Download or read book EUV Mask Reflectivity Measurements with Micron scale Spatial Resolution written by and published by . This book was released on 2008 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: The effort to produce defect-free mask blanks for EUV lithography relies on increasing the detection sensitivity of advanced mask inspection tools, operating at several wavelengths. We describe the unique measurement capabilities of a prototype actinic (EUV wavelength) microscope that is capable of detecting small defects and reflectivity changes that occur on the scale of microns to nanometers. Types of defects: (a) Buried Substrate Defects: particles & pits (causes amplitude and/or phase variations); (b) Surface Contamination (reduces reflectivity and (possibly) contrast); (c) Damage from Inspection and Use (reduces the reflectivity of the multilayer coating). This paper presents an overview of several topics where scanning actinic inspection makes a unique contribution to EUVL research. We describe the role of actinic scanning inspection in four cases: defect repair studies; observations of laser damage; after scanning electron microscopy; and native and programmed defects.
Download or read book EUV Mask Reflectivity Measurements with Micro scale Spatial Resolution written by and published by . This book was released on 2008 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: The effort to produce defect-free mask blanks for EUV lithography relies on increasing the detection sensitivity of advanced mask inspection tools, operating at several wavelengths. They describe the unique measurement capabilities of a prototype actinic (EUV) wavelength microscope that is capable of detecting small defects and reflectivity changes that occur on the scale of microns to nanometers. The defects present in EUV masks can appear in many well-known forms: as particles that cause amplitude or phase variations in the reflected field; as surface contamination that reduces reflectivity and contrast; and as damage from inspection and use that reduces the reflectivity of the multilayer coating. This paper presents an overview of several topics where scanning actinic inspection makes a unique contribution to EUVL research. They describe the role of actinic scanning inspection in defect repair studies, observations of laser damage, actinic inspection following scanning electron microscopy, and the detection of both native and programmed defects.
Download or read book Emerging Lithographic Technologies written by and published by . This book was released on 2007 with total page 540 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book X ray EUV Optics for Astronomy and Microscopy written by Richard B. Hoover and published by . This book was released on 1989 with total page 688 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book EUV X ray and Gamma ray Instrumentation for Astronomy written by and published by . This book was released on 1995 with total page 516 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book International Aerospace Abstracts written by and published by . This book was released on 1998 with total page 920 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Technical Digest written by and published by . This book was released on 1995 with total page 334 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Dynamic Methods and Process Advancements in Mechanical Manufacturing and Materials Engineering written by Davim, J. Paulo and published by IGI Global. This book was released on 2012-07-31 with total page 396 pages. Available in PDF, EPUB and Kindle. Book excerpt: Engineering and design are often a necessary steps for an industry to become effective. Industry modeling can help to bridge the communication gap among engineers and system designers. Dynamic Methods and Process Advancements in Mechanical, Manufacturing, and Materials Engineering examines the principles of physics and materials science for analysis, design, manufacturing and maintenance of mechanical equipments and systems. Targeting researchers, practitioners, and academicians, this volume promotes innovative findings in mechanical, manufacturing and materials engineering.
Download or read book Fundamental Principles of Optical Lithography written by Chris Mack and published by John Wiley & Sons. This book was released on 2011-08-10 with total page 503 pages. Available in PDF, EPUB and Kindle. Book excerpt: The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
Download or read book Handbook of Laser Micro and Nano Engineering written by KOJI SUGIOKA. and published by . This book was released on 2019 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook provides a comprehensive review of the entire field of laser micro and nano processing, including not only a detailed introduction to individual laser processing techniques but also the fundamentals of laser-matter interaction and lasers, optics, equipment, diagnostics, as well as monitoring and measurement techniques for laser processing. Consisting of 11 sections, each composed of 4 to 6 chapters written by leading experts in the relevant field. Each main part of the handbook is supervised by its own part editor(s) so that high-quality content as well as completeness are assured. The book provides essential scientific and technical information to researchers and engineers already working in the field as well as students and young scientists planning to work in the area in the future. Lasers found application in materials processing practically since their invention in 1960, and are currently used widely in manufacturing. The main driving force behind this fact is that the lasers can provide unique solutions in material processing with high quality, high efficiency, high flexibility, high resolution, versatility and low environmental load. Macro-processing based on thermal process using infrared lasers such as CO2 lasers has been the mainstream in the early stages, while research and development of micro- and nano-processing are becoming increasingly more active as short wavelength and/or short pulse width lasers have been developed. In particular, recent advances in ultrafast lasers have opened up a new avenue to laser material processing due to the capabilities of ultrahigh precision micro- and nanofabrication of diverse materials. This handbook is the first book covering the basics, the state-of-the-art and important applications of the dynamic and rapidly expanding discipline of laser micro- and nanoengineering. This comprehensive source makes readers familiar with a broad spectrum of approaches to solve all relevant problems in science and technology. This handbook is the ultimate desk reference for all people working in the field.
Download or read book CLEO Pacific Rim 95 written by and published by Institute of Electrical & Electronics Engineers(IEEE). This book was released on 1995 with total page 336 pages. Available in PDF, EPUB and Kindle. Book excerpt: The close tie between basic scientific efforts and new developments of industrial and other applications are reported in these papers. The extension into consumer opto-electronics, especially displays is described, Nonlinear and quantum optics are finding their niche in optical computing applications. Advances in lightwave communications components and techniques are presented."
