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Book Exploring Spatial and Compositional Control of Conductive Materials Using Atomic Layer Deposition

Download or read book Exploring Spatial and Compositional Control of Conductive Materials Using Atomic Layer Deposition written by Marja N. Mullings and published by . This book was released on 2013 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Consumer-driven demand for affordable, smaller and more sophisticated devices has driven advances in nanoscale engineering. Many of these products, whether they are consumer electronics, fuel cells or photovoltaics, are comprised of significant quantities of scarce, expensive and sometimes toxic materials. Manufacturing affordable and more environmentally benign products on decreasing length scales requires more economical use of scarce resources and the exploration of alternative and abundant materials. Platinum, as one example, is an outstanding catalyst used in automotive, fine chemical and fuel cell applications; however, it is extremely scarce and costly. Placing platinum only where needed and in small quantities to achieve desired performance may help economize its usage. Because nanoscale feature size and spacing influence catalytic behavior, being able to control these parameters may enable the careful engineering of more powerful platinum catalysts. Another scarce and expensive material whose usage follows rising consumer demand for electronics and photovoltaics is indium. Indium tin oxide is the industry standard transparent conducting oxide (TCO) for high-end electronics. The engineering of high-quality yet poorly-understood indium-free alternative metal oxides using earth-abundant and inexpensive materials may further the development of more powerful and advanced devices. In this dissertation, atomic layer deposition (ALD), a promising ultra-thin film growth technique, is used to selectively deposit small amounts of platinum and to alloy zinc tin oxide in order to address these concerns of scarcity and rising costs. ALD consists of self-limiting, gas-surface half-reactions separated by inert gas purges which allows for highly controlled growth of nanoscale materials. Because ALD is based on surface reactions, selectively blocking nucleation sites by passivating growth surfaces allows for the deposition of material only where desired. The spatial deposition of platinum using ALD is demonstrated in two studies. In the first, a water-soluble polymer, polymethacrylamide (PMAM) acts as a resist to ALD and allowed the deposition of very small features of platinum. In the second study, surface passivation by means of controlling defect site density in self-assembled monolayers (SAMs) also serves as a growth template to control the aerial density and size of platinum nanoparticles deposited via ALD. The highly tunable nature of the chemistry of each precursor half-reaction in ALD enables the careful alloying or doping of materials in any desired ratio. A range of compositions for the indium-free TCO alternative, zinc tin oxide (ZTO), is explored by varying the dosing cycle ratios of tin oxide (SnOx) and zinc oxide (ZnO) in each ALD super cycle. Because the effects of ZTO composition on conduction behavior and optical properties are not well understood, having nanoscale control over how the constituent metal oxides grow on one another is an effective approach to learning more about these properties. As a result, ALD is explored as a flexible system to allow for compositional sampling and variation of film lamination in ZTO. The characteristics of ZTO ALD and the structural and optical properties of these films were shown to vary significantly as a function of degree of lamination and composition. These findings suggest that having nanoscale control over these film characteristics via ALD can lead to further understanding of ZTO. The ALD of ZTO provides an excellent system for the nanoengineering of this material as an indium-free TCO or buffer layer in solar cells.

Book Atomic Layer Deposition

Download or read book Atomic Layer Deposition written by David Cameron and published by MDPI. This book was released on 2020-12-28 with total page 142 pages. Available in PDF, EPUB and Kindle. Book excerpt: Atomic layer deposition (ALD) is a thin film deposition process renowned for its ability to produce layers with unrivaled control of thickness and composition, conformability to extreme three-dimensional structures, and versatility in the materials it can produce. These range from multi-component compounds to elemental metals and structures with compositions that can be adjusted over the thickness of the film. It has expanded from a small-scale batch process to large scale production, also including continuous processing – known as spatial ALD. It has matured into an industrial technology essential for many areas of materials science and engineering from microelectronics to corrosion protection. Its attributes make it a key technology in studying new materials and structures over an enormous range of applications. This Special Issue contains six research articles and one review article that illustrate the breadth of these applications from energy storage in batteries or supercapacitors to catalysis via x-ray, UV, and visible optics.

