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Book Environmentally Focused Patterning and Processing of Polymer Thin Films by Initiated Chemical Vapor Deposition  iCVD  and Oxidative Chemical Vapor Deposition  oCVD

Download or read book Environmentally Focused Patterning and Processing of Polymer Thin Films by Initiated Chemical Vapor Deposition iCVD and Oxidative Chemical Vapor Deposition oCVD written by Nathan Jeffrey Trujillo and published by . This book was released on 2010 with total page 216 pages. Available in PDF, EPUB and Kindle. Book excerpt: The new millennium has brought fourth many technological innovations made possible by the advancement of high speed integrated circuits. The materials and energy requirements for a microchip is orders of magnitude higher than that of "traditional" goods, and current materials management requirements for EHS friendly low-k processing require a 10% annual increase in raw materials utilization. Initiated Chemical Vapor Deposition (iCVD) is a low-energy, one step, solvent-free process for producing polymeric thin films This thesis describes the deposition of a novel low-k iCVD precursor, 1,3,5,7-tetravinyltetramethylcylcotetrasiloxane (V4D4). The high degree of organic content in the as-deposited film affords the ability to tune the film's properties by annealing. The incorporation of atmospheric oxygen at high temperatures enhances the mechanical and electrical properties of the films. Films annealed at 410'C have a dielectric constant of 2.15, hardness and modulus of 0.78 GPa and 5.4 GPa, respectively. These values are comparatively better than previously reported results for CVD low-k films. Environmentally friendly low-k processing encompasses materials and energy management in the entire integration process, including lithography. Colloidal lithography was combined with iCVD and capillary force lithography to create spatially addressable grafted polymer pattern nanostructures, without the need for expensive lithography tools. Using this method, we pattern our novel low dielectric constant polymer down to 25 nm without the need for environmentally harmful solvents. Furthermore, these grafted patterns were produced for a broad material set of functional organic, fluorinated, and silicon containing polymers. A variation of this process created amine functionalized biocompatible conducting polymer nanostructure patterns for biosensor applications. These were fabricated using grafting reactions between oxidative chemical vapor deposition (oCVD) PEDOT conducting polymers and amine functionalized polystyrene (PS) colloidal templates. Carboxylate containing oCVD copolymer patterns were used to immobilized fluorescent dyes. Fluorescent colloidal particles were assembled within dyed PEDOT-co-TAA copolymer nanobowl templates to create bifunctional patterns for optical data storage applications. Finally, UV and e-beam lithography were used to pattern covalently tethered vinyl monolayers for resist-free patterning of iCVD and oCVD polymers, using environmentally innocuous solvents.

Book Initiated Chemical Vapor Deposition of Polymer Thin Films and Coatings for Biological Applications

Download or read book Initiated Chemical Vapor Deposition of Polymer Thin Films and Coatings for Biological Applications written by Ranjita K. Bose and published by . This book was released on 2011 with total page 214 pages. Available in PDF, EPUB and Kindle. Book excerpt: Advisor: Kenneth Lau.

Book Conformal Polymer Thin Films on Structurally Complex Surfaces by Initiated Chemical Vapor Deposition

Download or read book Conformal Polymer Thin Films on Structurally Complex Surfaces by Initiated Chemical Vapor Deposition written by Chia-Yun (Sharon) Hsieh and published by . This book was released on 2016 with total page 276 pages. Available in PDF, EPUB and Kindle. Book excerpt: Initiated chemical vapor deposition (iCVD) is a novel CVD technique for forming polymer thin films. Compared to traditional thermal and plasma CVD methods, iCVD operates at low substrate temperature and low power conditions. This has the benefit of enabling well-defined reaction pathways for polymerization that lead to stoichiometric polymers. The iCVD approach has been investigated for many polymer chemistries and the resulting iCVD polymers have been shown to possess analogous structures and properties as bulk polymers from liquid phase synthesis. Among iCVD reactions, free radical polymerization is the most common, where vinyl monomers can be polymerized with peroxide free radical initiators. Recently, cationic ring opening polymerization via iCVD was demonstrated by applying boron trifluoride diethyl etherate as a cationic initiator for the polymerization of ethylene oxide. This work will demonstrate for the first time the iCVD synthesis of polyglycidol (PGL) via cationic ring opening polymerization of glycidol. iCVD PGL shows similar structure and properties as liquid-synthesized PGL reported in literature based on spectroscopic analysis. Furthermore, the iCVD deposition behavior under different modes of iCVD polymerization environment - surface-driven, gas-driven, and supersaturation - will be discussed for forming polyglycidol (PGL), poly(2-hydroxyethyl methacrylate) (PHEMA), poly(tetrafluoroethylene) (PTFE) and polyvinylpyrrolidone (PVP) coatings on structurally complex substrates, including nanopores, nanorods, and microstructures. Two major parameters Pm/Psat that represents the ratio of the partial pressure of the monomer to its saturation pressure, and Knudsen number (Kn) will be evaluated and related with the observed deposition behavior. Surface-driven iCVD of PGL and PHEMA have been found to conformally deposit in nanoporous TiO2 and microcatheters by carefully controlling Pm/Psat over a wide range of Kn. However, with gas-driven iCVD of PTFE, although conformal coatings have been achieved on micropillars and nanorods, coating within nanoporous networks at very large Kn was difficult even with careful control of Pm/Psat. It is believed that the PTFE polymerization is significantly driven by gas phase reactions that are not well controlled with a surface Pm/Psat parameter and, by moving to smaller and more confined features, the gas phase chemistries dominate and interfere with surface polymerization. By controlling Pm/Psat > 1, i.e. in a supersaturated monomer state, a recent iCVD processing discovery was made. Under supersaturation conditions, PVP was found to selectively grow on certain material surfaces and not others. This is believed to be due to differences in wettability of the monomer that dictates where the polymer grows, and enables directed patterning through iCVD. With the ability to deposit polymer coatings on different substrates, this work will illustrate a number of applications that highlight iCVD as an enabling technology. iCVD of PHEMA on ventricular catheters is found to be an effective coating for reducing undesired cell attachment in vitro by 77% after 17 days in cultured media compared to bare catheters, and so has the potential for improving catheter viability and reliability. iCVD of PTFE on silicon micropillars and nickel nanorod arrays is able to produce effective non-wetting (superhydrophobic) surface structures for enhancing latent heat transfer. iCVD of PGL in mesoporous TiO2 nanoparticle networks produces polymer nanocomposites with ultrahigh nanofiller loading (>80 wt%), offering a valuable platform for studying polymer nanocomposites with uniform and ultrahigh loading that exceed conventional processing limits (10-15 wt%) due to filler particle aggregation. As a result, the PGL glass transition temperature is found to increase significantly by 50-60 ℗ʻC compared to bulk PGL films without TiO2 nanofiller. The enhanced glass transition is attributed to appreciable hydrogen bonding interactions between PGL and TiO2.

Book Enabling Integration of Vapor deposited Polymer Thin Films

Download or read book Enabling Integration of Vapor deposited Polymer Thin Films written by Christy Danielle Petruczok and published by . This book was released on 2014 with total page 178 pages. Available in PDF, EPUB and Kindle. Book excerpt: Initiated Chemical Vapor Deposition (iCVD) is a versatile, one-step process for synthesizing conformal and functional polymer thin films on a variety of substrates. This thesis emphasizes the development of tools to further enable the use of iCVD for industrial applications. The ability to pattern polymer thin films is a prerequisite for device fabrication. Two methods were developed for patterning iCVD polymers. The first technique facilitated patterning of nano- and microscale features of any iCVD thin film on planar surfaces. Retention of polymer functionality was demonstrated by incorporating the features into high-resolution resistive sensors. The second method adapted photolithographic techniques to achieve patterning on highly curved surfaces. Non-planar substrates were coated with a uniform layer of a functionalized, photoreactive iCVD polymer and exposed to ultraviolet light through a flexible mask. Exposed regions became insoluble in a developing solvent. The resolution and sensitivity of this iCVD-based negative photoresist were comparable to those of commercial products. Additionally, the patterned polymer was used as a mask for patterning metal on planar and curved surfaces. iCVD is typically a semi-continuous process. A batch process was investigated in order to minimize the use of expensive and corrosive reactants. The chemical functionality and conformality of the films were unaffected by the change in processing mode. Reaction yield was improved by one to two orders of magnitude for several film chemistries. iCVD is also unique in that it enables the deposition of cross-linked polymer films, which are difficult to create using conventional, solution-based methods. To potentially enhance durability, cross-linked poly(divinylbenzene) and poly(4-vinylpyridine-co-divinylbenzene) films were synthesized via iCVD. This is the first vapor-phase synthesis of the copolymer, which is a major component of many commercial ion exchange membranes. The degree of cross-linking was quantified using spectroscopic methods and was tightly controlled by adjusting the flow rate of divinylbenzene. Corresponding changes in the elastic moduli of the films were confirmed using nanoindentation. The first vapor-phase synthesis of poly(vinyl cinnamate) was also demonstrated. The cross-linking density of this polymer increases upon exposure to ultraviolet light and is readily quantifiable. Vinyl cinnamate was incorporated into a copolymer with N-isopropylacrylamide, yielding a temperature and light-responsive thin film.

Book Oxidative and Initiated Chemical Vapor Deposition for Application to Organic Electronics

Download or read book Oxidative and Initiated Chemical Vapor Deposition for Application to Organic Electronics written by Sung Gap Im and published by . This book was released on 2009 with total page 450 pages. Available in PDF, EPUB and Kindle. Book excerpt: (Cont.) A click chemistry functionalizable poly (propargyl methacrylate) (PPMA) films also were prepared via initiated chemical vapor deposition (iCVD). PPMA itself exhibits e-beam sensitivity and hence can be directly patterned via electron beam (e-beam) lithography without requiring a conventional resist layer. With this PPMA layer, a nanopatterned multi-functional surface was also fabricated and we demonstrated the covalent functionalization of two independent components in a one-pot, self-sorted area-selective process, performed in an aqueous solution at room temperature, having conditions which are bioompatible. Finally, we report a novel nano-adhesive layer deposited by the iCVD process. An epoxy-containing polymer, poly (glycidyl methacrylate) (PGMA) was used as a nano-adhesive layer. No leakage was observed up to the test pressure of 50 psia from the resulting microfluidic devices.

Book Functional and Responsive Surfaces Via Initiated Chemical Vapor Deposition  iCVD

Download or read book Functional and Responsive Surfaces Via Initiated Chemical Vapor Deposition iCVD written by Mahriah Elizabeth Alf and published by . This book was released on 2011 with total page 133 pages. Available in PDF, EPUB and Kindle. Book excerpt: Stimuli-responsive polymers provide a method to control system behavior through the use of an external stimulus, such as temperature, pH, or electric fields among others. Temperature-responsive polymers, especially those based on N-isopropylacryalmide (NIPAAm), are of particular research interest due the ease of implementation of temperature changes to systems as well as the large accessible range of hydrophilic / hydrophobic switching. Initiated chemical vapor deposition (iCVD) is shown to be a useful technique for surface modification with NIPAAm-based polymers due to its ability to provide complete functional retention and applicability to "real world" substrates, which many times have varying compositions and / or micro- or nano-structured surfaces. The novel copolymer thin film of iCVD poly(NIPAAm-co-di(ethylene glycol) divinyl ether) (p(NIPAAm-co-DEGDVE)) is shown to exhibit a sharp lower critical solution temperature (LCST) transition, better-than or equivalent to other surface modification techniques, while also being able to achieve a wider range of thicknesses from the nano- to micro-scale, which is especially useful for flow control, actuator or sensor applications. The bottom-up film growth of iCVD allows for compositional gradients throughout the thickness of a polymer film. A novel NIPAAm-based copolymer with a NIPAAm-rich surface layer is developed which exhibits both fast swelling and deswelling kinetics. Quartz crystal microbalance with dissipation monitoring (QCM-D) is used to study the transition behavior of these films. These data provide valuable information relating to the polymer conformational changes throughout the transition region and help elucidate thermodynamic and mesh characteristics of the films. Finally, an application is developed which utilizes both iCVD and a complementary technique, oxidative CVD (oCVD), to create self-heating membranes with responsive permeability characteristics.