Download or read book Harnessing Light written by National Research Council and published by National Academies Press. This book was released on 1998-09-25 with total page 358 pages. Available in PDF, EPUB and Kindle. Book excerpt: Optical science and engineering affect almost every aspect of our lives. Millions of miles of optical fiber carry voice and data signals around the world. Lasers are used in surgery of the retina, kidneys, and heart. New high-efficiency light sources promise dramatic reductions in electricity consumption. Night-vision equipment and satellite surveillance are changing how wars are fought. Industry uses optical methods in everything from the production of computer chips to the construction of tunnels. Harnessing Light surveys this multitude of applications, as well as the status of the optics industry and of research and education in optics, and identifies actions that could enhance the field's contributions to society and facilitate its continued technical development.
Download or read book Fourier Ptychographic Imaging written by Guoan Zheng and published by Morgan & Claypool Publishers. This book was released on 2016-06-30 with total page 94 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book demonstrates the concept of Fourier ptychography, a new imaging technique that bypasses the resolution limit of the employed optics. In particular, it transforms the general challenge of high-throughput, high-resolution imaging from one that is coupled to the physical limitations of the optics to one that is solvable through computation. Demonstrated in a tutorial form and providing many MATLAB® simulation examples for the reader, it also discusses the experimental implementation and recent developments of Fourier ptychography. This book will be of interest to researchers and engineers learning simulation techniques for Fourier optics and the Fourier ptychography concept.
Download or read book Nanofabrication written by Ampere A. Tseng and published by World Scientific. This book was released on 2008 with total page 583 pages. Available in PDF, EPUB and Kindle. Book excerpt: Many of the devices and systems used in modern industry are becoming progressively smaller and have reached the nanoscale domain. Nanofabrication aims at building nanoscale structures, which can act as components, devices, or systems, in large quantities at potentially low cost. Nanofabrication is vital to all nanotechnology fields, especially for the realization of nanotechnology that involves the traditional areas across engineering and science. This is the first book solely dedicated to the manufacturing technology in nanoscale structures, devices, and systems and is designed to satisfy the growing demands of researchers, professionals, and graduate students. Both conventional and non-conventional fabrication technologies are introduced with emphasis on multidisciplinary principles, methodologies, and practical applications. While conventional technologies consider the emerging techniques developed for next generation lithography, non-conventional techniques include scanning probe microscopy lithography, self-assembly, and imprint lithography, as well as techniques specifically developed for making carbon tubes and molecular circuits and devices. Sample Chapter(s). Chapter 1: Atom, Molecule, and Nanocluster Manipulations for Nanostructure Fabrication Using Scanning Probe Microscopy (3,320 KB). Contents: Atomic Force Microscope Lithography (N Kawasegi et al.); Nanowire Assembly and Integration (Z Gu & D H Gracias); Extreme Ultraviolet Lithography (H Kinoshita); Electron Projection Lithography (T Miura et al.); Electron Beam Direct Writing (K Yamazaki); Electron Beam Induced Deposition (K Mitsuishi); Focused Ion Beams and Interaction with Solids (T Ishitani et al.); Nanofabrication of Nanoelectromechanical Systems (NEMS): Emerging Techniques (K L Ekinci & J Brugger); and other papers. Readership: Researchers, professionals, and graduate students in the fields of nanoengineering and nanoscience.
Download or read book Materials and Processes for Next Generation Lithography written by and published by Elsevier. This book was released on 2016-11-08 with total page 636 pages. Available in PDF, EPUB and Kindle. Book excerpt: As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. - Assembles up-to-date information from the world's premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation - Includes information on processing and metrology techniques - Brings together multiple approaches to litho pattern recording from academia and industry in one place
Download or read book Vacuum Ultraviolet Spectroscopy written by James A. Samson and published by Academic Press. This book was released on 2000-12-21 with total page 317 pages. Available in PDF, EPUB and Kindle. Book excerpt: Techniques of Vacuum Ultraviolet Spectroscopy was first published in 1967. In the three decades since, the techniques associated with vacuum ultraviolet spectroscopy have been greatly expanded. Originally published as two volumes in the serial "Experimental Methods in the Physical Sciences," Vacuum Ultraviolet Spectroscopy combines in one paperback volume information on the many advances in vacuum ultraviolet (VUV) research. In addition, the book provides students and researchers with concise reviews of the important aspects of designing experiments in the VUV region.This is the only comprehensive treatise describing the use of synchrotron and other light sources for research, along with the new technologies in optical elements, multilayers, mirror coatings, soft x-ray zone plates, VUV detectors, interferometric spectrometers, and subjects such as spectromicroscopy, lithography, and photon-induced fluorescence. Vacuum Ultraviolet Spectroscopy is an ideal handbook both for the beginner and for the experienced researcher in any field requiring the use of VUV radiation. Key Features* Detailed review of synchrotron radiation sources including undulators and wigglers* Comprehensive outline of monochromator design* Concise review of optics theory for multilayers, spectrometers, and zone plates* Information about other important VUV sources such as laser produced plasmas and Electron Beam Ion Trap (EBIT) sources* Applications such as spectromicroscopy, lithography, and fluorescence
Download or read book Principles of Lithography written by Harry J. Levinson and published by SPIE Press. This book was released on 2005 with total page 446 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.