Book Atomic Layer Deposition

    Book Details:
  • Author : David Cameron
  • Publisher :
  • Release : 2020
  • ISBN : 9783039366538
  • Pages : 142 pages

Download or read book Atomic Layer Deposition written by David Cameron and published by . This book was released on 2020 with total page 142 pages. Available in PDF, EPUB and Kindle. Book excerpt: Atomic layer deposition (ALD) is a thin film deposition process renowned for its ability to produce layers with unrivaled control of thickness and composition, conformability to extreme three-dimensional structures, and versatility in the materials it can produce. These range from multi-component compounds to elemental metals and structures with compositions that can be adjusted over the thickness of the film. It has expanded from a small-scale batch process to large scale production, also including continuous processing - known as spatial ALD. It has matured into an industrial technology essential for many areas of materials science and engineering from microelectronics to corrosion protection. Its attributes make it a key technology in studying new materials and structures over an enormous range of applications. This Special Issue contains six research articles and one review article that illustrate the breadth of these applications from energy storage in batteries or supercapacitors to catalysis via x-ray, UV, and visible optics.

Book Atomic Layer Deposition for Semiconductors

Download or read book Atomic Layer Deposition for Semiconductors written by Cheol Seong Hwang and published by Springer Science & Business Media. This book was released on 2013-10-18 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt: Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.

Book Machine Learning Based Modelling in Atomic Layer Deposition Processes

Download or read book Machine Learning Based Modelling in Atomic Layer Deposition Processes written by Oluwatobi Adeleke and published by CRC Press. This book was released on 2023-12-15 with total page 353 pages. Available in PDF, EPUB and Kindle. Book excerpt: While thin film technology has benefited greatly from artificial intelligence (AI) and machine learning (ML) techniques, there is still much to be learned from a full-scale exploration of these technologies in atomic layer deposition (ALD). This book provides in-depth information regarding the application of ML-based modeling techniques in thin film technology as a standalone approach and integrated with the classical simulation and modeling methods. It is the first of its kind to present detailed information regarding approaches in ML-based modeling, optimization, and prediction of the behaviors and characteristics of ALD for improved process quality control and discovery of new materials. As such, this book fills significant knowledge gaps in the existing resources as it provides extensive information on ML and its applications in film thin technology. Offers an in-depth overview of the fundamentals of thin film technology, state-of-the-art computational simulation approaches in ALD, ML techniques, algorithms, applications, and challenges. Establishes the need for and significance of ML applications in ALD while introducing integration approaches for ML techniques with computation simulation approaches. Explores the application of key techniques in ML, such as predictive analysis, classification techniques, feature engineering, image processing capability, and microstructural analysis of deep learning algorithms and generative model benefits in ALD. Helps readers gain a holistic understanding of the exciting applications of ML-based solutions to ALD problems and apply them to real-world issues. Aimed at materials scientists and engineers, this book fills significant knowledge gaps in existing resources as it provides extensive information on ML and its applications in film thin technology. It also opens space for future intensive research and intriguing opportunities for ML-enhanced ALD processes, which scale from academic to industrial applications. . .

Book Atomic Layer Deposition Applications 11

Download or read book Atomic Layer Deposition Applications 11 written by F. Roozeboom and published by The Electrochemical Society. This book was released on 2015 with total page 281 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Chemical Vapor Deposition for Nanotechnology

Download or read book Chemical Vapor Deposition for Nanotechnology written by Pietro Mandracci and published by BoD – Books on Demand. This book was released on 2019-01-10 with total page 166 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the growth process at the nanoscale. This book aims to contribute to the knowledge of recent developments in CVD technology and its applications. To this aim, important process innovations, such as spatial ALD, direct liquid injection CVD, and electron cyclotron resonance CVD, are presented. Moreover, some of the most recent applications of CVD techniques for the growth of nanomaterials, including graphene, nanofibers, and diamond-like carbon, are described in the book.

Book Chemical Vapour Deposition

    Book Details:
  • Author : Anthony C. Jones
  • Publisher : Royal Society of Chemistry
  • Release : 2009
  • ISBN : 0854044655
  • Pages : 600 pages

Download or read book Chemical Vapour Deposition written by Anthony C. Jones and published by Royal Society of Chemistry. This book was released on 2009 with total page 600 pages. Available in PDF, EPUB and Kindle. Book excerpt: "The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket

Book TMS 2020 149th Annual Meeting   Exhibition Supplemental Proceedings

Download or read book TMS 2020 149th Annual Meeting Exhibition Supplemental Proceedings written by The Minerals, Metals & Materials Society and published by Springer Nature. This book was released on 2020-02-13 with total page 2046 pages. Available in PDF, EPUB and Kindle. Book excerpt: This collection presents papers from the 149th Annual Meeting & Exhibition of The Minerals, Metals & Materials Society.

