Download or read book Extreme Ultraviolet Source Development Using Laser Plasmas Containing Tin written by Patrick Hayden and published by . This book was released on 2007 with total page 204 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Angle resolved Studies of Tin Laser Plasma Extreme Ultraviolet Sources written by Oran Morris and published by . This book was released on 2008 with total page 143 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book High power Extreme Ultraviolet Source Based on Gas Jets written by and published by . This book was released on 1998 with total page 11 pages. Available in PDF, EPUB and Kindle. Book excerpt: The authors report on the development of a high power laser plasma Extreme Ultraviolet (EUV) source for Extreme Ultraviolet Lithography. The source is based on the plasma emission of a recycled jet beam of large Xe clusters and produces no particulate debris. The source will be driven by a pulsed laser delivering 1,500 W of focused average power to the cluster jet target. To develop condensers and to optimize source performance, a low power laboratory cluster jet prototype has been used to study the spectroscopy, angular distributions, and EUV source images of the cluster jet plasma emission. In addition, methods to improve the reflectance lifetimes of nearby plasma facing condenser mirrors have been developed. The resulting source yields EUV conversion efficiencies up to 3.8% and mirror lifetimes of 109 plasma pulses.
Download or read book EUV Sources for Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2006 with total page 1104 pages. Available in PDF, EPUB and Kindle. Book excerpt: This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.
Download or read book Extreme Ultraviolet Lithography with Laser Plasma Sources written by and published by . This book was released on 1995 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Ion Emission and Expansion in Laser produced Tin Plasma written by Russell Allen Burdt and published by . This book was released on 2011 with total page 153 pages. Available in PDF, EPUB and Kindle. Book excerpt: Laser produced Sn plasma, in its role as an efficient extreme ultraviolet (EUV) x-ray source, is being studied extensively in support of next generation manufacturing of integrated circuits by nanolithography. The ability to diagnose and manipulate the properties of ions emitted from the laser produced plasma (LPP) must be achieved in order for the technology to meet stringent performance requirements. Here we study the emission and expansion of ions from Sn LPP, in parameter space relevant to the EUV x-ray source application. Several particle and radiation plasma diagnostics, in addition to analytical and numerical analysis, are all used to elucidate the complex relationships between the target properties, irradiation conditions, and resultant plasma and ion properties. Two specific laser systems of current interest to the application, at wavelengths of 1.064 micrometers and 10.6 micrometers are both utilized, which allows for direct comparisons of the effects of laser wavelength on ion properties. Details of the available experimental apparatus, including the Nd:YAG and CO2 laser systems, are discussed first. Following, the design and realization of a custom charged particle plasma diagnostic, hereafter referred to as the ion probe, is described. The successful development of the ion probe enabled measurements of the energy distribution for each charge state of each ion species in expanding plasma, which is a new diagnostic capability. Measurements of mass ablation from Sn plasma produced by a 1.064 micrometer laser are discussed next, specifically the scaling of mass ablation rate with laser intensity. These measurements are useful in the design of mass-limited targets, and also are used to infer mechanisms of laser energy absorption and heat conduction within the plasma. In addition to the ion probe, an EUV spectrometer and a calibrated EUV calorimeter were both utilized as diagnostics to measure the mass ablation rate by complementary methods. Laser intensity was scanned from 3x1011W/cm2 to 2x1012 W/cm2, encompassing parameter space of the EUV x-ray source application to the low end of parameter space of the laser fusion application. Accordingly, previous theoretical results relevant to the laser fusion application can be applied in the data analysis. Experiments at two different laser wavelengths to extensively study the dynamics of ion expansion into vacuum are discussed next. In one set of experiments, the ion probe was used to measure energy distributions for all charge states of Sn ions at laser intensities of 3x1011W/cm2 to 2x1012, from 1.064 micrometer and 10.6 micrometer lasers, respectively. At the longer laser wavelength, higher charge state ions are observed. At both laser wavelengths, the peak ion energies increase approximately linearly as a function of charge state, and all ion energies greatly exceed the initial thermal electron temperature. In a second set of experiments, the distance from the target surface over which the charge state distribution evolves in vacuum is investigated. A Faraday cup translated along the path of plasma expansion is utilized in these measurements. It was found that at the longer laser wavelength, the charge state distribution is decaying to lower charge states over distances up to hundreds of millimeters from the target surface, whereas at the shorter laser wavelength the charge state distribution reaches a frozen-in state within a few tens of millimeters from the target surface. These experimental results are used to infer mechanisms of ion acceleration and recombination in the expanding plasma. In the last section, analytical models of ion expansion into vacuum relevant to the experimental results are first discussed. More detailed analyses are then carried out through numerical simulations. First, a zero-dimensional code following the time evolution of plasma temperature and the population of each ion species is discussed and used to verify some qualitative features observed in the experiments. A more complex one-dimensional Lagrangian hydrodynamics code utilizing the zero-dimensional code as one step in its algorithm is then used to simulate ion properties throughout the spatial expansion into vacuum. Due to the significant number of assumptions made in both codes, only qualitative features of the experiments are reproduced.