Book Initiated Chemical Vapor Deposition  iCVD  Polymer Thin Films

Download or read book Initiated Chemical Vapor Deposition iCVD Polymer Thin Films written by Vijay Jain Bharamaiah Jeevendrakumar and published by . This book was released on 2015 with total page 300 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Initiated Chemical Vapor Deposition of Polymeric Thin Films

Download or read book Initiated Chemical Vapor Deposition of Polymeric Thin Films written by Kelvin Chan (Ph. D.) and published by . This book was released on 2005 with total page 332 pages. Available in PDF, EPUB and Kindle. Book excerpt: (cont.) Growth rates and molecular weights, crucial parameters for polymeric thin films, were found to be highly dependent on the surface concentrations of monomers, leading to the conclusion that polymer formation occurs predominantly on the surface of the substrate. This conclusion also infers that controlling the surface concentrations of monomers can lead to copolymers/terpolymers with well-defined compositions, which was demonstrated in the iCVD of PHEMA-based thin films. iCVD therefore can be extended to complex polymer systems with multiple monomeric building blocks. Photo- initiatied chemical vapor deposition (piCVD) using a volatile photoinitiator is introduced for the first time in this thesis. piCVD possesses all the benefits of iCVD over conventional processes but uses a photochemical initiation mechanism that simplifies chamber design and potentially allows self-patterning during deposition.

Book Construction of an Initiated Chemical Vapor Deposition  iCVD  Reactor and Deposition of Polytetrafluoroethylene  PTFE  Thin Films Using Perfluoro 1 octanesulfonyl Fluoride as the Initiator

Download or read book Construction of an Initiated Chemical Vapor Deposition iCVD Reactor and Deposition of Polytetrafluoroethylene PTFE Thin Films Using Perfluoro 1 octanesulfonyl Fluoride as the Initiator written by Edgar Kiprop Kosgey and published by . This book was released on 2015 with total page 132 pages. Available in PDF, EPUB and Kindle. Book excerpt: Initiated Chemical Vapor Deposition (iCVD) is a surface polymerization technique that is different from other traditional chemical vapor deposition (CVD) techniques. iCVD is carried under a vacuum without the use of solvents, therefore eliminating contaminations. An initiator and a monomer are metered into a vacuum reactor chamber. Inside the reaction chamber is an array of resistively heated filaments and a cooled substrate stage. Monomer species adsorb on to the cooled substrate surface underneath the filament array. The thermal energy from the resistively heated filaments breaks the bonds in the initiator molecule, generating free radicals. These generated free radicals chemisorb to the monomer initiating an in situ free radical polymerization reaction which results in the formation of a polymer thin film. The overall objective of this research was to assemble a custom-built iCVD reactor and use it to grow polytetrafluoroethylene (PTFE) thin films. Perfluoro-1-octanesulfonyl fluoride (PFOSF) was used as the initiator while hexafluoropropylene oxide (HFPO) was used as the monomer. HPFO is well known for its good thermal decomposition. Nichrome filaments were resistively heated at temperature less than 400 °C and substrate surface cooled between 10 °C and 35 °C. Various characterization techniques such FTIR, XPS, SEM, and EDX were performed on as-deposited iCVD PTFE thin films. FTIR spectra of iCVD PTFE showed that the as-deposited iCVD thin films are spectroscopically identical to bulk PTFE.

Book Initiated Chemical Vapor Deposition of Functional Polyacrylic Thin Films

Download or read book Initiated Chemical Vapor Deposition of Functional Polyacrylic Thin Films written by Yu Mao and published by . This book was released on 2005 with total page 226 pages. Available in PDF, EPUB and Kindle. Book excerpt: Initiated chemical vapor deposition (iCVD) was explored as a novel method for synthesis of functional polyacrylic thin films. The process introduces a peroxide initiator, which can be decomposed at low temperatures (

Book Chemical Vapor Deposition

    Book Details:
  • Author : S Neralla
  • Publisher : BoD – Books on Demand
  • Release : 2016-08-31
  • ISBN : 9535125729
  • Pages : 292 pages

Download or read book Chemical Vapor Deposition written by S Neralla and published by BoD – Books on Demand. This book was released on 2016-08-31 with total page 292 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.

Book Design of an Initiated Chemical Vapor Deposition Process to Grow Polymer Films

Download or read book Design of an Initiated Chemical Vapor Deposition Process to Grow Polymer Films written by Kavya Ramachandra and published by . This book was released on 2011 with total page 118 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book CVD Polymers

Download or read book CVD Polymers written by Karen K. Gleason and published by John Wiley & Sons. This book was released on 2015-04-01 with total page 484 pages. Available in PDF, EPUB and Kindle. Book excerpt: The method of CVD (chemical vapor deposition) is a versatile technique to fabricate high-quality thin films and structured surfaces in the nanometer regime from the vapor phase. Already widely used for the deposition of inorganic materials in the semiconductor industry, CVD has become the method of choice in many applications to process polymers as well. This highly scalable technique allows for synthesizing high-purity, defect-free films and for systematically tuning their chemical, mechanical and physical properties. In addition, vapor phase processing is critical for the deposition of insoluble materials including fluoropolymers, electrically conductive polymers, and highly crosslinked organic networks. Furthermore, CVD enables the coating of substrates which would otherwise dissolve or swell upon exposure to solvents. The scope of the book encompasses CVD polymerization processes which directly translate the chemical mechanisms of traditional polymer synthesis and organic synthesis in homogeneous liquids into heterogeneous processes for the modification of solid surfaces. The book is structured into four parts, complemented by an introductory overview of the diverse process strategies for CVD of polymeric materials. The first part on the fundamentals of CVD polymers is followed by a detailed coverage of the materials chemistry of CVD polymers, including the main synthesis mechanisms and the resultant classes of materials. The third part focuses on the applications of these materials such as membrane modification and device fabrication. The final part discusses the potential for scale-up and commercialization of CVD polymers.

Book Chemical Vapor Deposition

Download or read book Chemical Vapor Deposition written by Jong-Hee Park and published by ASM International. This book was released on 2001 with total page 477 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Magneto Luminous Chemical Vapor Deposition

Download or read book Magneto Luminous Chemical Vapor Deposition written by Hirotsugu Yasuda and published by CRC Press. This book was released on 2011-04-04 with total page 256 pages. Available in PDF, EPUB and Kindle. Book excerpt: The magneto luminous chemical vapor deposition (MLCVD) method is the perfect example of the "front-end green process." It employs an entirely new process that expends the minimum amount of materials in gas phase, yields virtually no effluent, and therefore requires no environmental remediation. Unlike the "back-end green process," which calls for a

Book Advances in Chemical Vapor Deposition

Download or read book Advances in Chemical Vapor Deposition written by Dimitra Vernardou and published by MDPI. This book was released on 2021-01-15 with total page 94 pages. Available in PDF, EPUB and Kindle. Book excerpt: Pursuing a scalable production methodology for materials and advancing it from the laboratory to industry is beneficial to novel daily-life applications. From this perspective, chemical vapor deposition (CVD) offers a compromise between efficiency, controllability, tunability and excellent run-to-run repeatability in the coverage of monolayers on substrates. Hence, CVD meets all of the requirements for industrialization in basically all areas, including polymer coatings, metals, water-filtration systems, solar cells and so on. The Special Issue “Advances in Chemical Vapor Deposition” is dedicated to providing an overview of the latest experimental findings and identifying the growth parameters and characteristics of perovskites, TiO2, Al2O3, VO2 and V2O5 with desired qualities for potentially useful devices.