Book Handbook of Manufacturing Engineering and Technology

Download or read book Handbook of Manufacturing Engineering and Technology written by Andrew Y. C. Nee and published by Springer. This book was released on 2014-10-31 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Springer Reference Work Handbook of Manufacturing Engineering and Technology provides overviews and in-depth and authoritative analyses on the basic and cutting-edge manufacturing technologies and sciences across a broad spectrum of areas. These topics are commonly encountered in industries as well as in academia. Manufacturing engineering curricula across universities are now essential topics covered in major universities worldwide.

Book 21st Century Nanoscience

Download or read book 21st Century Nanoscience written by Klaus D. Sattler and published by CRC Press. This book was released on 2022-01-18 with total page 4153 pages. Available in PDF, EPUB and Kindle. Book excerpt: This 21st Century Nanoscience Handbook will be the most comprehensive, up-to-date large reference work for the field of nanoscience. Handbook of Nanophysics, by the same editor, published in the fall of 2010, was embraced as the first comprehensive reference to consider both fundamental and applied aspects of nanophysics. This follow-up project has been conceived as a necessary expansion and full update that considers the significant advances made in the field since 2010. It goes well beyond the physics as warranted by recent developments in the field. Key Features: Provides the most comprehensive, up-to-date large reference work for the field. Chapters written by international experts in the field. Emphasises presentation and real results and applications. This handbook distinguishes itself from other works by its breadth of coverage, readability and timely topics. The intended readership is very broad, from students and instructors to engineers, physicists, chemists, biologists, biomedical researchers, industry professionals, governmental scientists, and others whose work is impacted by nanotechnology. It will be an indispensable resource in academic, government, and industry libraries worldwide. The fields impacted by nanoscience extend from materials science and engineering to biotechnology, biomedical engineering, medicine, electrical engineering, pharmaceutical science, computer technology, aerospace engineering, mechanical engineering, food science, and beyond.

Book 2D Metal Carbides and Nitrides  MXenes

Download or read book 2D Metal Carbides and Nitrides MXenes written by Babak Anasori and published by Springer Nature. This book was released on 2019-10-30 with total page 534 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book describes the rapidly expanding field of two-dimensional (2D) transition metal carbides and nitrides (MXenes). It covers fundamental knowledge on synthesis, structure, and properties of these new materials, and a description of their processing, scale-up and emerging applications. The ways in which the quickly expanding family of MXenes can outperform other novel nanomaterials in a variety of applications, spanning from energy storage and conversion to electronics; from water science to transportation; and in defense and medical applications, are discussed in detail.

Book 21st Century Nanoscience     A Handbook

Download or read book 21st Century Nanoscience A Handbook written by Klaus D. Sattler and published by CRC Press. This book was released on 2019-11-26 with total page 509 pages. Available in PDF, EPUB and Kindle. Book excerpt: This up-to-date reference is the most comprehensive summary of the field of nanoscience and its applications. It begins with fundamental properties at the nanoscale and then goes well beyond into the practical aspects of the design, synthesis, and use of nanomaterials in various industries. It emphasizes the vast strides made in the field over the past decade – the chapters focus on new, promising directions as well as emerging theoretical and experimental methods. The contents incorporate experimental data and graphs where appropriate, as well as supporting tables and figures with a tutorial approach.

Book Mesoscale Chemistry

    Book Details:
  • Author : National Research Council
  • Publisher : National Academies Press
  • Release : 2015-08-06
  • ISBN : 030937331X
  • Pages : 229 pages

Download or read book Mesoscale Chemistry written by National Research Council and published by National Academies Press. This book was released on 2015-08-06 with total page 229 pages. Available in PDF, EPUB and Kindle. Book excerpt: In the last few decades great strides have been made in chemistry at the nanoscale, where the atomic granularity of matter and the exact positions of individual atoms are key determinants of structure and dynamics. Less attention, however, has been paid to the mesoscale-it is at this scale, in the range extending from large molecules (10 nm) through viruses to eukaryotic cells (10 microns), where interesting ensemble effects and the functionality that is critical to macroscopic phenomenon begins to manifest itself and cannot be described by laws on the scale of atoms and molecules alone. To further explore how knowledge about mesoscale phenomena can impact chemical research and development activities and vice versa, the Chemical Sciences Roundtable of the National Research Council convened a workshop on mesoscale chemistry in November 2014. With a focus on the research on chemical phenomena at the mesoscale, participants examined the opportunities that utilizing those behaviors can have for developing new catalysts, adding new functionality to materials, and increasing our understanding of biological and interfacial systems. The workshop also highlighted some of the challenges for analysis and description of mesoscale structures. This report summarizes the presentations and discussion of the workshop.

Book Atomic Layer Deposition of Nanostructured Materials

Download or read book Atomic Layer Deposition of Nanostructured Materials written by Nicola Pinna and published by John Wiley & Sons. This book was released on 2012-09-19 with total page 463 pages. Available in PDF, EPUB and Kindle. Book excerpt: Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.

Book Handbook of Crystal Growth

Download or read book Handbook of Crystal Growth written by Tom Kuech and published by Elsevier. This book was released on 2014-11-02 with total page 1384 pages. Available in PDF, EPUB and Kindle. Book excerpt: Volume IIIA Basic TechniquesHandbook of Crystal Growth, Second Edition Volume IIIA (Basic Techniques), edited by chemical and biological engineering expert Thomas F. Kuech, presents the underpinning science and technology associated with epitaxial growth as well as highlighting many of the chief and burgeoning areas for epitaxial growth. Volume IIIA focuses on major growth techniques which are used both in the scientific investigation of crystal growth processes and commercial development of advanced epitaxial structures. Techniques based on vacuum deposition, vapor phase epitaxy, and liquid and solid phase epitaxy are presented along with new techniques for the development of three-dimensional nano-and micro-structures.Volume IIIB Materials, Processes, and TechnologyHandbook of Crystal Growth, Second Edition Volume IIIB (Materials, Processes, and Technology), edited by chemical and biological engineering expert Thomas F. Kuech, describes both specific techniques for epitaxial growth as well as an array of materials-specific growth processes. The volume begins by presenting variations on epitaxial growth process where the kinetic processes are used to develop new types of materials at low temperatures. Optical and physical characterizations of epitaxial films are discussed for both in situ and exit to characterization of epitaxial materials. The remainder of the volume presents both the epitaxial growth processes associated with key technology materials as well as unique structures such as monolayer and two dimensional materials.Volume IIIA Basic Techniques - Provides an introduction to the chief epitaxial growth processes and the underpinning scientific concepts used to understand and develop new processes. - Presents new techniques and technologies for the development of three-dimensional structures such as quantum dots, nano-wires, rods and patterned growth - Introduces and utilizes basic concepts of thermodynamics, transport, and a wide cross-section of kinetic processes which form the atomic level text of growth process Volume IIIB Materials, Processes, and Technology - Describes atomic level epitaxial deposition and other low temperature growth techniques - Presents both the development of thermal and lattice mismatched streams as the techniques used to characterize the structural properties of these materials - Presents in-depth discussion of the epitaxial growth techniques associated with silicone silicone-based materials, compound semiconductors, semiconducting nitrides, and refractory materials

Book Multilayer Thin Films

Download or read book Multilayer Thin Films written by Sukumar Basu and published by BoD – Books on Demand. This book was released on 2020-01-15 with total page 274 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book, "Multilayer Thin Films-Versatile Applications for Materials Engineering", includes thirteen chapters related to the preparations, characterizations, and applications in the modern research of materials engineering. The evaluation of nanomaterials in the form of different shapes, sizes, and volumes needed for utilization in different kinds of gadgets and devices. Since the recently developed two-dimensional carbon materials are proving to be immensely important for new configurations in the miniature scale in the modern technology, it is imperative to innovate various atomic and molecular arrangements for the modifications of structural properties. Of late, graphene and graphene-related derivatives have been proven as the most versatile two-dimensional nanomaterials with superb mechanical, electrical, electronic, optical, and magnetic properties. To understand the in-depth technology, an effort has been made to explain the basics of nano dimensional materials. The importance of nano particles in various aspects of nano technology is clearly indicated. There is more than one chapter describing the use of nanomaterials as sensors. In this volume, an effort has been made to clarify the use of such materials from non-conductor to highly conducting species. It is expected that this book will be useful to the postgraduate and research students as this is a multidisciplinary subject.