Download or read book EUV Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2009 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt: Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Download or read book Opening the Extreme Ultraviolet Lithography Source Bottleneck written by John White (Ph.D.) and published by . This book was released on 2006 with total page 251 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Laser plasma Sources for Extreme ultraviolet Lithography written by Björn A. M. Hansson and published by . This book was released on 2003 with total page 58 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Modern Methods in Collisional Radiative Modeling of Plasmas written by Yuri Ralchenko and published by Springer. This book was released on 2016-02-25 with total page 220 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a compact yet comprehensive overview of recent developments in collisional-radiative (CR) modeling of laboratory and astrophysical plasmas. It describes advances across the entire field, from basic considerations of model completeness to validation and verification of CR models to calculation of plasma kinetic characteristics and spectra in diverse plasmas. Various approaches to CR modeling are presented, together with numerous examples of applications. A number of important topics, such as atomic models for CR modeling, atomic data and its availability and quality, radiation transport, non-Maxwellian effects on plasma emission, ionization potential lowering, and verification and validation of CR models, are thoroughly addressed. Strong emphasis is placed on the most recent developments in the field, such as XFEL spectroscopy. Written by leading international research scientists from a number of key laboratories, the book offers a timely summary of the most recent progress in this area. It will be a useful and practical guide for students and experienced researchers working in plasma spectroscopy, spectra simulations, and related fields.
Download or read book Development of a Gas based Spectral Filter for Carbon Dioxide Laser Produced Plasma Extreme Ultraviolet Sources written by Chimaobi Mbanaso and published by . This book was released on 2012 with total page 176 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 994 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Emerging Lithographic Technologies written by and published by . This book was released on 2007 with total page 540 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Optical Sensing and Spectroscopy written by Hugh J. Byrne and published by SPIE-International Society for Optical Engineering. This book was released on 2005 with total page 744 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Download or read book Method for Generating Extreme Ultraviolet with Mather type Plasma Accelerators for Use in Extreme Ultraviolet Lithography written by and published by . This book was released on 2006 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: A device and method for generating extremely short-wave ultraviolet electromagnetic wave uses two intersecting plasma beams generated by two plasma accelerators. The intersection of the two plasma beams emits electromagnetic radiation and in particular radiation in the extreme ultraviolet wavelength. In the preferred orientation two axially aligned counter streaming plasmas collide to produce an intense source of electromagnetic radiation at the 13.5 nm wavelength. The Mather type plasma accelerators can utilize tin, or lithium covered electrodes. Tin, lithium or xenon can be used as the photon emitting gas source.
Download or read book Lithography written by Michael Wang and published by BoD – Books on Demand. This book was released on 2010-02-01 with total page 680 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography, the fundamental fabrication process of semiconductor devices, plays a critical role in micro- and nano-fabrications and the revolution in high density integrated circuits. This book is the result of inspirations and contributions from many researchers worldwide. Although the inclusion of the book chapters may not be a complete representation of all lithographic arts, it does represent a good collection of contributions in this field. We hope readers will enjoy reading the book as much as we have enjoyed bringing it together. We would like to thank all contributors and authors of this book.
Download or read book Building Electro Optical Systems written by Philip C. D. Hobbs and published by John Wiley & Sons. This book was released on 2022-01-26 with total page 834 pages. Available in PDF, EPUB and Kindle. Book excerpt: Building Electro-Optical Systems In the newly revised third edition of Building Electro-Optical Systems: Making It All Work, renowned Dr. Philip C. D. Hobbs delivers a birds-eye view of all the topics you’ll need to understand for successful optical instrument design and construction. The author draws on his own work as an applied physicist and consultant with over a decade of experience in designing and constructing electro-optical systems from beginning to end. The book’s topics are chosen to allow readers in a variety of disciplines and fields to quickly and confidently decide whether a given device or technique is appropriate for their needs. Using accessible prose and intuitive organization, Building Electro-Optical Systems remains one of the most practical and solution-oriented resources available to graduate students and professionals. The newest edition includes comprehensive revisions that reflect progress in the field of electro-optical instrument design and construction since the second edition was published. It also offers approximately 350 illustrations for visually oriented learners. Readers will also enjoy: A thorough introduction to basic optical calculations, including wave propagation, detection, coherent detection, and interferometers Practical discussions of sources and illuminators, including radiometry, continuum sources, incoherent line sources, lasers, laser noise, and diode laser coherence control Explorations of optical detection, including photodetection in semiconductors and signal-to-noise ratios Full treatments of lenses, prisms, and mirrors, as well as coatings, filters, and surface finishes, and polarization Perfect for graduate students in physics, electrical engineering, optics, and optical engineering, Building Electro-Optical Systems is also an ideal resource for professional designers working in optics, electro-optics, analog electronics, and photonics.
