manufacturers. Approaches to designing and implementing reduction in dielectric constant for intermetal dielectric materials are featured and range from the evolution of silicon dioxide to fluorinated silicate glass, to the use of inorganic/organic polymers and spin-on-material, to fluorinated diamond-like carbon and nanoporous silica. The book also addresses the practical aspects of the use of low-dielectric constant materials such as chemical mechanical polishing of these materials and optimization of wiring delays in devices utilizing low-k material.
Download or read book Scientific Basis for Nuclear Waste Management XX Volume 465 written by Walter J. Gray and published by . This book was released on 1997-07 with total page 1398 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book features scientific research that supports the safe and effective disposal of radioactive waste in a geological repository. One highlight of the volume is the opening talk by Rustum Roy, who was instrumental in establishing the first symposium on this topic in 1978. Professor Roy summarizes his views of the past 19 years of progress in the field. A second highlight is the participation by several Russian and Ukrainian scientists who authored papers on nuclear waste disposal aspects of the Chernobyl Unit 4 reactor that exploded in April 1986. Additional topics include: glass formulations and properties; glass/water interactions; cements in radioactive waste management; ceramic and crystalline waste forms; spent nuclear fuel; waste processing and treatment; radiation effects in ceramics, glasses and nuclear waste materials; waste package materials; radionuclide solubility and speciation; radionuclide sorption; radionuclide transport; repository backfill; performance assessment; natural analogues and excess plutonium dispositioning.
Download or read book Thin Films Structure and Morphology Volume 441 written by Steven C. Moss and published by . This book was released on 1997-07-29 with total page 904 pages. Available in PDF, EPUB and Kindle. Book excerpt: An interdisciplinary group of materials scientists, physicists, chemists and engineers come together in this book to discuss recent advances in the structure and morphology of thin films. Both scientific and technological issues are addressed. Work on thin films for a host of applications including microelectronics, optics, tribology, biomedical technologies and microelectromechanical systems (MEMS) are featured. Topics include: kinetics of growth; grain growth; instabilities, segregation and ordering; silicides; metallization; stresses in thin films; deposition and growth simulations; energetic growth processes; diamond films and carbide and nitride films.
Download or read book Ferroelectric Thin Films Volume 200 written by Edward R. Myers and published by . This book was released on 1990-11-16 with total page 376 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Download or read book Materials Reliability in Microelectronics VI Volume 428 written by William F. Filter and published by . This book was released on 1996-11-18 with total page 616 pages. Available in PDF, EPUB and Kindle. Book excerpt: MRS books on materials reliability in microelectronics have become the snapshot of progress in this field. Reduced feature size, increased speed, and larger area are all factors contributing to the continual performance and functionality improvements in integrated circuit technology. These same factors place demands on the reliability of the individual components that make up the IC. Achieving increased reliability requires an improved understanding of both thin-film and patterned-feature materials properties and their degradation mechanisms, how materials and processes used to fabricate ICs interact, and how they may be tailored to enable reliability improvements. This book focuses on the physics and materials science of microelectronics reliability problems rather than the traditional statistical, accelerated electrical testing aspects. Studies are grouped into three large sections covering electromigration, gate oxide reliability and mechanical stress behavior. Topics include: historical summary; reliability issues for Cu metallization; characterization of electromigration phenomena; modelling; microstructural evolution and influences; oxide and device reliability; thin oxynitride dielectrics; noncontact diagnostics; stress effects in thin films and interconnects and microbeam X-ray techniques for stress measurements.
Download or read book Thin Films Stresses and Mechanical Properties VI written by William W. Gerberich and published by . This book was released on 1997 with total page 576 pages. Available in PDF, EPUB and Kindle. Book excerpt: Interest in the mechanical properties of thin films remains high throughout the world, as evidenced by the large international contingent represented in this book. With regard to stresses, techniques for sorting out residual stress and strain states are becoming more varied and sophisticated. Discussions include Raman scattering, nonlinear acoustic responses and back-scattered electron imaging microscopies, as well as the more standard wafer-bending and X-ray techniques. Spectroscopy, indenting and the burgeoning field of nanoprobe imaging for the characterization of mechanical properties of thin films are also highlighted. Topics include: mechanical properties of films and multilayers; fracture and adhesion; nanoindentation of films and surfaces; mechanical property methods and modelling; tribological properties of thin films; properties of polymer films; stress effects in thin films and interconnects; epitaxy and strain relief mechanisms, measurements.
Download or read book Thin Films Stresses and Mechanical Properties VI written by Shefford P. Baker and published by Materials Research Society. This book was released on 1996-02-11 with total page 576 pages. Available in PDF, EPUB and Kindle. Book excerpt: Interest in the mechanical properties of thin films remains high throughout the world, as evidenced by the large international contingent represented in this book. With regard to stresses, techniques for sorting out residual stress and strain states are becoming more varied and sophisticated. Discussions include Raman scattering, nonlinear acoustic responses and back-scattered electron imaging microscopies, as well as the more standard wafer-bending and X-ray techniques. Spectroscopy, indenting and the burgeoning field of nanoprobe imaging for the characterization of mechanical properties of thin films are also highlighted. Topics include: mechanical properties of films and multilayers; fracture and adhesion; nanoindentation of films and surfaces; mechanical property methods and modelling; tribological properties of thin films; properties of polymer films; stress effects in thin films and interconnects; epitaxy and strain relief mechanisms, measurements.
Download or read book Applications of Synchrotron Radiation to III Volume 437 written by Louis J. Terminello and published by . This book was released on 1996-12-03 with total page 282 pages. Available in PDF, EPUB and Kindle. Book excerpt: As third-generation synchrotron facilities are constructed and go online in both the United States and around the world, increasingly more applications of synchrotron radiation will be realized. Both basic and applied research possibilities are manyfold, and include studies of solid surfaces and interfaces, electronic materials, metal oxides, glasses, thin films, superconductors, polymers, alloys, multilayer metal systems and intermetallic compounds. In addition, the combination of synchrotron-based spectroscopic techniques, with ever increasing high-resolution microscopy, allows researchers to study very small domains of materials in an attempt to understand their chemical and electronic properties. This book from MRS focuses on the various types of information that can be obtained from synchrotron-related techniques in order to expand the use of this unique and powerful experimental approach to materials research. Topics include: structure of reduced dimensional materials; magnetic materials; microscopy, topography and tomography; X-ray probes of solids; and materials characterization with X-ray absorption.
Download or read book Thin Films for Photovoltaic and Related Device Applications Volume 426 written by David Ginley and published by . This book was released on 1996-11-18 with total page 632 pages. Available in PDF, EPUB and Kindle. Book excerpt: There has been considerable progress in the development of thin-film photovoltaic devices with new efficiency records and enhanced durability. These achievements are the result of significant advances in the fundamental understanding of the materials, interfaces and devices. With 18 countries represented, this truly international volume brings together engineers and researchers from academic, industrial and national laboratories worldwide to review different materials systems and address common issues and problems. A wide variety of topics related to the development of thin-film photovoltaic and related devices, including thick-film transistors and materials for flat-panel displays, are addressed. Areas of emphasis include materials synthesis, device fabrication and characterization, and modelling. Topics include: thin-film amorphous silicon devices; thin-film silicon devices; thin-film devices based on copper-indium diselenide; cadmium-telluride devices; transparent conductive oxides and related materials for thin-film devices; and novel concepts for thin-film photovoltaics.
