Download or read book Feature Profile Evolution During the High Density Plasma Etching of Polysilicon written by Arpan Pravin Mahorowala and published by . This book was released on 1998 with total page 200 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Plasma Processing XII written by G. S. Mathad and published by The Electrochemical Society. This book was released on 1998 with total page 308 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Plasma Processing XIV written by G. S. Mathad and published by . This book was released on 2002 with total page 342 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Proceedings of the International Symposium on Thin Film Materials Processes Reliability and Applications Thin Film Processes written by G. S. Mathad and published by The Electrochemical Society. This book was released on 1998 with total page 388 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book A Fundamental Study of Feature Evolution During High Density Plasma Etching written by Jennifer Marie Lane and published by . This book was released on 1999 with total page 220 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Study of Plasma surface Kinetics and Feature Profile Simulation of Poly silicon Etching in Cl2 HBr Plasma written by Weidong Jin and published by . This book was released on 2003 with total page 185 pages. Available in PDF, EPUB and Kindle. Book excerpt: This work characterized the Cl2/HBr ion enhanced plasma-surface interactions with poly-silicon as a function of the gas composition, ion energy, ion incident angle and other important process parameters. A realistic inductively coupled plasma beam apparatus capable of generating ions and neutrals representative of real commercial etcher was constructed and utilized to simulate accurately a high density plasma environment. Etching rate of poly- silicon, the oxygen effect and loading effect are quantified to better describe the etching of patterned poly-silicon in fabricating the gate electrode of a transistor in VLSI manufacturing process. The kinetics model derived from these measurements are incorporated into a Monte Carlo based feature profile simulator, and profile evolution has been simulated under various processing conditions. The realistic plasma beam was used to measure the etching yields of poly-silicon with Cl2/HBr chemistry at different ion energies. The etching yields were found to scale linearly with ... where the threshold energies, Eth are 10 eV for both Cl2 and HBr. The etching yields at different neutral-to-ion flux ratio were measured and the sticking coefficients are derived for reactive neutrals for Cl2 and HBr. The sticking coefficient for HBr system is lower probably due to the relatively larger size of bromine atom compared with chlorine and its relatively lower chemical reactivity. The etching yields for mixed Cl2+HBr plasma at different compositions were also measured.
Download or read book Lecture Notes on Principles of Plasma Processing written by Francis F. Chen and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 213 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.
Download or read book Atomic Layer Processing written by Thorsten Lill and published by John Wiley & Sons. This book was released on 2021-06-28 with total page 306 pages. Available in PDF, EPUB and Kindle. Book excerpt: Learn about fundamental and advanced topics in etching with this practical guide Atomic Layer Processing: Semiconductor Dry Etching Technology delivers a hands-on, one-stop resource for understanding etching technologies and their applications. The distinguished scientist, executive, and author offers readers in-depth information on the various etching technologies used in the semiconductor industry, including thermal, isotropic atomic layer, radical, ion-assisted, and reactive ion etching. The book begins with a brief history of etching technology and the role it has played in the information technology revolution, along with a collection of commonly used terminology in the industry. It then moves on to discuss a variety of different etching techniques, before concluding with discussions of the fundamentals of etching reactor design and newly emerging topics in the field such as the role played by artificial intelligence in the technology. Atomic Layer Processing includes a wide variety of other topics as well, all of which contribute to the author's goal of providing the reader with an atomic-level understanding of dry etching technology sufficient to develop specific solutions for existing and emerging semiconductor technologies. Readers will benefit from: A complete discussion of the fundamentals of how to remove atoms from various surfaces An examination of emerging etching technologies, including laser and electron beam assisted etching A treatment of process control in etching technology and the role played by artificial intelligence Analyses of a wide variety of etching methods, including thermal or vapor etching, isotropic atomic layer etching, radical etching, directional atomic layer etching, and more Perfect for materials scientists, semiconductor physicists, and surface chemists, Atomic Layer Processing will also earn a place in the libraries of engineering scientists in industry and academia, as well as anyone involved with the manufacture of semiconductor technology. The author's close involvement with corporate research & development and academic research allows the book to offer a uniquely multifaceted approach to the subject.
Download or read book Meeting Abstracts written by Electrochemical Society and published by . This book was released on 2002 with total page 1590 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Dissertation Abstracts International written by and published by . This book was released on 2004 with total page 788 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Study of Plasma surface Kinetics and Simulation of Feature Profile Evolution in Chlorine Etching of Patterened Polysilicon written by Jane Pei-chen Chang and published by . This book was released on 1998 with total page 218 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Surface Evolution During Integrated Circuit Processing written by Michael Andrew Vyvoda and published by . This book was released on 1999 with total page 446 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Molecular Dynamics written by Lichang Wang and published by BoD – Books on Demand. This book was released on 2012-04-11 with total page 448 pages. Available in PDF, EPUB and Kindle. Book excerpt: Molecular Dynamics is a two-volume compendium of the ever-growing applications of molecular dynamics simulations to solve a wider range of scientific and engineering challenges. The contents illustrate the rapid progress on molecular dynamics simulations in many fields of science and technology, such as nanotechnology, energy research, and biology, due to the advances of new dynamics theories and the extraordinary power of today's computers. This second book begins with an introduction of molecular dynamics simulations to macromolecules and then illustrates the computer experiments using molecular dynamics simulations in the studies of synthetic and biological macromolecules, plasmas, and nanomachines. Coverage of this book includes: Complex formation and dynamics of polymers Dynamics of lipid bilayers, peptides, DNA, RNA, and proteins Complex liquids and plasmas Dynamics of molecules on surfaces Nanofluidics and nanomachines
Download or read book Emerging Technologies and Circuits written by Amara Amara and published by Springer Science & Business Media. This book was released on 2010-09-28 with total page 257 pages. Available in PDF, EPUB and Kindle. Book excerpt: Emerging Technologies and Circuits contains a set of outstanding papers, keynote and tutorials presented during 3 days at the International Conference On Integrated Circuit Design and Technology (ICICDT) held in June 2008 in Minatec, Grenoble.
Download or read book Miniaturized Transistors written by Lado Filipovic and published by MDPI. This book was released on 2019-06-24 with total page 202 pages. Available in PDF, EPUB and Kindle. Book excerpt: What is the future of CMOS? Sustaining increased transistor densities along the path of Moore's Law has become increasingly challenging with limited power budgets, interconnect bandwidths, and fabrication capabilities. In the last decade alone, transistors have undergone significant design makeovers; from planar transistors of ten years ago, technological advancements have accelerated to today's FinFETs, which hardly resemble their bulky ancestors. FinFETs could potentially take us to the 5-nm node, but what comes after it? From gate-all-around devices to single electron transistors and two-dimensional semiconductors, a torrent of research is being carried out in order to design the next transistor generation, engineer the optimal materials, improve the fabrication technology, and properly model future devices. We invite insight from investigators and scientists in the field to showcase their work in this Special Issue with research papers, short communications, and review articles that focus on trends in micro- and nanotechnology from fundamental research to applications.
Download or read book Plasma Density Control for Reactive Ion Etch Variation Reduction in Industrial Microelectronics written by Pete Ivan Klimecky and published by . This book was released on 2002 with total page 426 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Plasma Processing XIII written by G. S. Mathad and published by The Electrochemical Society. This book was released on 2000 with total page 408 pages. Available in PDF, EPUB and Kindle. Book excerpt:
