Download or read book Electron Beam induced Organometallic Chemical Vapor Deposition for Nanostructure Fabrication written by Hong Jiang and published by . This book was released on 2000 with total page 262 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Electron Beam Induced Chemistry written by Anthony Dominic Garetto and published by . This book was released on 2007 with total page 121 pages. Available in PDF, EPUB and Kindle. Book excerpt: Keywords: chemical vapor deposition, nanofabrication, electron beam induced deposition, Electron Beam Induced Chemistry.
Download or read book Functional Nanostructures Fabricated by Focused Electron Ion Beam Induced Deposition written by Rosa Córdoba Castillo and published by Springer Science & Business Media. This book was released on 2013-10-08 with total page 157 pages. Available in PDF, EPUB and Kindle. Book excerpt: This thesis constitutes a detailed study of functional nanostructures (ferromagnetic, superconducting, metallic and semiconducting) fabricated by focused electron/ion beam induced deposition techniques. The nanostructures were grown using different precursor materials such as Co2(CO)8, Fe2(CO)9, W(CO)6, (CH3)3Pt(CpCH3) and were characterized by a wide range of techniques. This work reports results obtained for the morphology, the microstructure, the composition, the electrical transport mechanism, magnetic and superconducting properties of nanostructures. The results offers exciting prospects in a wide range of applications in nanotechnology and condensed matter physics.
Download or read book Nanofabrication Using Focused Ion and Electron Beams written by Ivo Utke and published by Oxford University Press. This book was released on 2012-05-01 with total page 840 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanofabrication Using Focused Ion and Electron Beams presents fundamentals of the interaction of focused ion and electron beams (FIB/FEB) with surfaces, as well as numerous applications of these techniques for nanofabrication involving different materials and devices. The book begins by describing the historical evolution of FIB and FEB systems, applied first for micro- and more recently for nanofabrication and prototyping, practical solutions available in the market for different applications, and current trends in development of tools and their integration in a fast growing field of nanofabrication and nanocharacterization. Limitations of the FIB/FEB techniques, especially important when nanoscale resolution is considered, as well as possible ways to overcome the experimental difficulties in creating new nanodevices and improving resolution of processing, are outlined. Chapters include tutorials describing fundamental aspects of the interaction of beams (FIB/FEB) with surfaces, nanostructures and adsorbed molecules; electron and ion beam chemistries; basic theory, design and configuration of equipment; simulations of processes; basic solutions for nanoprototyping. Emerging technologies as processing by cluster beams are also discussed. In addition, the book considers numerous applications of these techniques (milling, etching, deposition) for nanolithography, nanofabrication and characterization, involving different nanostructured materials and devices. Its main focus is on practical details of using focused ion and electron beams with gas assistance (deposition and etching) and without gas assistance (milling/cutting) for fabrication of devices from the fields of nanoelectronics, nanophotonics, nanomagnetics, functionalized scanning probe tips, nanosensors and other types of NEMS (nanoelectromechanical systems). Special attention is given to strategies designed to overcome limitations of the techniques (e.g., due to damaging produced by energetic ions interacting with matter), particularly those involving multi-step processes and multi-layer materials. Through its thorough demonstration of fundamental concepts and its presentation of a wide range of technologies developed for specific applications, this volume is ideal for researches from many different disciplines, as well as engineers and professors in nanotechnology and nanoscience.
Download or read book Advances in Imaging and Electron Physics written by Peter W. Hawkes and published by Elsevier. This book was released on 2011-07-29 with total page 263 pages. Available in PDF, EPUB and Kindle. Book excerpt: Advances in Imaging and Electron Physics merges two long-running serials-Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. This series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.
Download or read book Nanostructure Fabrication Using Electron Beam Irradiation of Organometallic Compounds written by Thomas Robert Bedson and published by . This book was released on 2001 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Proceedings of the 48th Annual Midwest Solid State Conference and the Midwest Solid State Theory Symposium Grand Forks US October 13 15 2000 written by John Wagner and published by . This book was released on 2001 with total page 604 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chemical Vapor Deposition for Nanotechnology written by Pietro Mandracci and published by BoD – Books on Demand. This book was released on 2019-01-10 with total page 166 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the growth process at the nanoscale. This book aims to contribute to the knowledge of recent developments in CVD technology and its applications. To this aim, important process innovations, such as spatial ALD, direct liquid injection CVD, and electron cyclotron resonance CVD, are presented. Moreover, some of the most recent applications of CVD techniques for the growth of nanomaterials, including graphene, nanofibers, and diamond-like carbon, are described in the book.
Download or read book Atomic Layer Deposition of Nanostructured Materials written by Nicola Pinna and published by John Wiley & Sons. This book was released on 2012-09-19 with total page 463 pages. Available in PDF, EPUB and Kindle. Book excerpt: Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.
Download or read book The Chemistry of Metal CVD written by Toivo T. Kodas and published by John Wiley & Sons. This book was released on 2008-09-26 with total page 562 pages. Available in PDF, EPUB and Kindle. Book excerpt: High purity, thin metal coatings have a variety of important commercial applications, for example, in the microelectronics industry, as catalysts, as protective and decorative coatings as well as in gas-diffusion barriers. This book offers detailed, up- to-date coverage of the chemistry behind the vapor deposition of different metals from organometallic precursors. In nine chapters, the CVD of metals including aluminum, tungsten, gold, silver, platinum, palladium, nickel, as well as copper from copper(I) and copper(II) compounds is covered. The synthesis and properties of the precursors, the growth process, morphology, quality and adhesion of the resulting films as well as laser- assisted, ion- assisted and plasma-assisted methods are discussed. Present applications and prospects for future developments are summarized. With ca. 1000 references and a glossary, this book is a unique source of in-depth information. It is indispensable for chemists, physicists, engineers and materials scientists working with metal- coating processes and technologies. From Reviews: 'I highly recommend this book to anyone interested in learning more about the chemistry of metal CVD.' J. Am Chem. Soc.
Download or read book In Situ Transmission Electron Microscopy written by Litao Sun and published by Springer Nature. This book was released on 2023-03-11 with total page 378 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book focuses on in-situ transmission electron microscopy (TEM), an investigatory technique used to observe a sample’s response to a given stimulus (including electron irradiation, thermal excitation, mechanical force, optical excitation, electric and magnetic fields) at the nanoscale in real time. The book introduces readers to the technical strategy behind the in-situ technique and its developments. It reviews the research frontiers of using in-situ TEM in energy conversion and storage, catalysis, nanomaterials synthesis, nanoelectronics, etc. Furthermore, it discusses the future prospects for in-situ TEM. The book offers a valuable guide for all undergraduate and graduate students who are interested in TEM characterization technology. It also serves as a reference source on cutting-edge in-situ techniques for researchers and engineers.
Download or read book Oxidative and Initiated Chemical Vapor Deposition for Application to Organic Electronics written by Sung Gap Im and published by . This book was released on 2009 with total page 450 pages. Available in PDF, EPUB and Kindle. Book excerpt: (Cont.) A click chemistry functionalizable poly (propargyl methacrylate) (PPMA) films also were prepared via initiated chemical vapor deposition (iCVD). PPMA itself exhibits e-beam sensitivity and hence can be directly patterned via electron beam (e-beam) lithography without requiring a conventional resist layer. With this PPMA layer, a nanopatterned multi-functional surface was also fabricated and we demonstrated the covalent functionalization of two independent components in a one-pot, self-sorted area-selective process, performed in an aqueous solution at room temperature, having conditions which are bioompatible. Finally, we report a novel nano-adhesive layer deposited by the iCVD process. An epoxy-containing polymer, poly (glycidyl methacrylate) (PGMA) was used as a nano-adhesive layer. No leakage was observed up to the test pressure of 50 psia from the resulting microfluidic devices.
Download or read book Experimental Theoretical and Device Application Development of Nanoscale Focused Electron beam induced Deposition written by and published by . This book was released on 2005 with total page 200 pages. Available in PDF, EPUB and Kindle. Book excerpt: To elucidate the effects of beam heating in electron beam-induced deposition (EBID), a Monte-Carlo electron-solid interaction model has been employed to calculate the energy deposition profiles in bulk and nanostructured SiO2. Using these profiles, a finite element model was used to predict the nanostructure tip temperatures for standard experimental EBID conditions. Depending on the beam energy, beam current, and nanostructure geometry, the heat generated can be substantial. This heat source can subsequently limit the EBID growth by thermally reducing the mean stay time of the precursor gas. Temperature dependent EBID growth experiments qualitatively verified the results of the electron beam-heating model. Additionally, experimental trends for the growth rate as a function of deposition time supported the conclusion that electron beam-induced heating can play a major role in limiting the EBID growth rate of SiO2 nanostructures. In an EBID application development, two approaches to maskless, direct-write lithography using electron beam-induced deposition (EBID) to produce ultra-thin masking layers were investigated. A single layer process used directly written SiO[subscript x] features deposited from a tetraethoxysilane (TEOS) precursor vapor as a masking layer for amorphous silicon thin films. A bilayer process implemented a secondary masking layer consisting of standard photoresist into which a pattern--directly written by EBID tungsten from WF6 precursor--was transferred. The single layer process was found to be extremely sensitive to the etch selectivity of the plasma etch. As a result, patterns were successfully transferred into silicon, but only to a minimal depth. In the bilayer process, EBID tungsten was written onto photoresist and the pattern transferred by means of an oxygen plasma dry development. A brief refractory descum plasma etch was implemented to remove the peripheral tungsten contamination prior to the development process. Conditions were developed to reduce the spatial spread of electrons in the photoresist layer and obtain minimal linewidths, which enabled patterning of [sim] 35 nm lines. Additionally, an EBID-based technique for field emitter repair was applied to the Digital Electrostatically focused e-beam Array Lithography (DEAL) parallel electron beam lithography configuration. Damaged or missing carbon nanofiber (CNF) emitters are very common in these prototype devices, so there is a need for a deterministic repair process. Relatively carbon-free, high aspect ratio tungsten nanofibers were deposited from a WF6 precursor in a gated cathode and a damaged triode (DEAL) device. The I-V response of the devices during vacuum FE testing indicated stable, cold field emission from the EBID cathodes. The field emission threshold voltage was shown to decrease from -130 V to -90 V after a short initiation period. Finally, lithography was performed using the repaired device to write a series of lines in PMMA with variable focus voltage. Successful focusing of the beam with increased focus voltage was evident in the patterned and developed PMMA. The I-V and lithography results were comparable to CNF-based DEAL devices indicating a successful repair technique.
Download or read book Electron Beam Chemical Vapor Deposition of Platinum and Carbon written by David Cartier Beaulieu and published by . This book was released on 2005 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Electron Beam Chemical Vapor Deposition (EBCVD) is a process by which an electron beam is used to decompose adsorbed reagent molecules to produce a deposit. The primary electrons from the beam, and especially the secondary electrons emitted from the substrate, dissociate the adsorbed molecules. Important factors for the deposition process include the beam parameters and reagent gas composition. Simple structures are fabricated through utilization of the various scanning modes of an SEM. Fibers (pillar-like structures) can be deposited, and lines (wall-like structures) can be deposited easily. This investigation focuses on the process parameters controlling deposition rate and geometry for platinum and carbon fibers and lines in a modified SEM. Platinum deposition was performed using a system with a small diameter needle that supplied a localized flow of gas from an organometallic platinum compound. Carbon deposition was performed in the Environmental mode, in which the microscope chamber is filled with a specified pressure of reagent gas. Statistically designed experiments were performed for platinum fiber and line deposition. Analysis indicated that the beam current and deposition time were dominant factors in determining the deposition rate. The voltage also had a significant effect on fiber deposition. For platinum line deposition, the effects of the dwell time and line time were also studied. The line time had a significant effect on line height deposited per scan. Optimization analysis was performed, and results indicated that high voltage and high beam current led to higher aspect ratios. Medium voltage and low beam current were preferable for depositing minimal width lines (200 nm). Low voltage and high beam current were preferable for maximum deposition rates. EDS and EELS performed for platinum deposits in a TEM indicated amorphous structure with no carbon detected. This differs significantly from previously reported results. Statistically designed experiments were performed for carbon line deposition. The voltage, beam current, and dwell/line time were studied. Increasing line time led to a significant increase in line height/scan and appeared to be a dominant factor. Lower beam currents appeared to favor higher deposition rates. TEM analysis indicated that carbon deposits were mostly amorphous.
Download or read book Low Energy Electrons written by Oddur Ingólfsson and published by CRC Press. This book was released on 2019-04-23 with total page 274 pages. Available in PDF, EPUB and Kindle. Book excerpt: Low-energy electrons are ubiquitous in nature and play an important role in natural phenomena as well as many potential and current industrial processes. Authored by 16 active researchers, this book describes the fundamental characteristics of low-energy electron–molecule interactions and their role in different fields of science and technology, including plasma processing, nanotechnology, and health care, as well as astro- and atmospheric physics and chemistry. The book is packed with illustrative examples, from both fundamental and application sides, features about 130 figures, and lists over 800 references. It may serve as an advanced graduate-level study course material where selected chapters can be used either individually or in combination as a basis to highlight and study specific aspects of low-energy electron–molecule interactions. It is also directed at researchers in the fields of plasma physics, nanotechnology, and radiation damage to biologically relevant material (such as in cancer therapy), especially those with an interest in high-energy-radiation-induced processes, from both an experimental and a theoretical point of view.
Download or read book Magneto Luminous Chemical Vapor Deposition written by Hirotsugu Yasuda and published by CRC Press. This book was released on 2011-04-04 with total page 256 pages. Available in PDF, EPUB and Kindle. Book excerpt: The magneto luminous chemical vapor deposition (MLCVD) method is the perfect example of the "front-end green process." It employs an entirely new process that expends the minimum amount of materials in gas phase, yields virtually no effluent, and therefore requires no environmental remediation. Unlike the "back-end green process," which calls for a
Download or read book JJAP written by and published by . This book was released on 2005 with total page 1220 pages. Available in PDF, EPUB and Kindle. Book excerpt:
